• Title/Summary/Keyword: Highly reflective layer

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Change of Anti-reflective Optical Property by Nano-structural Control of Alumina Layer through Hydro-thermal Process (수열합성 공정을 통한 알루미나 코팅층의 나노구조 조절에 의한 반사방지 특성의 변화)

  • Lee, Yun-Yi;Son, Dae-Hee;Lee, Seung-Ho;Lee, Gun-Dae;Hong, Seong-Soo;Park, Seong-Soo
    • Applied Chemistry for Engineering
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    • v.21 no.5
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    • pp.564-569
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    • 2010
  • Highly anti-reflective optical property has been focussed in the field of thin film and display because of increasing demands to the high transparency and clearness of optical component. In this study, to obtain anti-reflective property, the formation of aluminium oxide with nanoscaled flowerlike frame structure was introduced as oxide material monolayer on the substrate by hydrothermal synthesis through sol-gel method. The properties of coating layer were measured by the means of UV-Vis spectroscopy, FT-IR spectroscopy, XRD, and FE-SEM. The morphology of coating layer in alumina-sol coated samples was controlled by hydrothermal temperature and time with aid of ultrasound. It was found that high transparency and anti-reflective optical properties were obtained the formation of flowerlike nanoframe structure.

Optimal Pixel Design for Low Driving Single Gamma Curve and Single Gap Transflective Fringe Field Switching Display (단일갭 반투과 FFS 액정 디스플레이를 위한 최적 화소 디자인)

  • Jeong, Youn-Hak;Lim, Young-Jin;Jeong, Eun;Lee, Seung-Hee
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.20 no.12
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    • pp.1068-1071
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    • 2007
  • When a dielectric layer, in-cell retarder (ICR) is formed between electrode and LC layer to get a single gap transflective fringe-field switching (FFS) display, the operating voltage ($V_{op}$) is highly increased due to the thickness of dielectric material. But, we also knew the phenomenon that the increasing rate of Vop is different whether the 1st common electrode was composed of plate type or slit type. In this paper, the common electrode in transmissive part was composed of slit type which had less steepness effect of the Vop and in reflective part was composed of plate type. The rubbing angle of reflective part can be adjusted properly to match the voltage dependent transmittance and reflectance.

Optimal pixel design for low driving single gamma curve and single gap transflective fringe field switching display (단일랩 반투과 FFS 액정 디스플레이를 위한 최적 화소 디자인)

  • Jeong, Youn-Hak;Lim, Young-Jin;Jeong, En;Lee, Jeung-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.06a
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    • pp.435-436
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    • 2007
  • In general, Single gap transflective FFS display has an in-cell retarder (ICR) between reflective electrode and liquid crystal (LC) layer. Therefore, Operating voltage is highly increased due to this thick dielectric material. But, we also knew the phenomenon that the increasing rate of Vop is different whether the 1st common electrode was composed of plate type or slit type. In this paper, the common electrode in transmissive part was composed of slit type which had less steepness effect of the V op and in reflective part was composed of plate type. The rubbing angle of reflective part can be adjusted properly to match the voltage dependent transmittance and reflectance.

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Effects of Surface Homogeneity on Optical Properties of Sputter-deposited AlTiO Selective Transmitting Layers (스퍼터 증착으로 형성된 AlTiO 선택적 투과막의 표면 균질성에 따른 광학적 특성)

  • Jeong, So-Un;Lim, Jung-Wook;Lee, Seung-Yun
    • Journal of the Korean Vacuum Society
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    • v.21 no.1
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    • pp.22-28
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    • 2012
  • Transparent dye-sensitized solar cells have been widely investigated for the application to building integrated photovoltaic system. Thin film Si-based solar cells are emerging as a substitute for the dye-sensitized solar cells because their merits of well-established manufacturing processes. Since the selective transmitting layer transmits visible light and reflects infrared light, the solar cell efficiency increases with the introduction of the selective transmitting layer. In this work, AlTiO thin films were grown as the selective transmitting layer by cost-effective sputter deposition and their transmittances were improved by controlling deposition parameters.

