• 제목/요약/키워드: Dry cleaning

검색결과 331건 처리시간 0.025초

제천출토 청송심씨 출토유물의 보존처리 (A Study on the Conservation of Lady Shim's Costume Excavated in Jecheon Province)

  • 박봉순;이목근;장인우
    • 복식
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    • 제65권7호
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    • pp.47-59
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    • 2015
  • This paper studies the conservation treatment of Lady Shim's costume, which was excavated in Jecheon Province in 2012. There were the significant problems, which were encountered in the treatment of the costume ; First the Jeogoris were transformed during the excavation, Second fibers were seriously deteriorated, Third most of the fabrics such as Chusa were readily deformed. To overcome these problems and to secure stability in the conservation treatment, we decided to alternate between two different washing methods ; dry cleaning by n-hexane and wet cleaning by water. The costume shape was recovered by steaming and by swelling with Hanji(Korean traditional paper). The combined cleaning method proved to be relatively efficient and stable. In addition, the shape of Chusa was well preserved by dry cleaning.(using n-hexane also solved the problem of bad smell after washing with organic solvents.) The effects of the conservation treatment on the excavated costumes could be seen in the change of Lab color difference. Washing made the distribution of Lab color difference narrower, which may suggest that the impurities on the fiber was removed by washing. In addition, the value of L was greater than a-value and b-value after the treatment. This result indicates that the change of value represents the change of color difference by cleaning.

오존/자외선에 의한 실리콘 웨이퍼의 정밀세정에 관한 연구 (A Study on the Contaminants Precision Cleaning of Etched Silicon Wafer by Ozone/UV)

  • 박현미;이창호;전병준;윤병한;임창호;송현직;김영훈;이광식
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2004년도 하계학술대회 논문집 C
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    • pp.1820-1822
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    • 2004
  • In this study, major research fields are classified as ozone generation system for dry cleaning wafer of etched silicon wafer, dry cleaning process of etched silicon wafer which includes SEM analysis and ESCA analysis. The following results are deduced from each experiment and analysis. The magnitudes of carbon and silicon were similar to the survey spectrum of silicon wafer which does not cleaning, but magnitude of oxygen was much bigger Because UV light activates oxygen molecules in the oxide film on the silicon wafer.

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세탁방법에 따른 데님직물의 변색과 변형 (Effects of Cleaning Methods on the Change of Color and Dimensions in Denim Fabric)

  • 황소연;정혜원
    • 한국의류산업학회지
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    • 제12권1호
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    • pp.114-121
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    • 2010
  • Denim is one of the most frequently used fabrics for blue jeans. After washing denim fabric frequently changes its size and color. Salespersons recommended that after purchasing blue jeans customers should dry clean them once before washing. The aim of this study was to investigate to what degree washing with a household washing machine and dry cleaning affected the dimensions and the color of denim fabric. The denim fabric shrank greatly after the first laundering in warp direction regardless of whether it had been dry-cleaned or not. However, it shrank little from the second to the tenth laundering and after each number of dry cleanings. The thickness of the denim changed in the same way as the shrinkage occurred when the number of launderings or dry-cleanings increased. Although the indigo came out of the denim into washing liquor, both of the $L^*$ values and the $b^*$ values of the laundered and the dry-cleaned denim fabrics were lower than those of the control fabric. Darkening of the fabric after washing attributed to the shrinkage in warp; specifically the deep-blue warp yarns more spaced on the fabric face and the back. The $L^*$ and $b^*$ values of the dry-cleaned fabric decreased less than those of the laundered. The value of $a^*$ increased much less than the other values. Staining of the white cotton fabric laundered with the denim fabrics became less as the number of launderings increased. The degree of staining from the dry-cleaned denim was much lower than that of the laundered fabric.

반도체/디스플레이 소자용 초음파 건식세정 시뮬레이션 연구 (Simulation of Ultrasonic Dry Cleaning for Semiconductor/display Device Application)

  • 윤의중;이강원;김철호;이석태
    • 한국전기전자재료학회논문지
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    • 제17권12호
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    • pp.1259-1263
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    • 2004
  • In this paper, the optimum design of ultrasonic dry cleaning head was investigated. The transducer instead of mechanical dynamic structure was used to generate ultrasonic wave and the horn-shape amplifier was utilized to solve the energy decaying problem of ultrasonic wave with propagating it through the media. The analyses of ultrasonic wave and a fluid for the selected structure of a cleaning head were carried out using SYSNOISE and ANSYS simulators, respectively. Based on simulator results, the distance between a horn and the substrate of 4 mm and the horn diameter of 10 mm were determined to maximize the energy of ultrasonic waves. The cooling structure was also considered to reduce the heat from the transducer and the horn. The equivalent circuit for the fabricated horn was deduced from HP4194A impedance/gain/phase analyzer and the frequency of an ultrasonic wave of 20.25 kHz was confirmed using the parameters of the equivalent circuit.

