• Title/Summary/Keyword: Gas Ion Source

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Isolation of a Pseudomonas sp. Capable of Utilizing 4-Nonylphenol in the Presence of Phenol

  • Chakraborty Joydeep;Dutta Tapan K.
    • Journal of Microbiology and Biotechnology
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    • v.16 no.11
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    • pp.1740-1746
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    • 2006
  • Enrichment techniques led to the isolation of a Pseudomonas sp. strain P2 from municipal waste-contaminated soil sample, which could utilize different isomers of a commercial mixture of 4-nonylphenol when grown in the presence of phenol. The isolate was identified as Pseudomonas sp., based on the morphological, nutritional, and biochemical characteristics and 16S rDNA sequence analysis. The ${\beta}$-ketoadipate pathway was found to be involved in the degradation of phenol by Pseudomonas sp. strain P2. Gas chromatography-mass spectrometric analysis of the culture media indicated degradation of various major isomers of 4-nonylphenol in the range of 29-50%. However, the selected ion monitoring mode of analysis of biodegraded products of 4-nonylphenol indicated the absence of any aromatic compounds other than those of the isomers of 4-nonylphenol. Moreover, Pseudomonas sp. strain P2 was incapable of utilizing various alkanes individually as sole carbon source, whereas the degradation of 4-nonylphenol was observed only when the test organism was induced with phenol, suggesting that the degradation of 4-nonylphenol was possibly initiated from the phenolic moiety of the molecule, but not from the alkyl side-chain.

A Study on the Low-energy Large-aperture Electron Beam Generator (저에너지 대면적 전자빔 발생장치 개발에 관한 연구)

  • Jo, Ju-Hyeon;Choe, Yeong-Uk;Lee, Hong-Sik;Im, Geun-Hui;U, Seong-Hun;Lee, Gwang-Sik
    • The Transactions of the Korean Institute of Electrical Engineers C
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    • v.48 no.12
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    • pp.785-790
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    • 1999
  • This research has been carried out to develop a low-energy large-aperture pulsed electron beam generator (LELA), 200keV 1A, for industrial applications. One of the most important feature of this electron beam generator is large electron beam cross section of $190cm^2$. Low energy electron beam generators have been used for water cleaning, flue gas cleaning, and pasteurization, etc. In these applications the cross sectionof the e-beam is related to reaction efficiency. Another important feature of this LELA EB generator is easy maintenance because of its simple structure and relatively low vacuum operation compared to the conventional EB generators. The conventional EB generators need to be scanned because the small cross section thermal electron emitters are used in the conventional EB generators which have small EB cross section. In this research, we use the secondary electrons generated by ion bombardment on the HV cathode surface as a electron source. Therefore we can make any shape of EB cross section without scanning.

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Ni Coating Characteristics of High K Capacitor Ceramic Powders

  • Park, Jung-Min;Lee, Hee-Young;Kim, Jeong-Joo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.339-339
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    • 2007
  • Metal coating on ceramic powder has long been attracting interest for various applications such as superconductor where the brittle nature of high temperature ceramic superconductor was complemented by silver coating and metalloceramics where mechanical property improvement was achieved via electroless plating. More recently it has become of great interest in embedded passive device applications since metal coating on ceramic particles may result in the enhancement of the dielectric properties of ceramic-polymer composite capacitors. In our study, nickel ion-containing solution was used for coating commercial capacitor-grade $BaTiO_3$ powder. After filtering process, the powder was dried and heat-treated in 5% forming gas at $900^{\circ}C$. XRD and TEM were utilized for the observation of crystallization behavior and morphology of the particles. It was found that the nickel coating characteristics were strongly dependent on the several parameters and processing variables, such as starting $BaTiO_3$ particle size, nickel source, solution chemistry, coating temperature and time. In this paper, the effects of these variables on the coating characteristics will be presented in some detail.

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Etch Characteristics of $SiO_2$ by using Pulse-Time Modulation in the Dual-Frequency Capacitive Coupled Plasma

  • Jeon, Min-Hwan;Gang, Se-Gu;Park, Jong-Yun;Yeom, Geun-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.472-472
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    • 2011
  • The capacitive coupled plasma (CCP) has been extensively used in the semiconductor industry because it has not only good uniformity, but also low electron temperature. But CCP source has some problems, such as difficulty in varying the ion bombardment energy separately, low plasma density, and high processing pressure, etc. In this reason, dual frequency CCP has been investigated with a separate substrate biasing to control the plasma parameters and to obtain high etch rate with high etch selectivity. Especially, in this study, we studied on the etching of $SiO_2$ by using the pulse-time modulation in the dual-frequency CCP source composed of 60 MHz/ 2 MHz rf power. By using the combination of high /low rf powers, the differences in the gas dissociation, plasma density, and etch characteristics were investigated. Also, as the size of the semiconductor device is decreased to nano-scale, the etching of contact hole which has nano-scale higher aspect ratio is required. For the nano-scale contact hole etching by using continuous plasma, several etch problems such as bowing, sidewall taper, twist, mask faceting, erosion, distortions etc. occurs. To resolve these problems, etching in low process pressure, more sidewall passivation by using fluorocarbon-based plasma with high carbon ratio, low temperature processing, charge effect breaking, power modulation are needed. Therefore, in this study, to resolve these problems, we used the pulse-time modulated dual-frequency CCP system. Pulse plasma is generated by periodical turning the RF power On and Off state. We measured the etch rate, etch selectivity and etch profile by using a step profilometer and SEM. Also the X-ray photoelectron spectroscopic analysis on the surfaces etched by different duty ratio conditions correlate with the results above.

