• 한국정밀공학회지
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• 제25권12호
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• pp.132-138
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• 2008

Recently, mastering processes for high density optical disc such as Blu-ray disc rely on electron beams, which are operable in only vacuum. In the mastering process, one of the most important tasks is to design precision stages for providing precise positioning of the works with respect to the source in a high vacuum environment. In this paper, we have developed a precision rotation table usable in the electron beam mastering. The rotation table adopted air bearings for a high positioning repeatability and velocity stability. The air leakage from the air bearings has been minimized by employing the differential exhaust scheme using three steps of air drain. The design parameters such as diameters of exhaust lines, seal lengths, and pumping speeds were decided according to the optimization method using genetic algorithm. The performance on the vacuum level of the rotation table was evaluated experimentally and theoretically. The results indicate that a vacuum level of $10^{-4}$ Pa is achieved with operation of air bearings in a vacuum chamber, which is sufficient for the electron beam mastering.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 추계학술대회 논문집
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• pp.601-602
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• 2008

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2007년도 춘계학술대회 논문집
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• pp.161-162
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• 2007

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2008년도 춘계학술대회 논문집
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• pp.93-94
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• 2008

• 한국정밀공학회지
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• 제25권4호
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• pp.134-139
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• 2008

A spirally arrayed nano-pattern is designed as a model pattern for the next generation optical storage media. The pattern consists off types of embossed rectangular dot, which are 50nm, 100nm, 150nm and 200nm in length and 50nm in width. The height of the dot is designed to be 50nm. The pitch of the spiral track of the pattern is 100nm. A ER(Electron resist) master for this pattern is fabricated by e-beam lithography process. The ER is first spin-coated to be 50nm thick on a Si wafer and then the model pattern is written on the coated ER layer by e-beam. After developing this pattern written wafer in the solution, a ER pattern master is fabricated. The most conventional e-beam machine can write patterns in orthogonal way, so we made our own pattern generator which can write the pattern in circular or spiral way. This program generates the patterns to be compatible with the e-beam machine from Raith(Raith 150). To fabricate 50nm pattern master precisely, a series of experiments were done including the design compensation for the pattern size, optimization of the dose, acceleration voltage, aperture size and developing. Through these experiments, we conclude that the higher accelerating voltages and smaller aperture size are better for mastering the nano pattern which is in order of 50nm. With the optimized e-beam lithography process, a spiral arrayed 50nm pattern master adopting PMMA resist was fabricated to have dimensional accuracy over 95% compared to the designed. Using this pattern master, a metal pattern stamp will be fabricated by Ni electro plating for injection molding of the patterned plastic substrate.

• 한국생산제조학회지
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• 제23권4호
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• pp.392-397
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• 2014

Recently, there is an increase in the need for precision linear stages with vacuum compatibility in such areas as lithography equipment for wafer or mask manufacturing, mask mastering equipment for optical data storage and electron beam equipment. A simple design, high stiffness and low cost can be achieved by using ball bearings. However, a ball bearing have friction and wear problems just as in ambient air. In order to decrease the friction, a special finish, a diamond-like carbon (DLC) film coating, is applied to the surface of a guide rail by sputtering deposition. This paper presents the result of an experimental investigation on the control performance of a ball bearing-guided linear motion stage under two environmental conditions: in air and vacuum. A comparison between the results with and without the DLC coating was also considered in the experimental investigation.