• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집
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• pp.232-235
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• 2002

An 150 kV gas cluster ion accelerator was fabricated and assessed. The change of surface morphology and surface roughness were examined by an atom force microscope (AFM) after irradiation of $CO_2$ gas clusters on Si (100) surfaces at the acceleration voltages of 50 kV. The density of hillocks induced by cluster ion impact was gradually increased with the dosage up to 5$\times$10$^{11}$ ions/$\textrm{cm}^2$. At the boundary of the ion dosage of 10$^{12}$ ions/$\textrm{cm}^2$, the density of the induced hillocks was decreased and RMS (root mean square) surface roughness was not deteriorated further. At the dosage of 5x10$^{13}$ ions/$\textrm{cm}^2$, the induced hillocks completely disappeared and the surface became very flat. In addition, the irradiated region was sputtered. $CO_2$ cluster ions are irradiated at the acceleration voltage of 25 kV to remove hillocks on indium tin oxide (ITO) surface and thus to attain highly smooth surfaces. $CO_2$ monomer ions are also bombarded on the ITO surface at the same acceleration voltage to compare sputtering phenomena. From the AFM results, the irradiation of monomer ions make the hillocks sharper and the surfaces rougher On the other hand, the irradiation of $CO_2$ cluster ions reduces the hight of hillocks and planarize the ITO surfaces. From the experiment of isolated cluster ion impact on the Si surfaces, the induced hillocks m high had the surfaces embossed at the lower ion dosages. The surface roughness was slightly increased with the hillock density and the ion dosage. At higher than a critical ion dosage, the induced hillocks were sputtered and the sputtered particles migrated in order to fill valleys among the hillocks. After prolonged irradiation of cluster ions, the irradiated region was very flat and etched.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.368.2-368.2
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• 2014

$SnO_2$을 이용한 반도체는 기체 센서, 트랜지스터, 태양전지와 같은 여러 분야에 적용 가능하기 때문에 많은 각광을 받고 있다. $SnO_2$을 이용한 반도체 소자는 높은 화학적 안정성과 독특한 물리 화학적 특성을 지니고 있을 뿐만 아니라 부피에 대한 높은 표면적 비율을 가지고 있다. 우수한 $SnO_2$나노구조를 얻기 위해서 전자관 박막증착, 졸겔법, 물리적 증기증착, 열증착과 같은 다양한 방법들이 사용되었다. 다양한 합성 방법들 중에서 전기화학 증착법은 높은 성장율, 대면적 공정, 낮은 가격과 같은 장점을 가지고 있어 많은 연구가 진행되었지만, $SnO_2$ 구조의 성장조건에 따른 체계적인 연구는 진행되지 않았다. 본 연구는 indium-tin-oxide (ITO)로 코팅된 유리 기판 위에 전기화학 증착법을 사용하여 다양한 성장 조건에 따라 성장된 $SnO_2$나노구조들의 물리적 특성들을 관찰하였다. ITO 유리 기판 위에 성장된 $SnO_2$나노구조는 음극의 전구체와 전류의 상호작용에 의해 생성되는 산소 분자의 환원에 의해 형성된다. $SnO_2$나노구조의 모양은 전기화학 증착의 성장 환경에 따라 달라진다. $SnO_2$나노구조를 관찰하기 위해 시간에 따른 전압-전류, X-ray광전자분광법, 주사형전자현미경, X-ray회절분석법을 사용하여 측정하였다. ITO 유리 기판 위에 성장한 $SnO_2$ 소자에 서로 다른 인가 전압을 가해 주었을 때에 따른 전류밀도를 측정하였다. 일정한 인가전압에서 $SnO_2$나노구조의 X-ray광전자분광법 측정 을 통해 화학적 결합과 X-ray회절분석법 통한 $SnO_2$ 성장 방향을 관찰하였다. 주사형전자현미경 측정을 통하여 $SnO_2$의 표면을 관찰하였다

• Journal of information and communication convergence engineering
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• 제3권4호
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• pp.179-183
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• 2005

A photodiode capable of obtaining a sufficient photo/ dark current ratio at both forward bias state and reverse bias state is proposed. The photodiode includes a glass substrate, an aluminum film formed as a lower electrode over the glass substrate, an alumina film formed as an insulator barrier over the aluminum film, a hydrogenated amorphous silicon film formed as a photo conduction layer over a portion of the alumina film, and a transparent conduction film formed as an upper electrode over the hydro-generated amorphous silicon film. A good quality alumina $(Al_2O_3)$ film is formed by oxidation of aluminum film using electrolyte solution of succinic acid. Alumina is used as a potential barrier between amorphous silicon and aluminum. It controls dark-current restriction. In case of photodiodes made by changing the formation condition of alumina, we can obtain a stable dark current $(\~10^{-12}A)$ in alumina thickness below $1000{\AA}$. At the reverse bias state of the negative voltage in ITO (Indium Tin Oxide), the photo current has substantially constant value of $5{\times}10^{-9}$ A at light scan of 100 1x. On the other hand, the photo/dark current ratios become higher at smaller thicknesses of the alumina film. Therefore, the alumina film is used as a thin insulator barrier, which is distinct from the conventional concept of forming the insulator barrier layer near the transparent conduction film. Also, the structure with the insulator thin barrier layer formed near the lower electrode, opposed to the ITO film, solves the interface problem of the ITO film because it provides an improved photo current/dark current ratio.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.111-114
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• 1999

