• Title/Summary/Keyword: Ga-As laser

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The mesa formation and fabrication of planar buried heterostructure laser diode by using meltback method (Meltback을 이용한 mesa shape의 형성과 평면매립형 반도체레이저의 제작)

  • 황상구;오수환;김정호;김운섭;김동욱;홍창희
    • Korean Journal of Optics and Photonics
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    • v.10 no.6
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    • pp.518-523
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    • 1999
  • In thi, study, we made experiments to fonn a mesa shape by meltback method with various concentration of solutions and found that unsaturated (20%) InGaAsP (1.55 !-tm) solution at a growth temperature was the most suitable for the formation of a mesa ,hape on the wafer which has an InGaAsP active layer and an InP cap layer on an n-InP substrate. It was difficult to form a proper mesa shape for the fabrication of PBH-LDs only by the meltback method; therefore, we fabricated PBH-LDs by forming the mesa shape with the meltback method after wet etching and by growing a current-blocking layer successively. As the electrical and optical charaleri,tiecs of MQW-PBH-LDs fabricated by above methods, when the cavity length was $300{\mu}m$, the threshold current was about 10 mA, internal quantum efficiency 82%, internal loss $9.2cm^{-1}$, and characteristic temperature was 65 K at $25~45^{\circ}C$ and 42 K at $45~65^{\circ}C$. /TEX>.

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Characterization of photonic quantum ring devices manufactured using wet etching process (습식 식각 공정을 이용하여 제작된 광양자테 소자의 특성 분석)

  • Kim, Kyoung-Bo;Lee, Jongpil;Kim, Moojin
    • Journal of Convergence for Information Technology
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    • v.10 no.6
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    • pp.28-34
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    • 2020
  • A structure in which GaAs and AlGaAs epilayers are formed with a metal organic chemical vapor deposition equipment on a GaAs wafer similar to the structure of making a vertical cavity surface emitting laser is used. Photonic Quantum Ring (PQR) devices that are naturally generated by 3D resonance are manufactured by chemically assisted ion beam etching technology, which is a dry etching method. A new technology that can be fabricated has been studied, and as a result, the possibility of wet etching of a solution containing phosphoric acid, hydrogen peroxide and methanol was investigated, and the device fabrication by applying this method are also discussed. In addition, the spectrum of the fabricated optical device was measured, and the results were theoretically analyzed and compared with the wavelength value obtained by the measurement. It is expected that the PQR device will be able to model cells in a three-dimensional shape or be applied to the display field.

Ohmic contacts to p-type GaN for high brightness LED applications

  • Seong, Tae-Yeon
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.11a
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    • pp.23-23
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    • 2003
  • GaN-related semiconductors are of great technological importance for the fabrication of optoelectronic devices, such as blue and ultra violet light emitting diodes (LEDs), laser diodes, and photo-detectors. One of the most important applications of GaN-based LEDs is solid-state lighting, which could replace incandescent bulbs and ultimately fluorescent lamps. For solid-state lighting applications, the achievement of high extraction efficiency in LED structures is essential. For flip-chip LEDs (FCLEDS), the formation of low resistance and high reflective p-GaN contact is crucial. So far, a wide variety of different methods have been employed to improve the ohmic properties of p-type contacts to GaN. For example, surface treatments using different chemical solutions have been successfully used to produce high-quality ohmic contacts, Metallization schemes, such as Ta/Ti contacts to p-GaN, were also investigated. For these contacts, the removal of hydrogen atoms from the Mg atoms doped n the GaN was argued to be responsible for low contact resistances.

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Generation of coherent bulk and folded acoustic phonon oscillations in InGaN light-emitting diodes structure (InGaN LED 구조에서 결맞는 bulk phonon과 folded acoustic phonon의 생성)

  • Yang Ji-Sang;Jo Yeong-Dal;Lee Gi-Ju;O Eun-Sun;Kim Dae-Sik
    • Proceedings of the Optical Society of Korea Conference
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    • 2001.02a
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    • pp.54-55
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    • 2001
  • Recently, there has been much interests in InGaN/GaN multiple-quantum-well (MQW) structures due to their applicability as optoelectronic devices such as light-emitting diodes (LEDs) and laser diodes [1]. Their ultrafast and physical properties are also of significant interests. Anomalously large acoustic phonon oscillations have been observed using ultrafast lasers in InGaN MQWs [2]. In this study, we have peformed femtosecond pump-probe experiments in the reflection geometry on 5 periods InGaN/GaN MQW LED structure with well width of 20$\AA$ and barrier width of 100$\AA$ at room temperature. (omitted)

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Quasi-Continuous Operation of 1.55- μm Vertical-Cavity Surface-Emitting Lasers by Wafer Fusion

  • Song, Dae-Sung;Song, Hyun-Woo;Kim, Chang-Kyu;Lee, Young-Hee;Kim, Jung-Su
    • Journal of the Optical Society of Korea
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    • v.5 no.3
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    • pp.83-89
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    • 2001
  • Room temperature quasi-continuous operation is achieved near 1556 nm with threshold current as low as 2.2 mA from a 5.6-${\mu}{\textrm}{m}$ oxide-aperture vertical-cavity surface-emitting laser. Wafer fusion techniques are employed to combine the GaAs/AlGaAs mirror and the InP-based InGaAs/InGaAsP active layer. In this structure, an $Al_x/O_y$/GaAs distributed bragg reflector and intra-cavity contacts are used to reduce free carrier absorption.

