• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.145-145
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• 2008

High-k materials have been paid much more attention for their characteristics with high permittivity to reduce the leakage current through the scaled gate oxide. Among the high-k materials, $ZrO_2$ is one of the most attractive ones combing such favorable properties as a high dielectric constant (k= 20 ~ 25), wide band gap (5 ~ 7 eV) as well as a close thermal expansion coefficient with Si that results in good thermal stability of the $ZrO_2$/Si structure. During the etching process, plasma etching has been widely used to define fine-line patterns, selectively remove materials over topography, planarize surfaces, and trip photoresist. About the high-k materials etching, the relation between the etch characteristics of high-k dielectric materials and plasma properties is required to be studied more to match standard processing procedure with low damaged removal process. Among several etching techniques, we chose the inductively coupled plasma (ICP) for high-density plasma, easy control of ion energy and flux, low ownership and simple structure. And the $BCl_3$ was included in the gas due to the effective extraction of oxygen in the form of $BCl_xO_y$ compounds. During the etching process, the wafer surface temperature is an important parameter, until now, there is less study on temperature parameter. In this study, the etch mechanism of $ZrO_2$ thin film was investigated in function of $Cl_2$ addition to $BCl_3$/Ar gas mixture ratio, RF power and DC-bias power based on substrate temperature increased from $10^{\circ}C$ to $80^{\circ}C$. The variations of relative volume densities for the particles were measured with optical emission spectroscopy (OES). The surface imagination was measured by scanning emission spectroscope (SEM). The chemical state of film was investigated using energy dispersive X-ray (EDX).

• 한국분말재료학회지
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• 제18권3호
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• pp.226-237
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• 2011

W-ZrC and W-HfC composite powders were fabricated by the Plasma Alloying & Spheroidization (PAS) method and the powders were sprayed into hybrid coating layers by using Low Vacuum Plasma Spray (LVPS) process, respectively. Microstructure, mechanical properties, and ablation characteristics of the fabricated coating layers were investigated. The LVPS process led to successful production of W-Carbide hybrid coatings, approximately 400 ${\mu}M$ or above in thickness. As the substrate preheating temperature increased from $870^{\circ}C$ to $917^{\circ}C$, the hardness of the W-ZrC coating layer increased due to decreased porosity. Vickers hardness showed higher value (about 108.4 HV) in W-ZrC hybrid coating material compared to that of W-HfC while adhesive strength was found to be similar in both coating layers. The plasma torch test revealed good ablation resistance of the W-Carbide hybrid coating layers. The relatively high performance W-ZrC coating layer at the elevated temperature is thought to be attributed to both the strengthening effect of ZrC particle remained in the layer and the formation of ZrO2 phase with high temperature stability.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2008년도 추계학술대회A
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• pp.1869-1873
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• 2008

In this work, to make it possible to generate glow discharge in atmospheric pressure condition with relatively high and wide electric field, micro channel reactor is proposed. Si DRIE and Cr deposition by Ebeam evaporation is used to make channel and bottom electrode layer. Upper electrode is made from ITO glass to visualize discharge within micro channel. Fabricated reactor is verified by generating uniform glow plasma with N2 / He gases each as working fluid. The range of gas electric field to generate glow plasma is from about 200 V/cm and upper limit is not observed in tested condition of up to 150 kV/cm. This data shows that micro channel plasma reactor is more versatile. Indirect estimation of electron temperature in this reactor can be inferred that the electron temperature within glow discharge in micro reactor lies $0{\sim}2eV$. This research demonstrates that the reactor is appropriate in application that needs to maintain low temperature condition during chemical process.

• 한국광학회지
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• 제12권2호
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• pp.115-120
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• 2001

본 연구는 고온 고압의 전열(electrothermal)플라즈마내에 존재하는 구리원자의 발광 스펙트럼을 정량적으로 분석하는 방법에 대해 논하였다. 플라즈마는 플라즈마 발생장치내에 설치되어 있는 모세관 양단의 두 개의 전극이 방전함으로써 발생하며 고속으로 대기를 향해 전파해 나간다. 플라즈마의 특성을 분석하기 위해서는 플라즈마의 여기온도나 전자밀도와 같은 물리량의 측정이 필요하다. 그러나 여기온도나 전자밀동와 직접적으로 관련이 있는 발광 스펙트럼은 분광시스템의 파장에 따른 서로다른 응답 특성 때문에 왜곡되어질 수 있다 따라서 본 연구에서는 펄스 플라즈마 제트로부터 얻은 구리원자의 발광 스펙트럼을 정밀하게 보정하는 방법을 제시하였다.

