• 제목/요약/키워드: High reactive substrate

검색결과 154건 처리시간 0.03초

스퍼터의 산소분압비율에 의존한 ITO/PET박막의 조절 (Control of ITO/PET Thin Films Depending on the Ratio of Oxygen Partial Pressure in Sputter)

  • 김현후;신재혁;신성호;박광자
    • 한국표면공학회지
    • /
    • 제32권6호
    • /
    • pp.671-676
    • /
    • 1999
  • ITO (indium tin oxide) thin films on PET (polyethylene terephthalate) substrate have been deposited by a dc reactive magnetron sputtering without heat treatments such as substrate heater and post heat treatment. Each sputtering parameter during the sputtering deposition is an important factor for the high quality of ITO thin films deposited on polymeric substrate. Particularly, the material, electrical and optical properties of as-deposited ITO oxide films are dominated by the ratio of oxygen partial pressure. As the experimental results, the excellent ITO films are prepared on PET substrate at the operating conditions as follows : operating pressure of 5 mTorr, target-substrate distance of 45mm, do power of 20~30W, and oxygen gas ratio of 10%. The optical transmittance is above 80% at 550 nm, and the sheet resistance and resistivity of films are 24 Ω/square and $1.5\times$10$^{-3}$ Ωcm, respectively.

  • PDF

HYDROXYAPATITE GRANULE IMPLANTED Ti-ALLOY

  • Nonami, Toru;Taoda, Hiroshi;Kamiya, Akira;Naganuma, Katsuyoshi;Sonoda, Tsutomu;Kameyama, Tetsuya
    • 한국표면공학회지
    • /
    • 제32권3호
    • /
    • pp.356-359
    • /
    • 1999
  • To obtain a biomaterial that has both biological affinity and high mechanical strength, hydroxyapatite granules were implanted into the surface of pure titanium film coated titanium alloy. The film was coated by reactive DC sputtering method on the alloy substrate. Hydroxyapatite granules (32- $38\mu\textrm{m}$ in diameter)were spread over titanium alloy substrate and pressed to implant the granules in the substrate. They can be implanted into substrate under 17MPa at $800^{\circ}C$ for 10minutes. The only tops of the granules were exposed and they were firmly stuck in substrate. The hydroxyapatite implanted titanium alloy composites were expected to be useful for biomaterials as artificial bones and dental roots.

  • PDF

Inductively Coupled Plasma Reactive Ion Etching of MgO Thin Films Using a $CH_4$/Ar Plasma

  • Lee, Hwa-Won;Kim, Eun-Ho;Lee, Tae-Young;Chung, Chee-Won
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
    • /
    • pp.77-77
    • /
    • 2011
  • These days, a growing demand for memory device is filled up with the flash memory and the dynamic random access memory (DRAM). Although DRAM is a reasonable solution for current demand, the universal novel memory with high density, high speed and nonvolatility, needs to be developed. Among various new memories, the magnetic random access memory (MRAM) device is considered as one of good candidate memories because of excellent features including high density, high speed, low operating power and nonvolatility. The etching of MTJ stack which is composed of magnetic materials and insulator such as MgO is one of the vital process for MRAM. Recently, MgO has attracted great interest in the MTJ stack as tunneling barrier layer for its high tunneling magnetoresistance values. For the successful realization of high density MRAM, the etching process of MgO thin films should be investigated. Until now, there were some works devoted to the investigations on etch characteristics of MgO thin films. Initially, ion milling was applied to the etching of MgO thin films. However, ion milling has many disadvantages such as sidewall redeposition and etching damage. High density plasma etching containing the magnetically enhanced reactive ion etching and high density reactive ion etching have been employed for the improvement of etching process. In this work, inductively coupled plasma reactive ion etching (ICPRIE) system was adopted for the improvement of etching process using MgO thin films and etching gas mixes of $CH_4$/Ar and $CH_4$/$O_2$/Ar have been employed. The etch rates are measured by a surface profilometer and etch profiles are observed using field emission scanning emission microscopy (FESEM). The effects of gas concentration and etch parameters such as coil rf power, dc-bias voltage to substrate, and gas pressure on etch characteristics will be systematically explored.

