• 한국산업보건학회지
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• 제9권1호
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• pp.112-124
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• 1999

The purposes of this study were to provide the data for composition of ethylene glycol ethers and 2-ethoxyethyl acetate(EEA) exposure assessment of workers in various industrial operations. In this study, 80 thinners were analyzed to identify their composition and the air concentration of 2-ethoxyethyl acetate(EEA) and urinary 2-ethoxyacetic acid(EAA) were measured. In this study the subjects were the total of 183 drawn from 98 workers who were occupationally exposed to EEA and 85 workers who were not. The results were as follows: 1. There were found average 4.2 components in each thinner. 2. There were 90 components(26.9%) in ethylene glycol ethers of total of 334 detected organic solvents 3. Ethoxyethyl acetate, ethoxyethanol, buthoxyethanol, methoxy-ethanol were found in 30(37.5%), 27(33.8%), 19(23.8%), 2thinners(2.5%), respectively and their contents were average 18.5%. 4. Benzene was found 8 thinners(10.0%) of the total 80 surveyed. 5. In the electronic painting workers EEA exposure concentration was the highest, as showed 2.88ppm(0.01~15.1ppm), cases of exceeded threshold limit value(TLV=5ppm) were 7(10.6%) workers among the total of 98 exposed workers. 6. The geometric mean of urinary EEA in exposed workers was 1.61 mg/gcreatinine, and was higher than that of workers who were not exposed. In the electronic painting workers and offset printers, the geometric mean of urinary EAA was the highest showing 2.8 mg/gcreatinine. 7. The correlation coefficient between urinary concentration of EAA and air concentration of EEA was 0.90(P<0.05). The present results suggest that composition of ethylene glycol ethers in thinners must be evaluated when industrial hygiene surveys and biological monitoring are performed.

• 한국응용과학기술학회지
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• 제30권1호
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• pp.116-126
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• 2013

Glycol ethers는 페인트에 흔히 사용되는 ethylene glycol의 alkyl ethers에 기반을 둔 용제들이다. 이 용제들은 일반적으로 저분자량 에테르와 알코올의 용제 친화적 성질과 더불어 더 높은 비등점을 가지고 있다. Union Carbide Corp.는 "Glycol ethers"를 하나의 미국 상표로 등록했으며, 이는 제약, 자외선차단제, 화장품, 잉크, 염료 및 수성페인트에서 찾아볼 수 있다. 반면 glycol ethers는 그리스 제거제, 세제, 에어로졸 페인트와 접착제에서도 발견된다. 대부분의 glycol ethers는 수용성, 생분해성이며, 아주 적은 수의 glycol ethers만이 유독성이라고 여겨진다. 그러므로 glycol ethers는 환경에 부작용을 낳을 것 같지는 않다. 최근 연구는 glycol ethers에 작업상 노출되는 것이 남성 정자의 저 운동성과 연관이 되어 있다고 제시했지만, 이는 다른 이들에 의해 반박되어지고 있다. 본 연구에서는 3가지 종류의 glycol ethers의 피부침투성에 관해 용제와 세제의 조합을 사용하여 시험관을 통해 연구한다. Methyl glycol ethers, ethyl glycol ethers and butyl glycol ethers의 흡수는 쥐의 피부를 통해 시험관에서 측정되었다. Epidermal membranes는 Franz diffusion cells에 세워졌으며, 그들의 PBS 침투율은 glycol ethers가 epidermal surface에 적용되기 전, 피부의 보전을 위해 처리하였다. 개별 glycol ethers의 흡수율은 최대 흡수 파장(${\lambda}_{max}$)에서 흡광도를 측정하여 결정하였으며, 침투율의 측정은 esters와의 접촉을 이유로 장벽 기능 내 불가역 변화를 정량화하였다. 시험관 실험 결과 glycol ethers의 종류는 methyl glycol ethers > ethyl glycol ethers > butyl glycol ethers의 순에 따라 빠르게 나타났다. 피부침투는 저분자량 피부침투, 친수성과 같은 화학적구조의 차이에서 유익했다. 이는 분배계수와 용해 방법 및 수동확산이 전달이 고려되는 곳에서 속도를 올렸기 때문이다.

