• Bulletin of the Korean Chemical Society
• /
• v.34 no.11
• /
• pp.3399-3404
• /
• 2013

A new accepter unit, pyrrolo[3,2-b]pyrrole-2,5-dione, was prepared and utilized for the synthesis of the conjugated polymers containing electron donor-acceptor pair for OPVs. Pyrrolo[3,2-b]pyrrole-2,5-dione unit, regioisomer of the known pyrrolo[3,4-c]pyrrole-1,4-dione, is originated from the structure of stable synthetic pigment. The new conjugated polymers with 1,4-diphenylpyrrolo[3,2-b]pyrrole-2,5-dione, thiophene and carbazole were synthesized using Suzuki polymerization to generate P1 and P2. The solid films of P1 and P2 show absorption bands with maximum peaks at about 377, 554 and 374, 542 nm and the absorption onsets at 670 and 674 nm, corresponding to band gaps of 1.85 and 1.84 eV, respectively. To improve the hole mobility of the polymer with 1,4-bis(4-butylphenyl)-pyrrolo[3,2-b]-pyrrole-2,5-dione unit, which was previously reported by us, the butyl group at the 4-positions of the N-substituted phenyl group was substituted with hydrogen and methyl group. The field-effect hole mobility of P2 is $9.6{\times}10^{-5}cm^2/Vs$. The device with $P2:PC_{71}BM$ (1:2) showed $V_{OC}$ value of 0.84 V, $J_{SC}$ value of 5.10 $mA/cm^2$, and FF of 0.33, giving PCE of 1.42%.

• The Transactions of the Korean Institute of Electrical Engineers C
• /
• v.49 no.1
• /
• pp.24-29
• /
• 2000

We propose a simple method to control the crystallization depth of amorphous silicon (a-Si) deposited by PECVD or LPCVD during the excimer laser annealing (ELA). Employing the new method, we have formed poly-Si/a-Si double film and fabricated a new poly-Si TFT with vertical a-Si offsets between the poly-Si channel and the source/drain of TFT without any additional photo-lithography process. The maximum leakage current of the new poly-Si TFT decreased about 80% due to the highly resistive vertical a-Si offsets which reduce the peak electric field in drain depletion region and suppress electron-hole pair generation. In ON state, current flows spreading down through broad a-Si cross-section in the vertical a-Si offsets and the current density in the drain depletion region where large electric field is applied is reduced. The stability of poly-Si TFT has been improved noticeably by suppressing trap state generation in drain region which is caused by high current density and large electric field. For example, ON current of the new TFT decreased only 7% at a stress condition where ON current of conventional TFT decreased 89%.

• Proceedings of the KSME Conference
• /
• 2003.04a
• /
• pp.1881-1884
• /
• 2003

In this experiment, the oxidations of p-Xylene (140-180 ppmv), one of the air pollutants as a VOC, using $UV/TiO_2$ photocatalyst is studied. In order to increase the specific surface area, the filter is coated by nano $TiO_2$ particles. The photodegradation system consists of a VOCs generator, a photocatalyst filter and a measuring equipment. Illumination is generally provided by two of 20 W black light lamps with 380 nm of wavelength. The filter coated by nano $TiO_2$ particles has a passing efficiency over 80% but a pressure drop of 9.0 $mmH_2O$ at 0.45 cm/s. The filter endurance is better than activated carbon at the same pressure drop.