• Transactions on Electrical and Electronic Materials
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• 제1권1호
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• pp.32-39
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• 2000

Langmuir probe measurements of electron density, electron temperature and potential are mad in the early stage (<5${\mu}$s) of a laser ablated plasma plume, in which a positive current form positive ions and a electron current are overlapped. The plasma wes produced by focusing the second harmonic, 532 nm, of Q-switched Nd:YAG laser on a high purity carbon target. Then the laser intensity on the target of ~1.6${\times}$10$\^$15/ W/$\textrm{cm}^2$. The measured electron desities and temperatures are ~2${\times}$10/sip 11/ cm$\^$-3/ and -3 eV. In particluar , the phenomenon that the electron temperature decreased and then increased was observed,. It could be well explained that this phenomenon occurred in the process of inverse Bremsstrahlung of free electrons in plasma. Additionally, the plasma potential(>11V) was higher than the published values.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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• pp.136.1-136.1
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• 2015

In the present study, UHF (320 MHz) in combination with RF (13.56 MHz) plasmas was used for the synthesis of hydrogenated silicon nitride (SiNx:H) films by PECVD process at low temperature. RF/UHF hybrid plasmas were maintained at a fixed pressure of 410 mTorr in the N2/SiH4 and N2/SiH4/NH3 atmospheres. To investigate the radical generation and plasma formation and their control for the growth of the film, plasma diagnostic tools like vacuum ultraviolet absorption spectroscopy (VUVAS), optical emission spectroscopy (OES), and RF compensated Langmuir probe (LP) were utilized. Utilization of RF/UHF hybrid plasmas enables very high plasma densities ~ 1011 cm-3 with low electron temperature. Measurements using VUVAS reveal the UHF source is quite effective in the dissociation of the N2 gas to generate more active atomic N. It results in the enhancement of the Si-N bond concentration in the film. Consequently, the deposition rate has been significantly improved up to 2nm/s for the high rate synthesis of highly transparent (up to 90 %) SiNx:H film. The films properties such as optical transmittance and chemical composition are investigated using different analysis tools.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.250.2-250.2
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• 2014

Currently, teeth whitening method which is applicable to dental surgery is that physician expertises give medical treatment to teeth directly dealed with a high concentration of hydrogen peroxide and carbamide peroxide. If hydrogen peroxide concentration is too high for treatment of maximized teeth whitening effect [1], it is harmful to the human body [2]. To the maximum effective and no harmful teeth whitening effect in a short period of time at home, we have observed the whitening effect using carbamide peroxide (15%) and a low-temperature atmospheric pressure plasma jet which is regulated by the Food and Drug Administration. The gas supplied conditions of the non-thermal atmospheric pressure plasma jet was with the humidified (0.6%) gas in nitrogen or air at gas flow rate of 1000 sccm. Also, the measurement of chemical species from the jet was carried out using the optical emission spectroscopy (OES), the evidence of increased reactive oxygen species compared to non-humidified plasma jet. We have found that the whitening effect of the plasma is very excellent through this experiment, when bovine teeth are treated in carbamide peroxide (15%) and water vapor (0.2 to 1%). The brightness of whitening teeth was increased up to 2 times longer in the CIE chromaticity coordinates. The colorimetric spectrometer (CM-3500d) can measure color degree of whitening effect.

• 대한기계학회:학술대회논문집
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• 대한기계학회 2007년도 춘계학술대회B
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• pp.2506-2511
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• 2007

The coupled simulation is performed to find out the interaction of arc plasmas with surrounding materials in a thermal puffer plasma chamber. In order to be more realistic, PTFE nozzle ablation and Cu electrode evaporation, which are caused by high temperature of arc plasmas, are considered together. Pressure rise and temperature inside the chamber generated during the whole arcing history are investigated with the applied currents. It is very important to define how thermal flow and mass transfer are processing between the arc plasma and surrounding materials for further understanding complex physics inside the chamber. It is concluded that the result might be very useful to understand the mechanism happened inside and to design thermal puffer plasma chambers, but further experimental studies are required to verify the results for the more practical applications.

• 한국연소학회:학술대회논문집
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• 대한연소학회 2003년도 제27회 KOSCO SYMPOSIUM 논문집
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• pp.27-32
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• 2003

The effect of non-thermal plasma on diffusion flames in co-flow jets has been studied experimentally by adopting a dielectric barrier discharge technique. The generation of streamers was enhanced with a flame due to increased reduced electric fields by high temperature burnt gas and the abundance of ions in the flame region. The effect of streamers on flame behavior reveals that the flame length was significantly decreased as the applied voltage increased and the yellow luminosity by the radiation of soot particles was also significantly reduced. The formation of PAH and soot was influenced appreciably by the non-thermal plasma, while the flame temperature and the concentration of major species were not influence much with the plasma generation. The results demonstrated that the application of non-thermal plasma can be a viable technique in controlling soot generation in flames with low power consumption in the order of 1 W.

• 한국연소학회지
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• 제11권2호
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• pp.15-21
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• 2006

Characteristics of a plasma reactor for partial oxidation of methane, especially focused on the role and effectiveness of plasma chemistry, are investigated. Partial oxidation of methane is investigated using a rotating arc which is a three dimensional version of a typical gliding arc. Three different modes of operation were found. Each mode shows different reforming performance. The reason for the difference is due to the difference in relative role of thermal and plasma chemistry in overall process. A mode with high temperature results higher methane conversion and hydrogen selectivity in contrast to the mode with lower temperature where poor methane conversion and higher selectivity of $C_2$ species are observed. In this way, we can confirm that by controlling characteristic of process or controlling relative strength of plasma chemistry and thermal chemistry, it is possible to map an optimal condition of reforming process by rotating arc.