• 제목/요약/키워드: Electrode interface

검색결과 494건 처리시간 0.028초

Effects of PZT-Electrode Interface Layers on Capacitor Properties (PZT 박막 캐퍼시터의 특성에 기여하는 PZT-전극계면층의 영향)

  • Kim, Tae-Ho;Gu, Jun-Mo;Min, Hyeong-Seop;Lee, In-Seop;Lee, In-Seop
    • Korean Journal of Materials Research
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    • 제10권10호
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    • pp.684-690
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    • 2000
  • In order to study effects of interfacial layers between $Pb(Zr,Til)Q_3(PZT)$ films and electrodes for Metal-Ferroelectric-MetaI(MFM) structure capacitors, we have fabricated the capacitors with the Pt/PZT/interfacial-layer/Pt/$TiO_2/SiO_2$/Si structure. $PbTiO_3(PT)$ interfacial layers were formed by sol-gel deposition and PbO, ZrO, and $TiO_2$ thin layers were deposited by reactive sputtering. $TiO_2$ interface layers result in the finest grains of PZT(crystalline Temp. $600^{\circ}C$) films compare to $PbO_2\;and\;ZrO_2$ layers. However, as the thickness of $TiO_2$ layer increases. PZT thin films become rough and electrical characteristics were deteriorated due to remained anatase phase. On the other hand. PT interface layers result in improved morphology of PZT films and do not significantly change ferroelectric properties. It is a also observed that seed layers at the middle and top of PZT films do not give significant effects on grain size but the PT seed layer at the interface between the bottom electrode and the PZT films results in the small grain size.

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Stability Assessment of Lead Sulfide Colloidal Quantum Dot Based Schottky Solar Cell

  • Song, Jung-Hoon;Kim, Jun-Kwan;An, Hye-Jin;Choi, Hye-Kyoung;Jeong, So-Hee
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.413-413
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    • 2012
  • Lead sulfide (PbS) Colloidal quantum dots (CQDs) are promising material for the photovoltaic device due to its various outstanding properties such as tunable band-gap, solution processability, and infrared absorption. More importantly, PbS CQDs have large exciton Bohr radius of 20 nm due to the uniquely large dielectric constants that result in the strong quantum confinement. To exploit desirable properties in photovoltaic device, it is essential to fabricate a device exhibiting stable performance. Unfortunately, the performance of PbS NQDs based Schottky solar cell is considerably degraded according to the exposure in the air. The air-exposed degradation originates on the oxidation of interface between PbS NQDS layer and metal electrode. Therefore, it is necessary to enhance the stability of Schottky junction device by inserting a passivation layer. We investigate the effect of insertion of passivation layer on the performance of Schottky junction solar cells using PbS NQDs with band-gap of 1.3 eV. Schottky solar cell is the simple photovoltaic device with junction between semiconducting layer and metal electrode which a significant built-in-potential is established due to the workfunction difference between two materials. Although the device without passivation layer significantly degraded in several hours, considerable enhancement of stability can be obtained by inserting the very thin LiF layer (<1 nm) as a passivation layer. In this study, LiF layer is inserted between PbS NQDs layer and metal as an interface passivation layer. From the results, we can conclude that employment of very thin LiF layer is effective to enhance the stability of Schottky junction solar cells. We believe that this passivation layer is applicable not only to the PbS NQDs based solar cell, but also the various NQDs materials in order to enhance the stability of the device.

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Electroencephalography for Occupational Therapy for Stroke Patients: A Literature Review (뇌졸중 환자의 작업치료 중재 결과를 측정하기 위해 사용된 뇌전도(Electroencephalography)에 대한 문헌 고찰)

  • Kwak, Ho-Soung;Park, Ji-Hyuk
    • Therapeutic Science for Rehabilitation
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    • 제7권2호
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    • pp.9-16
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    • 2018
  • Objective : The aim of this research was to provide EEG (electroencephalogram) basic data in clinical areas through identifying measurement tools, measurement methods, and evaluation and analysis method of the EEG which is a neurological change measurement of patients with brain injury. Methods : Previous studies were found in an electronic database (e.g., PubMed, Science Direct). The keyword search terms were 'Electroencephalography', 'stroke', 'intervention OR training'. Results : Utilitizing brain-computer interface, the EEG, which is a tool for measuring the effects of rehabilitation through changes of brain activation state. Also, it could identify functional brain reorganization mechanism. Whenever a research utilized the EEG, which is composed of various channels, different types of electrode, and varied electrode locations. Conclusions : Through this review, we found that Electroencephalography is possible to neurologically verify the effectiveness of intervention and formulate an intervention strategy for efficient occupational therapy.