  • PDF

탈리그닌한 자기가수분해 시료로부터 준비한 카복시메틸화 시료의 특성 (Characteristics of Carbozymethylated Substrates from Delignified Autohydrolyzed Substrates)

  • 조남석
    • Journal of the Korean Wood Science and Technology
    • /
    • 제32권1호
    • /
    • pp.28-34
    • /
    • 2004
  • 본 연구는 자기가수분해전 처리를 통하여 제조한 반응성이 높은 셀룰로오스(high reactive cellulose, HRC)기질의 카르복시메틸화(carboxymethylation, CM화) 특성을 알기 위하여 수행되었으며, 비교를 위하여 시판 알파셀룰로오스(commercial α-cellulose, CAC) 및 침엽수 리파이나기계펄프(Refiner mechanical pulp, RMP) 2종의 시료를 사용하였다. HRC는 12시간 당화처리로 70%, 24시간 처리로 90%, 72시간 처리로 99.5%의 높은 당화율을 나타냈다. 아울러 Cellulase 효소활성에 있어서 처리 전후에 측정된 CMCase 및 Avicelase의 효소활성의 큰 변화가 없었다. 이에 대하여 72시간 처리로 CAC는 57%의 당화율을, 리그닌을 많이 포함하는 RMP는 38%의 매우 낮은 당화율을 보였다. CM화시 리그닌함량이 낮은 HRC 및 CAC시료의 CM화가 용이하였고, 1.13-1.15의 높은 치환도를, 리그닌함량이 많은 RMP는 0.85 정도의 낮은 치환도를 나타냈다. 모든 시료에서 알칼리의 농도는 30%, 3시간 처리가 가장 높은 치환도를 보여주었다. CM화물로부터의 수용성부분은 HRC 및 CAC에서 98-98.5%, RMP 로부터는 31.5%로 매우 낮았다. 비표면적이 낮은 RMP는 보수도가 매우 낮았으며, 비표면적이 높았던 CAC 및 HRC는 435% 및 321%의 매우 높은 보수도 값을 나타냈다. 팽윤도에 있어서는 비표면적과는 무관하게 HRC, RMP 그리고 CAC 순으로 팽윤율이 커졌다.

반응성 DC 마그네트론 스퍼터링법으로 증착한 ITO 박막의 전기적 특성 평가 (Electrical Properties of ITO Thin Film Deposited by Reactive DC Magnetron Sputtering using Various Sn Concentration Target)

  • 김민제;정재헌;송풍근
    • 한국표면공학회지
    • /
    • 제47권6호
    • /
    • pp.311-315
    • /
    • 2014
  • Indium tin oxide (ITO) thin films (30 nm) were deposited on PET substrate by reactive DC magnetron sputtering using In/Sn(2, 5 wt.%) metal alloy target without intentionally substrate heating during the deposition under different DC powers of 70 ~ 110 W. The electrical properties were estimated by Hall-effect measurements system. The resistivity of ITO thin film deposited using In/Sn (5 wt.%) metal alloy target at low DC power increased with increasing annealing time. However, they increased with increasing annealing time at high DC power. In the case of ITO (Sn 2 wt%), we can't find clear change in resistivity with increasing annealing time. However, carrier density and mobility showed difference behavior due to change of oxygen vacancy.

COMPOSITION OF SUPERCONDUCTING YBCO THIN FILMS WITH RF REACTIVE SPUTTERING CONDITIONS

  • Kim, H.H.;Kim, S.;Shin, S.H.;Park, J.I.;Park, K.J.
    • 한국표면공학회지
    • /
    • 제29권6호
    • /
    • pp.829-833
    • /
    • 1996
  • Superconducting YBaCuO thin films were deposited on MgO (100) single crystal substrate by rf reactive sputtering method. Sputtering target was prepared by mixing the original powders of $Y_2O_3$, $BaCO_3$, and CuO at $830^{\circ}C$, and its composition was $YBa_2Cu_{3.3}O_x$ adding the excess CuO to compensate for the loss of Cu in the deposition process. The sputtering conditions for a high quality of YBCO thin film were: substrate temperature of 13$0^{\circ}C$; gas pressure of 10 mTorr; gas mixture ($O_2$: Ar =10: 90); distance of 2.5 inch; and rf power density of 4.87 W /$\textrm{cm}^2$. The deposition rate was 2.4~2.6 nm/min. From the RBS results, it was found that Cu and Ba contents in thin films decreased with the increase of substrate temperature. The increase of gas pressure resulted in significant deficiency of Ba elements.

