• 제목/요약/키워드: Flexible Beam

검색결과 476건 처리시간 0.033초

반응표면법을 이용한 광학미러용 일체형 유연힌지 마운트 최적설계 (Optimal Design of the Monolithic Flexure Mount for Optical Mirror Using Response Surface Method)

  • 이경호;남병욱;남성식
    • 한국군사과학기술학회지
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    • 제26권3호
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    • pp.205-213
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    • 2023
  • An optimal design of a simple beam-shaped flexure hinge mount supporting an optical mirror is presented. An optical mirror assembly is an opto-mechanically coupled system as the optical and mechanical behaviors interact. This side-supporting mount is flexible in the radial direction and rigid for the remaining degrees of freedom to support the mirror without transferring thermal load. Through thermo-elastic, optical and eigenvalue analysis, opto-mechanical performance was predicted to establish the objective functions for optimization. The key design parameters for this flexure are the thickness and length. To find the optimal values of design parameters, response surface analysis was performed using the design of experiment based on nested FCD. Optimal design candidates were derived from the response surface analysis, and the optimal design shape was confirmed through Opto-mechanical performance validation analysis.

Three-key Triple Data Encryption Algorithm of a Cryptosystem Based on Phase-shifting Interferometry

  • Seok Hee Jeon;Sang Keun Gil
    • Current Optics and Photonics
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    • 제7권6호
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    • pp.673-682
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    • 2023
  • In this paper, a three-key triple data encryption algorithm (TDEA) of a digital cryptosystem based on phase-shifting interferometry is proposed. The encryption for plaintext and the decryption for the ciphertext of a complex digital hologram are performed by three independent keys called a wavelength key k1(λ), a reference distance key k2(dr) and a holographic encryption key k3(x, y), which are represented in the reference beam path of phase-shifting interferometry. The results of numerical simulations show that the minimum wavelength spacing between the neighboring independent wavelength keys is about δλ = 0.007 nm, and the minimum distance between the neighboring reference distance keys is about δdr = 50 nm. For the proposed three-key TDEA, choosing the deviation of the key k1(λ) as δλ = 0.4 nm and the deviation of the key k2(dr) as δdr = 500 nm allows the number of independent keys k1(λ) and k2(dr) to be calculated as N(k1) = 80 for a range of 1,530-1,562 nm and N(dr) = 20,000 for a range of 35-45 mm, respectively. The proposed method provides the feasibility of independent keys with many degrees of freedom, and then these flexible independent keys can provide the cryptosystem with very high security.

New Approaches for Overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film

  • Hong, Mun-Pyo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.100-101
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    • 2012
  • The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

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InGaZnO active layer 두께에 따른 thin-film transistor 전기적인 영향

  • 우창호;김영이;안철현;김동찬;공보현;배영숙;서동규;조형균
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 추계학술대회 논문집
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    • pp.5-5
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    • 2009
  • Thin-film-transistors (TFTs) that can be prepared at low temperatures have attracted much attention because of the great potential for transparent and flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited due to low field-effect mobility and rapid degradation after exposing to air. Alternative approach is the use of amorphous oxide semiconductors as a channel. Amorphous oxide semiconductors (AOSs) based TFTs showed the fast technological development, because AOS films can be fabricated at room temperature and exhibit the possibility in application like flexible display, electronic paper, and larges solar cells. Among the various AOSs, a-IGZO has lots of advantages because it has high channel mobility, uniform surface roughness and good transparency. [1] The high mobility is attributed to the overlap of spherical s-orbital of the heavy post-transition metal cations. This study demonstrated the effect of the variation in channel thickness from 30nm to 200nm on the TFT device performance. When the thickness was increased, turn-on voltage and subthreshold swing was decreased. The a-IGZO channels and source/drain metals were deposited with shadow mask. The a-IGZO channel layer was deposited on $SiO_2$/p-Si substrates by RF magnetron sputtering, where RF power is 150W. And working pressure is 3m Torr, at $O_2/Ar$ (2/28 sccm) atmosphere. The electrodes were formed with electron-beam evaporated Ti (30 nm) and Au (70 nm) bilayer. Finally, Al (150nm) as a gate metal was thermal-evaporated. TFT devices were heat-treated in a furnace at 250 $^{\circ}C$ and nitrogen atmosphere for 1hour. The electrical properties of the TFTs were measured using a probe-station. The TFT with channel thickness of 150nm exhibits a good subthreshold swing (SS) of 0.72 V/decade and on-off ratio of $1{\times}10^8$. The field effect mobility and threshold voltage were evaluated as 7.2 and 8 V, respectively.

