• 전자공학회논문지D
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• 제34D권3호
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• pp.87-92
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• 1997

Inductively coupled Cl$_{2}$ plasma has been studied to etch Pt thin films, which hardly form volatile compound with any reactive gas at normal process temperature. Low etch rate and residue problems are frequently observed. For higher etch rate, high density plasma and higher process temperature is adopted observed. For higher etch rate, high density plasma and higher process temperature is adopted and thus SiO$_{2}$ is used as for patterning mask instead of photoresist. The effect of O$_{2}$ or Ar addition to Cl$_{2}$ was investigated, and the chamber pressure, gas flow rate, surce RF power and bias RF power are also varied to check their effects on etch rate and selectivity. The major etching mechanism is the physical sputtering, but the ion assisted chemical raction is also found to be a big factor. The proposs can be optimized to obtain the etch rate of Pt up to 200nm/min and selectivity to SiO$_{2}$ at 2.0 or more. Patterning of submicron Pt lines are successfully demonstrated.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1995년도 추계학술대회 논문집 학회본부
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• pp.326-328
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• 1995

SiC buffer layers were grown on Si(100) substrates by ultra-high-vacuum electron cryclotron resonance plasma (UHV ECR plasma) from $CH_4/H_2$ mixture at 700$^{\circ}C$. The electron densities and temperature were measured by single probe. The axial plasma potentials measured by emissive probe had the double layer structure at positive substrate bias. Piranha cleaning was carried out as ex-situ wet cleaning. Clean and smooth silicon surface were prepared by in-situ hydrogen plasma cleaning at 540$^{\circ}C$. A short exposure to hydrogen plasma transforms the Si surface from 1$\times$1 to 2$\times$1 reconstruction. It was monitored by reflection high energy electron diffraction (RHEED). The defect densities were analysed by the dilute Schimmel etching. The results showed that the substrate bias is important factor in hydrogen plasma cleaning. The low base pressure ($5\times10^{-10}$ torr) restrains the $SiO_2$ growth on silicon surface. The grown layers showed different characteristics at various substrate bias. RHEED and K-ray Photoelectron spectroscopy study showed that grown layer was SiC.

• 한국진공학회지
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• 제18권5호
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• pp.390-393
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• 2009

유기물 기반의 전자 소자에서 소자간의 전기적인 전류 흐름 및 기생저항 등을 차단하기 위하여 표면 에너지를 이용한 새로운 패터닝 기법을 제안하였다. 소수성의 perfluoro-alkyl fluorosilanes을 플라즈마 이온 에칭을 이용하여 선택적으로 친수성으로 변환한 뒤 wettability 현상을 통해 유기 물질을 자동 패터닝 하였다. 또한 이 기법을 이용하여 $V_{oc}$ (open circuit voltage): 482 mV, $J_{sc}$ (short circuit current density): 2.4 mA/$cm^2$, FF (Fill factor): 0.58, $\eta$ (Efficiency): 0.95 % 의 특성을 보이는 bulk-이종접합 유기 태양 전지 소자를 제작하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.109-110
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• 2007

Plasma etching process에서 magnetic field 영향에 관한 연구이다. High level dry etch process를 위해서는 high density plasma(HDP)가 요구된다. HDP를 위해서 MERIE(Magnetical enhancement reactive ion etcher) type의 설비가 사용되며 process chamber side에 4개의 magnetic coil을 사용한다. 이런 magnetic factor가 특히 wafer edge부문에 plasma charging에 의한 damage를 유발시키고 이로 인해 device Vth(Threshold voltage)가 shift 되면서 제품의 program 동작 문제의 원인이 되는 것을 발견하였다. 이번 연구에서 magnetic field와 관련된 plasma charge damage를 확인하고 damage free한 공정조건을 확보하게 되었다.

• 한국재료학회지
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• 제4권5호
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• pp.590-599
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• 1994

취성재료의 균열첨단에서 전위의 이동에 대한 거동을 이해하기 위하여 단결정의 알루미나에 대한 취성-연성 전이(BDT)에 대한 한 연구가 진행되었다. 여러 온도에서, 예비균열된 시편으로 4점 굽힘시험을 이용하여 임계응력확대계수와 항복강도가 측정되었다. 그 결과로, BDT온도는 변형속도와 시편 방향에 따라 달랐다.:(1120)파단면에 대하여 $4.2 \times 10^{-6}$와 $4.2 \times 10^{-7}s^{-1}$에서 BDT온도는 각각$1034^{\circ}C$, $1150^{\circ}C$이었다. 또한 4점굽힘 시험을 이용하여 연성영역에서 균열첨단으로 부터 방출된 전위의 이동거리과 방향은 에칭 피트법에 의해서 측정되었다. 이중 에칭법을 이용하여 즉정된 사파이어에서 전위의 이동속도는 모델링 연구에 응용되었다.