Electroluminescence(EL) devices based on organic thin films have been attracted lots of interests in large-area light-emitting display. In this stuffy, an emissive layer was fabricated using Langmuir-Blodgett(LB) technique in organic light-emitting (OLEDs). This emissive organic material was synthesized and named PECCP[poly(3.6-N-2-ethylhexyl carbazolyl cyanoterephthalidene)] which has a strong electron donor group and an electron acceptor group in main chain repeated unit. This material has good solubility in common organic solvents such as chloroform. THF, etc, and has a good stability in air. The Langmuir-Blodgett(LB) technique has the advantage of precise control of the thickness down to the molecular scale, In particular, by varying the film thickness it is possible to investigate the metal/polymer interface. Optimum conditions for the LB film deposition are usually determined by investigating a relationship between a surface pressure $\pi$ and an effective are A occupied by one molecule on the subphase. The LB films were deposited on an indium-tin-oxide(ITO) glass at a surface pressure of 10 mN/m and dipping speed of 12 mm/min after spreading PECCP solution on distilled water surphase at room temperature, Cell structure was ITO/PECCP LB film/Alq$_3$/Al. We considered PECCP as a hole -transport layer inserted between the emissive layer and ITO. We also used Alq$_3$ as an emissive layer and an electron transport layer. We measured current-voltage(I-V) characteristics, UV/visible absorption, PL spectrum and EL spectrum of the OLEDs.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.1
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• pp.158-161
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• 2004

We have studied a lifetime in organic light-emitting diodes depending on buffer layer. A transparent electrode of indium-tin-oxide(ITO) was used as an anode. And the cathode for electron injection was LiAl. Phthalocyanine Copper(CuPc), Poly(3,4-ethylenedioxythiophene):poly (PEDOT:PSS), or poly (9-vinylcarbazole)(PVK) material was used as a buffer layer. A thermal evaporation was performed to make a thickness of 40nm of TPD layer at a rate of $0.5{\sim}1\;{\AA}/s$ at a base pressure of $5{\times}10^{-6}\;torr$. A material of tris(8-hydroxyquinolinate) Aluminum($Alq_3$) was used as an electron transport and emissive layer. A thermal evaporation of $Alq_3$ was done at a deposition rate of $0.7{\sim}0.8[{\AA}/s]$ at a base pressure of $5{\times}10^{-6}\;torr$. By varying the buffer material, hole injection at the interface could be controlled because of the change in work function. Devices with CuPc and PEDOT:PSS buffer layer are superior to the other PVK buffer layer.

• 마이크로전자및패키징학회지
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• 제21권1호
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• pp.7-11
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• 2014

최근 유기태양전지의 효율향상을 위하여 고분자의 PEDOT:PSS 양극(Anode) 버퍼층이 널리 사용되고 있다. 그러나 고효율 태양전지의 개발과 더불어 새로이 적용되고 있는 역구조 유기 태양전지에는 이 같은 친수성의 PEDOT:PSS 고분자가 소수성의 양극이나 광활성층 상에 균일하게 코팅되는 것이 문제점으로 지적되고 있다. 이러한 문제점을 극복하기 위해서 양극 버퍼층으로 $V_2O_5$와 같은 p-type 금속산화물을 사용한 연구가 많이 보고되고 있다. 본 연구에서는 저항을 낮추고 홀 이동도를 향상 시키기 위해 Ag를 삽입층으로 한 $V_2O_5$/Ag/ITO 구조의 다층 박막을 제작하고 Ag두께에 따른 전기적, 광학적, 구조적 특성의 변화에 대하여 살펴보았다. 가시광 영역에서는 Ag 두께가 증가함에 따라 광 투과율이 감소하는 반면 전기적 특성은 향상되는 것을 볼 수 있었다. 광소자의 투명전극산화물로 적합한 구조인지 평가하기 위해 Figure Of Merit(FOM)의 값을 측정하였고, 그 결과 Ag의 두께가 4 nm에서 가장 좋은 특성을 나타냈다. $V_2O_5$/Ag/ITO 구조의 다층 박막은 가시광 영역에서 Ag의 두께가 4 nm일 때 88%의 광 투과율을 나타내었고 저항 값은 $4{\times}10^{-4}{\Omega}cm$로써 광소자로 적합한 구조임을 확인하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 하계학술대회 논문집 Vol.9
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• pp.66-66
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• 2008

