• 제목/요약/키워드: Hydrogen Plasma

검색결과 564건 처리시간 0.039초

수소 플라즈마 처리된 산화 아연 나노선의 자외선 발광 특성향상 (Improvement of UV Photoluminescence of Hydrogen Plasma Treated ZnO Nanowires)

  • 강우승;박성훈
    • 한국진공학회지
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    • 제22권6호
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    • pp.291-297
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    • 2013
  • Au 촉매를 코팅한 사파이어 기판 상에서 산화아연과 흑연 분말을 혼합한 분말재료를 이용하여 VLS (vapor-liquid-solid) 법으로 산화아연 반도체 나노선을 합성하였다. 제조된 산화아연 나노선은 380 nm에서 근 자외선 영역의 NBE (near-band edge) 발광과 600 nm 부근의 가시광선 영역에서 넓게 퍼져 발광하는 상대적으로 강한 DL (deep level) 발광이 확인되었다($I_{NBE}/I_{DL}$ <1). 산화아연 나노선을 효율적인 단일 파장 자외선 발광체에 적용될 수 있도록 NBE 발광을 극대화함과 동시에 DL 발광을 억제시키기 위하여 본 실험에서는 합성된 산화아연 나노선에 수소 플라즈마 처리를 하였다. 플라즈마 처리시간이 길어짐에 따라(120초 이상) 발광특성의 향상정도는 점차로 감소하였지만, 수소 플라즈마 처리를 통해 나노선 내부에 존재하는 불순물 제어 등으로 다소 짧은 시간의 플라즈마 처리로(90초 이내) DL발광대비 NBE발광의 세기가 약 4배로 향상됨을 확인 하였다($I_{NBE}/I_{DL}$ ~4).

수소 플라즈마 에칭과 탄소 확산법에 의한 다이아몬드막 표면의 평탄화 (Planarization of the Diamond Film Surface by Using the Hydrogen Plasma Etching with Carbon Diffusion Process)

  • 김성훈
    • 대한화학회지
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    • 제45권4호
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    • pp.351-356
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    • 2001
  • 철, 코발트, 니켈 합금을 이용한 탄소확산-수소플라즈마 에칭법으로 다이아몬드 자체막의 표면을 매우 평탄하게 할 수 있었다. 이 방법에서의 다이아몬드 자체막을 합금과 몰리브데늄 기판 사이에 위치시켜 금속-다이아몬드-몰리브데늄(MDM) 샌드위치 형태의 샘플 세 트를 이루게 하였다. 이 샘플세트를 마이크로 웨이브 플라즈마 장치에 장착하여 수소 플라즈마를 발생시켜서 기판온도가 섭씨 1,000 이상이 되도록 하였다. 이와 같은 과정들은 탄소확산-수소플라즈마 방법이라고 하였다. 다이아몬드 자체막 표면을 에칭한 후 표면 거칠기, 표면형상, 에칭한 다이아몬드 표면속의 불순물의 침투를 조사하였다. 결론적으로, 탄소 확산-수소 플라즈마 에칭법은 전자 디바이스에 응용할 수 있는 매우 평탄한 다이아몬드 표면을 형성시키는 방법임을 알 수 있다.

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플라즈마 원자층증착 초박막전해질 수소 세라믹연료전지의 초기성능 저하 (Initial Performance Degradation of Hydrogen-Fueled Ceramic Fuel Cell with Plasma-Enhanced Atomic Layer-Deposited Ultra-Thin Electrolyte)

  • 지상훈
    • 한국수소및신에너지학회논문집
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    • 제32권5호
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    • pp.340-346
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    • 2021
  • The initial electrochemical performance of ceramic fuel cell with thin-film electrolyte fabricated by plasma-enhanced atomic layer deposition method was evaluated in terms of peak power density ratio, open circuit voltage ratio, and activation/ohmic resistance ratios at 500℃. Hydrogen and air were used as anode fuel and cathode fuel, respectively. The peak power density ratio reduced as ~52% for 30 min, which continually decreased as time increased but degradation rate gradually decreased. The open circuit voltage ratio decreased with respect time; however, its behavior was evidently different from the reduction behavior of the peak power density. The activation resistance ratio increased as ~127% for 30 min, which was almost similar with the reduction behavior of the peak power density ratio.

