Hydrogeneted Amorphous Carbon Nitride Films on Si(100) Deposited by DC Saddle Field Plasma Enhanced Chemical Vapor Deposition
($N_2/CH_4$ 가스비에 따른 Hydrogenated Amorphous Carbon Nitride 박막의 특성)
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- Journal of the Korean Vacuum Society
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- v.7 no.3
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- pp.242-247
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- 1998