• 대한치과보철학회지
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• 제43권3호
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• pp.393-408
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• 2005

Statement of problem. In the process of bone formation, titanium (Ti) surface roughness is an important factor modulating osteoblastic function. Purpose. This study was carried out to determine the effect of different Ti surface on biologic responses of a human osteoblast-like cell line (MG63). Materials and methods. MG63 cells were cultured on S (smooth), SLA (sandblasted largegrit & acid etching), HA (hydroxyapatite) Ti. The morphology and attachment of the cells were examined by SEM. The cDNAs prepared from total RNAs of MG63 were hybridized to a human cDNA microarray (1,152 elements). Results. The appearances of the surfaces observed with SEM were different in the three types of dental substrates. The surface of SLA and HA were shown to be rougher than S. MG63 cells cultured on SLA and HA were cell-matrix interaction. In the expression of genes involved in osseointegration, upregulated genes were bone morphogenetic protein, Villin, Integrin, Insulin-like growth factors in different surfaces. Downregulated genes were fibroblast growth factor receptor 4, Bcl 2-related protein, collagen, CD4 in different surfaces. Conclusion. The attachment and expression of key osteogenic regulatory genes were enhanced by surface roughness of the dental materials.

• 소성∙가공
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• 제15권1호
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• pp.3-8
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• 2006

The demand fer small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased by using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable fur mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-replication process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the surface profiles of master, mold and molded pattern were measured by optical scanning profiler. The geometrical deviation between the master and the molded DOE was less than $0.1{\mu}m$. The diffraction efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

• The Journal of Advanced Prosthodontics
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• 제2권1호
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• pp.18-24
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• 2010

PURPOSE. The aim of this pilot study was to investigate the effect of etched microgrooves on the hydrophilicity of Ti and osteoblast responses. MATERIAL AND METHODS. Microgrooves were applied on Ti to have 15 and $60{\mu}m$ width, and 3.5 and $10{\mu}m$ depth by photolithography, respectively. Further acid etching was applied to create Ti surfaces with etched microgrooves. Both smooth- and acid-etched Ti were used as the controls. The hydrophilicity of Ti was analyzed by determining contact angles. Cell proliferation and osteogenic activity of MC3T3 mouse preosteoblasts were analyzed by bromodeoxyuridine assay and alkaline phosphatase (ALP) activity test, respectively. One-way ANOVA, Pearson's correlation analysis and multiple regression analysis were used for statistics. RESULTS. Etched microgrooves significantly increased the hydrophilicity of Ti compared to the smooth Ti. $60{\mu}m$-wide etched microgrooves significantly enhanced cell proliferation, whereas the osteogenic activity showed statistically non-significant differences between groups. Result of the osteogenic activity significantly correlated with those of hydrophilicity and cell proliferation. Hydrophilicity was determined to be an influential factor on osteogenic activity. CONCLUSION. This study indicates that increase in hydrophilicity of Ti caused by etched microgrooves acts as an influential factor on osteogenic activity. However, statistically non-significant increase in the ALP activity suggests further investigation.

• 한국소성가공학회:학술대회논문집
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• 한국소성가공학회 2005년도 금형가공,미세가공,플라스틱가공 공동 심포지엄
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• pp.35-40
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• 2005

The demand for small and high-capacity optical data storage devices has rapidly increased. The areal density of optical disk is increased using higher numerical aperture objective lens and shorter wavelength source. A wafer-scale stacked micro objective lens with a numerical aperture of 0.85 and a focal length of 0.467mm for the 405nm blue- violet laser was designed and fabricated. A diffractive optical element (DOE) was used to compensate the spherical aberration of the objective lens. Among the various fabrication methods for micro DOE, the UV-replication process is more suitable for mass-production. In this study, an 8-stepped DOE pattern as a master was fabricated by photolithography and reactive ion etching process. A flexible mold was fabricated for improving the releasing properties and shape accuracy in UV-molding process. In the replication process, the effects of exposing time and applied pressure on the replication quality were analyzed. Finally, the shapes of master, mold and molded pattern were measured by optical scanning profiler. The deviation between the master and the molded DOE was less than 0.1um. The efficiency of the molded DOE was measured by DOE efficiency measurement system which consists of laser source, sample holder, aperture and optical power meter, and the measured value was $84.5\%$.

• 한국결정성장학회지
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• 제2권1호
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• pp.10-19
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• 1992

Soft Ferrites 가운데 대표적인 자성재료로써 최근에 개발된 Mn-Zn Ferrite는 높은 초기투자율과 포화자속밀도, 낮은 손실계수를 갖고 있으며 또한, 단결정으로써의 기계적 특성이 우수하며 VTR Head의 소재로 사용되는 중요한 전자부품이다. melt를 수용하는 도가니를 사용치 않아 결정으로의 불순물 침입이 없으며 halogen lamp로부터 방출된 적외선을 열원으로 하여 한 곳에 초점을 이루어 온도구배를 크게 유지하여 결정성장을 이루는 Floating Zone(FZ)법에 의해 Ar 및 $O_2$혼합가스 분위기 하에서 직경 8mm의 Mn-Zn Ferrite 단결정을 육성하였다. 성장 중 용융대에서의 최고온도는 $1650^{\circ}C$ 온도를 유지하였고 결정성장 속도는 10mm/hr, 회전속도는 20 rpm 이었으며 성장방위를 확인하기 위해 Laue 분석 및 XRD, TEM을 이용, 결정의 상등을 분석하였으며 화학적인 etching을 하여 광학현미경을 통해 etch pits 형상을 관찰하였다. 그리고 양질의 결정을 얻기 위해 원료봉 직경에 따른 결정화 속도와 적정한 melt직경과 길이에 대한 상관관계를 찾아내었고 또한 성장계면의 양상에 대해 고찰하였다.