Journal of the Korea Academia-Industrial cooperation Society
/
v.15
no.12
/
pp.7443-7450
/
2014
To resolve shortcomings of high-rate anaerobic processes, such as high upward flow velocity, this study sought to improve the structure of the high-rate anaerobic reactor and evaluate its performance. The improved reactor was manufactured by adjusting the diameter and dividing the reactor into three parts. The evaluation of the structurally improved reactor revealed that the reactor could stabilize a single circuit, and prevent the accumulation of solid matter and leakage of microbes, thereby stabilize the microbes. In the process of anaerobic digestion, an increase in pH and alkalinity within the reactor was presumably attributed to bicarbonate created in the process of organic matter decomposition and due to the re-dissolution of some biogas. To maintain a high rate of organic matter removal, the reactor should be operated with more than 9 hrs of HRT and an organic matter load of under $10.kgTCODcr/m^3{\cdot}d$. The methane gas generated in the anaerobic digestion process showed a high content of 65~83 % at the organic matter load of over $7.7kgTCODcr/m^3{\cdot}d$. per removal of CODcr. The methane quantity was generated at $0.10{\sim}0.23m^3CH_4/kgCOD_{rem}$, showing that it was smaller than the theoretical methane generation amount (0.35) in the STP state. In the latter part of high-rate anaerobic process, an advanced treatment process was required to remove nitrogen.
Journal of the Korean Institute of Telematics and Electronics D
/
v.36D
no.4
/
pp.63-69
/
1999
The electrical properties of rf-magnetron sputtered $Ba_{0.5}Sr_{0.3}TiO_3$ (BST) capacitors were investigated by varying annealing temperature and atmosphere of the rapid thermal annealing (RTA). The electrical properties of Pt/BST/Pt capacitors were found to strongly depend on the RTA condition. It seems that the dependence of the electrical properties of the Pt/BST/Pt capacitors on the RTA condition is related to the oxygen vacancies in BST thin films. In order to clarify the relation between the oxygen vacancies and the electrical properties of Pt/BST/Pt capacitors, we have examined the two different annealing methods. One annealing method was performed in $O_2$ gas and the other was done in $O_2$-plasma at the same condition of 450$^{\circ}C$, 20 mtorr. It was found that the leakage current densities of $O_2$-plasma annealed capacitor were much lower than those of $O_2$ annealed capacitor. The dielectric constants of $O_2$ annealed capacitor decreased about 14% comparing with those of as-deposited. In contrast, there was no decrease in the dielectric constant of $O_2$-plasma annealed. These results indicate that $O_2$-plasma annealing is very effective in compensation the oxygen vacancies in BST thin films. It can be also concluded that the oxygen vacancies greatly affect the electrical properties of Pt/BST/Pt capacitors.
Journal of Advanced Marine Engineering and Technology
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v.36
no.4
/
pp.459-466
/
2012
The accurate engine output is basically one of important factors for the analysis of engine performance. Nowadays in-cylinder pressure analysis in internal combustion engine is also an indispensable tool for engine research and development, environment regulation and maintenance of engine. Here, it is essential more than anything else to find the correct TDC(Top Dead Center) position for the accuracy of engine output for diesel engine. Therefore this study is to analyze affecting factors to TDC position in 2-stroke large low speed engine and to suggest new method for determining correct TDC position. In the previous paper, it was mentioned that the accuracy of engine output is influenced by the determination of exact TDC position, and that 'Angle based sampling' method is better than 'Time based sampling' method in terms of precision. It was confirmed that there is 'Loss of angle', which is a difference between compression pressure peak and real TDC caused by heat loss and blow by of gas leakage. Consequently we invented new method, called "An improved method of time based sampling", which can obtain the correct engine output. The results by this method with compensating loss of angle was shown the same result by the 'Angle based sampling' method in encoder setting cylinder. This study is to suggest the new measuring method of exact engine output, and to examnine the reliance on the outcome.
