• Title/Summary/Keyword: How wall epitaxy

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Hot-wall epitaxial growth and characteristic of CdTe films (Hot-wall epitaxy법에 의한 CdTe 박막의 성장과 특성)

  • 박효열;조재혁;진광수;황영훈
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.14 no.4
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    • pp.140-144
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    • 2004
  • CdTe thin films were grown on GaAs (100) substrates by hot wall epitaxy method. From the XRD measurements, it was found that CdTe/GaAs (100) film was grown as a single crystals with the different from growth plane of (III), and growth rate of CdTe thin films was found to be 30 $\AA/sec$ by SEM. To acquire a high quality CdTe thin film, the optimum temperature for the source and substrate are found to be $500^{\circ}C$ and $320^{\circ}C$, respectively, which was checked by PL.