• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2010.06a
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• pp.123-123
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• 2010

The hydrophobic coating for multi-walled nanotubes was treated with toluene and trimethylchlorosilane glow discharge plasma under low pressure, and the hydrophobic surface of the treated MWCNT was investigates. In order to investigate the effects of -CH components from the toluene and TMCS glow plasma, we conducted on the total surface free energies of the MWCNT powder, which was calculated by measuring the contact angle between the cushion of MWCNT powder and the probe liquids. The total surface free energies were determined by Owens-Wendt equation and drastically decreased.

• Textile Coloration and Finishing
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• v.5 no.4
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• pp.29-41
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• 1993

In order to surface Hydrophobilization of Poly(ethylene terephthalate) (PET) fiber samples were treated in the atmosphere of CF$_{4}$ or $C_{2}$F$_{6}$glow discharge. The sample used in this study was PET film which is 75$\mu$m thick made by Teijin, O-Type(Japan). The cleaned samples were placed in plasma reactor made of pyrex glass cylinder, and plasma processing was carried out by glow discharge of CF$_{4}$ or $C_{2}$F$_{6}$ gas, being continuously fed by gas flow and continuously pumped out by a vacuum system. Electric power source for generate plasma state was sustained alternating current(60Hz) and voltage was sustained 600 volt. The duration of plasma treatment varied from 15 to 120 seconds except special case, the monomer gase pressure varied from 0.02 to 0.3 Torr and power range was 10 to 90 watts. The hydrophobic features of changed PET surface were evaluated by contact angle measurement and surface chemical characteristics were analyzed by ESCA. Results can be summerized as follows. 1. The most favorable setting position of substrate was the center area between the two electrodes. 2. $C_{2}$F$_{6}$ discharge current was lower than that of CF$_{4}$ when same voltage was sustained. Treated efficiency between CF$_{4}$ and $C_{2}$F$_{6}$ did not revealed significant differences under same electric power(wattage). 3. When monomer pressure is very low below 0.02 torr, as though substrate is exposed to CF$_{4}$ or $C_{2}$F$_{6}$ plasma, it tend to be hydrophilic through a little of fluorine bond and a great deal of oxidizing reaction. 4. There brought good hydrophobilization when monomer pressure was more 0.1 torr and duration of glow discharge treatment was over 45 seconds. When monomer pressure was too high, discharge current became low. Although prolong the duration, there was no more high hydrophobilization. 5. According to ESCA analysis, there were a little CF bond and a prevailing CF$_{2}$ bond in CF$_{4}$-treated substrate. There were CF$_{3}$, a little CF and a prevailing CF$_{2}$ bond in $C_{2}$F$_{6}$-treated substrate.d substrate.

• Analytical Science and Technology
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• v.15 no.6
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• pp.514-520
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• 2002

The electrothermal vaporization (ETV) hollow cathode glow discharge atomic emission spectrometer for analysis of liquid sample has been developed and characterized. This system has improved the sample introduction method of electrothermal vaporization and the hollow cathode glow discharge. The sample introduction method was possible to provide high analyte transport efficiency to the plasma by helix coil made of tungsten material. In addition, small volume samples (<$30{\mu}{\ell}$) could be used. The system has glow discharge cell with special design for improvement of precision. The effect of discharge parameters such as discharge power, gas flow rate has been studied to find optimum condition. The emitted light was effectively carried into detector by fiber optic cable in UV region. The calibration curve of Pb, Cd were obtained with 3 samples.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.07b
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• pp.874-877
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• 2002

The optogalvanic signals were measured using hollow cathode discharge tube with argon as buffer gas at change of discharge currents. A change of ionization rate due to electron collision causes an increase or decrease of the electric conductivity. This change in electric conductivity generates the optogalvanic signal. We conclude that optogalvanic signal has close relation with the lowest metastable atoms density at low current.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.05b
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• pp.142-145
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• 2000

The performance of ac plasma display panels (PDP) is influenced strongly by the surface glow discharge characteristics on the MgO thin films. This paper deals with the surface glow discharge characteristics and some physical properties of MgO thin films prepared by reactive RF planar unbalanced magnetron sputtering in connection with ac PDP. The samples prepared with the dc bias voltage of -10V showed lower discharge voltage and lower erosion rate by ion bombardment than those samples prepared by conventional magnetron sputtering or E-beam evaporation. The main factor that improves the discharge characteristics by bias voltage is considered to be due to the morphology changes or crystal structure of the MgO thin film by ion bombardment during deposition process.

• Journal of the Korean Vacuum Society
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• v.4 no.S2
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• pp.49-57
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• 1995

At present the processes of boronizing have been mostly studied in a plasma from gaseous compounds containing the impregnating element and are in an industrial use. These have been investigated by a variety of works in a glow discharge with different mixture ratios of $B_2H_6$ and $H_2$ as well as $BCl_3$ and $H_2$. The active atomosphere has been diluted by Ar or some other inert gas in order to enhance control of boron potential and to reduce the ignition voltage of the glow discharge. The Control of gaseous atomosphere is essential to a boride layer in plamsa boronizing treatment. The boride formation is required to make the workpiece surface saturated with boron content. The present study considers the efficiency of plasma boronizing reactions and the morphology of boride layer under various plasma conditions

• Analytical Science and Technology
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• v.12 no.1
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• pp.1001-1010
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• 1999

• Proceedings of the KIEE Conference
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• 1984.07a
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• pp.234-236
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• 1984

• Proceedings of the Korean Vacuum Society Conference
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• 1993.07a
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• pp.47-48
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• 1993

• Proceedings of the Korean Vacuum Society Conference
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• 2003.02a
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• pp.218-218
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• 2003