• Proceedings of the Korean Society of Marine Engineers Conference
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• 2002.05a
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• pp.49-59
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• 2002

For the purpose of helping development of a GDI(Gasoline Direct Injection) engine, the spray behaviors and fuel distributions were investigated in a single cylinder GDI engine. The experimental engine is a swirl type GBI engine with a SCV(Swirl Control Valve). PLIF(Planar Laser Induced Fluorescence) system with KrF Excimer laser was used for the measurement of the fuel distributions. The effects of SCV opening angle and the Injector specifications, such as the spray cone angle and the offset an91e on the fuel distributions characteristics were investigated. As a result, it was found that the SCV opening angle had a great effect on the fuel distributions in the late stage of compression process by changing flow fields in the combustion chamber.

• Journal of the Microelectronics and Packaging Society
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• v.21 no.2
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• pp.53-57
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• 2014

Thin glass (< 100 microns) is a promising material from which advanced interposers for high density electrical interconnects for 2.5D chip packaging can be produced. But thin glass is extremely brittle, so mechanical micromachining to create through glass vias (TGVs) is particularly challenging. In this article we show how laser processing using deep UV excimer lasers at a wavelength of 193 nm provides a viable solution capable of drilling dense patterns of TGVs with high hole counts. Based on mask illumination, this method supports parallel drilling of up over 1,000 through vias in 30 to $100{\mu}m$ thin glass sheets. (We also briefly discuss that ultrafast lasers are an excellent alternative for laser drilling of TGVs at lower pattern densities.) We present data showing that this process can deliver the requisite hole quality and can readily achieve future-proof TGV diameters as small $10{\mu}m$ together with a corresponding reduction in pitch size.

• Journal of the Korean Institute of Telematics and Electronics D
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• v.34D no.12
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• pp.62-67
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• 1997

The optical lithography wit an ArF excimer laser as a light source is expected to be used in the mass production of giga-bit DRAMs which require less than 0.2.mu.m minimum feature size. In this case, the distortion of a patterned image becomes very severe, since the lithography porcess is performed at the resolution limit. Traditionally, the photomask pattern was designed and revised with trial-and-error methods, such as repeated execution of process simulators or actual process experiments which require time and effort. Ths paper describes a program which automatically finds an optimal mask pattern. The program divides the mask plane into cells with same sizes, chooses a cell randomly, changes the transparent/opaque property of the cell, and eventually genrates a mask pattern which produces required image pattern. The program was applied to real DRAM cell patterns to produce mask patterns which genertes image patterns closer to object images than original mask patterns.

• Proceedings of the IEEK Conference
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• 2001.06b
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• pp.225-228
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• 2001

We simulated and analyzed the flicker phenomena in the poly-Si TFT-LCD using PSpice for the development of wide-area and high-quality LCD display We define the electric quantity of flicker in the TFT-LCD, which is the ratio of half frame frequency (30Hz) to DC (0 Hz) frequency. We compared two different types of TFTs, excimer laser annealed (ELA) poly-Si TFT and silicide mediated crystallization (SMC) poly-Si TFT, and found that the ELA and SMC TFTs show different flicker characteristics because of their mobility and leakage current. In addition, we showed that the gate voltage should be chosen carefully at the minimum flicker because of the larger leakage current of poly-Si Tn as compared with a-Si TFT

• Proceedings of the Optical Society of Korea Conference
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• 1991.06a
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• pp.88-89
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• 1991

For the micro-lithography using a KrF excimer laser beam(λ=0.248${\mu}{\textrm}{m}$) a mirror system consisting of four spherical surfaces with reduction magnification 5$\times$ is designed. Initially the aplanat condition of the mirror system is considered. And for the further improved performance of the system the distortion free condition and flat field condition within Seidel 3rd order aberrations are added to the above condition. During the process of designing the computer-aided optimization technique is extensively employed. The spherical aberration, coma, field curvature and distortion of the optimized four-spherical mirror system are removed to the diffraction limit, and residual astigmatism and off-axial vignetting are not corrected enough.

