• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2002년도 춘계학술대회 논문집
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• pp.968-971
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• 2002

Two decisive mechanisms of the electrorhological polishing for a small part(for example, a aspherical surface in a micro lens) are explained. Firstly, non-uniform electric field generated in the polishing structure increases a shear stress of ER fluids which is maximized dramatically near the tool, therefore, substrate adjacent to the tool can be removed effectively by mixed abrasives in the ER fluid. Secondly, abrasives in a non-uniform electric field are governed by the dielectrophoretic phenomena. Abrasives move toward the tool because the field gradient is highest near the tool and then abrasives are actively holded in that area. This phenomena is observed and evaluated by the optical measurement.