Most of the properties of ITO films depend on their substrate nature, deposition techniques and ITO film composition. For the display panel application, it is normally deposited on the glass substrate which has high strain point (>575 degree) and must be deposited at a temperature higher than $250^{\circ}C$ and then annealed at a temperature higher than $300^{\circ}C$ in order to high optical transmittance in the visible region, low reactivity and chemical duration. But the high strain point glass (HSPG) used as FPDs is blocking popularization of large sizes FPDs because it is more expensive than a soda lime glass (SLG). If the SLG could be used as substrate for FPDs, then diffusion of Na ion from the substrate occurs into the ITO films during annealing or heat treatment on manufacturing process and it affects the properties. Therefore proper care should be followed to minimize Na ion diffusion. In this study, we investigate the electrical, optical and structural properties of ITO films deposited on the SLG and the Asahi glass(PD200) substrate by rf magnetron sputtering using a ceramic target ($In_2O_3:SnO_2$, 90:10wt.%). These films were annealed in $N_2$ and air atmosphere at $400^{\circ}C$ for 20min, 1hr, and 2hrs. ITO films deposited on the SLG show a high electrical resistivity and structural defect as compared with those deposited on the PD200 due to the Na ion from the SLG on diffuse to the ITO film by annealing. However these properties can be improved by introducing a barrier layer of $SiO_2$ or $Al_2O_3$ between ITO film and the SLG substrate. The characteristics of films were examined by the 4-point probe, FE-SEM, UV-VIS spectrometer, and X-ray diffraction. SIMS analysis confirmed that barrier layer inhibited Na ion diffusion from the SLG.

• 한국재료학회지
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• 제4권8호
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• pp.861-869
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• 1994

Chemical vapor deposition using titanium tetra isopropoxide(TTIP) was employed to investigate effects of process parameters on the uniformity of $TiO_{2}$this films deposited on Indium Tin Oxide (ITO)coated glass. Deposition experiments were carried out at temperatures ranging from $300^{\circ}C$ to $400^{\circ}C$ under the pressure of 0.5~2 torrin a cold wall reactor which can handle 200mm substrate. It was found that the growth rate of $TiO_{2}$was closely related to the reaction temperature and the ractant gas compositions. Apparent activation energy for the deposition rate was 62.7lkJ/mol in the absence of $O_{2}$ and 100.4kj/mol in the presence of $O_{2}$, respectively. Homogeneous reactions in the gas phase were promoted when the total pressure of the reactor was increased. Variance in the film thickness was less than a few percent, but at high deposition rates film thickness was less uniform. Effects of reaction temperature on $TiO_{2}$ thin film characteristic was investigated with SEM, XRD and AES.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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• pp.361-361
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• 2012

PZT (Pb(Zr,Ti)O3) thin films have been used widely in the MEMS application, due to their inherent ferroelectric and piezoelectric properties. Such ferroelectricity induces much higher dielectric constants compared to those of the nonperovskite materials. In this work, the PZT thin films were deposited onto Indium-Tin-oxide (ITO) substrates through the spin-coating of PZT sols. The deposited PZT thin films were characterized in terms of the electrical and optical properties with special emphases on conductivity and optical constants. The detailed analysis techniques incorporate the dc-based current-voltage characteristics for the electrical properties, spectroscopic ellipsometry for optical characterization, atomic force microscopy for surface morphology, X-ray Photoelectron Spectroscopy for chemical bonding, Energy-dispersive X-ray Spectrometry for chemical analyses and X-ray diffraction for crystallinity. The ferroelectric phenomena were confirmed using capacitance-voltage measurements. The integrated physical/chemical features are attempted towards energy-oriented applications applicable to next-generation high-efficiency power generation systems.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.201.1-201.1
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• 2015

복합 유무기 혼합물을 사용하여 제작한 유기 쌍안정 메모리 소자는 저전력 소비, 고밀도 저장성, 높은 기계적 유연성, 저렴한 가격, 간단한 공정 과정 등의 장점들로 인하여 메모리 분야에서 많은 관심을 받고 있다. 그래핀 옥사이드층을 활용하여 만든 소자에 관한 연구는 이미 다양하게 진행되고 있으나, CdSe/ZnS 양자점을 활용한 메모리 소자에 관한 연구는 아직 많이 연구되고 있지 않다. 본 연구에서는 CdSe/ZnS 양자점을 그래핀 옥사이드에 내포한 유기 쌍안정 메모리 소자를 제작하여 메모리로써의 활용 가능성과 메커니즘을 확인하였다. Indium-tin-oxide (ITO) 기판을 세척한 후, CdSe/ZnS 양자점을 내포한 그래핀 옥사이드 층을 스핀코팅을 이용하여 1000 rpm, 3000 rpm, 1000 rpm으로 각각 3 s, 40 s, 3 s로 코팅한 후 핫플레이트에서 90oC로 30분 동안 열처리 한다. 이렇게 제작된 소자의 실온에서 전류-전압을 측정한 결과 높은 전도도와 낮은 전도도의 비율이 최대 [10]^3까지 나오는 것을 확인할 수 있었다. 투과전자 현미경 및 X선 광전자 분광법 측정결과 그래핀 옥사이드 층과 그 안에 내포된 양자점들의 유무를 확인할 수 있었다. 내구성을 측정한 결과 소자가 안정적이라는 것을 확인할 수 있었다.