• Applied Science and Convergence Technology
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• 제27권1호
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• pp.9-13
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• 2018

Samples of anodic oxide film used in semiconductor and display manufacturing processes were prepared at different electrolyte temperatures to investigate the corrosion resistance. The anodic oxide film was grown on aluminum alloy 6061 by using a sulfuric acid ($H_2SO_4$) electrolyte of 1.5 M at $0^{\circ}C$, $5^{\circ}C$, $10^{\circ}C$, $15^{\circ}C$, and $20^{\circ}C$. The insulating properties of the samples were evaluated by measuring the breakdown voltage, which gradually increased from 0.43 kV ($0^{\circ}C$) to 0.52 kV ($5^{\circ}C$), 1.02 kV ($10^{\circ}C$), and 1.46 kV ($15^{\circ}C$) as the electrolyte temperature was increased from $0^{\circ}C$ to $15^{\circ}C$, but then decreased to 1.24 kV ($20^{\circ}C$). To evaluate the erosion of the film by fluorine plasma, the plasma erosion and the contamination particles were measured. The plasma erosion was evaluated by measuring the breakdown voltage after exposing the film to $CF_4/O_2/Ar$ and $NF_3/O_2/Ar$ plasmas. With exposure to $CF_4/O_2/Ar$ plasma, the breakdown voltage of the film slightly decreased at $0^{\circ}C$, by 0.41 kV; however, the breakdown voltage significantly decreased at $20^{\circ}C$, by 0.83 kV. With exposure to $NF_3/O_2/Ar$ plasma, the breakdown voltage of the film slightly decreased at $0^{\circ}C$, by 0.38 kV; however, the breakdown voltage significantly decreased at $20^{\circ}C$, by 0. 77 kV. In addition, for the entire temperature range, the breakdown voltage decreased more when sample was exposed to $NF_3/O_2/Ar$ plasma than to $CF_4/O_2/Ar$ plasma. The decrease of the breakdown voltage was lower in the anodic oxide film samples that were grown slowly at lower temperatures. The rate of breakdown voltage decrease after exposure to fluorine plasma was highest at $20^{\circ}C$, indicating that the anodic oxide film was most vulnerable to erosion by fluorine plasma at that temperature. Contamination particles generated by exposure to the $CF_4/O_2/Ar$ and $NF_3/O_2/Ar$ plasmas were measured on a real-time basis. The number of contamination particles generated after the exposure to the respective plasmas was lower at $5^{\circ}C$ and higher at $0^{\circ}C$. In particular, for the entire temperature range, about five times more contamination particles were generated with exposure to $NF_3/O_2/Ar$ plasma than for exposure to $CF_4/O_2/Ar$ plasma. Observation of the surface of the anodic oxide film showed that the pore size and density of the non-treated film sample increased with the increase of the temperature. The change of the surface after exposure to fluorine plasma was greatest at $0^{\circ}C$. The generation of contamination particles by fluorine plasma exposure for the anodic oxide film prepared in the present study was different from that of previous aluminum anodic oxide films.

• 대한원격탐사학회지
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• 제36권6_1호
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• pp.1465-1483
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• 2020

증발산은 토양으로부터 발생하는 증발과 식물의 잎에서 발생하는 증산을 통칭하는 것으로, 물 수지, 가뭄, 작물생장, 기후변화 등의 모니터링에 있어 중요한 요소이다. 실제증발산은 식생 지표면의 물 소비량 또는 물 필요량이며 기준증발산에 작물계수를 곱하여 구하므로, 농지의 실제증발산을 구하기 위해서는 기준증발산의 계산이 정확히 이루어져야 한다. 격자형 기준증발산을 합리적으로 산출하기 위하여 그동안 많은 노력들이 있었고 복수의 산출물이 제공되고 있다. 이에 본 연구에서는 FAO56-PM, LDAPS, PKNU-NMSC, MODIS 기준증발산 산출물을 비교평가 함으로써, 우리나라처럼 복합적이고 이질적인 지표면에서 국지적 규모의 수문 및 농업 분야에 활용하기 위하여 어떤 기준증발산 산출 방법이 적합한지 살펴보고자 한다. 2016~2019년 3~11월의 1일 단위 자료와 8일 합성 자료를 기상청 현장관측치와 비교하여 지점별, 연도별, 월별로 분석하고 시계열변화를 검토한 결과, 기계학습을 통해 우리나라 농지에 대한 지역최적화가 상당히 잘 수행된 PKNU-NMSC 자료의 정확도가 월등히 높게 나타났으며, 시간과 장소에 상관없이 안정적인 산출이 이루어졌음을 확인하였다. 또한 본연구에서는 FAO56-PM, LDAPS, MODIS 산출물에 내재한 정확도 특성을 제시하였으며, 이는 기준증발산 자료 사용에 있어 중요한 정보가 될 것으로 기대한다.