• Journal of Biosystems Engineering
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• v.26 no.5
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• pp.469-474
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• 2001

Milling the rice with low moisture requires more energy, produces more cracked rice, and results in reducing taste of cooked rice. Accordingly, it is necessary to add moisture to the rice with low moisture to obtain optimum moisture level for milling and taste of rice. This study was performed to evaluate the influence of initial moisture content and absorption rate on rice crack, milling energy and whiteness of milled rice and to obtain the information for design of rewetting system mounted on stirring device in grain bin. The tests were conducted for the four levels of initial moisture content in the range of 11.4 to 14.5%(w.b.) and six levels of absorption rate in the range of 0.04 to 1.0%, w.b./hr. In the case of lower moisture content below 12%(w.b.), crack ratios of brown rice were remarkably high regardless of initial moisture contents. Therefore, it was found that rough rice below 12%(w.b.) in initial moisture content could not rewetted by spraying water without crack generation of low level. Absorption rate must be below 0.3%, w.b./hr to maintain crack ratio increase of less than 1% regardless of initial moisture contents. In the case of allowable crack ratio increase of 2% and 5%, it was found that the maximum absorprion rate was respectively 0.6%, w.b./hr and 1.0%, w.b./hr in the initial moisture content of above 13.5%(w.b.). Rewetting the rough rice in moisture content of 11.4 to 14.5%(w.b.) to 14.3 to 16.9%(w.b.) decreased milling energy consumption by 15.9 to 22.3%. The effect of energy saving was higher in the samples of higher initial moisture content. Whiteness of milled rice was decreased by 0.5 to 1.5.

• The Korean Journal of Mycology
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• v.26 no.2 s.85
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• pp.265-274
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• 1998

This study was carried out to obtain the basic data for an artificial cultivation of Phellinus sp.. The optimum conditions for the mycelial growth on the different sawdusts (Quercus aliena, Morns alba and Alnus japonica) substrate of an isolated Phellinus sp. were optimized by response surface methodology. The ratio of rice bran addition to sawdust and the suitable moisture content for the mycelial growth in the all sawdust media were about 30% (w/w) and $65{\sim}70%$ (w/v), respectively. The initial pHs for the mycelial growth of Quercus aliena and Morns alba were in the range of $pH\;5{\sim}6$, whereas Alnus japonica was obtained at pH 6. The optimum temperature for the mycelial growth was about $25{\sim}30^{\circ}C$, depending on the different kinds of wood substrates. From the response surface analysis, the values of independent variables of Quercus aliena at stationary points were determined to be 31.01 % (w/w) of rice bran, pH of 5.31 and 69.03% (w/v) of moisture content, and the expected value of mycelial growth was about 8.32 cm. Both the ratio of rice bran addition to sawdust $(X_1)$ and moisture content $(X_3)$ were effective to the mycelial growth. In the case of Morns alba, the ratio of rice bran addition to sawdust, initial pH and moisture content at the stationary points were 28.77% (w/w), 5.28 and 69.8 (w/v),respectively, and the expected mycelial growth of 7.60 cm was obtained. Stationary points for the mycelial growth in the sawdust media of Alnus japonica were 28.74% (w/w) of rice bran, pH of 6. 04 and 66.96% (w/v) of moisture content, and the expected values of mycelial growth was about 5.38 cm. Based on the above results, there was correlations between the mycelial growth and independent variables, and the effect of rice bran $(X_1)$ and initial pH $(X_2)$ for the mycelial growth were higher than the moisture content $(X_3)$. The optimum species of sawdust media for the my celial growth of Phellinus sp. was in the order of Quercus aliena > Morns alba > Alnus japonica.

• Journal of the Korean Ceramic Society
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• v.31 no.10
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• pp.1159-1168
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• 1994

We powders were synthesized from W powders in differnet particle sizes by Self-propagating High-temperature Synthesis process (SHS) using a chemical furnace. The effects of the mole ratio of chemical fuel content, pellet thickness and the mole ratio between carbon and tungsten (C/W Ratio) on synthesis were investigated with the tungsten powders have different particle size each other. Compositional and structural characterization of these powders was carried out by scanning electron microscope (SEM0 and x-ray diffractometer. Powder characterization was carried out by the measurement of particle size distribution with laser-particle size analyzer. The amounts of WC obtained by SHS process depend very much on the particle size of tungsten powder and heat contents given in a product, i.e. as the particle size of W powder is smaller, the amounts of WC produced increase. Also the more heat contents is given, the more amounts of WC increase. By optimizing the synthesis conditions, it is possible to fabricate WC powders which have little secondary phases (W2C, C).

• Journal of the Korean Ceramic Society
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• v.38 no.11
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• pp.1037-1041
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• 2001

Silicon diosixde thick film using silica optical waveguide cladding was fabricated by Plasma Enhanced Chemical Vapor Deposition (PECVD) method, at a low temperature (32$0^{\circ}C$) and from (SiH$_4$+$N_2$O) gas mixtures. The effects of deposition parameters on properties of SiO$_2$thick films were investigated by variation of $N_2$O/SiH$_4$flow ratio and RF power. As the $N_2$O/SiH$_4$flow ratio decreased, deposition rate increased from 2.9${\mu}{\textrm}{m}$/h to maximum 10.1${\mu}{\textrm}{m}$/h. As the RF power increased from 60 W to 120 W, deposition rate increased (5.2~6.7 ${\mu}{\textrm}{m}$/h) and refractive index approached at thermally grown silicon dioxide (n=1.46).