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Measurement of the Radiolysis Gases Generated in Several Waste Forms by External Irradiation (${\gamma}$-조사에 의한 방사성폐기물의 방사분해가스 발생량 평가)

  • Kwak, Kyung-Kil;Ryue, Young-Gerl;Kim, Ki-Hong;Je, Whan-Gyeong;Kim, Dong-Ho
    • Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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    • v.4 no.4
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    • pp.345-352
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    • 2006
  • The cemented and paraffin wastes form which are incorporated the concentrated wastes, the cemented waste form which is incorporated the spent ion-exchange resins, and the miscellaneous waste(decontamination paper) were irradiated up to $10^{+8}$ rads at $5.43{\times}10^{+5}$ rads/hr with Co-60(72,023.9 Ci) as an external irradiation source. As a result, the radiolysis gases such as $H_2,\;CH_4,\;N_2,\;C_2H_6,\;O_2,\;CO\;and\;CO_2$, were measured in all the wastes. The major gas which was generated in all the wastes was hydrogen($H_2$). The volume of the generated gases showed a difference from $0.029{\sim}0.788\;cm^3.atm/1.1g$ according to the type of wastes, and more was generated in the cemented waste form incorporated a spent ion-exchange resin than in the other wastes. More hydrogen($H_2$) gas was generated in the decontamination paper waste than in the other wastes, and the G($H_2$) value was 0.12.

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Luminescence properties of a new $Tb^{3+}$ ion activated long persistent phosphor (새로운 $Tb^{3+}$ 이온 활성 축광성 형광체의 발광 특성)

  • Park, Byeong-Seok;Choi, Jong-Geon
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.19 no.3
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    • pp.130-134
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    • 2009
  • A new long persistent phosphors of $CaZrO_3$ was synthesized at high temperature with weak reduction atmosphere by a traditional solid state reaction method. Photoluminescence spectra analysis showed that the $CaZrO_3$ doped with $Tb^{3+}$ emitted green-yellow emission caused by the energy level transition from the $^5D_3$ and $^5D_4$ to $^7F_1{\sim}^7F_6$. The main emission spectra of 542 nm peak by the $^5D_4{\rightarrow}^7F_5$ transition was revealed through synthesizing at high temperature in $N_2$ gas atmosphere. The afterglow emission spectra of $CaZrO_3:Tb^{3+}$ long persistent phosphores arise at 546 nm peak of narrow range. After the 254 nm ultraviolet light excitation source was switched off, the green-yellow long persistent phosphor can be observed which could last for 8 h in the limit of light perception of dark-adapted human eyes ($0.32\;mcd/m^2$).

Measurement of hydrogen content in a-C:H films prepared by ECR-PECVD (ECR-PECVD 방법으로 증착된 a-C:H 박막의 수소함량 측정)

  • 손영호;정우철;정재인;김인수;배인호
    • Journal of the Korean Vacuum Society
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    • v.10 no.1
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    • pp.119-126
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    • 2001
  • Hydrogenated amorphous carbon (a-C:H) films were deposited by ECR-PECVD (electron cyclotron resonance-plasma enhanced chemical vapor deposition) method with deposition conditions such as ECR plasma source power, gas composition of methane and hydrogen, deposition time and substrate bias voltage. The hydrogen content in the films has been measured by ERDA (elastic recoil detection analysis) using 2.5 MeV $He^{++}$ ion beam. From the results of AES (Auger electron spectroscopy), RBS (Rutherford backscattering spectrometry) and ERDA, the composition elements of deposited film were confirmed the carbon atom and the hydrogen atom. It was observed by FTIR (Fourier transform infrared) that the hydrogen contents in the film varied according to the deposition conditions. In deposition condition of substrate bias voltage, the hydrogen contents were decreased remarkably because the amount of dehydrogenation in films was increased as the substrate bias voltage increased. In the rest deposition conditions, the hydrogen contents in the film were measured in the range 45~55%.