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Nd:YAG Laser 직접 각인을 이용한 Carbon 스트레인 센서 (Carbon strain sensor using Nd: YAG laser Direct Writing)

  • 주동현;윤상우;김주한;박우태
    • 마이크로전자및패키징학회지
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    • 제25권1호
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    • pp.35-40
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    • 2018
  • Nd:YAG Laser를 이용하여 polyimide film에 탄화(carbonization)를 진행하여 Carbon을 생성하여 저가의 센서를 간단한 제조과정으로 만들었다. 이를 통하여 유연한 저가형 압저항 센서의 특성에 관한 연구를 수행하였다. 기존에 많은 연구들이 Polyimide에 $10.6{\mu}m$의 파장을 가지는 $CO_2$ laser를 이용하여 carbonization을 하여 센서를 제작하였다. 본 논문에서는 polyimide film에 $1.064{\mu}m$의 파장을 가지는Nd:YAG laser를 이용하여 carbonization(탄화공정)을 진행하였다. 또한 Nd:YAG laser를 사용하여 polyimide film위에 직접 탄화시키며 carbon을 생성하는 최적의 전력밀도($W/cm^2$)과 속도(scan rate) 조건 조합을 찾아 해상도를 높였다. $CO_2$ laser를 사용하였던 기존의 선행연구에서는 carbon생성의 최소 선폭이 $140{\sim}220{\mu}m$의 길이를 가졌지만, 본 연구에서는 카본의 생성되는 선폭이 $35{\sim}40{\mu}m$으로 축소시켰다. 이번 연구에서 제작된 센서의 초기 면저항은 $100{\sim}300{\Omega}/{\square}$ 이였다. 곡률 반경 21 R 로 인장을 하였을 때 저항이 30% 줄어들었고, 이를 통하여 계산된 게이지 팩터는 56.6이였다. 본 연구는 압저항 센서를 제조하기 위한 단순하고, 매우 유연하고 저렴한 공정을 제공한다.

Effects of thickness of GIZO active layer on device performance in oxide thin-film-transistors

  • Woo, C.H.;Jang, G.J.;Kim, Y.H.;Kong, B.H.;Cho, H.K.
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2009년도 하계학술대회 논문집
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    • pp.137-137
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    • 2009
  • Thin-film transistors (TFTs) that can be prepared at low temperatures have attracted much attention due to the great potential for flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited by low field effect mobility or rapidly degraded after exposing to air in many cases. Another approach is amorphous oxide semiconductors. Amorphous oxide semiconductors (AOSs) have exactly attracted considerable attention because AOSs were fabricated at room temperature and used lots of application such as flexible display, electronic paper, large solar cells. Among the various AOSs, a-IGZO was considerable material because it has high mobility and uniform surface and good transparent. The high mobility is attributed to the result of the overlap of spherical s-orbital of the heavy pest-transition metal cations. This study is demonstrated the effect of thickness channel layer from 30nm to 200nm. when the thickness was increased, turn on voltage and subthreshold swing were decreased. a-IGZO TFTs have used a shadow mask to deposit channel and source/drain(S/D). a-IGZO were deposited on SiO2 wafer by rf magnetron sputtering. using power is 150W, working pressure is 3m Torr, and an O2/Ar(2/28 SCCM) atmosphere at room temperature. The electrodes were formed with Electron-beam evaporated Ti(30nm) and Au(70nm) structure. Finally, Al(150nm) as a gate metal was evaporated. TFT devices were heat treated in a furnace at $250^{\circ}C$ in nitrogen atmosphere for an hour. The electrical properties of the TFTs were measured using a probe-station to measure I-V characteristic. TFT whose thickness was 150nm exhibits a good subthreshold swing(S) of 0.72 V/decade and high on-off ratio of 1E+08. Field effect mobility, saturation effect mobility, and threshold voltage were evaluated 7.2, 5.8, 8V respectively.

