• Solar Energy
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• v.19 no.3
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• pp.125-131
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• 1999

This paper deals with a novel structure of poly-Si solar cell. A grain boundary(GB) of poly-Si acts as potential barrier and recombination center for photo-generated carriers. To reduce unwanted side effects at the GB of poly-Si, we employed physical GB removal of poly-Si using chemical solutions. Various chemical etchants such as Sirtl, Yang, Secco, and Schimmel were investigated for the preferential GB etching. Etch depth about 10 ${\mu}m$ was achieved by a Schimmel etchant. After a chemical etching of poly-Si, we used $POCl_3$ for emitter junction formation. This paper used an easy method of top electrode formation using a RF sputter grown ITO film. ITO films with thickness of 300 nm showed resistivity of $1.26{\times}10^{-4}{\Omega}-cm$ and overall transmittance above 80%. Using a preferential GB etching and ITO top electrode, we developed a new fabrication procedure of poly-Si solar cells. Employing optimized process conditions, we were able to achieve conversion efficiency as high as 16.6% at an input power of 20 $mW/cm^2$. This paper investigates the effects of process parameters: etching conditions, ITO deposition factors, and emitter doping densities in a poly-Si cell fabrication procedure.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.12 no.1
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• pp.56-61
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• 1999

Highly conductive oxide films of BaRuO$_3$ have been grown heteroepitaxially on (100) LaAlO$_3$ single crystalline substrates by using pulsed laser deposition. The films are c-axis oriented with an in-plane epitaxial relationship of <010><100>BaRuO$_3$ // <110>LaAlO$_3$. Atomic force microscopy (AFM) observation shows that they consist of a fine-arranged network of grains and have a mosaic microstructure. Generally temperature-dependent resistivity shows the transition from metallic curve to semiconductor-metallic twofold curve by the deposition conditions for Ru oxide based materials like SrRuO$_3$, CaRuO$_3$, BaRuO$_3$, etc.. This twofold curve comes from the structural similarity of Ru oxide based materials including BaRuO$_3$. We find that the distance of Ru-Ru bonding in the unit cell of BaRuO$_3$ as well as the grain boundary scattering could be the two important causes of these interesting conductive properties.

• Journal of the Korean Ceramic Society
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• v.33 no.11
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• pp.1245-1252
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• 1996

The charcteristics for the copper-contained spinel ferrites such as NiCu-and ZnCu ferrites with various copper content are investigated in this study which can provide a explanation for the behavior of copper in sintering at a low temperatuer. The bulk density and the grain size for these sintered ferrites were increased with the larger amount of copper in compositions. In microstructure of copper-contained spinel ferrites copper exists in the grain boundary which is sintering process. Electrical resistivity and frequency range with maximum Q-facor of NiCu-or ZnCu ferrites were decreased as increasing of copper content in ferrite composition.

• Journal of the Korean Ceramic Society
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• v.25 no.3
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• pp.293-299
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• 1988

The effects of flux KCl and dopants, La2O3 and Ta2O5, on the PTCR characteristics in molten salt synthesized BaTiO3 have been studied. The resistivity of BaTiO3 at room temperature decreases with increasing amount of dopant La2O3 up to 0.2 atom%, and then increases with La2O3 content. In case of dopant Ta2O5, it increases with increasing amount ofthe dopant. These results could be explained by observation of the microstructure and defect equation. From the results of complex impedance-frequency characteristics, the grain resistances are almost same but the resistances at the grain boundary are quite different.

• Journal of the Korean Vacuum Society
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• v.5 no.1
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• pp.67-72
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• 1996

$RU_{1-x}Ir_xO_2$ films were deposited on the quartz substrate by a spray pyrolysis method. The x-ray diffraction patterns showed that the structure of the $RU_{1-x}Ir_xO_2$ film was tetragonal and the lattice constant $a_o$ and $c_o$ were increased from 4.495 A to 4.058 A and from 3.092A to 3.156 A, respectively as the Ir composition varied from 0.0 to 1.0. The $RU_{1-x}Ir_xO_2$ film was metallic and the resistivity of the samples was increased from $7{\times}10^{-5}{\Omega}\textrm{cm}$ to $48{\times}10^{-5}{\Omega}\textrm{cm}$ with increasing the Ir x. The surface of the sample was slightly roughed, the grain size and the grain boundary width were increased as the Ir composition varied from 0.0 to 1.0.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1988.05a
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• pp.3-6
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• 1988

Electrical and magnetic properties of $Y_1Ba_2Cu_3O_7-y$ sintered with $Bi_2O_3$ have been investigated by levitation experiment and the measurement of electrical resistivity. The effects of $Bi_2O_3$ addition on the microstructure of the sintered specimens were also investigated. The electrical resistivity in the normal state is smaller in $Y_{0.85}Bi_{0.15}Ba_2Cu_3O_{7-y}$, where the Bi is substituted into Y site, than in the basic compound $Y_1Ba_2Cu_3O_{7-y}$ due to improved microstructure. On the other hand, the microstructure is poor and electrical resistivity is larger in the $Y_1Ba_2Cu_3O_{7-y}$ sintered with excess $Bi_2O_3$. It appears that the impurity in grain boundary affect the electrical properties significantly but has little effect on the magnetic property.

