• 제목/요약/키워드: Field Oxide

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ITO Extended Gate Reduced Graphene Oxide Field Effect Transistor For Proton Sensing Application

  • Truong, Thuy Kieu;Nguyen, T.N.T.;Trung, Tran Quang;Son, Il Yung;Kim, Duck Jin;Jung, Jin Heak;Lee, N.E.
    • Proceedings of the Korean Vacuum Society Conference
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    • 2013.02a
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    • pp.653-653
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    • 2013
  • In this study, ITO extended gate reduced graphene oxide field effect transistor (rGO FET) was demonstrated as a transducer for a proton sensing application. In this structure, the sensing area is isolated from the active area of the device. Therefore, it is easy to deposit or modify the sensing area without affecting on the device performance. In this case, the ITO extended gate was used as a gate electrode as well as a proton sensing material. The proton sensing properties based on the rGO FET transducer were analyzed. The rGO FET device showed a high stability in the air ambient with a TTC encapsulation layer for months. The device showed an ambipolar characteristic with the Dirac point shift with varying the pH solutions. The sensing characteristics have offered the potential for the ion sensing application.

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Novel Low-Temperature Deposition of the $SiO_2$ Thin Film using the LPCVD Method and Evaluation of Its Reliability in the DRAM Capacitors (LPCVD 방법에 의한 저온 $SiO_2$ 박막의 증착방법과 DRAM 커패시터에서의 그 신뢰성 연구)

  • Ahn Seong-Joon;Park Chul-Geun;Ahn Seung-Joon
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.7 no.3
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    • pp.344-349
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    • 2006
  • The low-temperature processing is very important for fabrication of the very large scale ($60{\sim}70nm$) semiconductor devices since the submicron transistors are sensitive to the thermal budget. Hence, in this work, we propose a noble low-temperature LPCVD (Low-Pressure Chemical Vapor Deposition) process for the $SiO_2$ film and evaluate the electrical reliability of the LTO (Low-Temperature Oxide) by making the capacitors with ONO (Oxide/Nitride/Oxide) structure. The leak current of the LTO was similar to that of the high-temperature wet oxide until the electric field was lower than 5 MV/cm. However, when the electric field was higher, the LTO showed much better characteristics.

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An Analytical Model of the First Eigen Energy Level for MOSFETs Having Ultrathin Gate Oxides

  • Yadav, B. Pavan Kumar;Dutta, Aloke K.
    • JSTS:Journal of Semiconductor Technology and Science
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    • v.10 no.3
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    • pp.203-212
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    • 2010
  • In this paper, we present an analytical model for the first eigen energy level ($E_0$) of the carriers in the inversion layer in present generation MOSFETs, having ultrathin gate oxides and high substrate doping concentrations. Commonly used approaches to evaluate $E_0$ make either or both of the following two assumptions: one is that the barrier height at the oxide-semiconductor interface is infinite (with the consequence that the wave function at this interface is forced to zero), while the other is the triangular potential well approximation within the semiconductor (resulting in a constant electric field throughout the semiconductor, equal to the surface electric field). Obviously, both these assumptions are wrong, however, in order to correctly account for these two effects, one needs to solve Schrodinger and Poisson equations simultaneously, with the approach turning numerical and computationally intensive. In this work, we have derived a closed-form analytical expression for $E_0$, with due considerations for both the assumptions mentioned above. In order to account for the finite barrier height at the oxide-semiconductor interface, we have used the asymptotic approximations of the Airy function integrals to find the wave functions at the oxide and the semiconductor. Then, by applying the boundary condition at the oxide-semiconductor interface, we developed the model for $E_0$. With regard to the second assumption, we proposed the inclusion of a fitting parameter in the wellknown effective electric field model. The results matched very well with those obtained from Li's model. Another unique contribution of this work is to explicitly account for the finite oxide-semiconductor barrier height, which none of the reported works considered.

Properties and Applications of Graphite Oxides

  • Jeong, Hye-Gyeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.59-59
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    • 2010
  • Graphene has attracted much interest because of its fascinating electronic structure with excellent electron mobility. However, there are some difficulties in making graphene of large and uniform area for real applications. One alternative is graphite oxide. Since graphite oxide is water soluble, it can be sprayed or spin-coating onto any substrates for applications such as Transparent Conducting Film (TCF) and Field Effect Transistor (FET). In this talk, chemical and physical properties of graphite oxide will be discussed. In addition, possible applications made of graphite oxide (GO) will be introduced.

