• Title/Summary/Keyword: Hollow cathode discharge

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Characterization of Cold Hollow Cathode Ion Source by Modification of Electrode Structure (전극 구조 변화에 따른 Cold Hollow Cathode Ion Source의 특성 변화)

  • Seok, Jin-Woo;Chernysh, V.S.;Han, Sung;Beag, Young-Hwoan;Koh, Seok-Keun;Yoon, Ki-Hyun
    • Journal of the Korean Ceramic Society
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    • v.40 no.10
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    • pp.967-972
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    • 2003
  • The inner-diameter 5 cm cold hollow cathode ion source was designed for the high current density and the homogeneous beam profile of ion beam. The ion source consisted of a cylindrical cathode, a generation part of magnetic field, a plasma chamber, convex type ion optic system with two grid electrode, and DC power supply system. The cold hollow cathode ion sources were classified into standard type (I), electron output electrode modified type (II). The operation of the ion source was done with discharge current, ion beam potential and argon gas flow rate. The modification of electron output electrode resulted in uniform plasma generation and uniform area of ion beam was extended from 5 cm to 20 cm. Improved ion source was evaluated with beam uniformity, ion current, team extraction efficiency, and ionization efficiency.

Fabrication of a flexible hollow cathode discharge device (유연한 구조의 중공음극방전 소자의 제작)

  • Hwang, Jeang-Su;Kim, Geun-Young;Yang, Sang-Sik;Oh, Soo-Ghee
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.2377-2379
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    • 2005
  • 본 논문은 유연한 영상표시 장치에 응용될 수 있는 중공음극방전 소사(hollow cathode discharge device)를 마이크로머시닝기술로 제작하고 시험한 결과를 보여준다. 중공음극방전은 평판음극방전에 비해서 전류밀도가 큰 장점이 있다. 방전 소자는 유연한 구조의 양극과 음극, 그리고 그 사이의 절연층으로 구성되어 있으면 소자의 크기는 $20mm{\times}10mm$이다. 방전이 일어나는 영역은 관통 구멍으로서 $7{\times}11$개가 배열되어 있고, 구멍의 직경은 $70{\mu}m$이다. 실리콘 기판 위에 SU-8 몰드를 형성한 후 니켈 전기도금으로 음극을 제작한다. 그 위에 폴리이미드를 스핀코팅하여 절연층을 이루고, 열증착으로 알루미늄 양극을 제작한 후, 실리콘과 SU-8을 제거하여 방전 소자를 완성한다. 진공챔버내 아르곤 가스 분위기에서 소자의 두 전극 간 전압을 변화시켜 가면서 전류-전압 특성을 측정하였고, 방전상태를 관찰하였다. 챔버 내의 절대압력이 260mmHg이고 인가전압이 230V 정도일 때 안정 방전이 관찰되었다

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A Study on the Characteristics of the MgO Thin Film Deposited by the Hollow Cathode Discharge Ion Plating Method (HCD 이온 플레이팅법에 의해 증착된 MgO박막의 특성에 관한 연구)

  • Chung, Woo-Joon;Jeong, Heui-Seob;Whang, Ki-Woong
    • Proceedings of the KIEE Conference
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    • 1996.11a
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    • pp.200-202
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    • 1996
  • MgO film was deposited on the glass substrate by the hollow cathode discharge ion plating method and the characteristics of the MgO thin film such as deposition rate, crystalline orientation, surface morphology and secondary electron coefficient were investigated. The deposition rate of MgO thin films were $430^{\sim}1270{\AA}$/min at various temperatures and biases. The crystalline orientation of the MgO thin film changed from (200) to (220) upon increasing the HCD current from 100A to 200A. These results indicated that the crystallin orientation of the MgO thin film was determined by the super-saturation ratio. The (200) peak decreased and the (220) peak increased as the substrate bias increased, while both peaks increased as the substrate temperature increased. The grain size increased as the substrate bias increased and the secondary electron emission coefficient increased as the substrate bias increased.

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Development and characteristics investigation of new soft plasma ionization(SPI) source (새로운 소프트 플라스마 이온화(SPI) 장치의 개발 및 특성관찰)

  • Lee, Hiwwon;Park, Hyunkook;Lee, Sang Chun
    • Analytical Science and Technology
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    • v.22 no.2
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    • pp.152-158
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    • 2009
  • In this study, we made a new discharge source improving previous SPI source to ionize softly organic compounds. The new SPI source consists of two electrodes as a hollow mesh cathode of half cylindrical shape and a hollow anode. We optimized the geometrical parameter of the SPI source by investigating the I-V curves at the various distance between the cathode and the anode. As the results, we found stable conditions of the soft plasma on broad range of the current and the voltage. The new SPI source attached to quadrupole mass spectrometer (QMS), and we obtained the mass spectra of dichloromethane (DCM). The fragment patterns of DCM appeared similarly with the pattern of electron ionization (EI).

