• Title/Summary/Keyword: Fine-Line

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Oxidative Line Width Reduction of Imprinted Nanopatterns

  • Park, Dae Keun;Kang, Aeyeon;Jeong, Mira;Lee, Jaejong;Yun, Wan Soo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.650-650
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    • 2013
  • Although imprinted nanopatterns of organic polymer can be modified by the heat treatment [1], it generally requires high process temperatures and is material-dependent since the heat-induced mass loss of the organic polymer is greatly affected by its chemical characteristics. When oxygen is added during the annealing process, one can reduce the process temperature as well as the dependence of the materials. With the oxygen, line width reduction of a polymer (SU-8) patterns could be accomplished at temperature of as low as $250^{\circ}C$ which was not possible in the heat only process. This oxidative line width reduction can be dramatically promoted with the introduction of oxygen plasma. The oxygen plasma, with its highly-reactive oxygen species, vigorously etches away the organic materials, proven to be extremely effective line with reduction method. It is, however, very hard to control the extent and homogeneity of the etching, particularly of very fine patterns. Here, we report an effective and reliable line width reduction method of imprinted nanopatterns by combined plasma and heat treatment. The merits of this process include the reduction of process temperature, time and material-dependence.

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Fabrication of Ceramic Line Pattern by UV-Nanoimprint Lithography of Inorganic Polymers (무기고분자의 나노임프린트법에 의한 세라믹 선형 패턴의 제조)

  • Park Jun-Hong;Pham Tuan-Anh;Lee Jae-Jong;Kim Dong-Pyo
    • Polymer(Korea)
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    • v.30 no.5
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    • pp.407-411
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    • 2006
  • The SiC-based ceramic nanopatterns were prepared by placing polydimethylsiloxane (PDMS) mold from DVD master on the spincoated polyvinylsilaeane (PVS) or allylhydridopolycaybosilane (AHPCS) as ceramic precursors to fabricate line pattern via UV-nanoimprint lithography (UV-NIL), and subsequent pyrolysis at $800^{\circ}C$ in nitrogen atmosphere. As the dimensional change of polymeric and ceramic patterns was comparatively investigated by AFM and SEM, the shrinkage in height was 38.5% for PVS derived pattern and 24.1% for AHPCS derived pattern while the shrinkage in width was 18.8% for PVS and 16.7% for AHPCS. It indicates that higher ceramic yield of the ceramic precursor resulted in less shrinkage, and the strong adhesion between the substrate and the pattern caused anisotropic shrinkage. This preliminary work suggests that NIL is a promissing route for fabricating ceramic MEMS devices, with the development on the shrinkage control.

Filtration Characteristics of Paticulate Matter at Bag Filters Coated with PTFE Membrane During Off-Line Pulsing (PTFE membrane이 코팅된 여과백의 off-line 탈진시 미세먼지 집진 특성)

  • Kim, Joung-Hun;Moon, Il-Shik;Hwang, Min-Young;Kim, Ryang-Gyoon;Ko, Daekwun
    • Journal of Korean Society of Environmental Engineers
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    • v.39 no.7
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    • pp.391-402
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    • 2017
  • Particulate matter becomes an important issue in the environmental society recently so that it is necessary to evaluate that the commercial application of baghouse systems for effective control of fine particulates is viable. A laboratory-scale baghouse experimental apparatus with filter bags made of PTFE felt or PTFE felt coated with PTFE membrane is used to investigate the filtration performances of fine particulates. Experiments by changing filtration velocity, inlet dust concentration, and average dust particle size show that the dust collection efficiency becomes higher at lower filtration velocity, higher inlet dust concentration and larger average dust particle size. The total pressure drop through the filter media and dust layer becomes higher at higher filtration velocity and higher inlet dust concentration. The dust collection efficiency is higher and the pressure drop is lower at a baghouse with filter bags coated with PTFE membrane than that without membrane coating. From the result that the dust collection efficiency of $PM_{2.5}$ in a reasonable filtration velocity range during off-line pulsing at a baghouse with PTFE felt bag filters coated with PTFE membrane is as high as 99.99%, it is confirmed that the use of baghouse is an effective measure to control the fine particulates.

