• The Journal of Korean Institute of Communications and Information Sciences
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• v.19 no.3
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• pp.523-532
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• 1994

A knowledge of the accurate characteristic impedance of a GTEM cell is very useful to design it. This paper discusses the characteristic impedance of a GTEM cell applicable to both susceptibility and emission measurements, considering opening angle of it. The over-RGM for analysis is described : this numerical method is operated with respect to the spherical coordinate system. Some results are compared with others and the validity of this analysis is estabished. The characteristic impedances of a GTEM cell with the variation of geometrical constructions on cross section are presented ; the effect of the opening angle on the characteristic impedance is show. Finally, the electirc field uniformities on a cross section of a GTEM cell are considered for various opening angles.

• Polymer(Korea)
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• v.32 no.4
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• pp.334-339
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• 2008

Recently electro spinning is a widely used simple technique to prepared micro- to nanometer-sized fiber of various polymers. In general, a normal multiple-nozzle electro spinning system has been difficult to achieve high production-rate fabricating micro/nanofibers due to the interference of electric field between individual nozzles in the process. To reduce the interference effect of electric field between nozzles, we developed a multi-nozzle electrospinning system supplemented with auxiliary electrodes. Poly($\varepsilon$-carprolactone)(PCL), which has good mechanical property and biocompatibility, was electrospun by the multi-nozzle electro spinning system. Electrospinnability, product rate, and size uniformity of spun fibers for the system with and without auxiliary electrodes were characterized. As a result, the multi-nozzle electrospinning system supplemented with auxiliary electrodes provides excellently stable processability and showed high mass productivity of PCL-nanofibers relative to a normal multi-nozzle electro spinning system.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.8 no.3
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• pp.679-685
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• 2004

Although the electrophoretic deposition method has the advantage of simple processing procedure, less fabrication facilities, and easier control for deposition thickness and wire length, providing economical and technical merits, it also has the disadvantages of cracking and porosity phenomena, requiring an improved processing method for higher particle density and constant particle orientation. we have developed an optimization method to increase the particle density and to unify its orientation, and have performed a study to overcome the cracking and porosity problems in the fabricated superconductor. In order to improve the surface uniformity and the conduction properties of the fabricated YBCO thick films, a system that applies alternate voltage vertically has been developed for the first time and applied to the electrophoretic deposition process. The applied alternate electric field caused a force to be exerted on each YBCO particle and resulted in a rotation of the particle in the direction of applied electric field, accomplishing a uniform particle orientation. We name this process as the shaky-aligned electrophoretic deposition method. For commercial utilization and efficiency, in this dissertation, alternating voltage of 60 Hz and 25 ∼ 120 V/cm was proposed to apply it as a subsidiary source for shaky-flow deposition so that the fabricated thin film showed uniform surface morphology with less voids and cracks and Tc,zero of 90 K and the critical current density of 3419 A/$cm^2$.

• Nuclear Engineering and Technology
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• v.55 no.12
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• pp.4527-4542
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• 2023

The present microbial reinforcement of rock and soil exhibits limitations, such as uneven reinforcement effectiveness and low calcium carbonate generation rate, resulting in limited solidification strength. This study introduces electroosmosis as a standard microbial grouting reinforcement technique and investigates its solidification effects on microbial-reinforced uranium tailings. The most effective electroosmosis effect on uranium tailings occurs under a potential gradient of 1.25 V/cm. The findings indicate that a weak electric field can effectively promote microbial growth and biological activity and accelerate bacterial metabolism. The largest calcium carbonate production occurred under the gradient of 0.5 V/cm, featuring a good crystal combination and the best cementation effect. Staged electroosmosis and electrode conversion efficiently drive the migration of anions and cations. Under electroosmosis, the cohesion of uranium tailings reinforced by microorganisms increased by 37.3% and 64.8% compared to those reinforced by common microorganisms and undisturbed uranium tailings, respectively. The internal friction angle is also improved, significantly enhancing the uniformity of reinforcement and a denser and stronger microscopic structure. This research demonstrates that MICP technology enhances the solidification effects and uniformity of uranium tailings, providing a novel approach to maintaining the safety and stability of uranium tailings dams.

• Journal of Information Display
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• v.2 no.3
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• pp.48-53
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• 2001

Carbon nanotube emitters, prepared by screen printing, have demonstrated a great potential towards low-cost, largearea field emission displays. Carbon nanotube paste, essential to the screen printing technology, was formulated to exhibit low threshold electric fields as well as an emission uniformity over a large area. Two different types of triode structures, normal gate and undergate, have been investigated, leading us to the optimal structure designing. These carbon nanotube FEDs demonstrated color separation and high brightness over 300 $cd/m^2$ at a video-speed operation of moving images. Our recent developments are discussed in details.