레이저 충격파 클리닝 공정에서 음향 모니터링에 관한 연구 (Investigation of acoustic monitoring on laser shock cleaning process)

  • 김태훈;이종명;조성호;김도훈
    • 한국레이저가공학회지
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    • 제6권2호
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    • pp.27-33
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    • 2003
  • A laser shock cleaning technology is a new dry cleaning methodology for the effective removal of small particles from the surface. This technique uses a plasma shock wave produced by a breakdown of air due to an intense laser pulse. In order to optimize the laser shock cleaning process, it needs to evaluate the cleaning performance quantitatively by using a monitoring technique. In this paper, an acoustic monitoring technique was attempted to investigate the laser shock cleaning process with an aim to optimize the cleaning process. A wide-band microphone with high sensitivity was utilized to detect acoustic signals during the cleaning process. It was found that the intensity of the shock wave was strongly dependent on the power density of laser beam and the gas species at the laser beam focus. As a power density was larger, the shock wave became stronger. It was also seen that the shock wave became stronger in the case of Ar gas compared with air and N$_2$ gas.

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철도부지 오염도상자갈의 건식 정화 기술 성능 연구 (Study of the Performance of a Dry Cleaning Method for Polluted Ballast Gravel of Railroad Fields)

  • 조영민;박덕신;권태순;이재영
    • 한국철도학회논문집
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    • 제18권6호
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    • pp.552-557
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    • 2015
  • 철도부지의 도상자갈은 윤활유, 중금속 등으로 오염된 경우가 많다. 이에 본 연구에서는 오염된 자갈표면의 오염물질을 물리적으로 제거하는 오염도상자갈의 건식 정화 기술 성능을 알아보고자 하였다. 오염도상자갈 표면에 경도가 높은 금강사 연마재를 압축공기를 이용하여 분사할 수 있는 오염자갈 정화 장치를 제작하고, 여기에 오염자갈을 투입하여, 처리 시간을 1~10분까지 다양하게 변화시키면서 도상자갈의 석유계총탄화수소와 중금속 등의 정화 효율을 알아보았다. 석유계총탄화수소 제거 효율은 기관차 정차장에서 포집한 차량 윤활유 오염자갈은 70-80%로 다소 높은 반면에, 분기기에서 포집한 분기기 윤활유 오염자갈은 40-60%로 비교적 낮았다. 중금속 제거 효율은 구리와 납이 90% 이상으로 높은 반면에 니켈과 아연은 65-80%로 비교적 낮았다. 실험 결과 건식 자갈 정화 기술은 오염자갈의 처리에 효율적임을 확인할 수 있었다.

Frictional Characteristics of Woven and Nonwoven Wipes

  • Das A.;Kothari V. K.;Mane D.
    • Fibers and Polymers
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    • 제6권4호
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    • pp.318-321
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    • 2005
  • Demand for the fabric wipes is growing continuously. Wipes in industry are used for cleaning purpose. Cleaning involves rubbing action, so it is very important to know how much frictional force is encountered during the cleaning action. In this study the effects of normal load, sliding speed on frictional characteristics of nonwoven and woven wipes, both dry and wetted with different liquids, against glass and floor tile surfaces have been reported. With the increase in the normal load the coefficient of friction goes on decreasing for both nonwoven and woven wipes and this trend is observed in both dry and wet wipes. The coefficient of friction of both nonwoven and woven wipes against glass surface is in general higher than the floor tile surface. The wipes wetted with water shows an increase in coefficient of friction as compared to dry sample, but there is reduction in the coefficient of friction when the wipe samples are wetted with vegetable oil. In case of dry wipes, the coefficient of friction in case of nonwoven wipe is higher than the woven wipe. In case of woven wipes, the ranges of coefficient of friction either due to change in liquid type, normal load or sliding speed are in general smaller than that in case of nonwoven fabrics.

UV-excited chlorine radical을 이용한 실리콘 웨이퍼상의 금속 오염물의 건식세정에 관한 연구 (A study of dry cleaning for metallic contaminants on a silicon wafer using UV-excited chlorine radical)