Initial Study of a Wire Mesh Tomography Sensor for Liquid/Gas Component Investigation

  • Rahiman, M.H.F.;Siow, L.T.;Rahim, R.A.;Zakaria, Z.;Ang, Vernoon
    • Journal of Electrical Engineering and Technology
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    • 제10권5호
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    • pp.2205-2210
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    • 2015
  • Experimental studies have been carried out to study the principle operation of the conductive type wire-mesh tomography sensor and analyse the wire-mesh tomography sensor for the liquid/gas two-phase flow interface and void fraction distribution in a process column. The measurement of the two-phase flows in the process column is based on the cross-sectional local instantaneous conductivity. The sensor consists of two planes of parallel electrode wires with 16 electrodes each and was placed orthogonally with each plane. The sensor electrode wires were made of tinned copper wire with an outer diameter of 0.91 mm which stretched over the sensor fixture. Therefore, this result in the mesh grid size with 5.53×5.53mm2. The wire-mesh sensor was tested in a horizontal liquid/gas two-phase flows process column with nominal diameter of 95.6 mm and the sampling frequency of 5882.3529 Hz. The tomogram results show that the wire-mesh tomography provides significant results to represent the void fraction distribution in the process column and estimation error was found in the liquid/gas interface level

Property change of organic light-emitting diodes due to a SAM treatment of the ITO surface (ITO 표면의 SAM형 습식 개질에 의한 유기 발광 소자의 특성 변화)

  • Na, Su-Hwan;Joo, Hyun-Woo;An, Hui-Chul;Kim, Tae-Wan;Song, Min-Jong;Lee, Ho-Sik
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.314-315
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    • 2008
  • We have studied a property change of organic light-emitting diodes (OLED)s due to a surface reformation of indium-tin-oxide(ITO) substrate. An ITO is widely used as a transparent electrode in light-emitting diodes, and the OLEDs device performance is sensitive to the surface properties of the ITO. The ITO surface reformation could reduce the Schottky barrier at the ITO/organic interface and increase the adhesion of the organic layer onto the electrode. We have studied the characteristics of OLEDs with a treatment by a wet processing of the ITO substrate. The self-assembled monolayer(SAM) was used for wet processing. The characteristics of OLEDs were improved by SAM treatment of an ITO in this work. The OLEDs with a structure of ITO/TPD(50nm)/$Alq_3$(70nm)/LiF(0.5nm)/Al(100nm) were fabricated, and the surface properties of ITO were investigated by using seneral characterization techniques. Self-assembled monolayer introduced at the anode/organic interface gave an improvement in turn-on voltage, luminance and external quantum efficiency compared to the device without the SAM layer. SAM-treatment time of the ITO substrate was made to be 0/10/15/20/25min. The current efficiency of the device with 15min. treated SAM layer was increased by 3 times and the external quantum efficiency by 2.6 times.

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Reset-first Resistance Switching Mechanism of HfO2 Films Based on Redox Reaction with Oxygen Drift-Diffusion

  • Kim, Jong-Gi;Lee, Sung-Hoon;Lee, Kyu-Min;Na, Hee-Do;Kim, Young-Jae;Ko, Dae-Hong;Sohn, Hyun-Chul
    • Proceedings of the Korean Vacuum Society Conference
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    • 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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    • pp.286-287
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    • 2012
  • Reset-first resistive switching mechanism based on reduction reaction in HfO2-x with oxygen drift-diffusion was studied. we first report that the indirect evidence of local filamentary conductive path formation in bulk HfO2 film with local TiOx region at Ti top electrode formed during forming process and presence of anion-migration at interface between electrode and HfO2 during resistive switching through high resolution transmission electron microscopy (HRTEM), electron disperse x-ray (EDX), and electron energy loss spectroscopy (EELS) mapping. Based on forming process mechanism, we expected that redox reaction from Ti/HfO2 to TiOx/HfO2-x was responsible for an increase of initial current with increasing the post-annealing process. First-reset resistive switching in above $350^{\circ}C$ annealed Ti/HfO2 film was exhibited and the redox phenomenon from Ti/HfO2 to TiOx/HfO2-x was observed with high angle annular dark field (HAADF) - scanning transmission electron microscopy (STEM), EDX and x-ray photoelectron spectroscopy. Therefore, we demonstrated that the migration of oxygen ions at interface region under external electrical bias contributed to bipolar resistive switching behavior.

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A Study on the Formation of Cobalt Policide Gate Electrode (코발트 폴리사이드 게이트전극 형성에 관한 연구)

  • Shim, Hyun-Sang;Koo, Bon-Cheol;Joung, Yeon-Sil;Bae, Kyoo-Sik
    • Korean Journal of Materials Research
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    • 제8권6호
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    • pp.499-504
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    • 1998
  • For the formation of cobalt polycide gate electrode, CoSi, was grown on columnar poly-Si, granular poly-Si or amorphous Si by depositing either Co monolayer or Co/Ti bilayer and its thermal stability was compared to study effects of the substrate crystallinity and the silicide formation method. When specimens were rapidly heat-treated at 90$0^{\circ}C$ up to 600 seconds, using amorphous Si or Co/Ti on all substrates improved the thermal stability. This was attributed to the uniform chemical composition of initial CoSi, and its smooth interface with the substrates, induced by smooth and clean Si surface and delayed Co diffusion. The main factors determining the thermal stability were found to be composition uniformity and smooth interface of $CoSi_2$, intially formed at the early stage of the heat-treatment.