• Proceedings of the KIEE Conference
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• 2011.07a
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• pp.1662-1663
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• 2011

본 논문에서 하지 정맥 지료를 위한 마이크로파 시스템에서 사용될 가열 안테나의 전계 분포를 균일하게 형성시키기 위해 철사 도파관 안테나를 설계 및 제작하였다. 일반적인 도파관 안테나에 경우 안테나 중심 부분에 전계가 가장 세게 분포되어 온도가 다른 곳에 비해 차이가 많이 나므로 인체 피부가 회상을 입힐 위험이 있다. 제안된 철사 도파관 안테나는 끝단에 가느다란 철을 이용하여 전기장을 철사 부분에 집중시켜 안테나 중앙 부분에 집중된 전기장을 분산되도록 설계하였다. 따라서 전기장을 소스로 하는 온도도 균일하게 분포하게 된다. 제안된 철사 도파관 안테나 내부의 전계 분포는 Ansoft 사의 HFSS, 온도 분포는 CST 사의 MWS(Microwave Studio)를 이용하여 시뮬레이션을 하였고, 일반적인 안테나 경우보다 더 균일한 전계와 온도 분포 특성을 보임을 확인하였다. 제작된 철사 안테나는 사용주파수 15GHz에서 -10dB 이하의 반사 손실을 보였다. 또한 안테나 타당성을 검증하기 위해 개구면 앞에 돼지 껍데기를 두고 일정시간 가열하여 일반 안테나와 제안된 철사 도파관 안테나 온도 분포를 비교하였다. 열화상 카메라를 이용한 실험결과 일반 안테나에 경우 중앙과 가장 자리부분 사이에 약 $29^{\circ}C$, 제안된 철사 도파관 안테나에 경우에는 약 $12.5^{\circ}C$의 차이를 보였다. 이를 통해 제안된 철사 도파관 안테나가 전계 분포 균일성 향상에 기여함을 확인하였다.

• Journal of Electrical Engineering and Technology
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• v.9 no.1
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• pp.307-312
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• 2014

We present a full finite element analysis for plasma discharge in etching process of semiconductor circuit. The charge transport equations of hydrodynamic diffusion-drift model and the electric field equation were numerically solved in a fully coupled system by using a standard finite element procedure for transient analysis. The proposed method was applied to a real plasma reactor in order to characterize the plasma sheath that is closely related to the yield of the etching process. Throughout the plasma discharge analysis, the base electrode of reactor was tested and modified for improving the uniformity around the wafer edge. The experiment and numerical results were examined along with SEM data of etching quality. The feasibility and usefulness of the proposed method was shown by both numerical and experimental results.

• Korean Journal of Optics and Photonics
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• v.3 no.2
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• pp.133-136
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• 1992

Calculation and comparison of the design parameter between Chang and Ernst profile that can be used for the uniform discharge in excimer or TEA $Co_2$ laser are carried out. This result can be used to establish the initial $\kappa$-value in the design of electron. Also, calculation shows that Ernst profile is 2-3 times superior to Chang profile in uniformity of electric field with respect to the same k-value ($0.001\le\kappa\le0.25$).

• Progress in Superconductivity and Cryogenics
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• v.9 no.1
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• pp.37-42
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• 2007

We are developing a 22.9 kV/25 MVA superconducting fault current limiting(SFCL) system for a power distribution network. A Bi-2212 bulk SFCL element, which has the merits of large current capacity and high allowable electric field during fault of the power network, was selected as a candidate for our SFCL system. In this work, we experimentally investigated important characteristics of the 190 kVA Bi-2212 SFCL element in its application to the power grid e.g. DC voltage-current characteristic, AC loss, current limiting characteristic during fault, and so on. Some experimental data related to thermal and electromagnetic behaviors were also compared with the calculated ones based on numerical method. The results show that the total AC loss at rated current of the 22.9 kV/25 MVA SFCL system, consisting of one hundred thirty five 190 kVA SFCL elements, becomes likely 763 W, which is excessively large for commercialization. Numerically calculated temperature of the SFCL element in some sections is in good agreement with the measured one during fault. Local temperature distribution in the190 kVA SFCL element is greatly influenced by non-uniform critical current along the Bi-2212 bulk SFCL element, even if its non-uniformity becomes a few percentages.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.221-221
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• 2014

The present work proposes an improved numerical simulator for design and modification of large area capacitively coupled plasma (CCP) processing chamber. CCP, as notoriously well-known, demands the tremendously huge computational cost for carrying out transient analyses in realistic multi-dimensional models, because electron dissociations take place in a much smaller time scale (${\Delta}t{\approx}10-8{\sim}10-10$) than time scale of those happened between neutrals (${\Delta}t{\approx}10-1{\sim}10-3$), due to the rf drive frequencies of external electric field. And also, for spatial discretization of electron flux (Je), exponential scheme such as Scharfetter-Gummel method needs to be used in order to alleviate the numerical stiffness and resolve exponential change of spatial distribution of electron temperature (Te) and electron number density (Ne) in the vicinity of electrodes. Due to such computational intractability, it is prohibited to simulate CCP deposition in a three-dimension within acceptable calculation runtimes (<24 h). Under the situation where process conditions require thickness non-uniformity below 5%, however, detailed flow features of reactive gases induced from three-dimensional geometric effects such as gas distribution through the perforated plates (showerhead) should be considered. Without considering plasma chemistry, we therefore simulated flow, temperature and species fields in three-dimensional geometry first, and then, based on that data, boundary conditions of two-dimensional plasma discharge model are set. In the particular case of SiH4-NH3-N2-He CCP discharge to produce deposition of SiNxHy thin film, a cylindrical showerhead electrode reactor was studied by numerical modeling of mass, momentum and energy transports for charged particles in an axi-symmetric geometry. By solving transport equations of electron and radicals simultaneously, we observed that the way how source gases are consumed in the non-isothermal flow field and such consequences on active species production were outlined as playing the leading parts in the processes. As an example of application of the model for the prediction of the deposited thickness uniformity in a 300 mm wafer plasma processing chamber, the results were compared with the experimentally measured deposition profiles along the radius of the wafer varying inter-electrode gap. The simulation results were in good agreement with experimental data.