• Proceedings of the KIEE Conference
• /
• 2006.04a
• /
• pp.324-326
• /
• 2006

CCD형 영상소자는 방사선 피폭 시 표면과 격자내부에 모두 손상을 받게 되며, 감마방사선이나 X선과 같은 고에너지의 이온화 방사선에 노출될 경우 격자 실리콘 내부에 전자-전공쌍(Electron-hole pair, EHP)이 발생된다. 이러한 EHP는 CCD의 순간 출력 광전류로 변환되어 백색 화소 형태의 영상잡음으로 가시화되며, 이 화소 수는 피폭 방사선량에 비례하여 증가하는 특성을 지니고 있다. 따라서 출력 영상정보를 분석하면 조사된 방사선의 양과 특성을 측정할 수 있다. 본 연구에서는 CCD를 이용하여 가상의 방사능 물질 누출 공간에서 방사선원의 방향과 거리정보를 고속으로 탐지하기 위한 장치와 고속 측정 알고리즘을 구현하고 실제 방사선장에서 실증시험을 수행하였다. 방사선 탐지기는 콘형 납 콜리메이터(Collimator)와 가시광 변환용 신틸레이터(CsITl) 및 차폐체로 구성된 센서부와 제어 및 방사광 신호처리를 수행하는 PC부로 구성된다. 감마방사선($^{60}Co$) 방사선장 실증시험에서 방사선원간 거리 83cm에서 측정된 거리 탐지는 5.3%의 오차로 확인되었다. 이 방사선 탐지기는 임의의 고방사선 누출사고에 대한 초기대응 작업을 수행하기 위한 무인 이동로봇용 방사선 탐지기로 활용이 가능하다.

• Journal of the Korean Ceramic Society
• /
• v.37 no.3
• /
• pp.263-270
• /
• 2000

The Pt/copper oxide/n-Si electrodes were fabricated by depositing copper oxide thin film of 500${\AA}$ and very thin Pt layer on the n-type (100) Si substrate. hotoelectrochemical properties and stability profiles of the electrodes were investigated as a function of deposition time of Pt layer. As the deposition time of Pt layer increased up to 10 seconds, the photocurrent and quantum efficiency were increased and then decreased with further depositing time. The better cell stability was observed for the electrode with longer deposition time. The improvements in above photoelectrochemical properties indicate that Pt layer acts as a catalyst layer at electrode/electrolyte interface as well as a protective layer. The decreasing tendency of the photocurrent and efficiency for the electrode with Pt layer deposited above 20 seconds was explained as an increases in probbility of electron-hole pair recombination and also the absorbing photon loss at electrode surface due to the excessive thickness of Pt layer. The results were confirmed by impedance spectroscopy, mutiple cycle voltammograms and microstructural analyses.

• JSTS:Journal of Semiconductor Technology and Science
• /
• v.15 no.5
• /
• pp.519-525
• /
• 2015

Positive bias stress-induced instability in amorphous indium-gallium-zinc-oxide (a-IGZO) bottom-gate thin-film transistors (TFTs) was investigated under high $V_{GS}$/low $V_{DS}$ and low $V_{GS}$/high $V_{DS}$ stress conditions through incorporating a forward/reverse $V_{GS}$ sweep and a low/high $V_{DS}$ read-out conditions. Our results showed that the electron trapping into the gate insulator dominantly occurs when high $V_{GS}$/low $V_{DS}$ stress is applied. On the other hand, when low $V_{GS}$/high $V_{DS}$ stress is applied, it was found that holes are uniformly trapped into the etch stopper and electrons are locally trapped into the gate insulator simultaneously. During a recovery after the high $V_{GS}$/low $V_{DS}$ stress, the trapped electrons were detrapped from the gate insulator. In the case of recovery after the low $V_{GS}$/high $V_{DS}$ stress, it was observed that the electrons in the gate insulator diffuse to a direction toward the source electrode and the holes were detrapped to out of the etch stopper. Also, we found that the potential profile in the a-IGZO bottom-gate TFT becomes complicatedly modulated during the positive $V_{GS}/V_{DS}$ stress and the recovery causing various threshold voltages and subthreshold swings under various read-out conditions, and this modulation needs to be fully considered in the design of oxide TFT-based active matrix organic light emitting diode display backplane.

• 한국태양에너지학회:학술대회논문집
• /
• 2012.03a
• /
• pp.149-152
• /
• 2012

$Cu(In,Ga)Se_2$ (CIGS) is one of the most promising photovoltaic materials because of large conversion efficiency which has been achieved with an optimum Ga/(In+Ga) composition in $CuIn_{1-x}Ga_xSe_2$ (X~0.3). The Ga/(In+Ga) content is important to determine band gap, solar cell performances and carrier behaviors at grain boundary (GB). Effects of Ga/(In+Ga) content on physical properties of the CIGS layers have been extensively studied. In previous research, it is reported that GB is not recombination center of CIGS thin-film solar cells. However, GB recombination and electron-hole pair behavior studies are still lacking, especially influence of with different X on CIGS thin-films. We obtained the GB surface potential, local current and I-V characteristic of different X (00.7 while X~0.3 showed higher potential than 100 mV on GBs. Higher potential on GBs appears positive band bending. It can decrease recombination loss because of carrier separation. Therefore, we suggest recombination and electron-hole behaviors at GBs depending on composition of X.

