• Title/Summary/Keyword: Electronic devices

Search Result 4,580, Processing Time 0.028 seconds

Direct Growth of Patterned-Graphene Using PVP Nanowire Shadow Mask (PVP 나노와이어를 활용한 패턴된 그래핀의 직성장)

  • Eunho Lee;Daesuk Bang
    • Journal of Adhesion and Interface
    • /
    • v.24 no.4
    • /
    • pp.120-123
    • /
    • 2023
  • Graphene, with its exceptional mechanical and electrical properties, has gained significant attention from researchers due to its superior characteristics compared to conventional materials. However, the application of graphene in electronic devices requires a crucial transcription and patterning process, which often introduces numerous defects, substantially impairing its properties. To overcome this limitation and unlock the full potential of graphene for commercial use, there have been various efforts to develop integrated processes for transcription and patterning. In this study, we present a novel growth method that simultaneously achieves precise patterning using polymer nanowires as masks, allowing for the direct growth of graphene. This innovative approach holds promise for realizing advanced electronic components based on nanomaterials in the future.

A Study on Thin-Film Silicon Solar Cells with Multi-Architecture Etching Technique to Improve Light Trapping (광 포획 향상을 위한 다중 아키텍처 식각 기술을 적용한 박막 실리콘 태양전지에 관한 연구)

  • Hyeong Gi Park;Junsin Yi
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.37 no.3
    • /
    • pp.337-344
    • /
    • 2024
  • This work focuses on improving the light-harvesting efficiency of thin-film silicon solar cells through innovative multi-architecture surface modifications. To create a regular optical structure, a lithographic process was performed to form it on a glass substrate through various etching processes, from Etch-1 to Etch-3. AZO was deposited on top of the structures and re-etched to create a multi-architectural surface. These surface-modified structures improved the light absorption and overall performance of the solar cell through changes in optical and physical properties, which we will analyze. In addition, we investigated the effect of post-cleaning on the etched glass structures through EDX analysis to understand the mechanism of the etching action. The results of this study are expected to provide important guidelines for the design and fabrication of solar cells and other photovoltaic devices.

Thermal Distribution Analysis in Nano Cell OLED (나노 셀 OLED의 열 분포 해석)

  • Kyung-Uk Jang
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.37 no.3
    • /
    • pp.309-313
    • /
    • 2024
  • The key to determining the lifetime of OLED device is how much brightness can be maintained. It can be said that there are internal and external causes for the degradation of OLED devices. The most important cause of internal degradation is bonding and degradation in the excited state due to the electrochemical instability of organic materials. The structure of OLED modeled in this paper consists of a cathode layer, electron injection layer (EIL), electron transport layer (ETL), light emission layer, hole transport layer (HTL), hole injection layer (HIL), and anode layer on a glass substrate from top to bottom. It was confirmed that the temperature generated in OLED was distributed around the maximum of 343.15 K centered on the emission layer. It can be seen that the heat distribution generated in the presented OLED structure has an asymmetrically high temperature distribution toward the cathode, which is believed to be because the sizes of the cathode and positive electrode are asymmetric. Therefore, when designing OLED, it is believed that designing the structures of the cathode and anode electrodes as symmetrically as possible can ensure uniform heat distribution, maintain uniform luminance of OLED, and extend the lifetime. The thermal distribution of OLED was analyzed using the finite element method according to Comsol 5.2.

Humidity Dependence Removal Technology in Oxide Semiconductor Gas Sensors (산화물 반도체 가스 센서의 습도 의존성 제거 기술)

  • Jiho Park;Ji-Wook Yoon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.37 no.4
    • /
    • pp.347-357
    • /
    • 2024
  • Oxide semiconductor gas sensors are widely used for detecting toxic, explosive, and flammable gases due to their simple structure, cost-effectiveness, and potential integration into compact devices. However, their reliable gas detection is hindered by a longstanding issue known as humidity dependence, wherein the sensor resistance and gas response change significantly in the presence of moisture. This problem has persisted since the inception of oxide semiconductor gas sensors in the 1960s. This paper explores the root causes of humidity dependence in oxide semiconductor gas sensors and presents strategies to address this challenge. Mitigation strategies include functionalizing the gas-sensing material with noble metal/transition metal oxides and rare-earth/rare-earth oxides, as well as implementing a moisture barrier layer to prevent moisture diffusion into the gas-sensing film. Developing oxide semiconductor gas sensors immune to humidity dependence is expected to yield substantial socioeconomic benefits by enabling medical diagnosis, food quality assessment, environmental monitoring, and sensor network establishment.

