• 제목/요약/키워드: Electrical bonding

검색결과 632건 처리시간 0.077초

마이크로 열원에 의한 이종전자재료의 접합성 (Bondability of Different Electronic Materials by Micro Heat source)

  • 이철인;서용진;신영의;장의구
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1994년도 추계학술대회 논문집
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    • pp.206-209
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    • 1994
  • This paper has been researched bondability of electronic devices, such as lead frame and thick film of Ag/Pd on an alumina substrate by different heat sources. To obtain the bonds with high quality, it is very important to control both the thermal distribution of the bonds and it stability, because electronics components is consist of different materials. Therefore, this paper clarifies not only heat mechanism of micro parallel gap resistance bonding method and pulse heat tip bonding method but also investigates selection of heat sources with micro-electronic materials for bonding. Finally, it is realzed fluxless bonding process with filler metal such as plating layers.

결정의존성 식각/기판접합을 이용한 MEMS용 구조물의 제작 (Si Micromachining for MEMS-lR Sensor Application)

  • 박흥우;주병권;박윤권;박정호;김철주;염상섭;서상의;오명환
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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    • pp.411-414
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    • 1998
  • In this paper, the silicon-nitride membrane structure for IR sensor was fabricated through the etching and the direct bonding. The PT layer as a IR detection layer was deposited on the membrane and its characteristics were measured. The attack of PT layer during the etching of silicon wafer as well as the thermal isolation of the IR detection layer can be solved through the method of bonding/etching of silicon wafer. Because the PT layer of c-axial orientation rained thermal polarization without polling, the more integration capability can be achieved. The surface roughness of the membrane was measured by AFM, the micro voids and the non-contacted area were inspected by IR detector, and the bonding interface was observed by SEM. The polarization characteristics and the dielectric characteristics of the PT layer were measured, too.

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와이어 본딩시 본딩 패드 리프트 불량에 관한 연구 (Study on the Bonding Pad Lift Failure in Wire Bonding)

  • 김경섭;장의구;신영의
    • 한국전기전자재료학회논문지
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    • 제11권12호
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    • pp.1079-1083
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    • 1998
  • In this study, ultrasonic power of Aluminum wire bonder, bond time and bond force are investigated and valued in order to minimize failure of bonding pad lift. We also tried to control those 3 factors properly. We got the conclusion that if we turn down the ability of ultrasonic power or bond time, we can get a pad lift from a boundary between bond pad ad wire because pad metal and wire joining is unstable, but it is best condition when it ultrasonic power is 100∼130unit, bond time is 15∼20msec and bond force is 4∼6gf.

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자동차용 파워 모듈 패키징의 은 소재를 이용한 접합 기술 (A Review of Ag Paste Bonding for Automotive Power Device Packaging)

  • 노명훈;;정재필
    • 마이크로전자및패키징학회지
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    • 제22권4호
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    • pp.15-23
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    • 2015
  • Lead-free bonding has attracted significant attention for automotive power device packaging due to the upcoming environmental regulations. Silver (Ag) is one of the prime candidates for alternative of high Pb soldering owing to its superior electrical and thermal conductivity, low temperature sinterability, and high melting temperature after bonding. In this paper, the bonding technology by Ag paste was introduced. We classified into two Ag paste bonding according to applied pressure, and each bonding described in detail including recent studies.

에폭시 솔더 페이스트 소재와 적용 (Epoxy solder paste and its applications)

  • 문종태;엄용성;이종현
    • Journal of Welding and Joining
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    • 제33권3호
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    • pp.32-39
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    • 2015
  • With the simplicity of process and high reliability in chip or package bonding, epoxy solder paste (ESP) has been recently considered as a competitive bonding material. The ESP material is composed of solder powder and epoxy formulation which can remove oxide layers on the surface of solder powder and pad finish metal. The bonding formed using ESP shows outstanding bonding strength and suppresses electrical short between adjacent pads or leads owing to the reinforced structure by cured epoxy after the bonding. ESP is also expected to suppress the formation and growth of whisker on the pads or leads. With the mentioned advantages, ESP is anticipated to become a spotlighted bonding material in the assembly of flexible electronics and electronic modules in automotive vehicles.

1-10 ㎓ 초고주파 패키지용 bonding wire 인덕턴스 특성 측정 (Inductance Characterization of Bonding Wires for 1-10㎓ Radio Frequency Packages)

  • 정태호;지용
    • 대한전자공학회:학술대회논문집
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    • 대한전자공학회 2001년도 하계종합학술대회 논문집(2)
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    • pp.221-224
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    • 2001
  • In this paper, the bonding wire interconnection has been studied from the points of view of modeling and electrical characterization. The bonding wire is measured by TDR(Time Domain Reflectometry) and Network analyzer(1-10㎓). First, one gold bonding wire mounted on 2mm gap substrate measured 3.68nH by TDR and 3.39nH by Network analyzer(6㎓). Two gold bonding wire mounted on 2mm gap substrate measured 3.14nH by TDR and 2.80nH by Network analyzer. This result presented that inductance of bonding wire could be employed as inductors for radio frequency circuit packaging.

