• Korean Journal of Materials Research
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• v.7 no.3
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• pp.175-179
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• 1997

bliniaturization oi microwave circuit components is an important issue with the development in the mobile communication. Capacitors, inductors anti hybrid devices of these are building blocks of electric circuits, and the fabrication of these devices using thin film technology will influence on the miniaturization of electronic devices In this paper, we report the successful fabrication of the inductors, capacitors and LC hybrid devices using a ferroelectric and a ferromagnetic oxide thin iilm. Au, stable at high temperatures in oxidizing ambient, is patterned by lift-off process, and oxide thin films are deposited by ion beam sputtering and chemical vapor deposition. These devices are characterized by a network analyzer in 0.5-15GtIz range We got the inductance of 5nH, capacitance oi 10, 000 pF and resonant frequencies of $10^{6}-10^{9}Hz$.

• Journal of the Institute of Electronics and Information Engineers
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• v.53 no.7
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• pp.27-38
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• 2016

This work proposes a 12b 30MS/s 0.18um CMOS SAR ADC based on low-power composite switching with an active die area of $0.16mm^2$. The proposed composite switching employs the conventional $V_{CM}$-based switching and monotonic switching sequences while minimizing the switching power consumption of a DAC and the dynamic offset to constrain a linearity of the SAR ADC. Two equally-divided capacitors topology and the reference scaling are employed to implement the $V_{CM}$-based switching effectively and match an input signal range with a reference voltage range in the proposed C-R hybrid DAC. The techniques also simplify the overall circuits and reduce the total number of unit capacitors up to 64 in the fully differential version of the prototype 12b ADC. Meanwhile, the SAR logic block of the proposed SAR ADC employs a simple latch-type register rather than a D flip-flop-based register not only to improve the speed and stability of the SAR operation but also to reduce the area and power consumption by driving reference switches in the DAC directly without any decoder. The measured DNL and INL of the prototype ADC in a 0.18um CMOS are within 0.85LSB and 2.53LSB, respectively. The ADC shows a maximum SNDR of a 59.33dB and a maximum SFDR of 69.83dB at 30MS/s. The ADC consumes 2.25mW at a 1.8V supply voltage.

• Korean Journal of Materials Research
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• v.20 no.10
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• pp.513-517
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• 2010

There have been many efforts to modify and improve the properties of functional thin films by hybridization with nano-sized materials. For the fabrication of electronic circuits, micro-patterning is a commonly used process. For photochemical metal-organic deposition, photoresist and dry etching are not necessary for microscale patterning. We obtained direct-patternable $SnO_2$ thin films using a photosensitive solution containing Ag nanoparticles and/or multi-wall carbon nanotubes (MWNTs). The optical transmittance of direct-patternable $SnO_2$ thin films decreased with introduction of nanomaterials due to optical absorption and optical scattering by Ag nanoparticles and MWNTs, respectively. The crystallinity of the $SnO_2$ thin films was not much affected by an incorporation of Ag nanoparticles and MWNTs. In the case of mixed incorporation with Ag nanoparticles and MWNTs, the sheet resistance of $SnO_2$ thin films decreased relative to incorporation of either single component. Valence band spectral analyses of the nano-hybridized $SnO_2$ thin films showed a relation between band structural change and electrical resistance. Direct-patterning of $SnO_2$ hybrid films with a line-width of 30 ${\mu}m$ was successfully performed without photoresist or dry etching. These results suggest that a micro-patterned system can be simply fabricated, and the electrical properties of $SnO_2$ films can be improved by incorporating Ag nanoparticles and MWNTs.