• Korean Journal of Materials Research
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• v.1 no.4
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• pp.177-183
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• 1991

Change of the properties of selective CVD-W by $SiH_4$ reduction with the variation of deposition time and pressure has been investigated. The lime required for covering the who)to Si substrate by tungsten at $300^{\circ}C$ under the pressure of 100mtorr is approximately 30 seconds. The film thickness tends to increase linearly in the early stage of deposition process and parabolically later, sheer resistance of the film tends to decrease rapidly initially, and slowly later with deposition time. Tungsten grain size does not change much, but grain boundary becomes hazy in the pressure range of 50-300mtorr. Also no ${\beta}-W$ but only ${\alpha}-W$ was found in this pressure range. The deposition rate and electrical resistivity of tungsten tend to increase wish increasing pressure. The results of AES analysis show that pressure does not much affect Si/W ratio of the tungsten film and silicidation at the W/Si interface.

• Journal of the Korean Ceramic Society
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• v.28 no.10
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• pp.803-809
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• 1991

Microstructure, room temperature resistivity and temperature coefficient of resistance of BaTiO3 ceramics were characterized and measured in this study. The basic composition of the BaTiO3 cremics was formed by adding 0.25 mol% Dy2O3 and 0.07 mol% MnO2 to the BaTiO3 composition. Samples of the BaTiO3 ceramics were prepared by adding various amounts of the TiO2, SiO2 and Al2O3 to the basic composition. An addition of 1 mol% TiO2, 2 mol% SiO2 and 0.5 mol% Al2O3 to the basic composition resulted both the values of the room temperature resistivity and the temperatured coefficient being maxium. Meanwhile, an addition of 1 mol% TiO2 and 1 mol% Al2O3 to the basic composition resulted the value of the room temperature resistivity maxium and the temperature coefficient minimum. The temperature coefficient showed a maximum value as well as a minimum value when the three kinds of the additives were added together to the basic composition of the BaTiO3 ceramics. Maxed phases of BaTi3O7, BaTiSiO5 and BaAl2Si2O8 were present at the grain boundary.

• Journal of Powder Materials
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• v.24 no.4
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• pp.292-297
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• 2017

A metallic oxide layer of a heat-resistant element contributes to the high-temperature oxidation resistance by delaying the oxidation and has a positive effect on the increase in electrical resistivity. In this study, green compacts of Fecralloy powder mixed with amorphous and crystalline silica are oxidized at $950^{\circ}C$ for up to 210 h in order to evaluate the effect of metal oxide on the oxidation and electrical resistivity. The weight change ratio increases as per a parabolic law, and the increase is larger than that observed for Fecralloy owing to the formation of Fe-Si, Fe-Cr composite oxide, and $Al_2O_3$ upon the addition of Si oxide. Si oxides promote the formation of $Al_2O_3$ and Cr oxide at the grain boundary, and obstruct neck formation and the growth of Fecralloy particles to ensure stable electrical resistivity.

• 한국신재생에너지학회:학술대회논문집
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• 2010.11a
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• pp.55.1-55.1
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• 2010

Cost efficient and large area deposition of superior quality $Al_2O_3$ doped zinc oxide (AZO) films is instrumental in many of its applications including solar cell fabrication due to its numerous advantages over ITO films. In this study, AZO films were prepared by a highly efficient rotating cylindrical dc magnetron sputtering system using AZO target, which has a target material utilization above 80%, on glass substrates in argon ambient. A detailed analysis on the electrical, optical and structural characteristics of AZO thin films was carried out for solar cell application. The properties of films were found to critically depend on deposition parameters such as sputtering power, substrate temperature, working pressure, and thickness of the films. A low resistivity of ${\sim}5.5{\times}10-4{\Omega}-cm$ was obtained for films deposited at 2kW, keeping the pressure and substrate temperature constant at 3 mtorr and $230^{\circ}C$ respectively, mainly due to an increase in carrier mobility and large grain size which would reduce the grain boundary scattering. The increase in carrier mobility with power can be attributed to the columnar growth of AZO film with (002) preferred orientation as revealed by XRD analysis. The AZO films showed a high transparency of>87% in the visible wavelength region irrespective of deposition conditions. Our results offers a cost-efficient AZO film deposition method which can fabricate films with significant low resistivity and high transmittance that can find application in thin-film solar cells.