• 한국표면공학회지
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• 제37권3호
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• pp.179-184
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• 2004

Hard chromium coating technology using hexavalent chromium bath is widely used in various industries. Because of the serious health and environmental problems of hexavalent chromium, many attempts to alternate the hexavalent chromium plating have been made over 50 years. Trivalent chromium plating is one of the challengeable technologies to alternate hexavalent chromium plating. It is relatively none-toxic. Although some papers have described hard chromium coatings produced from trivalent chromium solution, it has limited the industrialization because of chemical and electrochemical problems of trivalent chromium ions. This paper introduces a number of factors for successful trivalent chromium plating, to give a some information about trivalent chromium process.

• 한국표면공학회지
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• 제36권1호
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• pp.48-58
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• 2003

This paper will present an overview of toxicity of hexavalent chromium as well as effort for its replacement by a wide spectrum of alternative materials and technologies. Cr-based materials such as trivalent electrodeposit will be one of strong candidates for hard chromium by surface modification of its surface hardness. Ni-base alloy deposits has proved its application in specific mold for glass. HVOF has been studied in aircraft and military sector. There are still under way of development for commercially available alternatives. To date, no single coating has been identified as universal process as comparable to conventional hard chromium electroplating.

• 한국표면공학회지
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• 제25권4호
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• pp.181-186
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• 1992

To investigate how to produce the crack free and chromium deposits, bath compositions, additives, electrolysis conditions and other electroplating parameters, such as cathodic current efficiency, surface hard-ness, crack density and corrosion rate of deposits were examined carefully. The crack free chrome deposits were well obtained using both wetting agents and two kind of additives. At 60 A/d$\m^2$, $60^{\circ}C$ electrolysis condition, crack free bright hard chromium deposits were well obtained to a thickness $300\mu\textrm{m}$ in Additive-I and Additive-II added solution.

• 한국표면공학회지
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• 제36권2호
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• pp.155-160
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• 2003

The effect of the temperature, current density and deposit time on hard chromium deposition in trivalent chromium bath was investigated. Cathode current efficiency increased with increasing current density. Increasing bath temperature from $20^{\circ}C$ to $50^{\circ}C$, chromium deposits were produced in higher current density and the maximum current efficiency was increased. At the plating conditions of $40^{\circ}C$, $30A/dm\m^2$, the deposition thickness increased in proportion to increasing electrolysis time The rate is$ 90\mu\textrm{m}$/hrs. for 2 hours. Microhardness of chromium deposits increased with increasing bath temperature and decreasing current density, and it was constant with electrolysis time. All of bath conditions, microstructure of chromium deposits has nodular structure with some cracking pattern and nodule size increased with increasing deposit thickness.

• 한국생산제조학회지
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• 제18권5호
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• pp.469-476
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• 2009

Hard facing overlay welding in high chromium carbide is a representative way of extending the fatigue life or recompensing damage, because workpiece surface is uniformly overlay-welded by alloy material. In general, grinding process is currently used for finish due to hardness of weld material. The development of tool material, such as PCBN, has made it possible to use turning instead of grinding. There are many advantages of hard Owning, as lower equipment costs, shorter setup time, fewer process steps, higher material removal rate, better surface integrity and the elimination of cutting fluid. In this paper, machining characteristics and cutting performance are examined to investigate turning possibility of overly welding in high chromium carbide.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2003년도 춘계학술발표회 초록집
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• pp.25-25
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• 2003

• 한국표면공학회지
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• 제47권3호
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• pp.116-120
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• 2014

The addition of cyclo propane carbonyl (cpc) to chromium electroplating bath resulted in a chromium deposit which had greatly improved mechanical properties compared to conventional chromium deposits in condition of heat treatment at high temperature. The as-deposited layers had a Vicker's hardness of about 1170, which is comparable to that of conventional chromium plating deposits. With annealing, the hardness goes through a maximum of 1650 at $600^{\circ}C$. Generally speaking, the hardness of conventional plating decreases monotonically with heat treatment. X-ray diffraction show that annealing up to above $400^{\circ}C$ causes formation and growth of chromium crystallites and that chromium carbides form at above $500^{\circ}C$ temperature.

• 대한기계학회논문집A
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• 제39권12호
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• pp.1297-1303
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• 2015

장축의 내부 크롬도금은 크롬산 용액에 황산을 촉매로 경질의 후막 도금층을 형성시키는 기술로서 산업뿐만 아니라 군사적 목적으로도 널리 사용되고 있다. 대구경의 포신내부에 경질크롬도금을 처리하면 강성과 내마성을 증대시켜 고압의 폭발력에 견딜 수 있다. 탄자의 높은 운동에너지와 탄 폭발로 생긴 고압력에 의해 포신 내부의 크롬도금층이 탈락되는 문제가 있어 도금 공정 전반에 걸친 검토가 이루어졌다. 크롬도금은 탈지, 수세, 전해연마, 에칭, 도금, 수세 및 수소취성제거 등 여러 공정으로 이루어진다. 크롬도금 탈락은 도금의 밀착성과 연관이 있으며, 그 중에 전해연마액의 Fe 농도가 도금 밀착성에 영향을 미치는 것으로 나타났다. 도금부위의 요철상태를 SEM으로 조사하여 도금탈락을 방지할 수 있는 최적의 Fe 농도를 설정하고, 밀착성 시험 등으로 그 효과를 입증하였다.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2001년도 추계학술발표회 초록집
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• pp.29-30
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• 2001

This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2002년도 춘계학술발표회 초록집
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• pp.41-41
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• 2002