• Title/Summary/Keyword: Graphoepitaxy

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Graphoepitaxy of ZnO layers grown on periodic structured Si substrates (주기적 표면 구조의 SiO$_2$ 기판을 이용한 ZnO박막의 Graphoepitaxy)

  • Jung, Jin-U;Ahn, Hyeon-Cheol;Lee, Chang-Yong;Kim, Gwang-Hui;Choi, Seok-Cheol;Lee, Tae-Hun;Park, Seung-Hwan;Jung, Mi-Na;Jung, Myeong-Hun;Lee, Ho-Jun;Yang, Min;Yao, Takafumi;Chang, Ji-Ho
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • v.9 no.1
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    • pp.1042-1045
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    • 2005
  • The feasibility of graphoepitaxial growth of compound semiconductor has been studied. Two kinds of substrates were prepared; one is smooth substrate, the other one is a periodic structured substrate. ZnO film was deposited on both substrates by sputtering, and thermal treatment was performed to improve the crystal quality and investigate the effect of the periodic structure. Atomic force microscopy (AFM) and photoluminescence (PL) were used to characterize the samples. As a result, very similarchange, the improvement of crystallinity, has been observed from both samples, except the sample annealed at the highest temperature. It implies the periodic structure affects the crystallinity of the films, and the graphoepitaxy of compound semiconductors is possible by using appropriate surface structure.

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Graphoepitaxy of ZnO thin films by Zn evaporation (Graphoepitaxy법을 이용하여 SiO$_2$ 기판 위에 제작한 ZnO 박막의 특성에 관한 연구)

  • Kim, Gwang-Hui;Choi, Seok-Cheol;Lee, Tae-Hun;Jung, Jin-U;Park, Seung-Hwan;Jung, Mi-Na;Jung, Myeong-Hun;Yang, Min;Yao, Takafumi;Chang, Ji-Ho
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
    • /
    • v.9 no.1
    • /
    • pp.1026-1029
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    • 2005
  • The feasibility of graphoepitaxial growth of compound semiconductors has been studied. Two kinds of substrates were prepared; one is smooth substrate, the other one is a periodic structured substrate. ZnO film was formed on both substrates by thermal evaporation of elemental Zn and natural oxidation of the deposited Zn. Thermal treatment was performed to improve the crystal quality and to investigate the effect of the periodic structure. Atomic force microscopy (AFM) and photoluminescence (PL) were used to characterize the samples. As a result, the improvement of crystallinity as annealing temperature increase, has been observed from both samples. The samples, annealed at 800 $^{\circ}$C, show the best crystal quality in terms of PL linewidth. Also the sample grown on grating structure shows better crystal quality than the sample grown on flat substrate. It implies that the periodic structure affects the crystallinity of the films, and the graphoepitaxy of compound semiconductors is possible by using appropriate surface structure.

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