  • 손동수;황병철;조동률;김경중;문대원;구경완
    • 한국진공학회지
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    • 제6권1호
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    • pp.9-19
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    • 1997
  • 본 연구에서는 실리콘 웨이퍼 표면에 존재하는 미량의 Zn, Fe, Ti 금속 오염물들이 UV-excited chlorine radical을 이용한 건식세정 방법으로 제거되는 반응과정을 찾아내고자 하였다. 실리콘 웨이퍼 상에 진공증착법으로 원형패턴이 있는 Zn, Fe, Ti 박막을 증착시켜 상온 및 $200^{\circ}C$에서 UV/$Cl_2$세정하였을 때, 염소 래디컬($Cl^*$)이 Fe, Zn, Ti와 반응하여 제거되 는 것을 반응 전후 광학현미경과 SEM을 통해 표면 형상 변화를 관찰하였고, in-line으로 연결된 XPS를 통해서 반응 후 웨이퍼 표면에 남아있는 화합물의 화학적 결합상태를 관찰 하였으며, UV/$Cl_2$ 세정 후 실리콘 기판이 손상받는 정도를 알기 위해 AFM으로 표면 거칠 기를 측정하였다. 광학현미경과 SEM의 분석 결과에 의하면 Zn와 Fe는 쉽게 제거되는 반면 염화물을 형성하기 보다는 휘발성이 적은 산화물을 형성하는 경향이 강한 Ti은 약간만 제 거되는 것을 확인하였다. XPS분석을을 통해서 이들 금속 오염물들이 chlorine radical과 반 응하여 웨이퍼 표면에 금속 염화물을 형성하고 있는 것을 확인하였고, UV/$Cl_2$세정처리를 하였을 때 실리콘 웨이퍼의 표면 거칠기가 약간 증가하는 것을 알 수 있었다. 지금까지의 결 과를 볼 때, 습식세정과 UV/$Cl_2$건식세정을 병행하면 플라즈마 및 레이저를 사용하는 다른 건식세정 방법에 비하여 보다 저온에서 실리콘 기판의 큰 손상 없이 비교적 용이하게 금속 오염물을 제거할 수 있음을 제안 하였다.

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달맞이꽃 염색시 율피매염 효과 (Effects of Chestnut hulls Mordant on Oenothera Odorata Jacguin-Dyed Fabrics)

  • 서혜영;김혜림;송화순
    • 한국의류산업학회지
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    • 제13권6호
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    • pp.983-989
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    • 2011
  • This study aimed to identify mordant effects of Chestnut hulls. The color of post and pre-mordanted fabrics were measured in terms of H, V, C, $L^*$, $a^*$, $b^*$, and K/S values. In addition, color fastness and antimicrobial activity were evaluated. The pre-mordant concentration of Chestnut hulls for cotton, mercerized cotton and silk was optimized to 50% (o.w.f.) and 70% (o.w.f.), respectively. Post-mordant concentration of Chestnut hulls of mercerized cotton, silk and cotton was optimized to 50% (o.w.f.) and 90% (o.w.f.), respectively. The hue of fabrics was influenced by mordant methods, such as pre-mordant and post-mordant, slightly. Wet cleaning fastness of pre-mordanted cotton and mercerized cotton fabrics was higher than that of post-mordanted fabrics. The wet cleaning fastness of silk fabrics was not affected by the mordant method, and their fastness were proved to be excellent. The dry cleaning fastness of post-mordanted cotton fabrics was higher than that of pre-mordanted cotton fabrics. The dry cleaning fastness of mercerized cotton and silk was proved to be excellent regardless of mordant methods. The antimicrobial activity of Oenothera odorata jacquin dyed fabrics and Chestnut hulls mordanted fabrics was proved to 99.9%, and their excellent antimicrobial activity remained after wet and dry cleaning.

달맞이꽃을 이용한 천연염색 (Natural Dyeing with Evening Primrose)

  • 서혜영;송화순;김혜림
    • 한국의류학회지
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    • 제35권2호
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    • pp.181-191
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    • 2011
  • This study examines the effects of Evening primrose on colors, color fastness, and the antimicrobial activity of dyed fabrics. The results are as follows. The dyeing conditions of Evening primrose on cotton and mercerized cotton were optimized at $50^{\circ}C$, 60 minutes, and 200% (o.w.f.). In addition, Evening primrose dyeing on silk was determined at $90^{\circ}C$, 60 minutes and 200% (o.w.f.). The pre-mordant concentration of chemicals of cotton, mercerized cotton and silk was optimized at 1% (o.w.f.). The post-mordant concentration on mercerized cotton, silk and cotton was determined at 1% (o.w.f.) and 3% (o.w.f.), respectively. The mordant methods (such as pre-mordant and post-mordant) were slightly affected on the hue of dye-fabrics. Wet cleaning fastness of cotton was improved by post-mordant; otherwise, the wet cleaning fastness of mercerized cotton and silk was improved by a pre-mordant. The dry cleaning fastness of cotton and silk was excellent regardless of mordant methods. The dry cleaning fastness of mercerized cotton was improved by a post-mordant compared to a pre-mordant. The antimicrobial activity of Evening primrose-dyed fabrics was shown at 99.9%. The excellent antimicrobial activity of dyed fabrics remained after the mordant as well as wet and dry cleaning.