• Title/Summary/Keyword: Dry-cleaning

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A Study on the Conservation of Lady Shim's Costume Excavated in Jecheon Province (제천출토 청송심씨 출토유물의 보존처리)

  • Park, Bong Soon;Lee, Mok Kun;Chang, In Woo
    • Journal of the Korean Society of Costume
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    • v.65 no.7
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    • pp.47-59
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    • 2015
  • This paper studies the conservation treatment of Lady Shim's costume, which was excavated in Jecheon Province in 2012. There were the significant problems, which were encountered in the treatment of the costume ; First the Jeogoris were transformed during the excavation, Second fibers were seriously deteriorated, Third most of the fabrics such as Chusa were readily deformed. To overcome these problems and to secure stability in the conservation treatment, we decided to alternate between two different washing methods ; dry cleaning by n-hexane and wet cleaning by water. The costume shape was recovered by steaming and by swelling with Hanji(Korean traditional paper). The combined cleaning method proved to be relatively efficient and stable. In addition, the shape of Chusa was well preserved by dry cleaning.(using n-hexane also solved the problem of bad smell after washing with organic solvents.) The effects of the conservation treatment on the excavated costumes could be seen in the change of Lab color difference. Washing made the distribution of Lab color difference narrower, which may suggest that the impurities on the fiber was removed by washing. In addition, the value of L was greater than a-value and b-value after the treatment. This result indicates that the change of value represents the change of color difference by cleaning.

A Study on the Contaminants Precision Cleaning of Etched Silicon Wafer by Ozone/UV (오존/자외선에 의한 실리콘 웨이퍼의 정밀세정에 관한 연구)

  • Park, H.M.;Lee, C.H.;Chun, B.J.;Yoon, B.H.;Lim, C.H.;Song, H.J.;Kim, Y.H.;Lee, K.S.
    • Proceedings of the KIEE Conference
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    • 2004.07c
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    • pp.1820-1822
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    • 2004
  • In this study, major research fields are classified as ozone generation system for dry cleaning wafer of etched silicon wafer, dry cleaning process of etched silicon wafer which includes SEM analysis and ESCA analysis. The following results are deduced from each experiment and analysis. The magnitudes of carbon and silicon were similar to the survey spectrum of silicon wafer which does not cleaning, but magnitude of oxygen was much bigger Because UV light activates oxygen molecules in the oxide film on the silicon wafer.

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Effects of Cleaning Methods on the Change of Color and Dimensions in Denim Fabric (세탁방법에 따른 데님직물의 변색과 변형)

  • Hwang, So-Yeon;Chung, Hae-Won
    • Fashion & Textile Research Journal
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    • v.12 no.1
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    • pp.114-121
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    • 2010
  • Denim is one of the most frequently used fabrics for blue jeans. After washing denim fabric frequently changes its size and color. Salespersons recommended that after purchasing blue jeans customers should dry clean them once before washing. The aim of this study was to investigate to what degree washing with a household washing machine and dry cleaning affected the dimensions and the color of denim fabric. The denim fabric shrank greatly after the first laundering in warp direction regardless of whether it had been dry-cleaned or not. However, it shrank little from the second to the tenth laundering and after each number of dry cleanings. The thickness of the denim changed in the same way as the shrinkage occurred when the number of launderings or dry-cleanings increased. Although the indigo came out of the denim into washing liquor, both of the $L^*$ values and the $b^*$ values of the laundered and the dry-cleaned denim fabrics were lower than those of the control fabric. Darkening of the fabric after washing attributed to the shrinkage in warp; specifically the deep-blue warp yarns more spaced on the fabric face and the back. The $L^*$ and $b^*$ values of the dry-cleaned fabric decreased less than those of the laundered. The value of $a^*$ increased much less than the other values. Staining of the white cotton fabric laundered with the denim fabrics became less as the number of launderings increased. The degree of staining from the dry-cleaned denim was much lower than that of the laundered fabric.

