• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1998년도 추계학술대회 논문집
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• pp.159-162
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• 1998

This paper describes the electron transport characteristics in $SF_6$+He gas calculated for range of E/N values from 50~700[Td] by the Monte Carlo simulation and Boltzrnann equation method using a set of electmn collision cross sections determined by the authors and the values of electron swarm parameters are obtained by M F method. The results gained that the values of the electron swarm parameters such as the electron drift velocity, the electron ionization or attachment coefficents, longitudinal and h-ansverse diffusion coefficients agree with the experimental and theoretical for a range of E/N.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 학술대회 논문집 전문대학교육위원
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• pp.17-21
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• 2000

A Study on the electron energy distribution function in $SF_6+Ar$ mixtures gas used by MCS-BE algorithm, the electron swam parameters in the 0.5% and 0.2% $SF_6+Ar$ mixtures are measured by time of flight method over the E/N(Td) range from 30 to 300(Td). A two-term approximation of the Boltzmann equation analysis and Monte Carlo simulation have been also used to study electron transport coefficients. The electron energy distribution function has been analysed in $SF_6$ gas and $SF_6+Ar$ mixtures at E/N : 200(Td) for a case of the equilibrium region in the mean electron energy. The measured results and the calculated results have been compared each other.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2004년도 학술대회 논문집 전문대학교육위원
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• pp.41-44
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• 2004

This paper describes the electron transport characteristics in $SF_6$-He gas calculated for range of E/N values from 50${\sim}$700[Td] by the Monte Carlo simulation(MCS) and Boltzmann equation(BEq) method using a set of electron collision cross sections determined by the authors and the values of electron swarm parameters are obtained by TOF method. The results gained that the values of the electron swarm parameters such as the electron drift velocity. the electron ionization or attachment coefficients. longitudinal and transverse diffusion coefficients agree with the experimental and theoretical for a range of E/N.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 학술대회 논문집 전문대학교육위원
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• pp.72-75
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• 2001

In this paper, we describe the results of a combined experimental theoretical study designed to understand and predict the dielectric properties of $SF_6$ and $SF_6+Ar$ mixtures. The electron transport, ionization, and attachment coefficients for pure $SF_6$ and gas mixtures containing $SF_6$ has been analysed over the E/N range $30{\sim}300Td$ by a two term Boltzrnann equation and by a Monte Carlo Simulation using a set of electron cross sections determined by other authors, experimentally the electron swarm parameters for 0.2% and 0.5% $SF_6+Ar$ mixtures were measured by time- of- flight method, The results show that the deduced electron drift velocities, the electron ionization or attachment coefficients, longitudinal and transverse diffusion coefficients and mean energy agree reasonably well with the experimental and theoretical for a rang of E/N values.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2001년도 학술대회 논문집 전문대학교육위원
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• pp.76-79
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• 2001

Energy distribution function in $SiH_4$ has been analysed over the E/N range $0.5{\sim}300Td$ and Pressure value 0.5, 1.0, 2.5 Torr by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been calculated to give swarm parameters for the electron drift velocity, diffusion coefficient, electron ionization, mean energy and the electron energy distribution function. The electron energy distribution function has been analysed in $SiH_4$ at E/N=30, 50Td for a case of the equilibrium region in the mean electron energy and respective set of electron collision cross sections.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2002년도 학술대회 논문집 전문대학교육위원
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• pp.102-105
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• 2002

In this paper, the electron transport characteristics in $CF_4$ has been analysed over the E/N range 1${\sim}$300 [Td] by a two-term approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been calculated to give swarm parameters for the electron drift velocity, longitudinal diffusion coefficient, the ratio of the diffusion coefficient to the mobility, electron ionization and attachment coefficients, effective ionization coefficient, mean energy, collision frequency and the electron energy distribution function. The swarm parameter from the swarm study are expected to serve as a critical test of current theories of low energy electron scattering by atoms and molecules, in particular, as well as crucial information for quantitative simulations of weakly ionized plasmas.

• 대한방사선치료학회지
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• 제14권1호
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• pp.175-186
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• 2002

The purpose of this study is directly measure and evaluate about absorbed dose change according to nominal energy and electron cone or medical accelerator on isodose curve, percentage depth dose, contaminated X-ray, inhomogeneous tissue, oblique surface and irradiation on intracavitary that electron beam with high energy distributed in tissue, and it settled standard data of hish energy electron beam treatment, and offer to exactly data for new dote distribution modeling study based on experimental resuls and theory. Electron beam with hish energy of $6{\sim}20$ MeV is used that generated from medical linear accelerator (Clinac 2100C/D, Varian) for the experiment, andwater phantom and Farmer chamber md Markus chamber und for absorbe d dose measurement of electron beam, and standard absorbed dose is calculated by standard measurements of International Atomic Energy Agency(IAEA) TRS 277. Dose analyzer (700i dose distribution analyzer, Wellhofer), film (X-OmatV, Kodak), external cone, intracavitary cone, cork, animal compact bone and air were used for don distribution measurement. As the results of absorbed dose ratio increased while irradiation field was increased, it appeared maximum at some irradiation field size and decreased though irradiation field size was more increased, and it decreased greatly while energy of electron beam was increased, and scattered dose on wall of electron cone was the cause. In percentage depth dose curve of electron beam, Effective depth dose(R80) for nominal energy of 6, 9, 12, 16 and 20 MeV are 1.85, 2.93, 4.07, 5.37 and 6.53 cm respectively, which seems to be one third of electron beam energy (MeV). Contaminated X-ray was generated from interaction between electron beam with high energy and material, and it was about $0.3{\sim}2.3\%$ of maximum dose and increased with increasing energy. Change of depth dose ratio of electron beam was compared with theory by Monte Carlo simulation, and calculation and measured value by Pencil beam model reciprocally, and percentage depth dose and measured value by Pencil beam were agreed almost, however, there were a little lack on build up area and error increased in pendulum and multi treatment since there was no contaminated X-ray part. Percentage depth dose calculated by Monte Carlo simulation appeared to be less from all part except maximum dose area from the curve. The change of percentage depth dose by inhomogeneous tissue, maximum range after penetration the 1 cm bone was moved 1 cm toward to surface then polystyrene phantom. In case of 1 cm and 2 cm cork, it was moved 0.5 cm and 1 cm toward to depth, respectively. In case of air, practical range was extended toward depth without energy loss. Irradiation on intracavitary is using straight and beveled type cones of 2.5, 3.0, 3.5 $cm{\phi}$, and maximum and effective $80\%$ dose depth increases while electron beam energy and size of electron cone increase. In case of contaminated X-ray, as the energy increase, straight type cones were more highly appeared then beveled type. The output factor of intracavitary small field electron cone was $15{\sim}86\%$ of standard external electron cone($15{\times}15cm^2$) and straight type was slightly higher then beveled type.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1990년도 하계학술대회 논문집
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• pp.257-260
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• 1990

