• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2010년도 하계학술대회 논문집
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• pp.123-123
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• 2010

The hydrophobic coating for multi-walled nanotubes was treated with toluene and trimethylchlorosilane glow discharge plasma under low pressure, and the hydrophobic surface of the treated MWCNT was investigates. In order to investigate the effects of -CH components from the toluene and TMCS glow plasma, we conducted on the total surface free energies of the MWCNT powder, which was calculated by measuring the contact angle between the cushion of MWCNT powder and the probe liquids. The total surface free energies were determined by Owens-Wendt equation and drastically decreased.

• 한국염색가공학회지
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• 제5권4호
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• pp.29-41
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• 1993

In order to surface Hydrophobilization of Poly(ethylene terephthalate) (PET) fiber samples were treated in the atmosphere of CF$_{4}$ or $C_{2}$F$_{6}$glow discharge. The sample used in this study was PET film which is 75$\mu$m thick made by Teijin, O-Type(Japan). The cleaned samples were placed in plasma reactor made of pyrex glass cylinder, and plasma processing was carried out by glow discharge of CF$_{4}$ or $C_{2}$F$_{6}$ gas, being continuously fed by gas flow and continuously pumped out by a vacuum system. Electric power source for generate plasma state was sustained alternating current(60Hz) and voltage was sustained 600 volt. The duration of plasma treatment varied from 15 to 120 seconds except special case, the monomer gase pressure varied from 0.02 to 0.3 Torr and power range was 10 to 90 watts. The hydrophobic features of changed PET surface were evaluated by contact angle measurement and surface chemical characteristics were analyzed by ESCA. Results can be summerized as follows. 1. The most favorable setting position of substrate was the center area between the two electrodes. 2. $C_{2}$F$_{6}$ discharge current was lower than that of CF$_{4}$ when same voltage was sustained. Treated efficiency between CF$_{4}$ and $C_{2}$F$_{6}$ did not revealed significant differences under same electric power(wattage). 3. When monomer pressure is very low below 0.02 torr, as though substrate is exposed to CF$_{4}$ or $C_{2}$F$_{6}$ plasma, it tend to be hydrophilic through a little of fluorine bond and a great deal of oxidizing reaction. 4. There brought good hydrophobilization when monomer pressure was more 0.1 torr and duration of glow discharge treatment was over 45 seconds. When monomer pressure was too high, discharge current became low. Although prolong the duration, there was no more high hydrophobilization. 5. According to ESCA analysis, there were a little CF bond and a prevailing CF$_{2}$ bond in CF$_{4}$-treated substrate. There were CF$_{3}$, a little CF and a prevailing CF$_{2}$ bond in $C_{2}$F$_{6}$-treated substrate.d substrate.

• 분석과학
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• 제15권6호
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• pp.514-520
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• 2002

효율적인 시료의 분석을 위하여 개선된 전열증기화 속빈음극관 글로우 방전 우너자방출분광 장치를 제작하여 그에 대한 기초 연구를 수행하였다. 본 시스템은 개선된 속빈음극관 글로우 방잔에 개선된 전열증기화법을 이용한 샘플주입방법을 응용하였으며, ${\mu}{\ell}$단위의 적은 양으로도 분석가능하도록 순수한 텅스템 재질로 된 나선형 코일을 제작하여 증기화 효율을 최대한 높일수 있도록 하여 글로우 방전으로 최대한 많은 양이 주입될 수 있도록 개선하였다. 최적화된 분석조건을 위한 방전조건으로 시료운반기체 사용량과 방전 전력을 측정하였으며, 그 전에 글로우 방전셀의 냉각장치 및 내부의 구조적인 문제 여부에 따른 방출세기에 미치는 영향과 측정 정밀도를 관찰하였다. 방출되어 발생된 빛은 광전송용 광파이버에 의하여 효율적으로 검출기에 운반되도록 구성 제작하였으며, 마지막으로 본 연구결과에 의한 직선성을 관찰하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집 Vol.3 No.2
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• pp.874-877
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• 2002

The optogalvanic signals were measured using hollow cathode discharge tube with argon as buffer gas at change of discharge currents. A change of ionization rate due to electron collision causes an increase or decrease of the electric conductivity. This change in electric conductivity generates the optogalvanic signal. We conclude that optogalvanic signal has close relation with the lowest metastable atoms density at low current.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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• pp.142-145
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• 2000

The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the dc bias voltage of -10V showed lower discharge voltage and lower erosion rate by ion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process.

• 한국진공학회지
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• 제4권S2호
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• pp.49-57
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• 1995

At present the processes of boronizing have been mostly studied in a plasma from gaseous compounds containing the impregnating element and are in an industrial use. These have been investigated by a variety of works in a glow discharge with different mixture ratios of $B_2H_6$ and $H_2$ as well as $BCl_3$ and $H_2$. The active atomosphere has been diluted by Ar or some other inert gas in order to enhance control of boron potential and to reduce the ignition voltage of the glow discharge. The Control of gaseous atomosphere is essential to a boride layer in plamsa boronizing treatment. The boride formation is required to make the workpiece surface saturated with boron content. The present study considers the efficiency of plasma boronizing reactions and the morphology of boride layer under various plasma conditions

• 분석과학
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• 제12권1호
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• pp.1001-1010
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• 1999

• 대한전기학회:학술대회논문집
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• 대한전기학회 1984년도 하계학술회의논문집
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• pp.234-236
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• 1984

• 한국진공학회:학술대회논문집
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• 한국진공학회 1993년도 제5회 학술발표회 논문개요집
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• pp.47-48
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• 1993

• 한국진공학회:학술대회논문집
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• 한국진공학회 2003년도 제24회 학술발표회 초록집
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• pp.218-218
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• 2003