Design and Fabrication of Reflective Array Type Wideband SAW Dispersive Delay Line

  • Choi Jun-Ho;Yang Jong-Won;Nah Sun-Phil;Jang Won
    • Journal of electromagnetic engineering and science
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    • v.6 no.2
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    • pp.110-116
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    • 2006
  • A reflective array type surface acoustic wave(SAW) dispersive delay line(DDL) with high time-bandwidth at the V/UHF-band is designed and fabricated for compressive receiver applications. This type of the SAW DDL has the properties of the relative bandwidth of 20 %, the time delay of 49.89 usec, the insertion loss of 38.5 dB and the side lobe rejection of 39 dB. In comparison with a commercial SAW DDL, the insertion loss, amplitude ripple and side lobe rejection are improved by $1.5dB{\pm}0.6dB$ and 4 dB respectively. Using the fabricated SAW DDL, the prototype of the compressive receiver is developed. It is composed of RF converter, fast tunable LO, chirp LO, A/D converter, signal processing unit and control unit. This prototype system shows a fine frequency resolution of below 30 kHz with high scan rate.

Auto-patterned Ag signal line by solution-processed printing on zone-defined surface.

  • Kim, Jae-Hyun;Lee, Bo-Hyun;Moon, Tae-Tyoung;Park, Mi-Kyung;Chae, Gee-Sung;Kang, In-Byeong;Chung, In-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1774-1777
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    • 2007
  • Ultra-fine Ag line was automatically patterned to the extent of 10 ${\mu}m$ in width by slit coating on the $10^4$ $mm^2$ glass, which was pre-patterned as hydrophobic and hydrophilic zone by using hydrophobic material. The resistivity of Ag film was about $4{\mu}\;{\Omega}{\cdot}cm$.

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Mechanical Properties of High Strength Hot Strips For Line Pipe Application (라인파이프용 고강도 열연강판의 기계적 성질)

  • 김문수;김준성;강기봉;노광섭
    • Proceedings of the Korean Society for Technology of Plasticity Conference
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    • 1999.08a
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    • pp.383-389
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    • 1999
  • The purpose of this study was to investigate the effects of alloying and rolling condition on the mechanical properties and to develop high strength line pipe steels with good toughness. Tests were carried out by the laboratory experiments followed by mill trials and mass production. It was found that a small addition of microalloying elements, such as Nb, V with Mo or Ti remarkably increased the strength and toughness of hot strips. The optimum condition of thermomechanical rolling on low carbon microalloyed steel improved the toughness through the formation of a fine and uniform microstructure. Based on this mill trials following the fundamental research, the production technology of line pipe steels, grade X70∼X100 with high toughness, has been established. These grade steels exhibit excellent low temperature toughness (vTs= under -80$^{\circ}C$) and sufficient strength in both the base metal and the ERW seam weld position, respectively.

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Study on fine pattern with Micro filling using Etching-free process (Etching-free 공정 적용 Micro filling 미세 패턴 구현 연구)

  • Kim, Wan-Gyu;Yun, Yeong-U;Lee, Seong-Ui
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2012.11a
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    • pp.72-73
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    • 2012
  • Metal line을 형성하는 방법에는 그라비아 인쇄, 잉크젯 인쇄, photo 공정 후 박막 증착 공정 등을 많이 사용한다. 본 연구에서는 Micro-imprinting 공정과 DFR photo lithography 공정을 통해 음각의 미세한 pattern을 형성한 후 sputtering과 printing을 이용하여 pattern의 filling을 통해 metal line을 구현하는 것을 목표로 하였다. Pattern을 형성한 후 RIE 공정을 통해 기판 표면의 친수성 처리를 하고, SAM 공정을 통해 코팅 막의 소수성 처리를 하였다. Sputtering과 전면 프린팅 및 건조 후 strip 공정을 통해 metal line을 형성하고, 이에 대한 표면 특성과 전기적 특성을 분석하였다.