A new strain analysis model in epitaxial multilayer system (다층 구조에 대한 새로운 strain 해석 모델)

  • Jang, Dong-Hyeon;Sim, Jong-In
    • Proceedings of the Optical Society of Korea Conference
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    • 2007.07a
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    • pp.237-238
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    • 2007
  • A new strain analysis model, so called the stress matched model, in an epitaxial multilayer system is proposed. The model makes it possible to know the strain, the stress, the elastic strain energy in each epitaxial layer. Analytical formulas of strain parameters in each epitaxial layer are derived under assumptions that the substrate thickness is finite and the in-plane lattice constant is the same for all epitaxial layers for dislocation free growth. As an example, the model is applied to a 405nm InGaN/InGaN multiple quantum well laser diode. Analysis result shows that AlxGa1-xN layer with Al mole fraction of 0.06 and the thickness of 6${\mu}m$ is one of good templates for a laser. In fact, this layer structure coincides with experimentally optimized one.

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Laser induced dry etching of GaAs (레이저유기에 의한 GaAs의 건식에칭)

  • Park, Se-Ki;Lee, Choen;Choi, Won-Chel;Kim, Moo-Sung;Min, Suk-Ki;Ahn, Byung-Sung
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.05a
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    • pp.58-61
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    • 1995
  • Instead of using CCl$_4$CCl$_2$F$_2$ gases, we used a alternative reaction gas of CFCs which we have developed, for the experiment of laser induced dry etching of laser induced dry etching of GaAs, and compared with the etch profile of a usual reation gas. Laser powers(power density) on the sample surface were varied from 100 mW(12.7 MW/$\textrm{cm}^2$) to 210mW(27 MW/$\textrm{cm}^2$) The laser beam was scanned over the sample by moving the cell with a speed raging from 8.3$\mu\textrm{m}$/sec and the gas pressure also was varied form 260 Torr to 760 Torr, High etching rates up to 136 $\mu\textrm{m}$/sec and an aspect ratio of 2.6 have been achieved by single scan of laser beam. The chemical compositions of the reaction products deposited on the etched groove were measured by Auger electron spectroscopy(AES) Etch profiles, including depth and width were observed by scanning electron microscopy(SEM)

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GaAsP 다이오드 조사에 따른 창상치유 효과

  • Kim, Tae-Gon;Kim, Yeong-Pyo;Lee, Ho-Sik;Park, Yong-Pil;Cheon, Min-U
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.240-240
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    • 2009
  • We developed the low level laser therapy(LLLT) apparatus for external injury cure using a GaAsP Diode. This equipment was fabricated by using GaAsP diode and a microcontroller, and designed to enable us to control light irradiation timer, and frequency. In this paper, the designed device was used to find out how GaAsP diode light source affects the skin wound of RAT. In the experiment, $1cm^2$ wounds on the External injury of RAT were made. Light irradiation RAT and none light irradiation RAT divided, each RAT was irradiated 20 min a day for 9 days. In result, compared with none light irradiation RAT, the lower incidence of inflammation and faster recovery was shown in light irradiation RAT.

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Optimum thickness of GaAs top layer in AlGaAs-based 850 nm VCSELs for 56 Gb/s PAM-4 applications

  • Yu, Shin-Wook;Kim, Sang-Bae
    • ETRI Journal
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    • v.43 no.5
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    • pp.923-931
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    • 2021
  • We studied the influence of GaAs top-layer thickness on the small-signal modulation response and 56 Gb/s four-level pulse-amplitude modulation eye quality of 850 nm vertical-cavity surface-emitting lasers (VCSELs). We considered the proportionality of the gain-saturation coefficient to the photon lifetime. The simulation results that employed the transfer-matrix method and laser rate equations led to the conclusion that the proportionality should be considered for proper explanation of the experimental results. From the obtained optical eyes, we could determine an optimum thickness of the GaAs top layer that rendered the best eye quality of VCSEL. We also compared two results: one result with a fixed gain-saturation coefficient and the other that considered the proportionality. The former result with the constant gain-saturation coefficient demonstrated a better eye quality and a wider optimum range of the GaAs top-layer thickness because the resultant higher damping reduced the relaxation oscillation.