• Transactions of the Korean Society of Mechanical Engineers A
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• v.37 no.11
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• pp.1339-1347
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• 2013

Creep through nanoindentations has attracted increasing research attention in recent years. Many studies related to indentation creep tests, however, have simply focused on the characteristics of steady-state creep, and there exist wide discrepancies between the uniaxial test and the indentation test. In this study, we performed a computational simulation of spherical indentations, and we proposed a method for evaluating the creep properties considering transient creep. We investigated the material behavior with variation of creep properties and expressed it using regression equations for normalized variables. We finally developed a program to evaluate the creep properties considering transient creep. By using the proposed method, we successfully obtained creep exponents with an average error less than 1.1 and creep coefficients with an average error less than 2.3 from the load-depth curve.

• Journal of the Korean Society for Nondestructive Testing
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• v.33 no.2
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• pp.129-137
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• 2013

A force calibration of a nanoindenter and a 3D morphology observation of indenters were carried out in this study. A microbalance calibrated with standard weights was used for measuring the loads generated by a nanoindenter. The indentation load could be calibrated from the ratio of measured and generated loads and the first contact load also could be detected from the microbalance data. By analyzing atomic force microscopy images of two indenters, curvature radii of apexes were determined by $19.71{\pm}3.03$ and $1043.94{\pm}50.91$ nm, respectively, for the nearly new indenter A and the severly worn indenter B. Corresponding bluntness depths were estimated by 1.22 and 64.56 nm for the both indenters by overlapping their profiles on the perfect pyramidal shape. In addition, nanoindentation curves obtained from a fused silica reference material with the both indenters showed a depth difference corresponding to the bluntness depth difference along the indentation depth axis. By shifting amounts of the bluntness depths along the horizontal axis, whole nanoindentation curves overlapped on themselves and resulted in nanohardness values consistent within 1.11 % without considering the complex indenter area function of each indenter.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2000.11a
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• pp.3-4
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• 2000

Many researchers are interested in the synthesis and characterization of carbon nitride and diamond-like carbon (DLq because they show excellent mechanical properties such as low friction and high wear resistance and excellent electrical properties such as controllable electical resistivity and good field electron emission. We have deposited amorphous carbon nitride (a-C:N) thin films and DLC thin films by shielded arc ion plating (SAIP) and evaluated the structural and tribological properties. The application of appropriate negative bias on substrates is effective to increase the film hardness and wear resistance. This paper reports on the deposition and tribological OLC films in relation to the substrate bias voltage (Vs). films are compared with those of the OLC films. A high purity sintered graphite target was mounted on a cathode as a carbon source. Nitrogen or argon was introduced into a deposition chamber through each mass flow controller. After the initiation of an arc plasma at 60 A and 1 Pa, the target surface was heated and evaporated by the plasma. Carbon atoms and clusters evaporated from the target were ionized partially and reacted with activated nitrogen species, and a carbon nitride film was deposited onto a Si (100) substrate when we used nitrogen as a reactant gas. The surface of the growing film also reacted with activated nitrogen species. Carbon macropartic1es (0.1 -100 maicro-m) evaporated from the target at the same time were not ionized and did not react fully with nitrogen species. These macroparticles interfered with the formation of the carbon nitride film. Therefore we set a shielding plate made of stainless steel between the target and the substrate to trap the macropartic1es. This shielding method is very effective to prepare smooth a-CN films. We, therefore, call this method "shielded arc ion plating (SAIP)". For the deposition of DLC films we used argon instead of nitrogen. Films of about 150 nm in thickness were deposited onto Si substrates. Their structures, chemical compositions and chemical bonding states were analyzed by using X-ray diffraction, Raman spectroscopy, X-ray photoelectron spectroscopy and infrared spectroscopy. Hardness of the films was measured with a nanointender interfaced with an atomic force microscope (AFM). A Berkovich-type diamond tip whose radius was less than 100 nm was used for the measurement. A force-displacement curve of each film was measured at a peak load force of 250 maicro-N. Load, hold and unload times for each indentation were 2.5, 0 and 2.5 s, respectively. Hardness of each film was determined from five force-displacement curves. Wear resistance of the films was analyzed as follows. First, each film surface was scanned with the diamond tip at a constant load force of 20 maicro-N. The tip scanning was repeated 30 times in a 1 urn-square region with 512 lines at a scanning rate of 2 um/ s. After this tip-scanning, the film surface was observed in the AFM mode at a constant force of 5 maicro-N with the same Berkovich-type tip. The hardness of a-CN films was less dependent on Vs. The hardness of the film deposited at Vs=O V in a nitrogen plasma was about 10 GPa and almost similar to that of Si. It slightly increased to 12 - 15 GPa when a bias voltage of -100 - -500 V was applied to the substrate with showing its maximum at Vs=-300 V. The film deposited at Vs=O V was least wear resistant which was consistent with its lowest hardness. The biased films became more wear resistant. Particularly the film deposited at Vs=-300 V showed remarkable wear resistance. Its wear depth was too shallow to be measured with AFM. On the other hand, the DLC film, deposited at Vs=-l00 V in an argon plasma, whose hardness was 35 GPa was obviously worn under the same wear test conditions. The a-C:N films show higher wear resistance than DLC films and are useful for wear resistant coatings on various mechanical and electronic parts.nic parts.