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HNO$_3:H_2O_2$ : HF 세척법을 이용한 실리콘 직접 접합 기술에 관한 연구 (Study on the Direct Bonding of Silicon Wafers by Cleaning in $HNO_3:H_2_O2:HF$)

  • 주철민;최우범;김영석;김동남;이종석;성만영
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1999년도 하계학술대회 논문집 G
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    • pp.3310-3312
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    • 1999
  • We have studied the method of silicon direct bonding using the mixture of $HNO_$, $H_2O_2$, and HF chemicals called the controlled slight etch (CSE) solution for the effective wafer cleaning. CSE, two combinations of oxidizing and etching agents, have been used to clean the silicon surfaces prior to wafer bonding. Two wafers of silicon and silicon dioxide were contacted each other at room temperature and postannealed at $300{\sim}1100^{\circ}C$ in $N_2$ ambient for 2.5 h. We have cleaned silicon wafers with the various HF concentrations and characterized the parameters with regard to surface roughness, chemical nature, chemical oxide thickness, and bonding energy. It was observed that the chemical oxide thickness on silicon wafer decreased with increasing HF concentrations. The initial interfacial energy and final energy postannealed at $1100^{\circ}C$ for 2.5h measured by the crack propagation method was 122 $mJ/m^2$ and 2.96 $mJ/m^2$, respectively.

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Characterization of SOI Wafers Fabricated by a Modified Direct Bonding Technology

  • Kim, E.D.;Kim, S.C.;Park, J.M.;Kim, N.K.;Kostina, L.S.
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 춘계학술대회 논문집 전자세라믹스 센서 및 박막재료 반도체재료 일렉트렛트 및 응용기술
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    • pp.47-51
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    • 2000
  • A modified direct bonding technique employing a wet chemical deposition of $SiO_2$ film on a wafer surface to be bonded is proposed for the fabrication of Si-$SiO_2$-Si structures. Structural and electrical quality of the bonded wafers is studied. Satisfied insulating properties of interfacial $SiO_2$ layers are demonstrated. Elastic strain caused by surface morphology is investigated. The diminution of strain in the grooved structures is semi-quantitatively interpreted by a model considering the virtual defects distributed over the interfacial region.

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Investigation on the Spot for Grounding Systems in Buildings

  • Gil, Hyoung-Jun;Kim, Dong-Woo;Kim, Dong-Ook;Kim, Hyang-Kon
    • 조명전기설비학회논문지
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    • 제24권3호
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    • pp.39-45
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    • 2010
  • This paper deals with investigation on the spot for grounding systems of buildings based on international standards at construction sites. The investigation was carried out for grounding method, grounding type, shape of grounding electrode, grounding for a lightning protection system, continuity of steelwork in reinforced concrete structures, etc. The investigation on the spot was performed by a researcher and engineer with over fifteen years of industry experience all over the country. As a result of the investigation on the spot in 13 buildings, common grounding and structure grounding methods were dominant. The safety improvement methods include installation of equipotential bonding conductors for the connection to the main earthing terminal, equipotential bonding conductors for supplementary bonding, use of Surge Protective Devices (SPD), and safe connections between earthing conductors and the rebar.

Insulated, Passivated and Adhesively-Promoted Bonding Wire using Al2O3 Nano Coating

  • Soojae Park;Eunmin Cho;Myoungsik Baek;Eulgi Min;Kyujung Choi
    • 마이크로전자및패키징학회지
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    • 제31권2호
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    • pp.1-8
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    • 2024
  • Bonding wires are composed of conductive metals of Au, Ag & Cu with excellent electrical conductivities for transmitting power and signals to wafer chips. Wire metals do not provide electrical insulation, adhesion promoter and corrosion passivation. Adhesion between metal wires is extremely weak, which is responsible for wire cut failures during thermal cycling. Organic coating for electrical insulation does not satisfy bondability and manufacturability, and it is complex to apply very thin organic coating on metal wires. Automotive packages require enhanced reliability of packages under harsh conditions. LED and power packages are susceptible to wire cut failures. Contrary to conventional OCB behaviors, forming gas was not required for free air ball formation for both Ag and Pd-coated Cu wires with Al2O3 passivation.