• Title/Summary/Keyword: Ductile-to-brittle transition temperature

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A Study on the High Frequency Ultrasonic Attenuation Characterization in Artificially Aging Degraded 2.25Cr-1Mo Steel (2.25Cr-1Mo 강 인공 열화재의 고주파수 초음파 감쇠특성에 관한 연구)

  • Park, Ik-Keun;Park, Un-Su;Kim, Chung-Seok;Kim, Hyun-Mook;Kwun, Sook-In;Byeon, Jai-Won
    • Journal of the Korean Society for Nondestructive Testing
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    • v.21 no.4
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    • pp.439-445
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    • 2001
  • The destructive method is reliable and widely used lot the estimation of material degradation but, it have time-consuming and a great difficulty in preparing specimens from in-service industrial facilities. Therefore, the estimation of degraded structural materials used at high temperature by nondestructive evaluation such as electric resistance method, replica method, Barkhausen noise method, electro-chemical method and ultrasonic method are strongly desired. Ultrasonic nondestructive evaluation technique has been reported good to attain efficiency of measurement, high sensitivity of measurement, and rapidity and reliability of result interpretation. In this study, it was verified experimentally the feasibility of the evaluation of degraded 2.25Cr-1Mo steel specimens which were prepared by the isothermal aging heat treatment at $630^{\circ}C$ by high frequency longitudinal wave method investigating the change of attenuation coefficient by FFT analysis and wavelet transform. Because of carbide precipitation increase and spheroidization near grain boundary of microstructure to aging degradation, attenuation coefficient had a tendency to increase as degradation proceeded. It was identified possibly to evaluate degradation using the characteristics of high-frequency ultrasonics. Frequency dependence of ultrasonic attenuation coefficient to aging degradation appeared large, which made sure that attenuation coefficient is an important parameter for evaluation of aging degradation.

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Evaluation of Water Absorption Phenomena into the Photo-resist Dry Film for PCB Photo-lithography Process (PCB Photo-lithography 공정에 사용되는 Photo-resist인 Dry Film에 대한 물의 확산 침투 현상평가)

  • Lee, Choon Hee;Jeong, Giho;Shin, An Seob
    • Applied Chemistry for Engineering
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    • v.24 no.6
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    • pp.593-598
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    • 2013
  • In this study, we have evaluated the water absorption phenomenon of photoresist dry film, which is commonly used to build circuits on PCB (Printed Circuit Board) by photolithography, by using ATR-FTIR (Attenuated Total Reflectance-Fourier Transform Infrared). We have firstly observed significant change in fracture mode of dry film with respect to temperature and humidity, which we assumed the material transition from ductile to brittle. Secondly, we have established the process of absorption test for determining the diffusion coefficients of water into the dry film both with gravimeter and ATR-FTIR. We have successfully calculated the diffusion coefficients for each environmental conditions from the results which we achieved by gravimeter and ATR-FTIR. Compared to the gravimeter which is a conventional method for absorption test, the ATR-FTIR method in this study has been found to be very easy to use and have the same accuracy as gravimeter. Moreover, we are expecting to use the ATR-FTIR as an appropriate method to study the absorption phenomena related to any kinds of solvent and polymer system.