Controlled Synthesis of Colloidal Cu Nanowires and Nanoplates and Their Tunable Localized Surface Plasmon Resonances

  • Seokhwan Kim;Jong Wook Roh;Dong Choon Hyun;Seonhwa Park;Yuho Min
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.37 no.5
    • /
    • pp.547-553
    • /
    • 2024
  • Precise control over the morphology of nanostructures is critical for tailoring their physical and chemical properties. This study addresses the challenge of developing a simple, integrated method for synthesizing both 1D and 2D colloidal Cu nanostructures in a single system, achieving successful tuning of their localized surface plasmon resonance (LSPR) properties. A facile hydrothermal synthesis utilizing potassium iodide (KI) and hexadecylamine (HDA) is presented for controlling Cu nanostructure morphologies. The key to achieving 1D nanowires (NWs) and 2D nanoplates (NPs) depends on the controlled adsorption of HDA molecules and iodide (I-) ions on specific crystal facets. Depending on the morphologies, the resultant Cu nanostructures exhibit tunable LSPR peaks from 558 nm [nanoplates (NPs)] to 590 nm [nanowires (NWs)]. These results pave the way for the scalable and cost-effective production of plasmonic Cu nanostructures with tunable optical properties, holding promise for applications in sensing, catalysis, and photonic devices.

Design of a Shoe-Mounted Ground Inclination Measurement System Using Time of Flight Sensors (ToF 거리 센서를 이용한 신발 착용형 지면 기울기 측정 시스템 설계)

  • Hee-Chan Kim;Hyun-Jin Choi
    • The Journal of the Korea institute of electronic communication sciences
    • /
    • v.19 no.5
    • /
    • pp.1005-1012
    • /
    • 2024
  • Wearable walking assistance robots for people with complete paralysis utilize trajectory tracking control methods. In inclined environments, it is important to generate appropriate walking trajectories based on ground inclination. This paper presents the design of a shoe-mounted ground inclination measurement system using Inertial Measurement Unit (IMU) sensors and Time-of-Flight (ToF) sensors. The proposed system measures the absolute angle of the foot using the IMU sensor and the relative angle between the foot and the ground using the ToF sensor to derive the absolute angle of the ground. Walking experiments conducted on flat and inclined surfaces confirmed the feasibility of measuring ground inclination.

SRAM-Based Area-Efficient Computing-in-Memory for AI Edge Devices (AI 엣지 디바이스를 위한 SRAM 기반 면적 효율적인 컴퓨팅 인 메모리)

  • Hyun-Ki Hong;Sung-Hun Jo
    • The Journal of the Korea institute of electronic communication sciences
    • /
    • v.19 no.5
    • /
    • pp.1051-1058
    • /
    • 2024
  • In semiconductors for AI, Computing in Memory (CIM) integrates computation and memory to minimize data movement and reduce processing bottlenecks, thereby improving performance. In AI tasks that handle large amounts of data, CIM is gaining attention as a key technology that optimizes the performance of AI systems by improving power efficiency and enabling faster computation. In this paper, a new CIM architecture for AI semiconductors is proposed. The proposed architecture can perform MAC operations by controlling the width of the transistor and the pulse width of the control signal, and can be implemented in a smaller area than the existing architecture.

Characterizations of graded AlGaN epilayer grown by HVPE (HVPE 방법에 의해 성장된 graded AlGaN 에피층의 특성)

  • Lee, Chanbin;Jeon, Hunsoo;Lee, Chanmi;Jeon, Injun;Yang, Min;Yi, Sam Nyung;Ahn, Hyung Soo;Kim, Suck-Whan;Yu, Young Moon;Sawaki, Nobuhiko
    • Journal of the Korean Crystal Growth and Crystal Technology
    • /
    • v.25 no.2
    • /
    • pp.45-50
    • /
    • 2015
  • Compositionally graded AlGaN epilayer was grown by HVPE (hydride vapor phase epitaxy) on (0001) c-plane sapphire substrate. During the growth of graded AlGaN epilayer, the temperatures of source and the growth zone were set at $950^{\circ}C$ and $1145^{\circ}C$, respectively. The growth rate of graded AlGaN epilayer was about 100 nm/hour. The changing of Al contentes was investigated by field emission scanning electron microscope (FE-SEM) and energy dispersive spectroscopy (EDS). From the result of atomic force microscope (AFM), the average of roughness in 2 inch substrate of graded AlGaN epilayer was a few nanometers scale. X-ray diffraction (XRD) with the result that the AlGaN (002) peak ($Al_{0.74}Ga_{0.26}N$) and AlN (002) peak were appeared. It seems that the graded AlGaN epilayer was successfully grown by the HVPE method. From these results, we expect to use of the graded AlGaN epilayer grown by HVPE for the application of electron and optical devices.