Simulation of Ultrasonic Dry Cleaning for Semiconductor/display Device Application (반도체/디스플레이 소자용 초음파 건식세정 시뮬레이션 연구)

  • Yun, Eui-Jung;Lee, Gang-won;Kim, Chol-Ho;Lee, Seok-Tae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.17 no.12
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    • pp.1259-1263
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    • 2004
  • In this paper, the optimum design of ultrasonic dry cleaning head was investigated. The transducer instead of mechanical dynamic structure was used to generate ultrasonic wave and the horn-shape amplifier was utilized to solve the energy decaying problem of ultrasonic wave with propagating it through the media. The analyses of ultrasonic wave and a fluid for the selected structure of a cleaning head were carried out using SYSNOISE and ANSYS simulators, respectively. Based on simulator results, the distance between a horn and the substrate of 4 mm and the horn diameter of 10 mm were determined to maximize the energy of ultrasonic waves. The cooling structure was also considered to reduce the heat from the transducer and the horn. The equivalent circuit for the fabricated horn was deduced from HP4194A impedance/gain/phase analyzer and the frequency of an ultrasonic wave of 20.25 kHz was confirmed using the parameters of the equivalent circuit.

Investigation of acoustic monitoring on laser shock cleaning process (레이저 충격파 클리닝 공정에서 음향 모니터링에 관한 연구)

  • 김태훈;이종명;조성호;김도훈
    • Laser Solutions
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    • v.6 no.2
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    • pp.27-33
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    • 2003
  • A laser shock cleaning technology is a new dry cleaning methodology for the effective removal of small particles from the surface. This technique uses a plasma shock wave produced by a breakdown of air due to an intense laser pulse. In order to optimize the laser shock cleaning process, it needs to evaluate the cleaning performance quantitatively by using a monitoring technique. In this paper, an acoustic monitoring technique was attempted to investigate the laser shock cleaning process with an aim to optimize the cleaning process. A wide-band microphone with high sensitivity was utilized to detect acoustic signals during the cleaning process. It was found that the intensity of the shock wave was strongly dependent on the power density of laser beam and the gas species at the laser beam focus. As a power density was larger, the shock wave became stronger. It was also seen that the shock wave became stronger in the case of Ar gas compared with air and N$_2$ gas.

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Study of the Performance of a Dry Cleaning Method for Polluted Ballast Gravel of Railroad Fields (철도부지 오염도상자갈의 건식 정화 기술 성능 연구)

  • Cho, Youngmin;Park, Duckshin;Kwon, Tae-Soon;Lee, Jae-Young
    • Journal of the Korean Society for Railway
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    • v.18 no.6
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    • pp.552-557
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    • 2015
  • Ballast gravel in a railroad field is often polluted by grease and heavy metals. In this paper, the performances of a dry cleaning method for polluted ballast gravel in which pollutants on the gravel surface can be physically removed was extensively studied. A polluted ballast cleaning device able to shoot emery blasting media onto the surface using compressed air was prepared. Polluted ballast gravel was put into this device for cleaning, with the treatment time varied from 1 to 10 min. The cleaning efficiency of the total petroleum hydrocarbons and heavy metals were studied. The total petroleum hydrocarbon removal efficiency was 70-80% for gravels sampled from a locomotive waiting line, while it was 40-60% for gravels sampled from a turnout area. The heavy metal removal efficiency exceeded 90% for copper and lead, while it was 65-80% for nickel and zinc. This system was found to be effective for the remediation of polluted ballast gravels.

Frictional Characteristics of Woven and Nonwoven Wipes

  • Das A.;Kothari V. K.;Mane D.
    • Fibers and Polymers
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    • v.6 no.4
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    • pp.318-321
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    • 2005
  • Demand for the fabric wipes is growing continuously. Wipes in industry are used for cleaning purpose. Cleaning involves rubbing action, so it is very important to know how much frictional force is encountered during the cleaning action. In this study the effects of normal load, sliding speed on frictional characteristics of nonwoven and woven wipes, both dry and wetted with different liquids, against glass and floor tile surfaces have been reported. With the increase in the normal load the coefficient of friction goes on decreasing for both nonwoven and woven wipes and this trend is observed in both dry and wet wipes. The coefficient of friction of both nonwoven and woven wipes against glass surface is in general higher than the floor tile surface. The wipes wetted with water shows an increase in coefficient of friction as compared to dry sample, but there is reduction in the coefficient of friction when the wipe samples are wetted with vegetable oil. In case of dry wipes, the coefficient of friction in case of nonwoven wipe is higher than the woven wipe. In case of woven wipes, the ranges of coefficient of friction either due to change in liquid type, normal load or sliding speed are in general smaller than that in case of nonwoven fabrics.

