• Title/Summary/Keyword: HEATER

Search Result 1,744, Processing Time 0.029 seconds

Computational Fluid Dynamics Model for Solar Thermal Storage Tanks with Helical Jacket Heater and Upper Spiral Coil Heater (상부 코일히터를 갖춘 나선재킷형 태양열 축열조의 성능예측을 위한 CFD 해석모델 개발 및 검증)

  • Baek, Seung Man;Zhong, Yiming;Nam, Jin Hyun;Chung, Jae Dong;Hong, Hiki
    • Transactions of the Korean Society of Mechanical Engineers B
    • /
    • v.37 no.4
    • /
    • pp.331-341
    • /
    • 2013
  • In a solar domestic hot water (SDHW) system, solar energy is collected using collector panels, transferred to a circulating heat transfer fluid (brine), and eventually stored in a thermal storage tank (TST) as hot water. In this study, a computational fluid dynamics (CFD) model was developed to predict the solar thermal energy storage in a hybrid-type TST equipped with a helical jacket heater (mantle heat exchanger) and an immersed spiral coil heater. The helical jacket heater, which is the brine flow path attached to the side wall of a TST, has advantages including simple system design, low brine flow rate, and enhanced thermal stratification. In addition, the spiral coil heater further enhances the thermal performance and thermal stratification of the TST. The developed model was validated by the good agreement between the CFD results and the experimental results performed with the hybrid-type TST in SDHW settings.

Semiconductor wafer exhaust moisture displacement unit (반도체 웨이퍼 공정 배기가스 수분제어장치)

  • Chan, Danny;Kim, Jonghae
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.16 no.8
    • /
    • pp.5541-5549
    • /
    • 2015
  • This paper introduces a safer and more power efficient heater by using induction heating, to apply to the semiconductor wafer fabrication exhaust gas cleaning system. The exhaust gas cleaning system is currently made with filament heater that generates an endothermic reaction of N2 gas for the removal of moisture. Induction theory, through the bases of theoretical optimization and electronic implementation, is applied in the design of the induction heater specifically for the semiconductor wafer exhaust system. The new induction heating design provides a solution to the issues with the current energy inefficient, unreliable, and unsafe design. A robust and calibrated design of the induction heater is used to optimize the energy consumption. Optimization is based on the calibrated ZVS induction circuit design specified by the resonant frequency of the exhaust pipe. The fail-safe energy limiter embedded in the system uses a voltage regulator through the feedback of the MOSFET control, which allows the system performance to operate within the specification of the N2 Heater unit. A specification and performance comparison from current conventional filament heater is made with the calibrated induction heater design for numerical analysis and the proof of a better design.