• Journal of Periodontal and Implant Science
• /
• v.42 no.3
• /
• pp.95-104
• /
• 2012

Purpose: The purpose of this study was to determine whether increasing the Ti6Al4V surface oxide negative charge through heat ($600^{\circ}C$) or radiofrequency plasma glow discharge (RFGD) pretreatment, with or without a subsequent coating with fibronectin, stimulated osteoblast gene marker expression in the MC3T3 osteoprogenitor cell line. Methods: Quantitative real-time polymerase chain reaction was used to measure changes over time in the mRNA levels for osteoblast gene markers, including alkaline phosphatase, bone sialoprotein, collagen type I (${\alpha}1$), osteocalcin, osteopontin and parathyroid hormone-related peptide (PTH-rP), and the osteoblast precursor genes Runx2 and osterix. Results: Osteoprogenitors began to differentiate earlier on disks that were pretreated with heat or RFGD. The pretreatments increased gene marker expression in the absence of a fibronectin coating. However, pretreatments increased osteoblast gene expression for fibronectin-coated disks more than uncoated disks, suggesting a surface oxide-mediated specific enhancement of fibronectin's bioactivity. Heat pretreatment had greater effects on the mRNA expression of genes for PTH-rP, alkaline phosphatase and osteocalcin while RFGD pretreatment had greater effects on osteopontin and bone sialoprotein gene expression. Conclusions: The results suggest that heat and RFGD pretreatments of the Ti6Al4V surface oxide stimulated osteoblast differentiation through an enhancement of (a) coated fibronectin's bioactivity and (b) the bioactivities of other serum or matrix proteins. The quantitative differences in the effects of the two pretreatments on osteoblast gene marker expression may have arisen from the unique physico-chemical characteristics of each resultant oxide surface. Therefore, engineering the Ti6Al4V surface oxide to become more negatively charged can be used to accelerate osteoblast differentiation through fibronectin-dependent and independent mechanisms.

• Plant Journal
• /
• v.16 no.3
• /
• pp.47-52
• /
• 2020

This study investigated the methodologies to enhance the corrosion resistance and the ways to measure for subsea equipment made of aluminum. The methodologies for the anticorrosion were cathodic protection, conversion coating, anodizing and organic coating. The simply analyzed ways to measure the corrosion resistance were Scanning Electron Microscope (SEM), Electrochemical Impedance Spectroscopy (EIS), Glow discharge optical emission spectrum spectroscopy (GD-OES), Fourier Transform Infrared Spectroscopy (FT-IR), Transmission Electron Microscopy (TEM), X-ray Photoelectron Spectroscopy (XPS), Scanning Vibrating Electrode Technique (SVET), contact angle and interfacial tension. The most widely used tools for increasing the corrosion resistance were the anodizing and the organic coating. Many ways were evenly used to measure corrosion. The methods more frequently utilized were SEM for the surface investigation and the contact angle to evaluate the corrosion resistance.

• Corrosion Science and Technology
• /
• v.12 no.1
• /
• pp.40-49
• /
• 2013

Effects of magnesium and pH on corrosion of aluminum galvanically coupled to iron have studied by using potentio- dynamic and static tests for polarization curves, Mott-Schottky test for analysis of semiconductor property, and GD-AES and XPS for film analysis. Pitting potential was sensitive to magnesium as an alloying element but not to pH, while passive current was sensitive to pH but not to magnesium. It was explained with, instead of point defect model (PDM), surface charge model describing that the ingression of chloride depends on the state of surface charge and passive film at film/solution interface is affected by pH. In addition, galvanic current of aluminum electrically coupled to iron was not affected by magnesium in pH 8.4, 0.2M citrate solution but was increased by magnesium at the solution of pH 9.1. The galvanic current at pH 9.1 increased with time at the initial stage and after the exposure of about 200 minute, decreased and stabilized. The behavior of the galvanic current was related with the concentration of magnesium at the surface. It agreed with the depletion of magnesium at the oxide surface by using glow discharge atomic emission spectroscopy (GD-AES). In addition, pitting potential of pure aluminum was reduced in neutral pH solution where chloride ion maybe are competitively adsorbed on pure aluminum. It was confirmed by the exponential decrease of pitting potential with log of [$Cl^-$] around 0.025 M of [$Cl^-$] and linear decrease of the pitting potential. From the above results, unlike magnesium, alloying elements with higher electron negativity, lowering isoelectric point (ISE), are recommended to be added to improve pitting corrosion resistance of aluminum and its alloys in neutral solutions as well as their galvanic corrosion resistance in weakly basic solutions.