A study of dry cleaning for metallic contaminants on a silicon wafer using UV-excited chlorine radical (UV-excited chlorine radical을 이용한 실리콘 웨이퍼상의 금속 오염물의 건식세정에 관한 연구)

  • 손동수;황병철;조동률;김경중;문대원;구경완
    • Journal of the Korean Vacuum Society
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    • v.6 no.1
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    • pp.9-19
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    • 1997
  • The reaction mechanisms of dry cleaning with UV-excited chlorine radical for Zn, Fe and Ti trace contaminants on the Si wafer have been studied by SEM, AFM and XPS analyses in this work. The patterned Zn, Fe and Ti films were deposited on the Si wafer surface by thermal evaporation and changes in the surface morphology after dry cleaning with $Cl_2$and UV/$Cl_2$at $200^{\circ}C$ were studied by optical microscopy and SEM. In addition, changes in the surface roughness of Si wafer with the cleaning was observed by AFM. The chemical bonding states of the Zn, Fe and Ti deposited silicon surface were observed with in-line XPS analysis. Zn and Fe were easily cleaned in the form of volatile zinc-chloride and iron-chloride as verified by the surface morphology changes. Ti which forms involatile oxides was not easily removed at room temperature but was slightly removed by UV/$Cl_2$at elevated temperature of $200^{\circ}C$. It was also found that the surface roughness of the Si wafer increased after $Cl_2$and UV/$Cl_2$cleaning. Therefore, the metallic contaminants on the Si wafer can be easily removed at lower temperature without surface damage by a continuous process using wet cleaning followed by UV/$Cl_2$dry cleaning.

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Effects of Chestnut hulls Mordant on Oenothera Odorata Jacguin-Dyed Fabrics (달맞이꽃 염색시 율피매염 효과)

  • Seo, Hye-Young;Kim, Hye-Rim;Song, Wha-Soon
    • Fashion & Textile Research Journal
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    • v.13 no.6
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    • pp.983-989
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    • 2011
  • This study aimed to identify mordant effects of Chestnut hulls. The color of post and pre-mordanted fabrics were measured in terms of H, V, C, $L^*$, $a^*$, $b^*$, and K/S values. In addition, color fastness and antimicrobial activity were evaluated. The pre-mordant concentration of Chestnut hulls for cotton, mercerized cotton and silk was optimized to 50% (o.w.f.) and 70% (o.w.f.), respectively. Post-mordant concentration of Chestnut hulls of mercerized cotton, silk and cotton was optimized to 50% (o.w.f.) and 90% (o.w.f.), respectively. The hue of fabrics was influenced by mordant methods, such as pre-mordant and post-mordant, slightly. Wet cleaning fastness of pre-mordanted cotton and mercerized cotton fabrics was higher than that of post-mordanted fabrics. The wet cleaning fastness of silk fabrics was not affected by the mordant method, and their fastness were proved to be excellent. The dry cleaning fastness of post-mordanted cotton fabrics was higher than that of pre-mordanted cotton fabrics. The dry cleaning fastness of mercerized cotton and silk was proved to be excellent regardless of mordant methods. The antimicrobial activity of Oenothera odorata jacquin dyed fabrics and Chestnut hulls mordanted fabrics was proved to 99.9%, and their excellent antimicrobial activity remained after wet and dry cleaning.

Natural Dyeing with Evening Primrose (달맞이꽃을 이용한 천연염색)

  • Seo, Hye-Young;Song, Wha-Soon;Kim, Hye-Rim
    • Journal of the Korean Society of Clothing and Textiles
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    • v.35 no.2
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    • pp.181-191
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    • 2011
  • This study examines the effects of Evening primrose on colors, color fastness, and the antimicrobial activity of dyed fabrics. The results are as follows. The dyeing conditions of Evening primrose on cotton and mercerized cotton were optimized at $50^{\circ}C$, 60 minutes, and 200% (o.w.f.). In addition, Evening primrose dyeing on silk was determined at $90^{\circ}C$, 60 minutes and 200% (o.w.f.). The pre-mordant concentration of chemicals of cotton, mercerized cotton and silk was optimized at 1% (o.w.f.). The post-mordant concentration on mercerized cotton, silk and cotton was determined at 1% (o.w.f.) and 3% (o.w.f.), respectively. The mordant methods (such as pre-mordant and post-mordant) were slightly affected on the hue of dye-fabrics. Wet cleaning fastness of cotton was improved by post-mordant; otherwise, the wet cleaning fastness of mercerized cotton and silk was improved by a pre-mordant. The dry cleaning fastness of cotton and silk was excellent regardless of mordant methods. The dry cleaning fastness of mercerized cotton was improved by a post-mordant compared to a pre-mordant. The antimicrobial activity of Evening primrose-dyed fabrics was shown at 99.9%. The excellent antimicrobial activity of dyed fabrics remained after the mordant as well as wet and dry cleaning.