• 제목/요약/키워드: Electronic devices

검색결과 4,580건 처리시간 0.029초

Electrical characterization of OLED using metal free phthalocyanine (H2Pc) layer (무금속 프탈로시아닌(metal free phthalocyanine: H2Pc) 층이 삽입된 OLED의 전기적 특성 분석)

  • Ahn, Tae-Jun;Lee, Jong Ho;Choi, Bum Ho;Yu, Yun Seop
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
    • /
    • 한국정보통신학회 2018년도 추계학술대회
    • /
    • pp.195-196
    • /
    • 2018
  • We have investigated electrical and optical characteristics of $H_2Pc$ introduced OLED devices. $H_2Pc$ layer acted on tunnel barrier for incident electrons. we have also observed that energy band of the proposed structure was varied as applied electric field by simulation using TCAD program.

  • PDF

Electrical Characteristics of the Dual Gate Emitter Switched Thyristor (Dual Gate Emitter Switched Thyristor의 전기적 특성)

  • Kim, Nam-Soo;Lee, Eung-Rae;Cui, Zhi-Yuan;Kim, Yeong-Seuk;Kim, Kyoung-Won;Ju, Byeong-Kwon
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • 제18권5호
    • /
    • pp.401-406
    • /
    • 2005
  • Two dimensional MEDICI simulator is used to study the electrical characteristics of Dual Gate Emitter Switched Thyristor. The simulation is done in terms of the current-voltage characteristics with the variations of p-base impurity concentrations and current flow. Compared with the other power devices such as MOS Controlled Cascade Thyristor(MCCT), Conventional Emitter Switched Thyristor(C-EST) and Dual Channel Emitter Switched Thyristor(DC-EST), Dual Gate Emitter Switched Thyristor(DG-EST) shows to have tile better electrical characteristics, which is the high latch-up current density and low forward voltage-drop. The proposed DG-EST which has a non-planer u-base structure under the floating N+ emitter indicates to have the better characteristics of latch-up current and breakover voltage in spite of the same turn-off characteristics.

Effect of ZrO2 Buffer Layers for Pt/Bi3.25La0.75Ti3O12/ZrO2/Si (MFIS)-FET Structures (Pt/Bi3.25La0.75Ti3O12/ZrO2/Si (MFIS)-FET 구조를 위한 ZrO2 Buffer Layer의 영향)

  • Kim, Kyoung-Tae;Kim, Chang-Il
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • 제18권5호
    • /
    • pp.439-444
    • /
    • 2005
  • We investigated the structural and electrical properties of BLT films grown on Si covered with $ZrO_{2}$ buffer layer. The BLT thin film and $ZrO_{2}$ buffer layer were fabricated using a metalorganic decomposition method. The electrical properties of the MFIS structure were investigated by varying thickness of the $ZrO_{2}$ layer. AES and TEM show no interdiffusion and reaction that suppressed using the $ZrO_{2}$ film as a buffer layer The width of the memory window in the C-V curves for the MFIS structure decreased with increasing thickness of the $ZrO_{2}$ layer. It is considered that the memory window width of MFIS is not affected by remanent polarization. Leakage current density decreased by about four orders of magnitude after using $ZrO_{2}$ buffer layer. The results show that the $ZrO_{2}$ buffer layers are prospective candidates for applications in MFIS-FET memory devices.

Effects of Ozone Oxidation on the Contact Resistance of DRAM Cell (오존 산화가 DRAM 셀의 콘택 저항에 미치는 영향)

  • 최재승;이승욱;신봉조;박근형;이재봉
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • 제17권2호
    • /
    • pp.121-126
    • /
    • 2004
  • In this paper, the effects of the ozone oxidation of the landing polycrystalline silicon on the cell contact resistance of the DRAM device were studied. For this study, the ozone oxidation of the landing polycrystalline silicon layer was performed under various conditions, which was followed by the normal DRAM processes. Then, the cell contact resistance and $t_{WR}$ (write recovery time) of the devices were measured and analyzed. The experimental results showed that the cell contact resistance was more significantly increased for higher temperature of oxidation, longer time of oxidation, and higher concentration of ozone in the oxidation furnace. In addition, the TEM cross-sectional micrographs clearly showed that the oxide layer at the interface between the landing polycrystalline silicon layer and the plug polycrystalline silicon layer was increased by the ozone oxidation. Furthermore, the rate of the device failure due to too large write recovery time was also found to be well correlated with the increase of the cell contact resistance.