Analysis on the lgnition Charac teristics of Pseudospark Discharge Using Hybrid Fluid-Particle(Monte Carlo) Method (혼성 유체-입자(몬테칼로)법을 이용한 유사스파크 방전의 기동 특성 해석)

  • 심재학;주홍진;강형부
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.11 no.7
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    • pp.571-580
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    • 1998
  • The numerical model that can describe the ignition of pseudospark discharge using hybrid fluid-particle(Monte Carlo )method has been developed. This model consists of the fluid expression for transport of electrons and ions and Poisson's equation in the electric field. The fluid equation determines the spatiotemporal dependence of charged particle densities and the ionization source term is computed using the Monte carlo method. This model has been used to study the evolution of a discharge in Argon at 0.5 torr, with an applied voltage if 1kV. The evolution process of the discharge has been divided into four phases along the potential distribution : (1) Townsend discharge, (2) plasma formation, (3) onset of hollow cathode effect, (4) plasma expansion. From the numerical results, the physical mechanisms that lead to the rapid rise in current associated with the onset of pseudospark could be identified.

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Shape Characteristics of Exhaust Plume of Dual-Stage Plasma Thruster using Direct-Current Micro-Hollow Cathode Discharge (직류 마이크로 할로우 음극 방전을 이용한 이단 마이크로 플라즈마 추력기의 배기 플룸의 형상 특성)

  • Ho, Thi Thanh Trang;Shin, Jichul
    • Journal of the Korean Society of Propulsion Engineers
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    • v.20 no.3
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    • pp.54-62
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    • 2016
  • Micro plasma thruster (${\mu}PT$) was studied experimentally with a dual-stage micro-hollow cathode discharge (MHCD) plasma. Electrostatic-like acceleration exhibiting more directional and elongated exhaust plume was achieved by a dual layer MHCD at the total input power less than 10 W with argon flow rate of 40 sccm. V-I characteristic indicated that there was an optimal regime for dual-stage operation where the acceleration voltage across the second stage remained constant. Estimated exhaust plume length showed a similar trend to the analytic estimate of exhaust velocity which scales with an acceleration voltage. ${\mu}PT$ with multiple holes exhibited similar performance with single-hole thruster indicating that higher power loading is possible owing to decreased power through each hole. Boltzmann plot of atomic argon spectral lines showed average electron excitation temperature of about 2.6 eV (~30,170 K) in the exhaust plume.

Numerical Study on the Discharge Characteristics of Cylindrical Discharge Devices (원통형 방전소자의 방전특성 연구)

  • Seo, Jeong-Hyun;Shin, Bhum-Jae
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.62 no.7
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    • pp.980-986
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    • 2013
  • In this paper, the discharge characteristics of ac-type cylindrical discharge devices with diameters (D) in the $50{\sim}400{\mu}m$ range have been investigated numerically. The cylindrical devices have much lower breakdown voltages compared to the coplanar electrode structures. The breakdown voltage of the cylindrical structures increases with the decrease of diameters in $50{\sim}100{\mu}m$ range. In $100{\sim}200{\mu}m$ range, however, the breakdown voltage decreases slightly with the decrease of diameters. Also, as the diameter gets smaller, the electron heating efficiency is greatly improved.

An Analysis of the Characteristics of Pseudo-Spark Discharge (Pseudo-Spark 방전 특실의 해석(1))

  • Shim, Jae-Hak;Chang, Yong-Moo;Ko, Kwang-Cheol;Kang, Hyung-Boo
    • Proceedings of the KIEE Conference
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    • 1994.07b
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    • pp.1533-1535
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    • 1994
  • The Monte-Carlo simulation was used to define the physical mechanisms of the initiation phase of pseudo-spark discharge. The pseudo-spark discharge employing the hollow cathode geometry is accompanied by very fast current rising and intense charged particle beams. In this model, time-dependent continuity equation for the electrons and ions were solved consistently with Poisson's equation for the electric field in a two-dimensional, sysmmetrically cylinderical geometry. From the simulation, a sequence of physical mechanisms that cause the rapid current rise associated with the onset of pseudo-spark discharge mode were identified.

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TiN films by the HCD Ion plating (HCD법 이온플레이팅에 의한 TiN 박막제작)

  • Seo, Y.W.;Cho, S.M.;Kim, M.J.;Whang, K.W.
    • Proceedings of the KIEE Conference
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    • 1989.07a
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    • pp.335-337
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    • 1989
  • The Charcteristics of the HCD ion plating system for TiN coating was Investigated. 1-V curvet of the HCD ( hollow cathode discharge ), radiation temperatures of the Ta tube and the Ti pool and the electron density and the temperature of the generated plasma are shown. The preferred orientation and the micro-hardness of coatings performed by HCD process are studied.

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