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GC-MS Analysis of Organophosphorus Pesticide Residue in Seawater From the Kwangyang Bay, Korea (광양만 해수 중 유기인 잔류 농약성분의 GC-MS 분석)

  • Park, Mi-Ok;Park, Jeom-Sook
    • Journal of Environmental Science International
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    • v.15 no.4
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    • pp.293-304
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    • 2006
  • Sea water samples collected in August, 1994 from 20 stations in the Kwangyang Bay were analyzed by gas chromatography/mass spectrometry-selected ion monitoring (GC/MS-SIM) to investigate persistence and distribution pattern of four organophosphorus pesticides (DDVP, Diazinon, IBP, EDDP). Except for IBP, the contamination by DDVP, Diazinon, and EDDP in marine aquatic environment in Korea has not been reported previously. In this study, however, all these four pesticides were detected in all stations (except DDVP) and their concentrations were in ng/L level. The concentrations ranged from detection limit to 15.3ng/L for DDVP, 1.8-27.7ng/L for Diazinon, 7.3-63.5ng/L for IBP, and 22.2-1100.1ng/L for EDDP. It is noteworthy that the measured concentrations of IBP and EDDP in this study would be much lower than usual, since the use of IBP and EDDP was less than 50% of average annual consumption due to unusually dry and hot weather condition in the summer of 1994. It was very surprising to find that the highest concentrations of organophosphorus pesticides were observed at stations near Daesa Streamlet instead of Seomjin River, which has more point source of the pesticides. This result suggests that the small river discharge during heavy ram period in summer can give harmful effect on marine biota (both wild and aqua-cultured) with its organophosphorus pesticide residue, despite of their short residence time in aquatic environment. In order to protect the marine life properly from acute toxicity of the organophosphorus pesticides, it needs to be emphasized that monitoring the level of agricultural pesticides in river run-off should be done during active consumption period rather at regular intervals.

Ultrahigh Vacuum Technologies Developed for a Large Aluminum Accelerator Vacuum System

  • Hsiung, G.Y.;Chang, C.C.;Yang, Y.C.;Chang, C.H.;Hsueh, H.P.;Hsu, S.N.;Chen, J.R.
    • Applied Science and Convergence Technology
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    • v.23 no.6
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    • pp.309-316
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    • 2014
  • A large particle accelerator requires an ultrahigh vacuum (UHV) system of average pressure under $1{\times}10^{-7}$ Pa for mitigating the impact of beam scattering from the residual gas molecules. The surface inside the beam ducts should be controlled with an extremely low thermal outgassing rate under $1{\times}10^{-9}Pa{\cdot}m^3/(s{\cdot}m^2)$ for the sake of the insufficient pumping speed. To fulfil the requirements, the aluminum alloys were adopted as the materials of the beam ducts for large accelerator that thanks to the good features of higher thermal conductivity, non-radioactivity, non-magnetism, precise machining capability, et al. To put the aluminum into the large accelerator vacuum systems, several key technologies have been developed will be introduced. The concepts contain the precise computer numerical control (CNC) machining process for the large aluminum ducts and parts in pure alcohol and in an oil-free environment, surface cleaning with ozonized water, stringent welding process control manually or automatically to form a large sector of aluminum ducts, ex-situ baking process to reach UHV and sealed for transportation and installation, UHV pumping with the sputtering ion pumps and the non-evaporable getters (NEG), et al. The developed UHV technologies have been applied to the 3 GeV Taiwan Photon Source (TPS) and revealed good results as the expectation. The problems of leakage encountered during the assembling were most associated with the vacuum baking which result in the consequent trouble shootings and more times of baking. Then the installation of the well-sealed UHV systems is recommended.

Wettability and Aging Effect of Polystyrene Film Treated by PSII according to the Molecular Weight (플라즈마 이온주입 방법으로 처리된 폴리스티렌의 분자량에 따른 표면 친수성 및 에이징 현상)

  • Kim, Youngsoo;Lim, Hyuneui;Han, Seunghee;Lee, Yeonhee;Kim, Youngsang
    • Analytical Science and Technology
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    • v.15 no.3
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    • pp.229-235
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    • 2002
  • Plasma source ion implantation (PSII) technique was utilized to improve the wettability of polystyrene surfaces. It is well known that treated surfaces undergo aging, leading to hydrophobic recovery with time. We investigated the aging effect of polystyrene thin film on the various molecular weights. Polystyrenes with several molecular weights ($M_w$ = 760, 2430, 31600, 115700, 280000, 903600) were treated in different experimental conditions including gas species and pulse energy, and their hydrophilicity was measured by contact angle goniometer. To study wettability decay as a function of the molecular weight, PSII-treated samples were aged at different temperatures. Hydrophobic recovery of high molecular weight polystyrene was much slower than that of low molecular weight, even at high temperatures. The methods used to characterize treated surfaces were water contact angle measurement, TOF-SIMS, XPS, SEM and AFM.