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위성 기동 시 SAR 안테나 반사판에 발생하는 진동 분석 (Vibration Analysis of SAR Antenna Reflectors During Satellite Maneuver)

  • 김태현;김대연;서종은;한재흥;이재은;정화영
    • 한국항공우주학회지
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    • 제48권3호
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    • pp.225-231
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    • 2020
  • 기상 조건과 상관없이 영상을 획득할 수 있는 SAR 위성에 대한 수요가 최근 들어 계속해서 증가하고 있다. 일반적으로 SAR 안테나의 주반사판은 제한적인 탑재체의 공간에 효율적으로 수납하기 위해 여러 개의 전개 가능한 패널로 구성된다. 전개형 구조물은 본질적으로 구조적 강성이 부족하며 외란이나 가진에 취약하다. 특히, SAR 위성은 더 높은 각속도 요구조건 때문에 안테나 반사면에 발생하는 진동 수준이 높을 수 있다. 이미지를 얻는 동안 이미지의 품질을 위해 반사판의 높은 표면 정확도를 유지하는 것은 중요하다. 본 연구에서는 전개형 SAR 안테나의 구조적 변형 때문에 발생하는 성능 저하를 분석한다. 주반사판의 패널은 유연 구조물로 가정하였으며, 다물체 동역학 시뮬레이션 환경을 구축하였다. 이를 통해, 위성의 기동 시 패널의 변형량을 계산한다. 또, 이러한 변형이 안테나 성능과 임무 수행에 얼마나 영향을 미치는지 확인하기 위해, 안테나 이득 및 빔 지향오차를 분석하였다.

Aerodynamic and Aeroelastic Tool for Wind Turbine Applications

  • Viti, Valerio;Coppotelli, Giuliano;De Pompeis, Federico;Marzocca, Pier
    • International Journal of Aeronautical and Space Sciences
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    • 제14권1호
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    • pp.30-45
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    • 2013
  • The present work focuses on the unsteady aerodynamics and aeroelastic properties of a small-medium sized wind-turbine blade operating under ideal conditions. A tapered/twisted blade representative of commercial blades used in an experiment setup at the National Renewable Energy Laboratory is considered. The aerodynamic loads are computed using Computational Fluid Dynamics (CFD) techniques. For this purpose, FLUENT$^{(R)}$, a commercial finite-volume code that solves the Navier-Stokes and the Reynolds-Averaged Navier-Stokes (RANS) equations, is used. Turbulence effects in the 2D simulations are modeled using the Wilcox k-w model for validation of the CFD approach. For the 3D aerodynamic simulations, in a first approximation, and considering that the intent is to present a methodology and workflow philosophy more than highly accurate turbulent simulations, the unsteady laminar Navier-Stokes equations were used to determine the unsteady loads acting on the blades. Five different blade pitch angles were considered and their aerodynamic performance compared. The structural dynamics of the flexible wind-turbine blade undergoing significant elastic displacements has been described by a nonlinear flap-lag-torsion slender-beam differential model. The aerodynamic quasi-steady forcing terms needed for the aeroelastic governing equations have been predicted through a strip-theory based on a simple 2D model, and the pertinent aerodynamic coefficients and the distribution over the blade span of the induced velocity derived using CFD. The resulting unsteady hub loads are achieved by a first space integration of the aeroelastic equations by applying the Galerkin's approach and by a time integration using a harmonic balance scheme. Comparison among two- and three- dimensional computations for the unsteady aerodynamic load, the flap, lag and torsional deflections, forces and moments are presented in the paper. Results, discussions and pertinent conclusions are outlined.