• Transactions on Electrical and Electronic Materials
• /
• v.5 no.3
• /
• pp.89-92
• /
• 2004

For improving solar efficiencies, down conversion of high-energy photons to visible lights is discussed. The losses due to thermalization of charge carriers generated by the absorption of high-energy photons, can largely be reduced in a solar cell if more than one electron-hole pair can be generated per incident photon. The solar cell was constructed of dye-sensitized anatase-based TiO$_2$, approximately 30nm particle size, 6$\mu\textrm{m}$thickness, and 6${\times}$6$\textrm{mm}^2$ active area, Pt counter electrode and I$_3$$\^$-/I$_2$$\^$-/ electrolyte. After correction for losses due to light reflection and absorption by the conducting glass, the conversion of photons to electric current is practically quantitative in the plateau region of the curves. The incident photon to current conversion efficiency(IPCE) of N3 used as a dye in this work is about 80% at around 590nm and 610nm which is the emission spectrum of Eu doped LGF. The Eu doped LGF powder was prepared by conventional ceramic process, and used as a down converter for DSC after spin coated on the slide glass and fired.

• Journal of the Korea Institute of Information and Communication Engineering
• /
• v.21 no.10
• /
• pp.1827-1832
• /
• 2017

To observe the characteristics to be a resistive memory of $V_2O_5$ deposited by oxygen various gas flows and annealed, the hysteresis curves of $V_2O_5$ were analyzed. The good resistive memory was obtained from the electrical characteristics of $V_2O_5$ films with the Schottky contact as a result of electron-hole pair, and the oxygen vacancy generated from the annealing process contributes the high quality of Schottky contact and the formation of resistive memories. The balanced Schottky contacts owing to the oxygen vacancy effect as the result of an ionic reaction were formed at the $V_2O_5$ film annealed at $150^{\circ}C$ and $200^{\circ}C$ and the balanced Schottky contact with negative to positive voltages enhanced the electrical operation with write/erase states according to the forward or reverse bias voltages for the resistive memory behavior due to the oxygen vacancy.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2012.02a
• /
• pp.366-366
• /
• 2012

현재 사용되고 있는 투명전극재료 중에 ITO(Indium Tin Oxide)가 가장 투명하면서 전기도 잘 통하고 생산성도 좋다. 투명전극은 비저항이 $1{\times}10^{-3}{\Omega}/cm$이하, 면 저항이 $10^3{\Omega}/sq$이하로 전기전도성이 우수하고 380에서 780 nm의 가시광선 영역에서의 투과율이 80%이상이라는 두 가지 성질을 만족시키는 박막이다. 본 연구에서 X-ray Film을 제작하기 위하여 상용화된 ITO Glass 전극 기판에 X-ray가 조사되면 직접 전자 전공 쌍(electron-hole pair)을 발생시켜 전기적 신호를 발생하는 광도전체 물질(Photoconductor)인 PbO, $PbI_2$, $HgI_2$를 스크린 프린팅(Screen Printing)법을 이용하여 각각 제작하였다. 상부 전극으로 마그네틱 스퍼터링(Magnetic Sputtering) 진공 증착 장치를 사용하여 전류, 전압, 아르곤 및 산소 유입량등을 조절하면서 상부 전극을 증착하였다. 이때 타켓으로 $In_2O_3;SnO_2$ (조성비:90:10wt%)를 사용 하였고, base pressure는 $9{\times}10^{-7}torr$, deposition pressure는 $3{\times}10^5torr$를 고정하였다. 또한 전류와 전압은 각각 0.4A, 800V로 유지하고, $O_2$:0.3 ppm, Ar의 경우 4.9 ppm에서 70 ppm까지 올려 플라즈마를 활성화 시킨 후 90초 동안 ITO를 증착하였다. 본 실험에 제작된 박막으로 X-ray을 조사하여 검출기로써 특성 평가를 실시하였으며, 실험결과 X-선 투과와 전도성 등 두가지 특성이 동시에 만족 될 만한 성능을 가질 수 있음을 확인 할 수 있었다.