• Proceedings of the KIEE Conference
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• 1996.07c
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• pp.1428-1430
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• 1996

Thin Silicon oxynitride(SiON) films have been chemically deposited using 193nm ArF Excimer Laser CVD, with $Si_{2}H_{8}$, $N_{2}O$, and $NH_3$ as the reactive gases and $N_2$ as the carrier gas. Experimental results show that deposition rate and refractive index have a strong dependence on substrate temperature, chamber pressure, gas ratio, laser power and laser beam height. Electrical characterization of oxynitride films demonstrates that for $NH_{3}/N_{2}O$ flow ratios ranging from 0.25 to 1, the leakage currents, the interface trap density and the capacitances (dielect ric constant) increase and the dielectric breakdown fields decrease

• Proceedings of the KIEE Conference
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• 1996.07c
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• pp.1550-1552
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• 1996

Poly-Si films were deposited by Laser CVD using 193nm ArF Excimer Laser from disilane($Si_{2}H_{6}$) and then the films were etched by Laser Etching using the same Laser with SF6 etching gas. Dependence on various film deposition conditions and etching conditions was investigated respectively.

• Proceedings of the KIEE Conference
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• 1997.11a
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• pp.336-338
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• 1997

The anneal behavior of ArF excimer Laser CVD SiON films has been studied using FT-IR absorption spectroscopy. The anneal temperature range was $400{\sim}800^{\circ}C$ Abundant hydrogen effusion from thes layers was observed as anneal temperature increased. The coexistence of both Si-H am N-H bonds offers the possibility for cross linking am evidence for the occurrence of cross lingking was found in the IR spectrum. The electrical properties were also obtained that tire films have low leakage currents am good TZDB properties.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2003.10a
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• pp.434-438
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• 2003

XeCl 엑시머 레이저로 펌핑되는 쌍공진기형 색소레이저와 2단 증폭시스템을 개발하여 원격계측 시스템에 적합한 두 개의 파장을 동시 또는 순차적으로 출력하였다. 개발된 쌍공진기는 1200 g/mm의 회절격자를 갖는 grazing-incidence 방법에서 제 1차 및 제 2차 회절차수를 이용하여 구성되었다. 출력특성은 스펙트럼 선폭이 10 pm이하이고, 펌프 에너지에 대하 전체효율은 6% 이상이다. 또한, 파장가변 영역은 제 1차 및 제 2차의 회절차수에 대해 각각 434-470 nm, 436-468 nm 이며, 2단의 증폭기의 증폭이득은 37dB, 추출효율은 9%이다. 개발된 레이저 증폭시스템에서 Coumarine-450의 색소로 발진하고, 이의 출력 6 mJ을 원격계측시스템에 적용하여 수원상공의 NO$_2$의 가스농도분포를 측정하였다. 이 결과 개발된 색소레이저 시스템은 원격계측 시스템의 광원으로 매우 적합함을 확인하였다.

• Proceedings of the KIEE Conference
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• 2002.07c
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• pp.1612-1614
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• 2002

본 논문에서는 엑시머 레이저 조사에 의한 이온 농도의 분포 변화를 알아보기 위해 붕소 이온이 선택적으로 주입된 비정질 실리콘 박막 위에 XeCl (${\lambda}$=308nm) 엑시머 레이저를 조사하여 붕소이온의 수평 확산 현상을 관찰하였다. 도핑 농도의 분포를 알아보기 위해 불산/질산 용액에 의한 고농도 도핑 영역의 습식 식각을 이용하여 약 $10^{18}/cm^3$ 이하의 붕소이온을 가지는 실리콘 박막의 형태를 전자주사 현미경을 이용해서 관찰하였다. 실험 결과, $200mJ/cm^2$의 레이저 에너지가 조사될 경우, 약 100nm의 수평 확산이 일어났음을 확인 할 수 있었다.