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Effective Connecting Methods Between Incheon International Airport Railroad and Existing Railroads (인천국제공항철도와 기존 철도의 효율적인 연계방안)

  • 한우진
    • Proceedings of the KSR Conference
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    • 2002.10a
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    • pp.253-258
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    • 2002
  • The Incheon International Amort Railroad (IIAR) is the railroad that connects Incheon International Airport, Gimpo Airport and Seoul Station. IIAR is now under construction, and it will be finished to Gimpo Amort by 2006, to Seoul Station by 2008. But IIAR is not only so late to start but also has no discussion about effective connecting methods to existing railroads and fine operation plan. Therefore, after IIAR opens, it is possible for IIAR to lose to limousine bus using highway. So, this paper proposes 4 effective connecting methods for IIAR - (1) Shuttle transport, (2) Short-distance connecting transport (Inside IIAR, Seoul Subway Line 9, 'Han-River line') (3) Mid-distance connecting transport (Jung-ang, Tae-baek, Young-dong line) (4) Long-distance connecting transport (Korean Train express (korean high speed railroad)) These methods can increase the connectivity of IIAR with existing railroads and the competition power of IIAR against highway.

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Oxidative Etching of Imprinted Nanopatterns by Combination of Vacuum Annealing and Plasma Treatment

  • Park, Dae Keun;Kang, Aeyeon;Jeong, Mira;Lee, Jae-Jong;Yun, Wan Soo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.08a
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    • pp.251.1-251.1
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    • 2013
  • Combination of oxidative vacuum annealing and oxygen plasma treatment can serve as a simple and efficient method of line-width modification of imprinted nanopatterns. Since the vacuum annealing and oxygen plasma could lead mass loss of polymeric materials, either one of the process can yield a narrowed patterns. However, the vacuum annealing process usually demands quite high temperatures (${\geq}300^{\circ}C$) and extended annealing time to get appreciable line-width reduction. Although the plasma treatment may be considered as an effective low temperature rapid process for the line-width reduction, it is also suffering for the lowered controllability on application to very fine patterns. We have found that the vacuum annealing temperature can be lowered by introducing the oxygen in the vacuum process and that the combination of oxygen plasma treatment with the vacuum annealing could yield the best result in the line-with reduction of the imprinted polymeric nanopatterns. Well-defined line width reduction by more than 50% was successfully demonstrated at relatively low temperatures. Furthermore, it was verified that this process was applicable to the nanopatterns of different shapes and materials.

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Application of Inkjet Technology in Flat Panel Display

  • Ryu, Beyong-Hwan;Choi, Young-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 2005.07b
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    • pp.913-918
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    • 2005
  • It is expected that the inkjet technology offers prospect for reliable and low cost manufacturing of FPD (Flat Panel Display). This inkjet technology also offers a more simplified manufacturing process for various part of the FPD than conventional process. For example, recently the novel manufacturing processes of color filter (C/F) in LCD, or RGB patterning in OLED by inkjet printing method have been developed. This elaborates will be considered as the precious point of manufacturing process for the mass production of enlarged-display panel with a low price. On this point of view, we would like to review the status of inkjet technology in FPD, with some results on forming micro line by inkjet patterning of suspension type silver nano ink as below. We have studied the inkjet patterning of synthesized aqueous silver nano-sol on interface-controlled ITO glass substrate. Furthermore, we designed the conductive ink for direct inkjet patterning on bare ITO glass substrate. The first, the highly concentrated polymeric dispersant-assisted silver nano sol was prepared. The high concentration of batch-synthesized silver nano sol was possible to 40 wt%. At the same time the particle size of silver nanoparticles was below $10{\sim}20nm$. The second, the synthesized silver nano sol was inkjet - patterned on ITO glass substrate. The connectivity and width of fine line depended largely on the wettability of silver nano sol on ITO glass substrate, which was controlled by surfactant. The relationship was understood by wetting angle. The line of silver electrode as fine as $50{\sim}100\;{\mu}m$ was successfully formed on ITO glass substrate. The last, the direct inkjet-patternable silver nano sol on bare ITO glass substrate was designed also.

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