Proceedings of the Korean Society of Medical Physics Conference
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2002.09a
/
pp.161-163
/
2002
The BNCT(Boron Neutron Capture Therapy) facility has been developed in Hanaro(High-flux Advanced Neutron Application Reactor), a research reactor of Korea Atomic Energy Research Institute. A typical tangenial beam port is utilized with this BNCT facility. Thermal neutrons can be penetrated within the limits of the possible maximum instead of being filtered fast neutrons and gamma rays as much as possible using the silicon and bismuth single crystals. In addition to, the liquid nitrogen (LN$_2$) is used to cool down the silicon and bismuth single crystals for the increase of the penetrated thermal neutron flux. Neutron beams for BNCT are shielded using the water shutter. The water shutter was designed and manufactured not to interfere with any other subsystem of Hanaro when the BNCT facility is operated. Also, it is replaced with conventional beam port plug in order to cut off helium gas leakage in the beam port. A circular collimator, composed of $\^$6/Li$_2$CO$_3$ and polyethylene compounds, is installed at the irradiation position. The measured neutron flux with 24 MW reactor power using the Au-198 activation analysis method is 8.3${\times}$10$\^$8/ n/cm$^2$ s at the collimator, exit point of neutron beams. Flatness of neutron beams is proven to ${\pm}$ 6.8% at 97 mm collimator. According to the result of acceptance tests of the water shutter, the filling time of water is about 190 seconds and drainage time of it is about 270 seconds. The radiation leakages in the irradiation room are analyzed to near the background level for neutron and 12 mSv/hr in the maximum for gamma by using BF$_3$ proportional counter and GM counter respectively. Therefore, it is verified that the neutron beams from BNCT facility in Hanaro will be enough to utilize for the purpose of clinical and pre-clinical experiment.
Proceedings of the Korean Vacuum Society Conference
/
1999.07a
/
pp.58-58
/
1999
The diamond films which can be applied to SOD (silicon-on-diamond) structure were deposited on Si(100) substrate using CO/H2 CH4/H2 source gases by microwave plasma chemical vapor deposition(MPCVD), and SOD structure have been fabricated by poly-silicon film deposited on the diamond/Si(100) structure y low pressure chemical vapor deposition(LPCVD). The phase of the diamond film, surface morpholog, and diamond/Si(100) interface were confirmed by X-ray diffraction(XRD), scanning electron microscopy(SEM), atomic force microscopy(AFM), and Raman spectroscopy. The dielectric constant, leakage current and resistivity as a function of temperature in films are investigated by C-V and I-V characteristics and four-point probe method. The high quality diamond films without amorphous carbon and non-diamond elements were formed on a Si(100), which could be obtained by CO/H2 and CH4/H2 concentration ratio of 15.3% and 1.5%, respectively. The (111) plane of diamond films was preferentially grown on the Si(100) substrate. The grain size of the films deposited by CO/H2 are gradually increased from 26nm to 36 nm as deposition times increased. The well developed cubo-octahedron 100 structure nd triangle shape 111 are mixed together and make smooth and even film surface. The surface roughness of the diamond films deposited by under the condition of CO/H2 and CH4/H2 concentration ratio of 15.3% and 1.5% were 1.86nm and 3.7 nm, respectively, and the diamond/Si(100) interface was uniform resistivity of the films deposited by CO/H2 concentration ratio of 15.3% are obtained 5.3, 1$\times$10-9 A/cm, 1 MV/cm2, and 7.2$\times$106 $\Omega$cm, respectively. In the case of the films deposited by CH4/H2 resistivity are 5.8, 1$\times$10-9 A/cm, 1 MV/cm, and 8.5$\times$106 $\Omega$cm, respectively. In this study, it is known that the diamond films deposited by using CO/H2 gas mixture as a carbon source are better thane these of CH4/H2 one.
