• Bulletin of the Korean Chemical Society
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• 제31권7호
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• pp.2065-2068
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• 2010

• Bulletin of the Korean Chemical Society
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• 제33권1호
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• pp.159-166
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• 2012

We have introduced the Pickering emulsion systems to generate novel confining geometries for the selforganization of monodisperse polymer microspheres using nanoparticle-stabilized emulsion droplets encapsulating the building block particles. Then, through the slow evaporation of emulsion phases by heating, these microspheres were packed into regular polyhedral colloidal clusters covered with nanoparticle-stabilizers made of silica. Furthermore, polymer composite colloidal clusters were burnt out leaving nonspherical hollow micro-particles, in which the configurations of the cluster structure were preserved during calcination. The selfassembled porous architectures in this study will be potentially useful in various applications such as novel building block particles or supporting materials for catalysis or gas adsorption.

• Korean Chemical Engineering Research
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• 제45권6호
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• pp.611-618
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• 2007

아민기로 코팅된 단분산 폴리스티렌 입자를 제조한 뒤 톨루엔-물로 구성된 유중수 액적(oil-in-water emulsion) 내부에서 입자를 자기 조립(self-assembly)시켜 다양한 다면체(polyhedra) 구조의 콜로이드 클러스터(colloidal cluster)를 제조하였다. 콜로이드 클러스터의 표면에서 솔-젤(sol-gel) 반응을 유발한 뒤 표면이 실리카로 코팅된 복합(composite) 콜로이드 클러스터를 제조할 수 있었고 이를 주형(template)으로 활용하여 고온 소성에 의해 내부의 폴리스티렌 입자를 제거하고 마이크로미터 크기의 다양한 구조의 비구형상 공동 입자(hollow particle)를 제조하였다. 밀도구배원심분리법 (density gradient centrifugation)에 의해 폴리스티렌 구성 입자의 수와 구조가 균일한 콜로이드 클러스터를 제조할 수 있었으며 표면 솔-젤 반응에 의해 비구형상 구조의 공동 입자를 제조하였다.

• Bulletin of the Korean Chemical Society
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• 제12권6호
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• pp.635-643
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• 1991

The adsorption of methanethiol on a Ag(100) surface has been studied with Extended Huckel calculation in the cluster approximation of the substrate. Since it has been known that methanethiol is chemisorbed dissociatively on silver surface by rupture of S-H bond, the methanethiolate radical is taken as adsorbate. Of the various adsorption sites, the 4-fold hollow site is preferred. The methanethiolate radical is mainly adsorbed via its 2e orbital. The charge transfer from metal to this level leads to the C-S bond weakening, which is consistent with the red shift of C-S stretching mode in surface enhanced Raman (SER) spectrum.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2016년도 추계학술대회 논문집
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• pp.181-181
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• 2016

Hydrogenated microcrystalline silicon (${\mu}c-Si:H$) films have attracted much attention as materials of the bottom-cells in Si thin film tandem photovoltaics due to their low bandgap and excellent stability against light soaking. However, in PECVD, the source gas $SiH_4$ must be highly diluted by $H_2$, which eventually results in low deposition rate. Moreover, it is known that high-rate ${\mu}c-Si:H$ growth is usually accompanied by a large number of dangling-bond (DB) defects in the resulting films, which act as recombination centers for photoexcited carriers, leading to a deterioration in the device performance. During film deposition, Si nanoparticles generated in $SiH_4$ discharges can be incorporated into films, and such incorporation may have effects on film properties depending on the size, structure, and volume fraction of nanoparticles incorporated into films. Here we report experimental results on the effects of nonoparticles incorporation at the different substrate temperature studied using a multi-hollow discharge plasma CVD method in which such incorporation can be significantly suppressed in upstream region by setting the gas flow velocity high enough to drive nanoparticles toward the downstream region. All experiments were performed with the multi-hollow discharge plasma CVD reactor at RT, 100, and $250^{\circ}C$, respectively. The gas flow rate ratio of $SiH_4$ to $H_2$ was 0.997. The total gas pressure P was kept at 2 Torr. The discharge frequency and power were 60 MHz, 180 W, respectively. Crystallinity Xc of resulting films was evaluated using Raman spectra. The defect densities of the films were measured with electron spin resonance (ESR). The defect density of fims deposited in the downstream region (with nonoparticles) is higher defect density than that in the upstream region (without nanoparticles) at low substrate temperature of RT and $100^{\circ}C$. This result indicates that nanoparticle incorporation can change considerably their film properties depending on the substrate temperature.

• Nano
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• 제13권12호
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• pp.1850144.1-1850144.13
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• 2018

A nano-$MoS_2$/montmorillonite K-10 (K10) composite was prepared and characterized. The composite contains two types of 2H-$MoS_2$ nanoparticles. One is the hollow spherical $MoS_2$ with a size range of 75 nm, and the other is the spherical nano cluster of $MoS_2$ with a size range of 30 nm. The two kinds of nano-$MoS_2$ were formed via assembly of numerous $MoS_2$ nano-platelets with a size of ~10 nm. A tribological comparison was then made among nano-$MoS_2$/K10, K10, nano-$MoS_2$ and a mechanical mixture of K10 and nano-$MoS_2$. K10 reduced the wear but slightly increased the friction. Nano-$MoS_2$ remarkably reduced both friction and wear. The mechanical mixture demonstrated better wear resistance than nano-$MoS_2$, indicating a synergistic anti-wear effect of nano-$MoS_2$ and K10. The synergistic effect was reinforced using nano-$MoS_2$/K10 instead of the mechanical mixture. A part of the $MoS_2$ in the contact region always lubricated the friction pair, and the rest formed a tribofilm. K10 segregated the friction pair to alleviate the ablation wear but magnified the abrasive wear. S-$MoS_2$ protects K10 and they together function as both a lubricant and an isolating agent to reduce the ablation and abrasive wear.