Fabrication of Resistive Switching Memory based on Solution Processed AlOx - PMMA Blended Thin Film

  • 신중원;백일진;조원주
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.181.1-181.1
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    • 2015
  • 용액 공정을 이용한 Resistive random access memory (ReRAM)은 간단한 공정 과정, 대면적화, 저렴한 가격 등의 장점으로 인해 큰 관심을 받고 있으며, HfOx, TiOx, AlOx 등의 산화물이 ReRAM 절연 막으로 주로 연구되고 있다. 더 나아가 최근에는 organic 물질을 메모리 소자로 사용한 연구가 보고되고 있다. 이는 경제적이며, wearable 또는 flexible system에 적용이 용이하다. 그럼에도 불구하고, organic 물질을 갖는 메모리 소자는 기존의 산화물 소자에 비해 열에 취약하며 전기적인 특성과 신뢰성이 우수하지 못하다는 단점을 가지고 있다. 이를 위한 방안으로 본 연구에서는 AlOx - polymethylmethacrylate (PMMA) blended thin film ReRAM을 제안하였다. 이는 organic물질의 전기적 특성을 개선시킬 뿐 아니라, inorganic 물질을 wearable 소자에 적용했을 때 발생하는 crack과 같은 기계적 물리적 결함을 해결할 수 있는 새로운 방법이다. 먼저, P-type Si 위에 습식산화를 통하여 SiO2 300 nm 성장시킨 기판을 사용하여 electron beam evaporation으로 10 nm의 Ti, 100 nm의 Pt 층을 차례로 증착하였다. 그리고 PMMA 용액과 AlOx 용액을 초음파를 이용하여 혼합한 뒤, 이 용액을 Pt 하부 전극 상에서 spin coating방법으로 1000 rpm 10초, 5000 rpm 30초의 조건으로 증착하였다. Solvent 및 불순물 제거를 위하여 150, 180, $210^{\circ}C$의 온도로 30 분 동안 열처리를 진행하였고, shadow mask를 이용하여 상부 전극인 Ti를 sputtering 방식으로 100 nm 증착하였다. 150, 180, $210^{\circ}C$로 각각 열처리한 AlOx - PMMA blended ReRAM의 전기적 특성은 HP 4156B semiconductor parameter analyzer를 이용하여 측정하였다. 측정 결과 제작된 소자 전부에서 2 V이하의 낮은 동작전압, 안정된 DC endurance (>150cycles), 102 이상의 높은 on/off ratio를 확인하였고, 그 중 $180^{\circ}C$에서 열처리한 ReRAM은 더 높은 on/off ratio를 갖는 것을 확인하였다. 결론적으로 baking 온도를 최적화하였으며 AlOx - PMMA blended film ReRAM의 우수한 메모리 특성을 확인하였다. AlOx-PMMA blended film ReRAM은 organic과 inorganic의 장점을 갖는 wearable 및 system용 비휘발성 메모리소자에 적용이 가능한 경제적인 기술로 판단된다.

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평행구동방식 로봇 조작기의 진동제어 (Vibration Control of a Robot Manipulator with a Parallel Drive Mechanism)

  • 최승철;하영균;박영필
    • 대한기계학회논문집
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    • 제15권6호
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    • pp.2015-2025
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    • 1991
  • 본 연구에서는 무거운 부하중량(payload)을 운반하는 평행구동기구(parallel drive mechanism)를 가진 2 자유도 수직 로봇 조작기의 마지막 링크를 고속화 및 작업 영역의 확대를 위해 경량의 길이가 긴 링크로 구성하고, 동적 해석 및 제어를 위해 이 를 수직면상에서 회전하는 첨단질량을 가진 Euler-Bernoulli 외팔보로 모델링하였다. Hamilton의 원리를 적용하여 계의 지배방정식을 구하였으며 이를 조작기의 최종 자세 (configuration)에 대한 교란변수들(periturbed variables)을 도입하여 이산시간계 상 태방정식으로 표시하였다. 계의 상태방정식에 대해 디지탈 최적제어 및 최적관측기 이론을 적용하여, 유연한 조작기의 위치 및 진동제어를 병해하여 수행하는 제어기를 설계하였으며, 제어기의 효율성 및 적용성을 검토하기 위하여 수치해석 및 실험을 행 하였고 이들 결과를 비교, 검토하였다.