This study is intended to provide legislative direction for fire products life expectancy. Domestic and international laws relating to fire products life expectancy have been reviewed, and the results of a Fire Safety Manager Consciousness (FSMC) survey were analyzed. The FSMC survey has been designed in order to assist with the establishment of appropriate fire safety policy. A questionnaire survey was conducted with 660 fire safety administrators from 17 municipal and provincial districts, with the intention of gaining expertise on the extension of life-span for 32 fire products. The survey also asked for candidates opinions on future policy direction. Based on the survey results and the review of policies within other nations, we have devised a set of policy issues with the intention of extending the life-span of fire-safety items. The survey result revealed that 79.3% of Fire Safety Managers (FSMs) concurred with the establishment of legislation regarding the maintenance and correct care of fire-safety products. Overall, over 30% of FSMs were in favor of regulations regarding Ddry chemical fire extinguishers (77.3%), fire detectors (44.6%), fire hoses (44.4%), gaseous agent fire extinguisher (40.6%), automatic descending life lines (36.2%), exit lights (35.9%), air respirators (35.9%), extinguishing systems for residential cooking facilities (33.9%), automatic spray-type extinguishing units (33.9%), emergency lights (31.2%), and gas leakage detectors (30.7%). Especially, among these, dry chemical fire extinguishers (60.0%), detectors (20.0%), and fire hose (18.8%) were identified as the fire products primarily in need of maintenance legislation. The general consensus is that fire products older than 10 years need to be replaced. Based on the survey results, there was general agreement that fire product life expectancy is in need of legislation. This study recommends the introduction of fire product life expectancy legislation in phases.
Kim, Man-Goo;Jung, Young-Rim;Seo, Young-Min;Nam, Sung-Hyun;Kwon, Young-Jin
Analytical Science and Technology
/
v.14
no.3
/
pp.274-285
/
2001
In this study, the thermal desorption-cryofocusing-gas chromatographic(TD-C-GC) method was developed for determination of volatile organic compounds(VOCs) in ambient air and was applied at the municipal solid waste landfill sites. On-column cryofocusing was possible only with a 100 ml dewars bottle in TD-C-GC method with a stainless steel column. However, high operating pressure was needed for purging VOCs from the absorbent trap, which was able to solve by pressure programming with a electric pressure controller. By using both pressure and temperature programming brought increasing of resolution power in on-column cryofocusing method, but the high pressure caused a leakage of sample tube with repeated use. A loop cryofocusing devise was also developed and compared with the direct on-column method. In loop cryofocusing method, VOCs were concentrated on a 0.8mm i.d. loop which is located between the injector and separation column by using liquid nitrogen. In order to purge VOCs from the absorbent trap, only 0.4 psi of pressure was need in the loop cryofocusing method. Dual detection system was applied for the analysis of VOCs; a FID was used for hydrocarbons and a FPD was used for sulfur-containing compounds. Qualitative analysis was done by on-column cryofocusing GC-MS system. Among the large number of VOCs, toluene was the most abundant. Hydrogen sulfide, dimethyl sulfide, carbon disulfide, dimethyl disulfide and methyl propyl disulfide were detected at landfill site by FPD.
Journal of the Korean Society for Marine Environment & Energy
/
v.14
no.1
/
pp.51-64
/
2011
Carbon dioxide Capture and Storage (CCS) is one of the key players in greenhouse gas (GHG) reduction portfolio for mitigating climate change. CCS makes simultaneously it possible not only to reduce a huge amount of carbon dioxide directly from the emission sources (e.g., coal power plant) but also to maintain the carbon concentrated-energy and/or industry infrastructure. Internationally, the United Nations Framework Convention on Climate Change (UNFCCC) is dealing the agenda for considering the possibility of including CCS project as one of Clean Development Mechanism (CDM) projects. Despite its usefulness, however, there are the controversies in including CCS as the CDM project, whose issues include i) non-permanence, including long-term permanence, ii) measuring, reporting and verification (MRV), iii) environmental impacts, iv) project activity boundaries, v) international law, vi) liability, vii) the potential for perverse outcomes, viii) safety, and ix) insurance coverage and compensation for damages caused due to seepage or leakage. In this paper, those issues in considering CCS as CDM are summarized and analyzed in order to suggest some considerations to policy makers in realizing the CCS project in Korea in the future.
