• Title/Summary/Keyword: Energy Deposition

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Study on Effects of Direct Laser Melting Process Parameters on Deposition Characteristics of AlSi12 powders (AlSi12 분말의 직접 레이저 용융 적층 시 공정 조건에 따른 적층 특성에 관한 연구)

  • Seo, J.Y.;Yoon, H.S.;Lee, K.Y.;Shim, D.S.
    • Transactions of Materials Processing
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    • v.27 no.5
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    • pp.314-322
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    • 2018
  • AlSi12 is a heat-resistant aluminum alloy that is lightweight, corrosion-resistant, machinable and attracting attention as a functional material in aerospace and automotive industries. For that reason, AlSi12 powder has been used for high performance parts through 3D printing technology. The purpose of this study is to observe deposition characteristics of AlSi12 powder in a direct energy deposition (DED) process (one of the metal 3D printing technologies). In this study, deposition characteristics were investigated according to various process parameters such as laser power, powder feed rate, scan speed, and slicing layer thickness. In the single track deposition experiment, an irregular bead shape and balling or humping of molten metal were formed below a laser power of 1,000 W, and the good-shaped bead was obtained at 1.0 g/min powder feed rate. Similar results were observed in multi-layer deposition. Observation of deposited height after multi-layer deposition revealed that over-deposition occurred at all conditions. To prevent over-deposition, slicing layer thickness was experimentally determined at given conditions. From these results, this study presented practical conditions for good surface quality and accurate geometry of deposits.

A Study on the Characteristics of Laser Deposition Surface and Cross-section for Metal Powder (금속 분말의 레이저 적층 시 표면 및 단면 특성에 관한 연구)

  • Hwang, Jun-Ho;Shin, Seong-Seon;Jung, Gu-In;Kim, Sung-Wook;Kim, Hyun-Deok
    • Journal of Welding and Joining
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    • v.34 no.4
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    • pp.17-22
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    • 2016
  • In this study, we compared the physical and chemical properties evaluation for each size in the SUS316L metal powder produced by water atomization and gas atomization. and we analyzed the experimental data in order to find the basis of a suitable metal powder (SUS316L) for DED (Direct Energy Deposition) processing. Also it evaluated the properties of each layered surface and cross section according to the number of deposition and deposition speed. In the result of optical microscopy measurements, the metal powder by water atomization was the crack generated between the deposition layer, the deposition layer was poor quality. However, metal powder by gas atomization was obtained a relatively good deposition results than metal powder by water atomization.

Development of the Natural Gas Burner for Modified Chemical Deposition Processes (화학증착용 천연가스버너 개발)

  • You, Hyun-Seok;Lee, Joong-Seong;Han, Jeong-Ok;Choi, Dong-Soo
    • 한국연소학회:학술대회논문집
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    • 2001.06a
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    • pp.75-81
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    • 2001
  • MCVD(modified chemical vapor deposition) used in making optical-fiber currently utilizes the hydrogen-oxygen burner as a energy supply source. To improve the productivity and to reduce the manufacturing cost of optical-fiber, a natural gas-oxygen burner has been developed. The manufacturing processes of optical-fiber consist of vapor deposition, collapse and drawing processes. Among these processes, the vapor deposition and the collapse processes are important in terms of improving the productivity and saving the production cost. The vapor deposition and collapse processes are performed by combustion heat and flame force supplied by a burner. So the flame force of the burner used in these processes is required to have an optimal and consistent value in order to allow uniform heating and collapse of quartz tube. In this regard, the momentum ratio of natural gas and oxygen has been optimally determined by modification of a burner and the inlet flow pass also has been modified.

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Studies on Film Growth and Mechanical Properties of TiN by Chemical Vapor Deposition (화학증착에 의한 TiN 박막의 제조 및 기계적 성질에 관한 연구)

  • 김시범;김광호;천성순
    • Journal of the Korean Ceramic Society
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    • v.26 no.1
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    • pp.21-30
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    • 1989
  • Titanium Nitride (TiN) was deposited onto the SKH9 tool steels by chemical vapor deposition (CVD) using a gaseous mixture of TiCl4, N2, and H2. The effects of the deposition temperature and input gas composition on the deposition rate, microstructure, preferred orientation, microhardness and wear resistance of TiN deposits were studied. The experimental results showed that the TiN deposition is thermally activated process with an apparent activation energy of about 27Kcal/mole in the temperature range between 1200$^{\circ}$K and 1400$^{\circ}$K. As H2/N2 gas input ratio increased, the deposition rate increased, showed maximum at H2/N2 gas input ratio of 1.5 and then decreased. Mechanical properties such as microhardness and wear resistance have close relation with the microstructure and preferred orientation of TiN deposits. It is suggested that the equiaxed structure with random orientation increases the microhardness and wear resistance of TiN deposits.

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Studies on Electroless Nickel Plating on Alumina Ceramics(I) on Empirical Deposition Rate in Electroless Nickel Plating (알루미나 세라믹스 표면에 무전해 환원 니켈막의 형성에 관한 연구(I) 무전해 니켈도금의 실험적 석출속도에 관한 연구)

  • Kim, Yong-Dai;Lee, Joon
    • Journal of the Korean institute of surface engineering
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    • v.19 no.3
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    • pp.109-120
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    • 1986
  • The electroless nickel plating on high alumina ceramics was performed in the bath containing nickel chloride, sodium hypophosphite and mono- or bi-carboxylic acid as a complexing agent in order to examine the empirical rate law as well as the effects of the complexing agent, plating temperature and pH on the rate of deposition. Adding the carboxylic acid to the plating bath, the rate of deposition was increased considerably, and each of the complexing agents showed a maximum deposition rate plateau around a particular concentration of the complexing agent. The rate of deposition was increased with increasing either temperature or pH, but microstructure of the surface became more rough. Furthermore, empirical rate law of the elecltroless nickel deposition on high alumina ceramics was discussed with the activation energy and other rate parameters calculated.