• 한국응용과학기술학회지
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• 제7권1호
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• pp.49-62
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• 1990

In order to synthesize N,N-di-(polyoxyethylene) perfluoroacyl amines and the surface active monoperfluoroacyl aza crown ethers, it is performed as follow. Six of N,N-di(polyoxyethylene) perfluoro acyl amines were synthesized from perfluoroalkanoic acids with ethanol followed by oxyethylation with triethylene glycol mono chloride or tetra ethylene glycol mono chloride and six of N-perfluor acyl monoaza crown ethers by cyclization of corresponding N,N-di(polyoxy ethylene} perfluoro acyl amines with p-toluene suflonic chloride-NaOH/dioxane, p-toluene sulfonyl chloride KOH/dioxane and benzene sulfonic chloride-KOH/dioxane systems.

• Bulletin of the Korean Chemical Society
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• 제27권5호
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• pp.718-724
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• 2006

The heterogeneous association behaviour of various concentration binary mixtures of mono alkyl ethers of ethylene glycol with ethyl alcohol were investigated by dielectric measurement in benzene solutions over the entire concentration range at 25 ${^{\circ}C}$. The values of static dielectric constant $\epsilon_0$ of the mixtures were measured at 1 MHz using a four terminal dielectric liquid test fixture and precision LCR meter. The high frequency limiting dielectric constant $\epsilon_\infty$ values were determined by measurement of refractive index $n_D$ ($\epsilon_\infty\;=\;n_D\;^2$). The measured values of $\epsilon_0$ and $\epsilon_\infty$ were used to evaluate the values of excess dielectric constant $\epsilon^E$, effective Kirkwood correlation factor $g^{eff}$ and corrective correlation factor $g_f$ of the binary polar mixtures to obtain qualitative and quantitative information about the H-bond complex formation. The non-linear behaviour of the observed $\epsilon_0$ values of the polar molecules and their mixtures in benzene solvent confirms the variation in the associated structures with change in polar mixture constituents concentration and also by dilution in non-polar solvents. Appearance of the maximum in $\epsilon^E$ values at different concentration of the polar mixtures suggest the formation of stable adduct complex, which depends on the molecular size of the mono alkyl ethers of ethylene glycol. Further, the observed $\epsilon^E$ < 0 also confirms the heterogeneous H-bond complex formation reduces the effective number of dipoles in these polar binary mixtures. In benzene solutions these polar molecules shows the maximum reduce in effective number of dipoles at 50 percent dilutions. But ethyl alcohol rich binary polar mixtures in benzene solvent show the maximum reduce in effective number of dipoles in benzene rich solutions.

• 대한화장품학회지
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• 제19권1호
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• pp.108-126
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• 1993

유화, 가용화, 겔화 등의 화장품 제형에서 폴리옥시에칠렌 토코페릴에테르의 기능에 대해 연구하였다. Liquid paraffin의 유화에 있어서 POE(10)TE는 O/W 유화에서 우수한 유화능을 나타내었다. W/o 및 O/W 유화에서 oil 과 polyol 류의 함량 증가가 점도에 미치는 영향에 대해서도 연구하였다. O/W 유화에서 점도는 liquid paraffin 약 70% 함량에서 급격히 증가하기 시작하였으며, propylene glycol 첨가시는 약간의 증가만 나타내었다. 그러나 W/O 유화에서 점도는 liquid paraffin의 함량 증가에 따라 감소하였고, propylene glycol함량 증가에 대해서도 감소하는 경향을 나타내었다. Perfume oil의 가용화에 있어서 POE(18)TE는 우수한 가용화능을 나타내었다. Poe(n)TE의 gelling effect는 폴리옥시에칠렌의 사슬의 증가에 따라 50 mol 까지는 상승하는 현상을 나타내었다.

• 한국산업보건학회지
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• 제26권1호
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• pp.1-10
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• 2016

Objectives: The aim of this study is to review the results of exposure to chemicals and to extremely low frequency(ELF) magnetic fields generated in wafer fabrication operations in the semiconductor industry. Methods: Exposure assessment studies of silicon wafer fab operations in the semiconductor industry were collected through an extensive literature review of articles reported until the end of 2015. The key words used in the literature search were "semiconductor industry", "wafer fab", "silicon wafer", and "clean room," both singly and in combination. Literature reporting on airborne chemicals and extremely low frequency(ELF) magnetic fields were collected and reviewed. Results and Conclusions: Major airborne hazardous agents assessed were several organic solvents and ethylene glycol ethers from Photolithography, arsenic from ion implantation and extremely low frequency magnetic fields from the overall fabrication processes. Most exposures to chemicals reported were found to be far below permissible exposure limits(PEL) (10% < PEL). Most of these results were from operators who handled processes in a well-controlled environment. In conclusion, we found a lack of results on exposure to hazardous agents, including chemicals and radiation, which are insufficient for use in the estimation of past exposure. The results we reviewed should be applied with great caution to associate chronic health effects.