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The Electrical Characteristics of Varistor. (바리스터의 전기적 특성)

  • Hong, Kyung-Jin;Jang, Dong-Hwan;Cho, Jae-Cheol
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2001.05a
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    • pp.52-56
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    • 2001
  • The Breakdown electric field of ZnO semiconductor devices in voltage-current characteristics was increased by increasing of additive materials. The specimen that has not additive materials was not formed spinel structure. The critical voltage that has not spinel structure was 235[V]. When the additive materials has 0.5 and 2[mol%], the Breakdown electric field was 840 and 758[V] in each additive materials. The Breakdown electric field of varistors as a factor of voltage and current was increased by addition of oxide antimony. The varistors that has oxide antimony was linearly increased in low electric field.

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Gate Oxide 두께에 따른 NMOSFET소자의 전기적 특성 분석

  • Han, Chang-Hun;Lee, Gyeong-Su;Choe, Byeong-Deok
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.08a
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    • pp.350-350
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    • 2012
  • 본 연구에서는 Oxide 두께가 각각 4, 6 nm인 Symmetric NMOSFET의 전기적 특성 분석에 관한 연구를 진행하였다. 게이트 전압에 따른 Drain saturation current (IDSAT), Threshold Voltage(VT) 및 드레인 전압에 따른 Off-states 특성 변화를 분석하였다. 소자 측정 결과 oxide 두께가 4 nm인 경우 Vt는 0.3 V, IDSAT은 73 ${\mu}A$ (@VD=0.05)로, oxide 두께가 6 nm인 경우 Vt는 0.65 V, IDSAT은 66 ${\mu}A$ (@VD=0.05)로 각각 측정되었다. 이는 oxide 두께가 얇은 경우 게이트 전압 인가 시 Electric field 증가에 따른 것으로 판단된다. 또한 드레인 전압 인가에 따른 소자 특성 분석 결과 oxide 두께가 4nm인 경우 급격한 Gate leakage 증가를 보였으며, 이에 따라 Off-state에서의 leakage current가 증가함을 확인하였다. 본 연구는 Oxide 두께에 따른 MOSFET 소자의 전기적 특성 분석을 위해 진행되었으며, 상기 결과와 같이 oxide 두께 가변은 Idsat, Vt, leakage current 등의 주요 파라미터에 영향을 주어 NMOSFET 소자의 전기적 특성을 변화시킴을 확인하였다.

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Buckling analysis of graphene oxide powder-reinforced nanocomposite beams subjected to non-uniform magnetic field

  • Ebrahimi, Farzad;Nouraei, Mostafa;Dabbagh, Ali;Civalek, Omer
    • Structural Engineering and Mechanics
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    • v.71 no.4
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    • pp.351-361
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    • 2019
  • Present article deals with the static stability analysis of compositionally graded nanocomposite beams reinforced with graphene oxide powder (GOP) is undertaken once the beam is subjected to an induced force caused by nonuniform magnetic field. The homogenized material properties of the constituent material are approximated through Halpin-Tsai micromechanical scheme. Three distribution types of GOPs are considered, namely uniform, X and O. Also, a higher-order refined beam model is incorporated with the dynamic form of the virtual work's principle to derive the partial differential motion equations of the problem. The governing equations are solved via Galerkin's method. The introduced mathematical model is numerically validated presenting a comparison between the results of present work with responses obtained from previous articles. New results for the buckling load of GOP reinforced nanocomposites are presented regarding for different values of magnetic field intensity. Besides, other investigations are performed to show the impacts of other variants, such as slenderness ratio, boundary condition, distribution type and so on, on the critical stability limit of beams made from nanocomposites.

An Investigation of the Terahertz Absorption Characteristics of a Graphene Oxide Aqueous Solution Using Microfluidic Technology

  • Ningyi Cai;Boyan Zhang;Qinghao Meng;Siyu Qian;Bo Su;Hailin Cui;Shengbo Zhang;Cunlin Zhang
    • Current Optics and Photonics
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    • v.7 no.2
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    • pp.119-126
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    • 2023
  • The vibratory and rotational levels of many biological macromolecules lie in the terahertz (THz) band, which means that THz techniques can be used to identify and detect them. Moreover, since the biological activity of most biomolecules only becomes apparent in aqueous solution, we use microfluidic technology to study the biological properties of these biomolecules. THz time-domain spectroscopy was used to study the THz absorption characteristics of graphene oxide (GO) aqueous solution at different concentrations and different exposure times in fixed electric or magnetic fields. The results show that the spectral characteristics of the GO solution varied with the concentration: as the concentration increased, the THz absorption decreased. The results also show that after placing the solution in an external electric field, the absorption of THz first increased and then decreased. When the solution was placed in a magnetic field, the THz absorption increased with the increase in standing time. In this paper, these results are explained based on considerations of what is occurring at the molecular scale. The results of this study provide technical support for the further study of GO and will assist with its improved application in various fields.