Characteristics of InGaAs/GaAs/AlGaAs Double Barrier Quantum Well Infrared Photodetectors

  • Park, Min-Su;Kim, Ho-Seong;Yang, Hyeon-Deok;Song, Jin-Dong;Kim, Sang-Hyeok;Yun, Ye-Seul;Choe, Won-Jun
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2014.02a
    • /
    • pp.324-325
    • /
    • 2014
  • Quantum wells infrared photodetectors (QWIPs) have been used to detect infrared radiations through the principle based on the localized stated in quantum wells (QWs) [1]. The mature III-V compound semiconductor technology used to fabricate these devices results in much lower costs, larger array sizes, higher pixel operability, and better uniformity than those achievable with competing technologies such as HgCdTe. Especially, GaAs/AlGaAs QWIPs have been extensively used for large focal plane arrays (FPAs) of infrared imaging system. However, the research efforts for increasing sensitivity and operating temperature of the QWIPs still have pursued. The modification of heterostructures [2] and the various fabrications for preventing polarization selection rule [3] were suggested. In order to enhance optical performances of the QWIPs, double barrier quantum well (DBQW) structures will be introduced as the absorption layers for the suggested QWIPs. The DBWQ structure is an adequate solution for photodetectors working in the mid-wavelength infrared (MWIR) region and broadens the responsivity spectrum [4]. In this study, InGaAs/GaAs/AlGaAs double barrier quantum well infrared photodetectors (DB-QWIPs) are successfully fabricated and characterized. The heterostructures of the InGaAs/GaAs/AlGaAs DB-QWIPs are grown by molecular beam epitaxy (MBE) system. Photoluminescence (PL) spectroscopy is used to examine the heterostructures of the InGaAs/GaAs/AlGaAs DB-QWIP. The mesa-type DB-QWIPs (Area : $2mm{\times}2mm$) are fabricated by conventional optical lithography and wet etching process and Ni/Ge/Au ohmic contacts were evaporated onto the top and bottom layers. The dark current are measured at different temperatures and the temperature and applied bias dependence of the intersubband photocurrents are studied by using Fourier transform infrared spectrometer (FTIR) system equipped with cryostat. The photovoltaic behavior of the DB-QWIPs can be observed up to 120 K due to the generated built-in electric field caused from the asymmetric heterostructures of the DB-QWIPs. The fabricated DB-QWIPs exhibit spectral photoresponses at wavelengths range from 3 to $7{\mu}m$. Grating structure formed on the window surface of the DB-QWIP will induce the enhancement of optical responses.

  • PDF

A Study on the Definition of User Experience toward Electronic Publication for Education and Research and the Usability Test for the Electronic Publication Devices (교육·연구용 전자출판물 사용경험 정의 및 사용성 평가에 관한 연구)

  • Bae, Kyung-Jae
    • Journal of the Korean Society for Library and Information Science
    • /
    • v.49 no.2
    • /
    • pp.255-274
    • /
    • 2015
  • This study aims to define the user experience and to evaluate the usability toward electronic publication for education and research. As research methods, After total 20 people of 10 undergraduate students and 10 graduate students were randomly selected as the subjects, the research was conducted by using the in-depth interview and the e-book reader experimental method. As the results of analysis about subjective preferences in case of using academic resources, The subject relevance and understandability were responded as most important factors for selecting academic resources. And the most frequent purposes for using academic resources were to perform an assignment and to write an article. As the results of analysis about the user experience for using the print media and electronic media, the user experience of the print media is more positive than the electronic media and especially these results were caused by academic situation. Many subjects responded that the electronic media is more inconvenient in case of using academic resources. As a result of the e-book reader usability test, the hardware test score (3.47) is higher than the software test score (3.31).