AlTiO 선택적 투과막의 광학적 특성 개선

  • Jeong, So-Un;Bang, Gi-Su;Im, Jeong-Uk;Lee, Seung-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.334-334
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    • 2012
  • 태양전지 기술은 우주 항공에서부터 핸드폰과 같은 소규모 가전 시설에까지 폭 넓게 사용되고 있다. 현재 태양전지 기술은 기존의 화석 에너지에 비해 효율 측면에서의 열세함으로 인해 변환 효율을 높이는 연구가 진행되고 있다. 태양전지의 기본 구조에서 고반사막을 대신하여 선택적 투과막을 채용하면 적외선 영역은 광흡수층으로 재반사시키고 가시광선 영역은 선택적으로 투과시킬 수 있기 때문에 태양전지의 변환 효율을 높임과 동시에 채광에 유리한 투명 태양전지를 얻을 수 있다. 본 연구에서는 반응성 분위기에서 AlTi 단일 타겟을 스퍼터링하여 유리 기판 위에 AlTiO 선택적 투과막을 형성하고 광학적 특성을 평가하였다. 기존의 연구에서 스퍼터링으로 형성한 AlTiO 선택적 투과막은 가시광선 영역에서 약 30%의 비교적 높은 반사율을 나타내었다. 이번 연구에서는 광학 두께를 조절함으로써 가시광선 영역에서 반사율이 평균 20% 이상 감소하고 적외선 영역에서 약 30% 이상의 반사율을 나타내는 선택적 투과막을 형성한 결과를 보고한다.

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AlTiO 선택적 투과막의 표면 평탄도 개선

  • Jeong, So-Un;Bang, Gi-Su;Kim, Ji-Hye;Im, Jeong-Uk;Lee, Seung-Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.301-301
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    • 2012
  • 지구 온난화와 화석 연료의 고갈이 심각해지면서 청정 에너지원으로서 신재생에너지에 대한 관심이 더욱 고조되고 있다. 신재생에너지 분야의 핵심기술의 하나인 태양전지의 여러 응용분야 중에서 건물 일체형 태양전지의 발전 가능성이 특히 높게 평가되고 있다. Si 계 박막 태양전지 내에 금속 산화물 계 선택적 투과막을 적용하면 선택적으로 적외선영역을 광흡수층으로 반사시키므로 건물 일체형 태양전지에 적용이 가능한 높은 변환효율의 투명 태양전지를 제조할 수 있다. 최근 연구 결과에 의하면 AlTiO 선택적 투과막의 투과율은 표면 평탄도에 의존하며, 타겟에 인가되는 전력을 감소시킴으로써 reactive co-sputtering 시 발생하는 아크 방전을 억제하면 AlTiO 박막의 평탄도가 개선된다는 사실이 알려져 있다. 본 연구에서는 AlTi single 타겟을 이용하여 AlTiO 박막을 형성함으로써 박막 표면을 더욱 개선시켜 가시광선 영역의 투과율을 향상시킨 결과를 보고한다.

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Improvement of Optical 3D Scanner Performance Using Atomization-Based Spray Coating

  • Valinasab, Behzad;Rukosuyev, Maxym;Lee, Jason;Ko, Junghyuk;Jun, Martin B.G.
    • Journal of the Korean Society of Manufacturing Technology Engineers
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    • v.24 no.1
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    • pp.23-30
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    • 2015
  • The scanning quality can be influenced by reflective abilities of a surface. Transparency and glossiness of a surface can highly limit the scanning results. Various techniques have been developed to solve problems of reflective and transparent surfaces. As one of the most feasible and convenient solutions, a thin layer of coating with proper specifications is sprayed on surface for eliminating the problems of the surfaces. As the main goal is to keep the object geometry unchanged, then it is important to coat the surface with layers less than one micrometer in thickness. For this purpose, a newly designed atomization-based spray system has been developed and tested in sets of experiments to study its efficiency on scanning results while objects with the surface are in use. This paper presents the spray design process and then studies and compares the 3D scanning results of the surfaces coated with atomization-based and aerosol sprays.