Energy Band Schemes in Organic Electroluminescent Devices Using Terbium Complexes Prepared by Vacuum Evaporation Method (진공 증착법에 의한 Terbium Comp1exes를 이용한 유기 전기 발광 소자의 에너지 밴드에 관한 연구)

  • 표상우;김옥병;이한성;최돈수;이승희
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
    • /
    • pp.582-588
    • /
    • 1999
  • 정보화 사회의 발전과 함께 멀티미디어에 대한 관심이 집중되고 있으며, 점유 공간이 작고 가벼우며 대면적이 가능한 정보 표시 디스플레이에 대한 기술은 고부가가치 산업으로 인식되어 지고 있다. 이러한 정보 표시 디스플레이들 중, 전기 발광 소자 (Electroluminescence Display : ELD), 액정 표시 디스플레이 (Liquid Crystal Display LCD), 플라즈마 디스플레이 (Plasma Display Panel) 등의 대한 연구가 세계적으로 매우 활발하게 진행되고 있다. 본 연구에서는 란탄 계열의 금속 착 화합물인 Tb(ACAC)$_3$(Phen)과 Tb(ACAC)$_3$(Phen-Cl)를 이용해 다비이스를 제작한후 광학적 및 전기적 특성을 조사하였다. 또한 luminous efficiency와 cyclic voltametric 방법을 이용해 에너지 밴드로 두 발광 물질인 Tb(ACAC)$_3$(Phen)과 Tb(ACAC)$_3$(Phen-Cl)을 비교.분석하였다. 본 연구의 디바이스 구조를 보면 anode/hole transporting layer (HTL)/emitting material layer (EML)/electron transporting layer (ETL)/cathode와 같고 ETL를 aluminum-tris- (8-hydroxyquinoline) (Alq$_3$)와 bis(10-hydroxybenzo(h)quinolinato)beryllium (Bebq$_2$)를 사용하였으며 HTL 로 N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1,1'-biphenyl-4,4'-diamine (TPD)를 사용하였다.

  • PDF

The Study of Low Temperature $\muC-Si/CaF_2$/glass Film Growth using Buffer layer (Buffer layer 를 이용한 저온 $\muC-Si/CaF_2$/glass 박막성장연구)

  • 김도영;안병재;임동건;이준신
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
    • /
    • pp.589-592
    • /
    • 1999
  • This paper describes direct $\mu$C-Si/CaF$_2$/glass thin film growth by RPCVD system in a low temperature for thin film transistor (TFT), photovoltaic devices. and sensor applications. Experimental factors in a low temperature direct $\mu$ c-Si film growth are presented in terms of deposition parameters: SiH$_4$/H$_2$ ratio, chamber total pressure, substrate temperature, rf power, and CaF$_2$ buffer layer. The structural and electrical properties of the deposited films were studied by means of Raman spectroscopy, I-V, L-I-V, X-ray diffraction analysis and SEM. we obtain a crystalline volume fraction of 61%, preferential growth of (111) and (220) direction, and photosensitivity of 124. We achieved the improvement of crystallinity and electrical property by using the buffer layers of CaF$_2$ film.

  • PDF

Studies on The Optical and Electrical Properties if Europium Complexes with Monolayer and Multilayer (Europium complexes 단층과 다층 구조 박막의 전기적ㆍ광학적 특성에 관한 연구)

  • 이명호;표상우;이한성;김영관;김정수
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • 제11권10호
    • /
    • pp.871-877
    • /
    • 1998
  • Electroluminescent(EL) devices based on organic materials have been of great interest due to their possible applications for large-area flat-panel displays, where they are attractive because of their capability of multicolor emission, and low operation voltage. In this study, glass substrate/ITO/Eu(TTA)$_3$(phen)/Al, glass substrate/ITO/Eu(TTA)$_3$(phen)/Al and glass substrate/ITO/Eu(TTA)$_3$(phen)/AlQ$_3$/Al structures were fabricated by vacuum evaporation method, where aromatic diamine(TPD) was used as a hole transporting material, Eu(TTA)$_3$(phen) as an emitting material, and Tris(8-hydroxyquinoline) aluminu-m(AlQ$_3$) as an electron transporting layer. Electrolumescent(EL) and I-V characteristics of Eu(TTA)$_3$-(-phen) were investigated. These structures show the red EL spectra, which are almost the same at the PL spectrum of Eu(TTA)$_3$(phen). I-V characteristics of this structure show that turn-on voltage was 9V and current density was 0.01A/㎤ at a operation voltage of 9V. Electrical transporting phenomena of these structures were explained using the trapped-charge-limited current model with I-V characteristics.