Two field cooling tests were conducted to evaluate the cooling characteristic of paddy with a prototype grain cooler. The first test was carried out during summer season in a steel bin with 180.3ton of paddy at Sunchon. And the second test was carried out during harvesting season in a steel bin with 272.2ton of paddy at Ulsan. At the first test, initial paddy temperature of 23.6$^{\circ}C$ was dropped to 14$^{\circ}C$, and initial moisture content of 19.9% was dropped to 19.3% after 52.5 hours of cooling. At the second test, initial paddy temperature of 16.1$^{\circ}C$ dropped to 5.5$^{\circ}C$ after 78.0 hours of cooling. And, at the first test, the average air flow rates of chilled air leaving the grain cooler and penetrating the grain layer were 77.5 ㎥/min and 42.5 ㎥/min, respectively. To prevent leakage of chilled air from plenum chamber of steel bin, which was about 45% of the average air flow rates of chilled air leaving the grain cooler, a proper method was required. The average total power consumption at the first test during summer was 22.1 ㎾ with control of fan damper. At the second test, it was 17.4 ㎾ due to controlling the capacity of compressor with unloading solenoid valve and changing the flow rates of hot refrigerant gas flowing into evaporator and reheater from compressor, resulting in 27% reduction of energy consumption.
Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
/
2008.06a
/
pp.477-477
/
2008
For more than three decades, the gate dielectrics in CMOS devices are $SiO_2$ because of its blocking properties of current in insulated gate FET channels. As the dimensions of feature size have been scaled down (width and the thickness is reduced down to 50 urn and 2 urn or less), gate leakage current is increased and reliability of $SiO_2$ is reduced. Many metal oxides such as $TiO_2$, $Ta_2O_4$, $SrTiO_3$, $Al_2O_3$, $HfO_2$ and $ZrO_2$ have been challenged for memory devices. These materials posses relatively high dielectric constant, but $HfO_2$ and $Al_2O_3$ did not provide sufficient advantages over $SiO_2$ or $Si_3N_4$ because of reaction with Si substrate. Recently, $HfO_2$ have been attracted attention because Hf forms the most stable oxide with the highest heat of formation. In addition, Hf can reduce the native oxide layer by creating $HfO_2$. However, new gate oxide candidates must satisfy a standard CMOS process. In order to fabricate high density memories with small feature size, the plasma etch process should be developed by well understanding and optimizing plasma behaviors. Therefore, it is necessary that the etch behavior of $HfO_2$ and plasma parameters are systematically investigated as functions of process parameters including gas mixing ratio, rf power, pressure and temperature to determine the mechanism of plasma induced damage. However, there is few studies on the the etch mechanism and the surface reactions in $BCl_3$ based plasma to etch $HfO_2$ thin films. In this work, the samples of $HfO_2$ were prepared on Si wafer with using atomic layer deposition. In our previous work, the maximum etch rate of $BCl_3$/Ar were obtained 20% $BCl_3$/ 80% Ar. Over 20% $BCl_3$ addition, the etch rate of $HfO_2$ decreased. The etching rate of $HfO_2$ and selectivity of $HfO_2$ to Si were investigated with using in inductively coupled plasma etching system (ICP) and $BCl_3/Cl_2$/Ar plasma. The change of volume densities of radical and atoms were monitored with using optical emission spectroscopy analysis (OES). The variations of components of etched surfaces for $HfO_2$ was investigated with using x-ray photo electron spectroscopy (XPS). In order to investigate the accumulation of etch by products during etch process, the exposed surface of $HfO_2$ in $BCl_3/Cl_2$/Ar plasma was compared with surface of as-doped $HfO_2$ and all the surfaces of samples were examined with field emission scanning electron microscopy and atomic force microscope (AFM).
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