• Resources Recycling
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• v.29 no.5
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• pp.38-47
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• 2020

In this study, factors affecting the adsorption reaction for the separation/recovery of V and W using Lewatit monoplus MP 600, a strong basic anion exchange resin, from the leachate obtained through the soda roasting-water leaching process from the spent SCR DeNO_X catalyst investigated and the adsorption mechanism was discussed based on the results. In the case of the mixed solution of V and W, both ions showed a high adsorption ratio at pH 2-6, but the adsorption of W was greatly reduced at pH 8. In the adsorption isothermal experiment, both V and W were fitted well at the Langmuir adsorption isotherm, and the reaction kinetics were fitted well at pseudo-second-order. As a result of conducting an adsorption experiment by adjusting the pH with H₂SO₄ to remove Si, which inhibits the adsorption of V and W from the leachate, the lowest W adsorption ratio was shown at pH 8.5. Desorption of W was hardly achieved in strongly acidic solutions, and desorption of V was well performed in both strongly acidic and strongly basic solutions.

• Transactions of the Korean Society of Mechanical Engineers
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• v.18 no.10
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• pp.2533-2542
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• 1994

This paper suggests a simple approach to determining the screw characteristics for a three0dimensional flow in a channel with a finite aspect ratio(ratio of a width to a depth, W/H) by introducing a Total Shape Factor($F_t$) to correct a two-dimensional flow analysis for a channel with an infinite aspect ratio. In the present study, the Total Shape Factor($F_t$) was defined as a ratio of a net flow rate obtained by the three-dimensional analysis to that by the two-dimensional analysis. In the proposed approach, the quantity, $ \frac{{\partial}F_t}{\partial(H/W)}$ turns out to be almost constant and to play an important role in understanding the effects of the flights. Therefore, $ \frac{{\partial}F_t}{\partial(H/W)}$ are extensively reported in this paper in terms of several dimensionless parameters. This simple approach with such database will be very useful for extruder designers to predict the screw characteristics.

• Journal of the Korean Vacuum Society
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• v.7 no.2
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• pp.141-149
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• 1998

The W thin films were deposited on Si3N4 by a PECVD technique. The effects of substrate temperature and gas flow ratio on the properties of the W films were investigated. The deposition of W films were limited by surface reaction at the temperature range of 150>~$250^{\circ}C$, W films had the deposition rate of 150~530 $\AA$/min and stress of 0.85~$14.35\times10 ^9 \textrm {dynes/cm}^2}$ at various substrate temperatures and $SiH_4/WF_6$ flow ratios. $SiH_4/WF_6$ flow ratio affected the deposition rate and stress of the W films, expecially, excessive flow of SiH4 abruptly changed the structure, chemical bonding, and stress of the W films. Among the deposited W films on TiN, Ti, Mo, NiCr and Al adhesion layer, the one on the Al had the best adhesion property.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2009.06a
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• pp.206-207
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• 2009

PECVD를 이용하여 상온에서 Silicon nitride 박막을 제조하였다. 그리고 증착 중에 non-invasive ion energy analyzer를 이용하여 이온에너지와 이온에너지 flux룰 측정하였다. PECVD의 소스 파워는 500W, 바이어스 파워 100W으로 고정하고 주파수 250Hz으로 고정된 상태에서 펄스를 인가하여 duty ratio를 30-100%까지 변화시켰다. 작은 duty ratio 범위 (30-70%)에서 duty ratio가 감소할 때, 이온에너지와 이온에너지의 비가 감소하였다. 이 때 감소되는 굴절률은 저이온에너지 변수와 강한 연관성을 지니고 있었다. 굴절률은 1.65-2.46 사이에서 변화하였다.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.30 no.6 s.249
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• pp.505-513
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• 2006

The pressure drop characteristics in a rotating two-pass duct with rib turbulators are investigated in the present study. Three ducts of different aspect ratios (W/H=0.5, 1.0 and 2.0) are employed with a fixed hydraulic diameter ($D_h$) of 26.7 mm. $90^{\circ}$-rib turbulators with $1.5mm{\times}1.5mm$ cross-section are attached on the leading and trailing surfaces. The pitch-to-rib height ratio (p/e) is 1.0. The distance between the tip of the divider and the outer wall of the duct is 1.0 W. The thickness of divider wall is 6.0 mm o. 0.225 $D_h$. The Reynolds number (Re) based on the hydraulic diameter is kept constant at 10,000 and the .elation number (Ro) is varied from 0.0 to 0.2. As duct aspect ratio increases, high friction factor ratios show in overall regions. The reason is that the rib height-to-duct height ratio (e/H) increases, but the divider wall thickness-to-duct width ($t_d/W$) decreases. The rotation of duct produces pressure drop discrepancy between the leading and trailing surfaces. However, the pressure drop discrepancy of the high duct aspect ratio (AR=2.0) is smaller than that of the low duct aspect ratio (AR=0.5) due to the decrement of duct hight (H).

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.632-635
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• 2001

Microcrystalline Si films have been deposited by using five W-wire filaments of 0.5 mm diameter for hot-wire chemical vapor deposition (HWCVD). We compared the HWCVD grown films with the film exposed to transformer couple plasma system for the modification of seed layer. W-wire filament temperature was maintained below 1600$^{\circ}C$ to avoid metal contamination by thermal evaporation at the filament. Deposition conditions were varied with H$_2$dilution ratio, with and without plasma treatment. From the Raman spectra analysis, we observed that the film crystallization was strongly influenced by the H$_2$dilution ratio and weakly depended on the distance between the wire and a substrate. We were able to achieve the crystalline volume fraction of about 70% with an SiH$_4$/H$_2$ratio of 1.3%, a wire temperature of 1514$^{\circ}C$, a substrate separation distance of 4cm, and a chamber pressure of 38 mTorr. We investigated the influence of ${\mu}$c-Si film properties by using a plasma treatment. This article also deals with the influence of the H$_2$dilution ratio in crystallization modification.