• Journal of the Korean institute of surface engineering
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• v.44 no.6
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• pp.269-276
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• 2011

Phase evolution and tribological behavior of Cr-Mo-N multi compositional films with different interlayer were investigated. The films were deposited by hybrid PVD (Physical Vapor Deposition) system consisted of dc unbalanced magnetron (UBM) sputtering and arc ion plating (AIP) sources. A pure molybdenum (Mo) was used as sputtering target and also a pure Cr was used as AIP target to form the Cr-Mo-N films. Various growth planes were found, no textured surface, in all of the multi composition films. Maximum value of microhardness was measured in Cr-Mo-N film with Mo interlayer as 29 GPa. Composition film was mainly showed the aspect of the adhesive wear than CrN film. The friction coefficient was decreased from 0.6 for pure CrN coating to 0.35 for Cr-Mo-N film with Mo interlayer. This result may come from the formation of metal oxide tribo-layer which is known as solid lubricant during the wear test.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2014.11a
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• pp.304-304
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• 2014

Quaternary Ti-Al-Si-N films were deposited on WC-Co substrates by a hybrid deposition system of arc ion plating (AIP) method for Ti-Al source and DC magnetron sputtering technique for Si incorporation. The synthesized Ti-Al-Si-N films were revealed to be composites of solid-solution (Ti,Al)N crystallites and amorphous $Si_3N_4$ by instrumental analyses. The Si addition in Ti-Al-N films affected the refinement and uniform distribution of crystallites by percolation phenomenon of amorphous silicon nitride, similarly to Si effect in TiN film. As the Si content increased up to about 9 at.%, the hardness of Ti-Al-N film steeply increased from 30 GPa to about 50 GPa. The highest microhardness value (~50 GPa) was obtained from the Ti-Al-Si-N film having the Si content of 9 at.%, the microstructure of which was characterized by a nanocomposite of $nc-(Ti,Al)N/a-Si_3N_4$.

• Proceedings of the Polymer Society of Korea Conference
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• 2006.10a
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• pp.309-309
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• 2006

Latest developments on hybrid nanostructured materials fabricated by applying self-assembly strategies on organic/inorganic nanotemplates are discussed. Within this frame, numerous functional nanomaterials including arrays of composite metal/semiconductor nanoparticles, planar waveguides and functional multilayer thin films are generated using self-assembled polymers as templates or building blocks. In particular, surface plasmon resonance based optical sensing is employed to investigate nanofabrication processes occurring in nanoscale dimention. We also suggest unprecedented pathways to hybrid supramolecular multilayer nanoarchitectures in 1D or 2D geometry via layer-by-layer self-assembly.

• Macromolecular Research
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• v.12 no.3
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• pp.290-292
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• 2004

Multimode channel waveguides were fabricated using a direct UV patterning technology from thick films deposited by the one-step dip-coating of an organic/inorganic hybrid material (ORMOCER(equation omitted). The core size of the covered ridge waveguide was 43${\times}$51 $\mu\textrm{m}$$^2$; the waveguides can be readily prepared for multimode applications by direct UV patterning. The waveguides exhibited smooth surface profiles and a low optical loss of 0.07 ㏈/cm at the most important wavelength (850nm) used for optical interconnects.

• Bulletin of the Korean Chemical Society
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• v.35 no.9
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• pp.2689-2693
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• 2014

The control over microstructure in block copolymer thin films using external electric fields has become an interesting research topic. In this article, the effect of nanoparticle on the microdomain alignments in block copolymer (polystyrene-b-poly(2-vinylpyridine)/nanoparticle (Au) thin films under electric fields has been examined with transmission electron microscopy. The homogeneous dispersion of Au nanoparticles into the block copolymer matrix was achieved by surface modification of nanoparticles with compatible ligands. Compared with the phenomenon seen in the pristine block copolymer thin films, a peculiar alignment behavior was observed in the block copolymer/nanoparticle hybrid thin films under electric fields. In addition, the different pathways observed in the pristine and nanoparticle incorporated block copolymer thin films were also monitored as a function of exposure time. This work can provide the fundamental information for understanding microdomain alignment in block copolymer/nanoparticle thin films under external electric fields.