• Journal of the Korean Chemical Society
• /
• v.43 no.2
• /
• pp.182-192
• /
• 1999

The new GD/ICP-AES quick change over system has been developed and characterized. Within less than 15 minutes, ICP-AES could be switched to GD-AES and vise a versa. As a result, both solid and liquid samples could be analyzed in a very short period of time by the ICP/GD-AES quick change over system developed in our laboratory. The influences of the experimental variables, such as flow rate of coolant gas, flow rate of auxiliary gas, flow rate of sample carrier gas, sampling depth, orifice size of sampling cone, and rf (radio frequency) power on emission intensity have been presented. The detection limits of Cd(I) 228.8 nm, Mn (II) 257.61 nm, and Fe(II) 259.95 nm were found to be 3.86, 1.49, and 5.79 ppb, respectively. And linealities of the calibration curves were measured to be unity.

• Textile Coloration and Finishing
• /
• v.1 no.1
• /
• pp.7-18
• /
• 1989

The distinguishing characteristic of the glow discharge is that chemical reaction induced by partially ionized gases are limited only to the substrate surface. Most studies have been done on the plasma etching and polymerization. The graft polymerization in vapour phase by cold plasma has been rarely investigated. In this study the system of tub3ar reaction chamber with capacitively coupled electrode of alternative current of 60 Hz was employed for the graft polymerization. The graft polymerization of Acylic Acid(AA) onto the poly (ethylene terephthalate) (PET) was carried out by treatment of PET film and fabric by cold plasma (glow discharge of argon gas), followed by the supply of AA vapour. The graft yield was about 1 wt%. The surface property was determined by contact angle, the surface tension was evaluated by zisman’s plot and equation of surface tension mesurement. The results were as follows: 1. In order to obtain lower contact angle, it was effective to avoid the vicinity of electrodes for a setting position of substrate. 2. Contact angle affected on the monomer pressure and its duration of exposure to the acid vapour. 3. Polymer radical formation was influenced by the changes of the value of current density and plasma treatment time. 4. Total surface tension of plasma grafted PET film increased. With an increase in the carboxylic acid content, the dispersion force decreased, while, the polar force and hydrogen bonding force increased. 5. The contact angle decreased from $75^\circ$ to around $30^\circ$ by plasma grafting. There was no ageing effect on the contact angle after 4 months.

• Journal of the Korean Society for Heat Treatment
• /
• v.23 no.1
• /
• pp.23-28
• /
• 2010

The cylindrical magnetron sputtering has not been widely used, although this system is useful for only certain types of applications such as fiber coatings. This paper presents electrode configurations which improved the complicacy of the target assembly by using the positive voltage power supply. It is a modified type which has a target constructed with a large cylindrical part, a conical part and a small cylindrical part. When positive voltage was applied to an anode, a stable glow discharge was established and a high deposition rate was obtained. The substrate bias current was monitored to estimate the effect of ion bombardment. As a result, it was found that the substrate current was large. With cylindrical and conical cathode magnetron sputter deposition on the surface of the substrate to prevent re-sputtering, ion impact because it can increase the effectiveness with excellent ductility and adhesion of Ti film deposition can be obtained. We board at the front end of the ground resistance of $5\;k{\Omega}$ attached to the substrate potential can be controlled easily, and Ti film deposition with excellent adhesion can be obtained. Microstructure and morphology of Ti films deposited on pure Cu wires were investigated by scanning electron microscopy in relation to preparation conditions. High level ion bombardment was found to be effective in obtaining a good adhesion for Cu wire coatings.