  • PDF

반응성 동시 증착법에 의한 As-grown $YBa_2Cu_3O_{7-x}$ 박막의 결정 특성 및 표면형상에 관한 연구 (Crystalline Qualities and Surface Morphologies of As-Grown $YBa_2Cu_3O_{7-x}$ Thin Films on MgO(100) Substrate by Reactive Coevaporation Method)

  • 장호연;도부안광;토신전농;청수현사;추빈량삼;강본당일;송진태
    • 한국재료학회지
    • /
    • 제1권2호
    • /
    • pp.93-98
    • /
    • 1991
  • The as-grown $YBa_2Cu_3O_{7-x}$ superconducting thin films on MgO(100) substrate have been prepared by a reactive coevaporation method. The superconducting transition temperature, surface morphology and crystalline quality were examined as a function of the substrate temperature ranging from $450^{\circ}C$ to $590^{\circ}C$. From the reflection high energy electron diffraction (RHEED) analysis, it was found the film consisted of almost amorphous phase with a halo pattern deposited at the substrate temperature of $450^{\circ}C$. The film deposited at the substrate temperature of $510^{\circ}C$ consisted of polycrystalline phase, showing a broad ring pattern. On the other hand, for the film deposited at $590^{\circ}C$, RHEED showed spotty pattern indicating that this film consisted of single crystal phase. It has rough film surface due to the surface outgrowth. The surface outgrowth increased as the substrate temperature increased from $510^{\circ}C$ to $590^{\circ}C$. the surface outgrowth may be due to the anisotropic growth rate. The highest transition temperature obtained in this study was $Tc_{zero}$ of 83K with $Tc_{onset}$ of 88K for the film deposited at $590^{\circ}C$ using activated RF oxygen plasma.

  • PDF

Reactive Dyeing of Bio Pretreated Cotton Knitted Fabrics

  • Ayoub, Alvira;Ali, Iftikhar;Son, Eun Jong;Jeong, Sung Hoon
    • 한국염색가공학회지
    • /
    • 제26권4호
    • /
    • pp.283-289
    • /
    • 2014
  • This study describes the feasibility and optimization of reactive dyeing on bio treated cotton knitted fabrics. For this, cotton knitted fabrics distinctly with two different enzymes, alkaline Pectinases(Scourzyme $L^{(R)}$) and Pectate lyases(Bactosol Co. ip $liquor^{(R)}$). In this way by increasing the concentration and processing temperature, the access of enzymes towards the fatty and waxy substrate was found to be accelerated. To achieve higher absorbency and whiteness index, a series of experiments was carried out to assure that Pectate lyases enzymes possesses high access towards the fats and waxes at high temperature. To this end, cotton knitted fabrics was dyed without oxidative bleaching step. The Pectate lyases scoured and dyed fabrics showed less color difference when 2% dye shade is used. The fabrics pre-scoured with Pectate lyases showed good the light and washing fastness properties, compared to the conventional and Pectinases dyed fabrics. However pectinases enzymes showed lower activity at high temperature, caused poor wettability and whiteness index of fabrics. The improvement of the accessibility of enzyme to the pectin at higher temperature Pectate lyases treatment before dyeing was found to be useful for subsequent pectin degradation in cotton knitted fabrics.

HIPIMS Arc-Free Reactive Deposition of Non-conductive Films Using the Applied Material ENDURA 200 mm Cluster Tool

  • Chistyakov, Roman
    • 한국진공학회:학술대회논문집
    • /
    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
    • /
    • pp.96-97
    • /
    • 2012
  • In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

  • PDF

Coloration behaviors of phthalocyanine reactive dye on nylon substrates: experiments, empirical modeling and statistical analysis

  • Kim, Byung-Soon;Ravikumar, K.;Yoon, Seok-Han;Son, Young-A
    • 한국염색가공학회지
    • /
    • 제19권2호
    • /
    • pp.14-23
    • /
    • 2007
  • This research article explores the use of phthalocyanine reactive dye on nylon substrate. The effect of factors such as pH, temperature, liquor ratio and alkali addition on level of dye exhaustion, fixation and total fixation efficiency. Low pH, high temperature and low liquor ratio were found to be suitable conditions for maximum % exhaustion values. The effect of sulphatoethylsulphone(SES) and vinylsulphone(VS) form of the dyes on level of dye fixation was also discussed. The optimized exhaustion (%E), fixation(%F) and total fixation efficiency were determined. Modification of the dyeing process with alkali addition displayed that dye fixation(%) increased by alkali addition. Vinylsulphone(VS) moiety of the dye was found to be superior to. maximum fixation (%F). Appropriate predictable empirical models, relatively a new approach in dyeing processes, were developed incorporating interactions effects of temperature, pH and liquor ratio for predicting % exhaustion, fixation and total fixation efficiency. The significance of the mathematical model developed was ascertained using microsoft excel regression(solver) analysis module. High correlation coefficient was obtained (R2=0.9895 for % exhaustion, R2=0.9932 for fixation, R2=0.9965 for total fixation efficiency) for the model which shows prominent prediction capacity of the model for my conditions. The predictable polynomial equations developed from tile experimental results were thoroughly analyzed by ANOVA (Analysis of Variance) statistical concepts.