• Korean Chemical Engineering Research
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• v.49 no.3
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• pp.277-284
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• 2011

In this study, UV-curing type organic - inorganic hybrid hard coating solutions were prepared from alumina sols and acrylate monomers. The mixture of alumina sols, prepared from aluminum isopropoxide, and a silane coupling agent, methacryloxypropyl trimethoxysilane(MPTMS), was used as an inorganic component. Also, the mixture of acrylate monomers, pentaerythritol triacrylate(PETA), 1,6-hexanediol diacrylate(HDDA) and dipentaerythritol hexaacrylate (DPEHA), was used as an organic component. The organic-inorganic hybrid coating solutions were obtained by mixing the inorganic component and organic component, deposited on polycarbonate substrates by spin coating and densified by UV-curing. The effect of the amount of MPTMS in the inorganic component and the irradiation time during UV-curing was studied on the properties of coating films. As a result, when 0.20 mole of MPTMS was used, the pencil hardness of coated films showed an excellent pencil hardness of 3H and also exhibited a good abrasion resistance of 2% in haze.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.136.1-136.1
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• 2015

In the present study, UHF (320 MHz) in combination with RF (13.56 MHz) plasmas was used for the synthesis of hydrogenated silicon nitride (SiNx:H) films by PECVD process at low temperature. RF/UHF hybrid plasmas were maintained at a fixed pressure of 410 mTorr in the N2/SiH4 and N2/SiH4/NH3 atmospheres. To investigate the radical generation and plasma formation and their control for the growth of the film, plasma diagnostic tools like vacuum ultraviolet absorption spectroscopy (VUVAS), optical emission spectroscopy (OES), and RF compensated Langmuir probe (LP) were utilized. Utilization of RF/UHF hybrid plasmas enables very high plasma densities ~ 1011 cm-3 with low electron temperature. Measurements using VUVAS reveal the UHF source is quite effective in the dissociation of the N2 gas to generate more active atomic N. It results in the enhancement of the Si-N bond concentration in the film. Consequently, the deposition rate has been significantly improved up to 2nm/s for the high rate synthesis of highly transparent (up to 90 %) SiNx:H film. The films properties such as optical transmittance and chemical composition are investigated using different analysis tools.

• Korean Chemical Engineering Research
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• v.49 no.5
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• pp.535-540
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• 2011

Organic-inorganic hybrid coating solutions were prepared starting from colloidal silica, lanthanum nitrate and ${\gamma}$-glycidoxypropyl trimethoxysilane by the sol-gel method. Also, spiropyran-doped hard coating solutions were prepared by mixing the spiropyran solution, obtained after dissolving spiropyran dye into tetrahydrofuran solvent, with the organic-inorgnic hybrid coating solutions. The spiropyran-doped hard coating solutions were applied as a thin layer to polycarbonate sheets, and their photochromic properties were investigated. The effect of amount of colloidal silica added into the coating solutions was investigated on the photochromic properties of coating films. Both decoloration rate and pencil hardness of the coating films were increased with increasing the amounts of colloidal silica.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2002.11a
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• pp.477-480
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• 2002

Si-O-C(-H) thin film with a tow dielectric constant were deposited on a P-type Si(100) substrate by an inductively coupled plasma chemical vapor deposition (ICPCVD). Bis-trimethylsilymethane (BTMSM, H$_{9}$C$_3$-Si-CH$_2$-Si-C$_3$H$_{9}$) and oxygen gas were used as Precursor. Hybrid type Si-O-C(-H) thin films with organic material have been generated many voids after annealing. Consequently, the Si-O-C(-H) films can be made a low dielectric material by the effect of void. The surface characterization of Si-O-C(-H) thin films were performed by SEM(scanning electron microscope). The characteristic analysis of Si-O-C(-H) thin films were performed by X-ray photoelectron spectroscopy (XPS).

• Carbon letters
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• v.14 no.2
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• pp.105-109
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• 2013

Effects of the amount of nickel powder (Ni) in Ni-carbon fiber (CF) hybrid filler systems on the conductivity(or resistivity) and thermal coefficient of resistance (TCR) of filled high density polyethylene were studied. Increases of the resistivity and TCR with increasing Ni concentration at a given hybrid filler content were observed. Using the fiber contact model, we showed that the main role of Ni in the hybrid filler system is to decrease the interfiber contact resistance when Ni concentration is less than the threshold point. The formation of structural defects leading to reduced reinforcing effect resulted in both a reduction of strength and an increase of the coefficient of thermal expansion in the composite film; these changes are responsible for the increases of both resistivity and TCR with increasing Ni concentration in the hybrid filler system.