  • PDF

Studies on The Optical and Electrical Properties of Europium Complex (Europium compound박막의 전기적 광학적 특성에 관한 연구)

  • 이명호;표상우;김영관;김정수;이한성
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 한국전기전자재료학회 1998년도 춘계학술대회 논문집
    • /
    • pp.317-320
    • /
    • 1998
  • Electroluminescent(EL) devices based on organic materials have been of great interest due to their possible applications for large-area flat-panel displays, where they are attractive because of their capability of multicolor emission, and low operation voltage. In this study, glass substrate/ITO/Eu(TTA)$_3$(Phen)/Al(A), glass substrate/ITO/TPD/Eu(TTA)$_3$(phen)/Al(B) aNd glass substrate/ITO/TPD/Eu(TTA)$_3$(Phen)/A1Q$_3$/Al (C) structures were fabricated by vacuum evaporation method, where aromatic diamine(TPD) was used as a hole transporting material, Eu(TTA)$_3$(phen) as an emitting material, and tris(8-hydroxyquinoline) Aluminum (AlQ$_3$) as an electron transporting layer. Etectroluminescent(EL) and I-V characteristics of Eu(TTA)$_3$(phen) with a various thickness were investigated. This structure shows the red EL spectrum, which is almost the same as the PL spectrum of Eu(TTA)$_3$(phen). I-V characteristics of this structure show that turn-on voltage was 9V and current density was 0.01A/㎤ at a dc operation voltage of 9V. Electrical transporting phenomena of these structures was explained using the trapped-charge-limited current model with I-V characteristics.

  • PDF

Electrical and Optical Characteristics of AC P-ELD using ZnS:Cu,Cl (ZnS:Cu,Cl 형광체를 사용한 powder형 AC Electroluminescence의 전기적 광학적 특성)

  • 임민수;권순석;신유섭;윤성현;정득영;임기조;류부형
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
    • /
    • pp.271-274
    • /
    • 1999
  • In this paper, we studied the matrix type Powder AC Electroluminescence using ZnS:Cu,Cl Phosphor. Previously, Powder AC EL was used in Backlighting of LCD. Rescently, organic Thin Film EL was rapidly developed because of high Luminescence and low applied voltage. But Powder AC EL has Superior features that include sheet like flexibility thickness, low weight, self-emission, a wide viewing angle and a fast response time. We tried to change of phosphor thickness and binder mixture rate in order to obtain the good condition of powder AC EL and we obtained the very low breakdown voltage that was just 15V. Till now, we measured the current-voltage(V-I), luminance-voltage(V-L), Luminance-current (L-I), color coordinate (CIE), and phosphor Intensity of variable thickness. In experiment result, the devices has the luminance of 840 cd/$m^2$ and improved color coordinate, x=0.1557, y=0.2145, using a 10kHz drive frequency.

  • PDF

EL Devices for LCD Backlight Based on ZnS:Cu Phosphor (혼합파우더 및 절연박막층을 이용한 PELD의 광학특성)

  • 박수길;조성렬;전세호;엄재석;이주성
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 한국전기전자재료학회 1998년도 춘계학술대회 논문집
    • /
    • pp.391-394
    • /
    • 1998
  • Electroluminescence is the light emission obtained by an electrical excitation energy passing through a phosphor under an applied high electrical field. EL are paid much attention on flat panel display as a backlight and indicator, which are divided into ACPRL(alternating-current powder electroluminescent) and ACTFEL(alternating-current powder electroluminescent). In this paper, Electric and emission properties on ACPEL are investigated based on ZnS:Cu phosphor. The basic structure on this is ITO glass/phosphor/insulator/ backelectrode, CR-M which has high efficiency on thermal properties and dielectric Properties was introduced and BaTiO$_3$ as a insulating layer in order to increase app1ied electric field on phosphor. Changing on Dielectric and emission Properties was caused by a different viscosity of binder which filled on space between phosphor particle. 60cd/$m^2$ under 60V, 2kHz sinusoidal was gotten from ACPELD prepared in this work.

  • PDF