• Proceedings of the Optical Society of Korea Conference
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• 2009.10a
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• pp.314-315
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• 2009

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.419-419
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• 2012

We fabricated the Polyamide 4,6 (PA46) thin film using Adipoyl chloride and 1,4-butadiamine. PA46 film was grown at $70^{\circ}C$ by Molecular Layer Deposition (MLD) method. MLD is sequential and self-terminating fabrication method for organic thin film. The growth rate of PA46 is $3.5{\acute{\AA}}$ cycle. The thickness of PA46 film was measured by Ellipsometer. Surface morphology of this film was investigated by Atomic Force Microscopy (AFM) and roughness is directly proportional to number of growing cycles.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2006.05a
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• pp.172-176
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• 2006

본 논문에서는 물을 이용한 193nm immersion lithography에서 물이 photoresist(PR)에 흡수되는 현상을 측정하기 위하여 타원해석기(Ellipsometer)의 응용 가능성을 연구하였다. 물이 PR 에 흡수됨에 따라 swelling 현상이 발생하여 두께 증가로 나타났는데 이는 실시간 타원해석기를 적용하여 시간에 따른 두께 변화를 분석함으로써 그 반응정도를 분석해 낼 수 있었다. 또한 짧은 시간에 발생하는 물의 흡수 현상은 imaging 타원해석기론 이용하여 규명할 수가 있었다.

• Proceedings of the Optical Society of Korea Conference
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• 2001.02a
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• pp.260-261
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• 2001

일반적으로 상업화된 타원계는 회전 검광자(회전 편광자), 혹은 위상변조방식이 주를 이루고 있다. 회전 검광자나 위상변조방식의 타원계는 모터를 회전시키거나 위상을 변조시키는 방법에 의존하므로 하나의 타원상수쌍 ( ,Ψ)를 얻는데 수십 $\mu\textrm{s}$ - 수십 ms의 측정시간을 필요로 한다. 그러나, 예를 들어 상변화형 광기록매체인 Ge$_2$Sb$_2$Te$_{5}$(GST)와 같이 수십 ns 시간간격으로 비정질상과 결정상이 변화하면서 정보 데이터를 저장하거나 소거하게 되는 경우 비정질상에서 결정상으로 바뀌는 과정의 결정화과정을 측정하고 분석하기 위해서는 수 ns로 측정할 수 있는 장비가 필요하다. (중략)

• Proceedings of the Optical Society of Korea Conference
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• 2008.07a
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• pp.377-378
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• 2008

• Journal of the Korean institute of surface engineering
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• v.22 no.4
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• pp.215-220
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• 1989

Silicon Nitride whose thickness is about $100\AA$by the ellipsometer was successfully formed by the Plasma reaction. Nitrogen Plasma was formed by applying the 200KHz, 500Watt power between the two electroes and nitridation of silicon was carried out directly on the top of the silicon wafer. Thus Silicon Nitride formed was oxidized to from oxynitrides and their electrical characterlstice were analyzed by measuring I-V curves and capacitances. Through ESCA depth profiles, the chemical composition changes before and after the oxidation wers analyzed.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.388-388
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• 2010

Molybdenum oxide thin films were deposited on p-type Si(100) by an RF magnetron sputtering method. The physical and chemical properties of these films were studied with X-ray diffraction (XRD) and X-ray photoelectron spectroscopy (XPS) techniques. The thickness of molybdenum oxide thin films was measured by spectroscopic ellipsometer (SE) and the thickness was about 200 nm. As the oxygen gas pressure increased, the thickness was decreased, the phases of the thin films were changed, and the amount of metallic Mo decreased but the contents of $Mo^{6+}$ species increases.

• Proceedings of the Optical Society of Korea Conference
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• 2003.07a
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• pp.32-33
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• 2003

광학박막을 제작하는 많은 방법 중에서 이온빔 보조 증착방법은 이온빔을 사용해 박막에 운동량을 전달하여 주고 반응 이온빔의 산화를 촉진시켜주는 장점이 있으며, 스퍼터링은 증착입자의 에너지가 높아서 조밀하한 박막을 제작할 수 있다 그러나 단점으로 이온빔 보조 증착의 경우 증착입자가 낮은 에너지를 갖으며, 높은 에너지를 사용하는 경우 고가의 장비가 필요하게 된다. 그리고 스퍼터링의 경우 낮은 압력하에서 증착됨으로 증착률이 낮다. (중략)

• Journal of Korean Ophthalmic Optics Society
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• v.10 no.4
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• pp.267-272
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• 2005

We deposited thin films of organic light-emitting-material $Alq_3$(alumina quinoline) on silicon and slide-glass substrates using thermal evaporation method, and measured spectra of ellipsometry angles ${\Delta}$ and ${\Psi}$ in the photon-energy range of 1.5~5.0 eV using a variable angle spectroscopic ellipsometer. The optical constants, refractive index and extinction coefficient, of $Alq_3$ were determined via the dispersion parameters extracted from the curve-fitting process based on Jellison-Modine dispersion function. The reliability of determined optical constants were verified through the comparison of measured and simulated transmittance curves and the good agreement between simulated absorption-coefficient curves and absorbance spectra measured using a spectrophotometer.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.304.2-304.2
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• 2016

Hafnium oxide-aluminum oxide (HfO2-Al2O3) dielectric films have been fabricated by Pulsed Laser Deposition (PLD), and their properties are studied in comparison with HfO2 films. As a gate dielectric of the TFT, in spite of its high dielectric constant, HfO2 has a small energy band gap and microcrystalline structure with rough surface characteristics. When fabricated by the device, it has the drawback of generating a high leakage current. In this study, the HfAlO films was obtained by Pulsed Laser Deposition with HfO2-Al2O3 target(chemical composition of (HfO2)86wt%(Al2O3)14wt%). The characteristics of the thin Film have been investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and spectroscopic ellipsometer (SE) analyses. The X-ray diffraction studies confirmed that the HfAlO has amorphous structure. The RMS value can be compared to the surface roughness via AFM analysis, it showed HfAlO thin Film has more lower properties than HfO2. The energy band gap (Eg) deduced by spectroscopic ellipsometer was increased. HfAlO films was expected to improved the interface quality between channel and gate insulator. Apply to an oxide thin Film Transistors, HfAlO may help improve the properties of device.