회전 아크 적용 플라즈마 저 NOx 버너 연소특성 (Characteristics of Low NOx Plasma Burner Incorporating with Rotating Arc Plasma)

  • 김관태;강희석;이대훈;송영훈;박재언
    • 한국수소및신에너지학회논문집
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    • 제22권6호
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    • pp.934-941
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    • 2011
  • Characteristics of low NOx burner is investigated. Low NOx burner introduced in this paper adopts two staged combustion with plasma burner for the 1st stage combustion. Extensive parametric tests were done to figure out the effect of burner stoichiometry, staged thermal load, electric power for plasma generation. Overall NOx production by burner shows effective reduction by adopting plasma staged burner. and the aspects depends on the fuel stoichiometry of 1st stage burner or operating condition of plasma burner. It is promising to use plasma burner as an alternative tools of low NOx burner technology.

Study on the Effects of Ultrasonic Wave for the Effective Hydrogen Generation by Electrical Discharge Plasma Process

  • Park Jae-Youn;Cong Nghi-Vu;Han Sang-Bo;Kim Jong-Seok;Park Sang-Hyun;Lee Hyun-Woo;Lee Su-Jung
    • 한국전기전자재료학회논문지
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    • 제19권6호
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    • pp.591-598
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    • 2006
  • The research was tried to investigate the hydrogen generation from water by the pulsed power plasma process. Hydrogen was generated by way of the electrical pulse power discharge process with the ultrasonic wave. The yield on the hydrogen generation was also studied with and without operating the ultrasonic generator, in which the applied high voltage was varied from 10 kV to 15 kV. Nitrogen and argon gases were used as working gases. As the results, the generation yield using the pure nitrogen gas is better than argon and mixed gases such as argon and nitrogen. Hydrogen concentration are significantly increased when the ultrasonic generator was operated with the electrical discharge simultaneously. It is increased with increasing the applied ultrasonic level as well.

초고진공 전자공명 플라즈마를 이용한 SiC buffer layer 형성에 관한 연구 (A Study on SiC Buffer Layer Prepared by Ultra High Vacuum Electron Cyclotron Resonance CVD)

  • 전우곤;표재확;황기웅
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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    • pp.326-328
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    • 1995
  • SiC buffer layers were grown on Si(100) substrates by ultra-high-vacuum electron cryclotron resonance plasma (UHV ECR plasma) from $CH_4/H_2$ mixture at 700$^{\circ}C$. The electron densities and temperature were measured by single probe. The axial plasma potentials measured by emissive probe had the double layer structure at positive substrate bias. Piranha cleaning was carried out as ex-situ wet cleaning. Clean and smooth silicon surface were prepared by in-situ hydrogen plasma cleaning at 540$^{\circ}C$. A short exposure to hydrogen plasma transforms the Si surface from 1$\times$1 to 2$\times$1 reconstruction. It was monitored by reflection high energy electron diffraction (RHEED). The defect densities were analysed by the dilute Schimmel etching. The results showed that the substrate bias is important factor in hydrogen plasma cleaning. The low base pressure ($5\times10^{-10}$ torr) restrains the $SiO_2$ growth on silicon surface. The grown layers showed different characteristics at various substrate bias. RHEED and K-ray Photoelectron spectroscopy study showed that grown layer was SiC.

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Heteroepitaxial Growth of Diamond Films Synthesized by Microwave Plasma Enhanced Chemical Vapor Deposition

  • Kim, Yoon-Kee;Lee, Jai-Young
    • The Korean Journal of Ceramics
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    • 제2권4호
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    • pp.197-202
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    • 1996
  • The highly oriented diamond particles were deposited on the mirror-polished (100) silicon substrates in the bell-jar type microwave plasma deposition system using a three-step process consisting if carburization, bias-enhanced nucleation and growth. By adjusting the geometry of the substrate and substrate holder, very dense disc-shaped plasma was formed over the substrate when the bias voltage was below -200V. Almsot perfectly oriented diamond films were obtained only in this dense disc-shaped plasma. From the results of the optical emission spectra of the dense disc-shaped plasma, it was found that the concentrations of atomic hydrogen and hydrocarbon radical were increased with negative bias voltage. It was also found that the highly oriented diamonds were deposited in the region, where the intensity ratios of carbonaceous species to atomic hydrogen are saturated.

