• 한국진공학회지
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• 제17권6호
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• pp.511-517
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• 2008

기체 방전의 수치적 시뮬레이션을 위하여 FE-FCT(Finite-Element Flux-Corrected Transport) 방법을 이용한 준 2차원 수치적 모델을 제시한다. 이 모델에서는 전자와 이온에 대한 1차원 연속방정식을 풀어 시 공간적으로 변하는 전하 분포를 계산하고, 공간 전하 분포에 의한 전기장의 변화는 2차원적 전하 분포를 고려하는 디스크 방법을 적용하여 푸아송(Poisson)방정식을 풀어 계산한다. 다양한 벤치마크 문제에 대해 계산한 결과는 이 모델의 정확성과 적용성을 잘 보여준다. 또 스트리머 방전에 대해 계산한 결과는 앞선 연구 결과와 잘 일치하는 것을 보여 준다.

• Journal of Information Display
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• 제3권2호
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• pp.13-18
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• 2002

Numerical simulation is one of the most useful tools to study gas discharge phenomena that occur in alternating current plasma display panel (AC-PDP) cell. Most PDP cell simulations have been performed for two-dimensional cell, is cross-section along the address electrode. We developed a three-dimensional PDP simulator and applied it to a T-shaped electrode cell in order to show the effects of sustain electrode shape that cannot be included in two-dimensional simulation. The dependence of power consumption on electrode shape and area in the simulation showed the same trend as experiment.

• 전기전자학회논문지
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• 제23권2호
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• pp.524-528
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• 2019

다양한 종류의 방전 셀이 존재하고 있지만, 공통적으로 모든 방전 셀은 보다 낮은 구동 전압에서 보다 높은 효율 특성을 가지는 것을 우선적인 목표로 한다. 이러한 특성 개선을 위해 방전셀 내부의 방전 경로를 길게 하거나 구동 가스의 성분을 변화시키는 연구가 많이 이루어진다. 본 논문에서는 2차원 유체 시뮬레이션을 이용하여 방전전극 사이의 간격에 따른 방전전압 (개시전압 및 유지전압) 및 휘도와 효율의 변화를 계산하였다. 또한, 다양한 하전입자와 여기입자 및 파장별 진공자외선의 변화를 살펴보고 휘도와 효율의 원인을 연구해 보았다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2011년도 제42회 하계학술대회
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• pp.1582-1583
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• 2011

Recently, it has been found that trifluoroiodomethane ( $CF_3I$) gas can replace $SF_6$ gas as a prospective substitute gas. For quantitative understanding of gas discharge phenomena, we should know electron collision cross sections and electron transport coefficients. Using electron collision cross sections of $CF_3I$ and Xe, we calculated elecron drift velocity, longitudinal coefficient, effective ionization coefficient in $CF_3I$-Xe mixtures using a two-term approximation of the Boltzmann equation. We also compared the electron transport coefficients in pure gas and those of 10%, 20%, 50%, and 70% $CF_3I$-Xe mixture gases. The present data may be showed appropriate ratios of $CF_3I$-Xe mixture gas for replacing the $SF_6$ gas.

• 전기학회논문지
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• 제56권7호
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• pp.1275-1281
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• 2007

The discharge phenomena in a flat fluorescent lamp for the backlight unit of liquid crystal displays are simulated by sung a two-dimensional fluid model. The numerical methods for the calculation of plasma dynamics and the radiation transport are introduced for the discharge simulation and for the transmission of the vacuum ultraviolet lights. The simulation results are presented to compare the luminance and the luminance efficacy with the variation of gas pressure, gas mixture ratio, driving voltage, and frequency.

• 대한전기학회논문지:전기물성ㆍ응용부문C
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• 제48권6호
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• pp.483-488
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• 1999

The optimal mixing condition of four components gas(Ne,Xe,He,Ar) in PDPs was caculated by a numerical simulation method. The dominated reactions in which $Xe^*(^3P_1)$ is produced and decays were investigated in three components gas (Ne,Xe,He) and our new components gas (Ne,Xe,He,Ar). A peak point of $Xe^*$ density appears in the range of 0.1% to 2% of Ar mixture ratio. The results of simulation show that the direct exitation of Xe by electrons has the greatest influence on the inceasing $Xe^*$ density in both gas mixtures.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 추계학술대회 논문집 학회본부 C
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• pp.565-567
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• 2000

In this paper, the discharge characteristics of AC PDP, one of the leading technologies currently under development for large-area flat displays, is computed by using Finite Element Method(FEM) combined with Flux-corrected Transport(FCT) algorithm. Up to now, many simulations of AC PDP have been mainly done by Finite Difference Method(FDM). But we simulated the AC PDP by using FEM-FCT method which discretizes the region of interest with unstructured grids. FEM-FCT method can reduce the computational cost because of refining locally where the physical quantities have steep gradients and is more efficient in solving discharge problems, such as a AC PDP. Results are presented in Ne-Xe(4%) gas mixture for a gas pressure of 400 Torr and as the discharge proceeds, the space and time variations of the electron and ion densities, potential and wall charges on the dielectric are described. Results from our simulation by FEM-FCT are similar to those from simulation by FDM and are more efficient in computational cost reduction.

• Applied Science and Convergence Technology
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• 제25권6호
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• pp.138-144
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• 2016

The discharge characteristics of pulse-driven coplanar micro barrier discharges for an ultraviolet (UV) light source using Ne-Xe mixture have been investigated using a two-dimensional fluid simulation at near-atmospheric pressure. The densities of electrons, the radiative excited states, the metastable excited states, and the power loss are investigated with the variations of gas pressure and the gap distance. With a fixed gap distance, the number of the radiative states $Xe^*(^3P_1)$ increases with the increasing driving voltage, but this number shows weak dependency on the gas when that pressure is over 400 Torr. However, the number of the radiative states increases with the increase of the gap distance at a fixed voltage, while the power loss decreases. Therefore, a long gap discharge has higher efficiency for UV generation than does a short gap discharge. A slight change in the electrode tilt angle enhances the number of radiative species 2 or 3 times with the same operation conditions. Therefore, the intensity and efficiency of the UV light source can be controlled independently by changing the gap distance and the electrode structure.

• 한국광학회지
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• 제1권1호
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• pp.33-39
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• 1990

방전여기 방식의 KrF 엑사이머 레이저의 컴퓨터 시뮬레이션 프로그램을 개발하여 방전 중의 $KrF^*$ 형성, 탈여기 및 흡수반응 등에 대한 완충가스의 영향에 관해 해석하였다. He 가스와 Ne 가스의 경우 $KrF^*$ 생성효율은 각각 7.5%, 19%였으며, $KrF^*$ 탈여기는 충전전압 30kV에서 각각 45, 30%의 비율을 차지하였다. 그러나 흡수과정에서는 완충가스의 영향이 10% 이하였다.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2011년도 제42회 하계학술대회
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• pp.1544-1545
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• 2011

For quantitative understanding of gas discharge phenomena, we should know electron collision cross section. Processing plasma etching of semiconductor, and research are being used in the etching source $C_4F_6$ gas may be used by itself and mixed with other gases are also used. However, the molecular gas $C_4F_6$ study on the characteristics of the electron transport and the cross-sectional area of the decision is still lacking. Therefore, we understand the electron transport characteristics and analysed the electron transport coefficients. And to understand and interpret physical properties of the ionization coefficient ${\alpha}$/N, and the attachment coefficient ${\eta}$/N in $C_4F_6$ gas.