• Journal of the Korean Society for Heat Treatment
• /
• v.23 no.3
• /
• pp.150-155
• /
• 2010

Generally, plasma nitriding process has composed with a nitriding layer within glow discharge region occurred by energy exchange. The dissociations of nitrogen molecules are very difficult to make neutral atoms or ionic nitrogen species via glow discharge area. However, the captured electrons in which a double-folded screen with same potential cathode can stimulate and come out some single atoms or activated ionic species. It was showed an important thing that is called "hat is a dominant component in this nitriding process?" in plasma nitriding process and it can take an effective species for without compound layer. During a plasma nitriding process, it was able to estimate with analyzing and identification by optical emission spectroscopy (OES) study. And then we can make comparative studies on the nitrogen transfer with plasma nitriding and ATONA process using plasma diagnosis and metallurgical observation. From these observations, we can understand role of active species of nitrogen, like N, $N^+$, ${N_2}^+$, ${N_2}^*$ and $NH_x$-radical, in bulk plasma of each process. And the same time, during DC plasma nitriding and other processes, the species of FeN atom or any ionic nitride species were not detected by OES analyzing.

• Resources Recycling
• /
• v.21 no.2
• /
• pp.59-65
• /
• 2012

The refining effect of tantalum by electron beam melting(EBM) process for recycling tantalum scraps was investigated in the study. The purity of the tantalum metals refined by EBM was evaluated using glow discharge mass spectrometry (GDMS). From the result of GDMS, most impurities in the tantalum metals were removed by EBM down to a few mass ppm levels. The purity of the refined tantalum scraps was improved up to 5N (99.9991%) from 4 N (99.996%) of the initial tantalum scraps. The amount of metallic impurities in the tantalum was decreased from 30 ppm to 8 ppm. In addition, the gaseous impurities in the tantalum were decreased from 470 ppm to 50 ppm. Therefore a possibility of refining method for recycling tantalum scraps by EBM process was confirmed in this study.

• Journal of IKEEE
• /
• v.23 no.3
• /
• pp.865-872
• /
• 2019

We developed a one-dimensional Ar fluid model running in DC-type applied voltage with a sine and a pulse waveform at the atmosphere pressure. We investigated the light emissions and efficiencies of ${\lambda}_{128nm}$, ${\lambda}_{727nm}$, ${\lambda}_{912nm}$ and ${\lambda}_{966nm}$ from the Ar excited particles. From the results, the light emission of ${\lambda}_{128nm}$ and ${\lambda}_{727nm}$ in the applied voltage with a sine waveform were almost two times as in DC voltage type. The shorter the switching time of applied voltage was, the more the light emissions of ${\lambda}_{128nm}$ and ${\lambda}_{727nm}$ were. We discussed the power consumption and Joule heating by charged particles.

• Proceedings of the KIEE Conference
• /
• 2009.07a
• /
• pp.1533_1534
• /
• 2009

This paper presents an atmospheric micro glow plasma-jet device. The device consists of four components; a thin Ni anode, a porous alumina insulater, a stainless steel cathode and an aluminum case. The Ni anode is fabricated using micromachining technology. The anode has 10 holes, of which the hole diameter and the depth are $250{\mu}m$ and $60{\mu}m$, respectively. The discharge test is performed in nitrogen gas at atmospheric pressure for 20 kHz AC bias. The breakdown voltage is 3.5 kV at gas flow rate of 4 L/min and the the plasma-jet is blown out to ambient at 5.5 kV. In order to verify the characteristics of plasma, the current and the voltage of device are measured. The maximum temperature of plasma is $37^{\circ}C$. The plasma is well generated and stable at high voltage.