Monte Carlo simulations of electron impact ionization in silicon utilizing simple spherical band approximation including L valley are presented. The mean energy of electron at high electric field is lowered and the threshold energy of electron impact ionizaiotn is smeared out to $E_x$ by including L valley. This work also presents the importance of the modeling of L valley by calculating the electron population rate of it over the threshold energy of eletron impact ionization, which is higher than 10%

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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• pp.468-469
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• 2007

In this paper, the electron transport characteristics in $CF_4$ has been analysed over the E/N range 1~300[Td] by a two-tenn approximation Boltzmann equation method and by a Monte Carlo simulation. The motion has been calculated to give swarm parameters for the electron drift velocity, longitudinal diffusion coefficient, the ratio of the diffusion coefficient to the mobility, electron ionization and attachment coefficients, effective ionization coefficient, mean energy, collision frequency and the electron energy distribution function. The swarm parameter from the swarm study are expected to serve as a critical test of current theories of low energy electron scattering by atoms and molecules, in particular, as well as crucial information for quantitative simulations of weakly ionized plasmas.

• 한국진공학회:학술대회논문집
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• 한국진공학회 1999년도 제17회 학술발표회 논문개요집
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• pp.209-209
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• 1999

현재 magnetron sputter는 반도체, LCD 등을 포함하는 microelectronics 산업에서 박막형성을 위한 주요 장비로 널리 쓰이고 있으며, 소자의 고집적화 및 대형화 추세에 따라 그 이용가치는 더욱 증대되고 있다. 본 연구엣는 TFT-LCD용 Color Filter 제조시 ITO박막형성을 위해 사용하는 magnetron sputter 내부의 플라즈마 분포 및 ion kinetic energy에 대한 해석을 실시하였으며, ITO target의 erosion 형상의 원인을 실험결과와 비교하였다. Magnetron sputtering은 target에 가해지는 bias 전압(DC 혹은 RF)에 의해 target과 shield 혹은 target과 substrate 사이에서 생성될 수 잇는 플라즈마를 target 및 부분에 붙어있는 영구자석을 이용하여 target 근처에 집중시키고, target 표면과 플라즈마 사이의 전위차에 의해 가속된 이온들이 target 표면과 충돌하여 이차 전자방출을 일으킴과 동시에 target 표면에서 sputtering을 일으키고, 이들 sputtered 된 중성의 atom 들이 substrate로 날아가 박막을 형성하는 원리로 작동된다. 이때 target에서 방출되는 이차전자들은 영구자석에 의한 자기장 효과에 의해 target 근처에 갇히게 되어 중성 기체분자들과 이온화반응을 통해 플라즈마를 유지하고 그 밀도를 높혀주는 역할을 담당하게 된다. 즉 낮은 압력 및 bias 전압에서도 플라즈마 밀도를 높일수 있고 sputtering 공정이 가능한 장점을 가지고 있다. Magnetron sputtering 현상에 대한 시뮬레이션은 크게 magnetron discharge와 sputtering에 대한 해석 두가지로 나누어 볼 수 있는데, sputtering 현상 자체를 수치묘사할 수 있는 정량적인 모델은 아직까지 명확하게 정립되어 있지 않다. 따라서 본 연구에서는 magnetron plasma 자체에 대한 수치해석에 주안점을 두고 아울러 bulk plasma 영역에서 target으로 입사하는 이온들의 입사에너지 및 입사각도 등을 Monte Carlo 방법으로 추적하여 sputtering 현상을 유추해보았다. Sputtering 현상을 살펴보기 위해 magnetron sputter 내 플라즈마 밀도, 전자온도, 특히 target 및 substrate를 충돌하는 이온의 입사에너지 및 입사각 분포등을 계산하는데 hybrid 방법으로 시뮬레이션을 하였다. 즉 ion과 bulk electron에 대해서는 fluid 방식으로 접근하고, 이차전자 운동과 그로 인한 반응관계 및 target으로 입사하는 이온의 에너지와 입사각 분포는 Monte-Carlo 방법으로 처리하였다. 정지기장해석의 경우 상용 S/W인 Vector Fields를 사용하였다. 이를 통해 sputter 내 플라즈마 특성, target으로 입사하는 이온에너지 및 각 분포, 이들이 target erosion 형상에 미치는 영향을 살펴보았다. 또한 이들 결과로부터 간단한 sputtering 모델을 사용하여 target으로부터 sputter된 입자들이 substrate에 부착되는 현상을 Monte-Carlo 방법으로 추적하여 성막특성도 살펴보았다.