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Synthesis and characterization of amorphous NiWO4 nanostructures

  • Nagaraju, Goli;Cha, Sung Min;Yu, Jae Su
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.392.1-392.1
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    • 2016
  • Nowadays, research interest in developing the wearable devices are growing remarkably. Portable consumer electronic systems are becoming lightweight, flexible and even wearable. In fact, wearable electronics require energy storage device with thin, foldable, stretchable and conformable properties. Accordingly, developing the flexible energy storage devices with desirable abilities has become the main focus of research area. Among various energy storage devices, supercapacitors have been considered as an attractive next generation energy storage device owing to their advantageous properties of high power density, rapid charge-discharge rate, long-cycle life and high safety. The energy being stored in pseudocapacitors is relatively higher compared to the electrochemical double-layer capacitors, which is due to the continuous redox reactions generated in the electrode materials of pseudocapacitors. Generally, transition metal oxides/hydroxide (such as $Co_3O_4$, $Ni(OH)_2$, $NiFe_2O_4$, $MnO_2$, $CoWO_4$, $NiWO_4$, etc.) with controlled nanostructures (NSs) are used as electrode materials to improve energy storage properties in pseudocapacitors. Therefore, different growth methods have been used to synthesize these NSs. Of various growth methods, electrochemical deposition is considered to be a simple and low-cost method to facilely integrate the various NSs on conductive electrodes. Herein, we synthesized amorphous $NiWO_4$ NSs on cost-effective conductive textiles by a facile electrochemical deposition. The as-grown amorphous $NiWO_4$ NSs served as a flexible and efficient electrode for energy storage applications.

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STUDY ON THE IMPROVEMENT OF LIGHT TRAPPING IN THE SILICON-BASED THIN-FILM SOLAR CELLS (실리콘 박막 태양전지에서 광 포획(light trapping) 개선에 관한 연구)

  • Jeon Sang Won;Lee Jeong Chul;Ahn Sae Jin;Yun Jae Ho;Kim Seok Ki;Park Byung Ok;Song Jinsoo;Yoon Kyung Hoon
    • 한국신재생에너지학회:학술대회논문집
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    • 2005.06a
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    • pp.192-195
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    • 2005
  • The silicon thin film solar cells were fabricated by 13.56 MHz PECVD (Plasma-Enhanced Chemical-Vapor Deposition) and 60 MHz VHF PECVD (Very High-Frequency Plasma-Enhanced Chemical-Vapor Deposition). We focus on textured ZnO:Al films prepared by RF sputtering and post deposition wet chemical etching and studied the surface morphology and optical properties. These films were optimized the light scattering properties of the textured ZnO:Al after wet chemical etching. Finally, the textured ZnO:Al films were successfully applied as substrates for silicon thin films solar cells. The efficiency of tandem solar cells with $0.25 cm^2$ area was $11.8\%$ under $100mW/cm^2$ light intensity. The electrical properties of tandem solar cells were measured with solar simulator (AM 1.5, $100 mW/cm^2)$ and spectral response measurements.

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Electrical Properties of YSZ Electrolyte Film Prepared by Electron Beam PVD (EB-PVD법에 의해 제조된 YSZ 전해질의 전기적 특성)

  • Shin, Tae-Ho;Yu, Ji-Haeng;Lee, Shiwoo;Han, In-Sub;Woo, Sang-Kuk;Hyun, Sang-Hoon
    • Journal of the Korean Ceramic Society
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    • v.42 no.2 s.273
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    • pp.117-122
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    • 2005
  • Electron Beam Physical Vapor Deposition (EB-PVD) is a typical technology for thermal barrier coating with Yttria Stabilized Zirconia (YSZ) on aero gas turbine engine. In this study EB-PVD method was used to fabricate dense YSZ film on NiO-YSZ as a electrolyte of Solid Oxide Fuel Cell (SOFC). Dense YSZ films of -10 $\mu$m thickness showed nano surface structure depending on deposition temperature. Electrical conductivities of YSZ film and electric power density of the single cell were evaluated after screen- printing $LaSrCoO_3$ as a cathode.

Neural Network Modeling of Ion Energy Impact on Surface Roughness of SiN Thin Films (신경망을 이용한 SiN 박막 표면거칠기에의 이온에너지 영향 모델링)

  • Kim, Byung-Whan;Lee, Joo-Kong
    • Journal of the Korean institute of surface engineering
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    • v.43 no.3
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    • pp.159-164
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    • 2010
  • Surface roughness of deposited or etched film strongly depends on ion bombardment. Relationships between ion bombardment variables and surface roughness are too complicated to model analytically. To overcome this, an empirical neural network model was constructed and applied to a deposition process of silicon nitride (SiN) films. The films were deposited by using a pulsed plasma enhanced chemical vapor deposition system in $SiH_4$-$NH_4$ plasma. Radio frequency source power and duty ratio were varied in the range of 200-800 W and 40-100%. A total of 20 experiments were conducted. A non-invasive ion energy analyzer was used to collect ion energy distribution. The diagnostic variables examined include high (or) low ion energy and high (or low) ion energy flux. Mean surface roughness was measured by using atomic force microscopy. A neural network model relating the diagnostic variables to the surface roughness was constructed and its prediction performance was optimized by using a genetic algorithm. The optimized model yielded an improved performance of about 58% over statistical regression model. The model revealed very interesting features useful for optimization of surface roughness. This includes a reduction in surface roughness either by an increase in ion energy flux at lower ion energy or by an increase in higher ion energy at lower ion energy flux.