• Journal of the Korean institute of surface engineering
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• v.37 no.3
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• pp.179-184
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• 2004

Hard chromium coating technology using hexavalent chromium bath is widely used in various industries. Because of the serious health and environmental problems of hexavalent chromium, many attempts to alternate the hexavalent chromium plating have been made over 50 years. Trivalent chromium plating is one of the challengeable technologies to alternate hexavalent chromium plating. It is relatively none-toxic. Although some papers have described hard chromium coatings produced from trivalent chromium solution, it has limited the industrialization because of chemical and electrochemical problems of trivalent chromium ions. This paper introduces a number of factors for successful trivalent chromium plating, to give a some information about trivalent chromium process.

• Journal of the Korean institute of surface engineering
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• v.36 no.1
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• pp.48-58
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• 2003

This paper will present an overview of toxicity of hexavalent chromium as well as effort for its replacement by a wide spectrum of alternative materials and technologies. Cr-based materials such as trivalent electrodeposit will be one of strong candidates for hard chromium by surface modification of its surface hardness. Ni-base alloy deposits has proved its application in specific mold for glass. HVOF has been studied in aircraft and military sector. There are still under way of development for commercially available alternatives. To date, no single coating has been identified as universal process as comparable to conventional hard chromium electroplating.

• Journal of the Korean institute of surface engineering
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• v.25 no.4
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• pp.181-186
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• 1992

To investigate how to produce the crack free and chromium deposits, bath compositions, additives, electrolysis conditions and other electroplating parameters, such as cathodic current efficiency, surface hard-ness, crack density and corrosion rate of deposits were examined carefully. The crack free chrome deposits were well obtained using both wetting agents and two kind of additives. At 60 A/d$\m^2$, $60^{\circ}C$ electrolysis condition, crack free bright hard chromium deposits were well obtained to a thickness $300\mu\textrm{m}$ in Additive-I and Additive-II added solution.

• Journal of the Korean institute of surface engineering
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• v.36 no.2
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• pp.155-160
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• 2003

The effect of the temperature, current density and deposit time on hard chromium deposition in trivalent chromium bath was investigated. Cathode current efficiency increased with increasing current density. Increasing bath temperature from $20^{\circ}C$ to $50^{\circ}C$, chromium deposits were produced in higher current density and the maximum current efficiency was increased. At the plating conditions of $40^{\circ}C$, $30A/dm\m^2$, the deposition thickness increased in proportion to increasing electrolysis time The rate is$ 90\mu\textrm{m}$/hrs. for 2 hours. Microhardness of chromium deposits increased with increasing bath temperature and decreasing current density, and it was constant with electrolysis time. All of bath conditions, microstructure of chromium deposits has nodular structure with some cracking pattern and nodule size increased with increasing deposit thickness.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.18 no.5
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• pp.469-476
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• 2009

Hard facing overlay welding in high chromium carbide is a representative way of extending the fatigue life or recompensing damage, because workpiece surface is uniformly overlay-welded by alloy material. In general, grinding process is currently used for finish due to hardness of weld material. The development of tool material, such as PCBN, has made it possible to use turning instead of grinding. There are many advantages of hard Owning, as lower equipment costs, shorter setup time, fewer process steps, higher material removal rate, better surface integrity and the elimination of cutting fluid. In this paper, machining characteristics and cutting performance are examined to investigate turning possibility of overly welding in high chromium carbide.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2003.05a
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• pp.25-25
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• 2003

• Journal of the Korean institute of surface engineering
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• v.47 no.3
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• pp.116-120
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• 2014

The addition of cyclo propane carbonyl (cpc) to chromium electroplating bath resulted in a chromium deposit which had greatly improved mechanical properties compared to conventional chromium deposits in condition of heat treatment at high temperature. The as-deposited layers had a Vicker's hardness of about 1170, which is comparable to that of conventional chromium plating deposits. With annealing, the hardness goes through a maximum of 1650 at $600^{\circ}C$. Generally speaking, the hardness of conventional plating decreases monotonically with heat treatment. X-ray diffraction show that annealing up to above $400^{\circ}C$ causes formation and growth of chromium crystallites and that chromium carbides form at above $500^{\circ}C$ temperature.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.39 no.12
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• pp.1297-1303
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• 2015

The internal chromium plating of a long-axis tube is widely used in military and industrial application, with the thick hard plating formed using a mixed solution of Chromium acid and catalytic $H_2SO_4$. A large-caliber gun can endure a high explosive force as a result of the increased stiffness and wear resistance provided by this internal hard chromium surface. The internal chromium layer of a tube is prone to exfoliation caused by the high kinetic energy of the projectile and high pressure of the explosion. Therefore, we reviewed the plating process. Chromium plating comprises many steps, including the removal of Grease, water cleaning, electrolytic abrasion, etching, plating, water cleaning, and hydrogen brittleness removal. The exfoliated chromium plating layer is affected by the adhesion property of the plating. In particular, the Fe concentration of the electrolyte affects the adhesion property. The optimum Fe concentration for effectively suppressing the exfoliation of the plating layer was established by using a scanning electron microscope to determine the surface roughness, and the effectiveness was proved in an adhesion test, etc.

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2001.11a
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• pp.29-30
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• 2001

This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).

• Proceedings of the Korean Institute of Surface Engineering Conference
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• 2002.05a
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• pp.41-41
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• 2002