Interfacial Layer Control in DSSC

  • Lee, Wan-In
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.75-75
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    • 2011
  • Recently, dye-sensitized solar cell (DSSC) attracts great attention as a promising alternative to conventional silicon solar cells. One of the key components for the DSSC would be the nanocrystalline TiO2 electrode, and the control of interface between TiO2 and TCO is a highly important issue in improving the photovoltaic conversion efficiency. In this work, we applied various interfacial layers, and analyzed their effect in enhancing photovoltaic properties. In overall, introduction of interfacial layers increased both the Voc and Jsc, since the back-reaction of electrons from TCO to electrolyte could be blocked. First, several metal oxides with different band gaps and positions were employed as interfacial layer. SnO2, TiO2, and ZrO2 nanoparticles in the size of 3-5 nm have been synthesized. Among them, the interfacial layer of SnO2, which has lower flat-band potential than that of TiO2, exhibited the best performance in increasing the photovoltaic efficiency of DSSC. Second, long-range ordered cubic mesoporous TiO2 films, prepared by using triblock copolymer-templated sol-gel method via evaporation-induced self-assembly (EISA) process, were utilized as an interfacial layer. Mesoporous TiO2 films seem to be one of the best interfacial layers, due to their additional effect, improving the adhesion to TCO and showing an anti-reflective effect. Third, we handled the issues related to the optimum thickness of interfacial layers. It was also found that in fabricating DSSC at low temperature, the role of interfacial layer turned out to be a lot more important. The self-assembled interfacial layer fabricated at room temperature leads to the efficient transport of photo-injected electrons from TiO2 to TCO, as well as blocking the back-reaction from TCO to I3-. As a result, fill factor (FF) was remarkably increased, as well as increase in Voc and Jsc.

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Measurement of Effective Refractive Index of Nematic Liquid Crystal in Fabry-Perot Etalon

  • Ko, Myeong Ock;Kim, Sung-Jo;Kim, Jong-Hyun;Lee, Bong Wan;Jeon, Min Yong
    • Journal of the Optical Society of Korea
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    • v.19 no.4
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    • pp.346-350
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    • 2015
  • We report a measurement of the effective refractive index of a nematic liquid crystal (NLC) inside a Fabry-Perot (FP) etalon according to the applied electric fields. The effective refractive index of the NLC depends on the intensity of the applied electric field. A wavelength-swept laser with a polygon-scanner-based wavelength filter is used as a wide-band optical source to measure the effective refractive index of the NLC. The bandwidth of the optical source is greater than 90 nm around 1300 nm. The fabricated NLC FP etalon consists of glass substrates, gold layers as the electrodes with highly reflective surfaces, polyimide layers as the planar alignment layers, and an LC layer. Furthermore, we measured the Freedericksz transition voltages for three types of NLC FP etalons having thicknesses of $30.6{\mu}m$, $55.4{\mu}m$, and $108.8{\mu}m$. The Freedericksz transition voltages in the three cases are nearly equal. The measured effective refractive indices in the three cases decreased from 1.67 to 1.51 as the applied electric field intensity was increased. Beyond the threshold electric field, the effective refractive indices quickly decreased and eventually saturated at a value of 1.51 for all cases.

A Study of the Dielectric Characteristics of the Low-k SiOCH Thin Films by Ellipsometry (Ellipsometry를 이용한 Low-k SiOCH 박막의 유전특성에 관한 연구)

  • Yi, In-Hwan;Hwang, Chang-Su;Kim, Hong-Bae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.21 no.12
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    • pp.1083-1089
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    • 2008
  • We studied the dielectric characteristics of low-k SiOCH thin films by Ellipsometry. The SiOCH thin films were prepared by deposition of BTMSM precursors on p-Si wafer by CCP-PECVD method. The nano-porous structural organic/inorganic hybrid-type of SiOCH thin films correlated directly to the formation of low dielectrics close to pore(k=1). The structural groups including highly dense pores in SiOCH thin films originated the anisotropic geometry type of network structure directing to complex refractive characteristics of SiOCH single layer on the p-Si wafer. The linearly polarized beam of Xe-ramp in the range from 190 nm to 2100 nm introduced to the surface of SiOCH thin film, and the reflected beam was Elliptically polarized by complex refractive coefficients of SiOCH dipole groups. The amplitude variation $\Psi$ and phase variation $\Delta$ of the relative reflective coefficients between perpendicular and parallel components to the incident plane were measured by Ellipsometry. The complex optical constants n and k as well as the dielectric constant and thickness of SiOCH thin films were driven by the measured value of $\Psi$ and $\Delta$.