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Plasma nitriding on chromium electrodeposit

  • Wang Liang;K.S. Nam;Kim, D.;Kim, M.;S.C. Kwon
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 한국표면공학회 2001년도 추계학술발표회 초록집
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    • pp.29-30
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    • 2001
  • This paper presents some results of plasma nitriding on hard chromium deposit. The substrates were C45 steel and $30~50{\;}\mu\textrm{m}$ of chromium deposit by electroplating was formed. Plasma nitriding was carried out in a plasma nitriding system with $95NH_3{\;}+{\;}SCH_4$ atmosphere at the pressure about 600 Pa and different temperature from $450^{\circ}C{\;}to{\;}720^{\circ}C$ for various time. Optical microscopy and X-ray diffraction were used to evaluate the characteristics of surface nitride layer formed by nitrogen diffusion from plasma atmosphere inward iCr coating and interface carbide layer formed by carbon diffusion from substrate outward Cr coating. The microhardness was measured using microhareness tester at the load of 100 gf. Corrosion resistance was evaluated using the potentiodynamic measurement in 3.5% NaG solution. A saturated calomel electrode (SiCE) was used as the reference electrode. Fig.1 shows the typical microstructures of top surface and cross-section for nitrided and unnitrided samples. Aaer plasma nitriding a sandwich structure was formed consisting of surface nitride layer, center chromium layer and interface carbide layer. The thickness of nitride and carbide layers was increased with the increase of processing temperature and time. Hardness reached about 1000Hv after nitriding while 900Hv for unnitrided hard chromium deposit. X-ray diffraction indicated that surface nitrided layer was a mixture of $Cr_2N$ and CrN at low temperature and erN at high temperature (Fig.2). Anodic polarization curves showed that plasma nitriding can greatly improve the corrosion resistance of chromium e1ectrodeposit. After plasma nitriding, the corrosion potential moved to noble direction and passive current density was lower by 1 to 4 orders of magnitude compared with chromium deposit(Fig.3).

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Characteristics of Silver Nanow ire Solution and Film Depending on Hydroxypropyl Methylcellulose Adhesion Promoter Addition (Hydroxypropyl methylcellulose 접착력 증진제 첨가에 따른 은 나노와이어 용액 및 필름의 특성 변화)

  • Seungju Kang;Kim
    • Journal of Adhesion and Interface
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    • 제24권2호
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    • pp.54-59
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    • 2023
  • Silver nanowire-based transparent electrodes are very attractive as a next-generation flexible and transparent electrode that can replace ITO-based flexible electrodes because they have excellent conductivity, transmittance and mechanical flexibility. However, weak understanding of the silver nanowire solution for the fabrication of silver nanowire-based transparent electrodes often cause abnormal operation of the electrical device or peeling problem of the electrode films when applied to electronic devices. Here, we studied a Hydroxypropyl Methylcellulose (HPMC) adhesion promoter, which is one of the additives for silver nanowire solution, to improve the understanding of silver nanowire solution. In detail, it is characterized how the HPMC changes the properties of silver nanowire solution and silver nanowire film, which is fabricated with silver nanowire solution including the HPMC adhesion promoter. As the characteristics of solution, polar surface tension and dispersive surface tension were measured. As the film characteristics, surface energy, surface morphology, silver nanowire density, and sheet resistance were analyzed.

Effect of RuO$_2$ Thin Film Microstructure on Characteristics of Thin Film Micro-supercapacitor ($RuO_2$박막의 미세 구조가 박막형 마이크로 슈퍼캐패시터의 특성에 미치는 영향)

  • Kim, Han-Ki;Yoon, Young-Soo;Lim, Jae-Hong;Cho, Won-Il;Seong, Tae-Yeon;Shin, Young-Hwa
    • Korean Journal of Materials Research
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    • 제11권8호
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    • pp.671-678
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    • 2001
  • All solid-state thin film micro supercapacitor, which consists of $RuO_2$/LiPON/$RuO_2$ multi layer structure, was fabricated on Pt/Ti/Si substrate using a $RuO_2$ electrode. Bottom $RuO_2$ electrode was grown by dc reactive sputtering system with increasing $O_2/[Ar+O_2]$ ratio at room temperature, and a LiPON electrolyte film was subsequently deposited on the bottom $RuO_2$ electrode at pure nitrogen ambient by rf reactive sputtering system. Room temperature charge-discharge measurements based on a symmetric $RuO_2$/LiPON/$RuO_2$ structure clearly demonstrates the cyclibility dependence on the microstructure of the $RuO_2$ electrode. Using both glancing angle x-ray diffraction (GXRD) and transmission electron microscopy (TEM) analysis, it was found that the microstructure of the $RuO_2$ electrode was dependent on the oxygen flow ratio. In addition, x- ray photoelectron spectroscopy(XPS) examination shows that the Ru-O binding energy is affected by increasing oxygen flow ratio. Furthermore, TEM and AES depth profile analysis after cycling demonstrates that the interface layer formed by interfacial reaction between LiPON and $RuO_2$ act as a main factor in the degradation of the cyclibility of the thin film micro-supercapacitor.

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