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Characteristics of a Titanium-oxide Layer Prepared by Plasma Electrolytic Oxidation for Hydrogen-ion Sensing

  • Lee, Do Kyung;Hwang, Deok Rok;Sohn, Young-Soo
    • 센서학회지
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    • 제28권2호
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    • pp.76-80
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    • 2019
  • The characteristics of a titanium oxide layer prepared using a plasma electrolytic oxidation (PEO) process were investigated, using an extended gate ion sensitive field effect transistor (EG-ISFET) to confirm the layer's capability to react with hydrogen ions. The surface morphology and element distribution of the PEO-processed titanium oxide were observed and analyzed using field-emission scanning-electron microscopy (FE-SEM) and energy-distribution spectroscopy (EDS). The titanium oxide prepared by the PEO process was utilized as a hydrogen-ion sensing membrane and an extended gate insulator. A commercially available n-channel enhancement MOS-FET (metal-oxide-semiconductor FET) played a role as a transducer. The responses of the PEO-processed titanium oxide to different pH solutions were analyzed. The output drain current was linearly related to the pH solutions in the range of pH 4 to pH 12. It was confirmed that the titanium-oxide layer prepared by the PEO process could feasibly be used as a hydrogen-ion-sensing membrane for EGFET measurements.

플라즈마 가스 개질 응용을 위한 3상 아크 플라즈마 토치 시스템 특성 실험 (Basic Performance Test of a Three Phase AC Arc Plasma Torch System for Plasma Gas Reforming)

  • 이동현;다리안;박해원;이남기;백상윤;양시영;서준호
    • 한국수소및신에너지학회논문집
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    • 제34권1호
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    • pp.8-16
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    • 2023
  • In this work, we report basic performance test results of a lab-scale three phase alternative current (AC) arc plasma torch system for plasma gas reforming applications. The suggested system primarily consists of three graphite electrodes inclined at 12.5° to the central axis, a 𝞥 150 mm cylindrical gas path and a three phase-60 Hz AC power supply. At air flow rate of 50 Lpm and arc currents of 100-175 A, test results revealed that plasma resistances were decreasing from 1.08 Ω to 0.53 Ω with the increase of plasma power from 9.3 kW to 13.8 kW, causing the decrease of power factor and increase of the line voltages. However, the injected air can be heated quickly up to the temperatures of >1,200℃ when injecting AC arc plasma powers of >10 kW.

Influence of DBD Plasma Exposure on Normal and Cancer Cells Activity

  • Panngom, Kamonporn;Baik, Ku-Youn;Ryu, Young-Huo;Choi, Eun-Ha
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.172-172
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    • 2012
  • Non-thermal plasma has attracted medical researchers, since they showed higher apoptosis rate in cancer cells than normal cells. However, it is hard to conclude general cancer cell specific effect because comparison between normal and cancer cell activities after plasma treatment have not been reported yet. This research proposes a comparison of Dielectric Barrier Discharge (DBD) plasma effect on three normal cells lines and three cancer cells lines. We measured cell number, mitochondria activity (MTS assay) and amount of hydrogen peroxide (H2O2) for three days. The results show that the number of cancer cells decreased more than normal cells following of exposure time. On the other hand, mitochondria activities and amounts of H2O2 increased following of exposure time. In addition, we found that DBD plasma exposure on cell suspension in media and media only illustrated no difference in mitochondria activity, H2O2 quantity, and cell number. Thus, we can confirm higher apoptosis rate in cancer cells which is related to the reactive oxygen species (ROS) generated by DBD plasma. The related molecular mechanisms were investigated further.

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