• Title/Summary/Keyword: Discharge Flow Rate

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Vacuum Assisted Wound Closure Appliance and Continuous Irrigation on Infected Chronic Wound (감염된 만성창상에서 국소음압세척치료의 이용)

  • Jeong, Jin-Wook;Kim, Jun-Hyung;Jung, Yung-Jin;Park, Mu-Sik;Son, Dae-Gu;Han, Ki-Hwan
    • Archives of Plastic Surgery
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    • v.37 no.3
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    • pp.227-232
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    • 2010
  • Purpose: Continuous irrigation method is an important step in managing wound infection. V.A.C. devices have been used in intractable wounds for reducing discharge, improving local blood flow, and promoting healthy granulation tissue. We expect synergistic effects of reduced infection and more satisfactory, accelerated wound healing when using both methods simultaneously. This study evaluated continuous irrigation combined with V.A.C. appliance for treatment of infected chronic wounds. Methods: We reviewed data from 17 patients with infected intractable chronic wounds. V.A.C. device (Group A) was used in 9 patients, and V.A.C. with antibiotics irrigation (Group B) was used in 8 patients. We placed Mepitel$^{(R)}$ on the surface of wound and placed an irrigation and aspiration tube on each side. A sponge was placed on the Mepitel$^{(R)}$ and covered with film dressing. The wound was irrigated continuously with mixed antibiotics solution at the speed of 200 cc/hr and aspirated through the wall suction at the pressure of -125 mmHg. V.A.C. applied time, wound culture and wound size were compared between the two groups. Results: No complication were seen in two groups. Compared with Group A, in the Group B, V.A.C. applied time was shortened from 32.7 days to 25.6 days and showed efficacy in the reduction rate of wound size. No statistical differences were shown in bacterial reversion. Conclusion: V.A.C. appliance with continuous irrigation is an effective new method of managing infected chronic wounds and useful to reduce treatment duration and decrease wound size. Moreover it could be applied more widely to infected wound.

Numerical Sensitivity Analysis on Hydraulic Characteristics by Dredging in Upstream of Abrupt Expansion Region (급확대 구간에서 준설영향으로 인한 상류 수리특성 변화에 대한 민감도 분석)

  • Jeong, Seok Il;Ryu, Kwang Hyun;Lee, Seung Oh
    • Journal of the Korean Society of Safety
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    • v.32 no.4
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    • pp.46-52
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    • 2017
  • Sediment exchange in river has been affected by artificial changes such as dredging and abnormal climate changes like intense rainfall. Over last decades in Korea, there were many constructions, restoration or rehabilitation in rivers. Therefore, deposition and erosion become more actively occurred than before, which may threaten the river safety such as flood defense. For safety's sake, the dredging of river bed, which is considered as the most typical measure, has been increased to extend hydraulic conveyance compared with previous conditions. However, since it might change the sediment mechanism, there would be another risk at which unexpected side effects such as headward erosion could be occurred. Particularly, sedimentation at abrupt expansion region is able to lead to hydraulic characteristics like water elevation in the upstream region in the beginning of dredging, which, however, has been barely studied in this field. Therefore in this study, the relationship between sediment mechanism at dredging section and hydraulic characteristics in upstream region were presented through numerical simulations in the idealized abruptly widen channel using Delft3D. The ideal channel of 2,000 m length with each side angle of 45 degrees at abruptly widen expansion region was employed to consider the sediment angle of repose. The sensitivity analysis was performed on the dimensionless factors consisted of upstream and downstream depths($h_u$, $h_d$), width($w_u$, $w_d$), water level(H), flow rate(Q) and discharge of sediment($Q_s$). And the sedimentation amount at dredging and the upstream hydraulic characteristics were investigated through that analysis. It showed that $h_d/h_u$, $H/h_u$ and $w_d/w_u$ were more influential in sequence of effect on sedimentation amount, while $h_d/h_u$, $w_d/w_u$ and $H/h_u$ on upstream region. It means that $h_d/h_u$ was revealed as the most significant factors on sedimentation, also it would most highly affect the rising of water level upstream.

Effect of Ozone Injection into Exhaust Gas on Catalytic Reduction of Nitrogen Oxides (촉매 공정의 배기가스 질소산화물 저감 성능에 미치는 오존주입의 영향)

  • Yun, Eun-Young;Mok, Young-Sun;Shin, Dong-Nam;Koh, Dong-Jun;Kim, Kyong-Tae
    • Journal of Korean Society of Environmental Engineers
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    • v.27 no.3
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    • pp.330-336
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    • 2005
  • The ozone injection method was proposed to improve the catalytic process for the removal of nitrogen oxides ($NO_x$). Nitric oxide (NO) in the exhaust gas was first oxidized to nitrogen dioxide ($NO_2$) by ozone produced by dielectric barrier discharge, and then the exhaust gas containing the mixture of NO and $NO_2$ was directed to the catalytic reactor where both NO and $NO_2$ were reduced to $N_2$ in the presence of ammonia as the reducing agent. A commercially available $V_2O_5-WO_3/TiO_2$ catalyst was used as the catalytic reactor. The $NO_2$ content in the mixture of NO and $NO_2$ was changed by the amount of ozone added the exhaust gas. The effect of reaction temperature, initial $NO_x$ concentration, feed gas flow rate, and ammonia concentration on the removal of $NO_x$ at various $NO_2$ contents was examined and discussed. The increase in the content of $NO_2$ by the ozone injection remarkably improved the performance of the catalytic reactor, especially at low temperatures. The present ozone injection method appears to be promising for the improvement of the catalytic reduction of $NO_x$.

Statistical significance test of polynomial regression equation for Huff's quartile method of design rainfall (설계강우량의 Huff 4분위 방법 다항회귀식에 대한 유의성 검정)

  • Park, Jinhee;Lee, Jaejoon;Lee, Sungho
    • Journal of Korea Water Resources Association
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    • v.51 no.3
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    • pp.263-272
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    • 2018
  • For the design of hydraulic structures, the design flood discharge corresponding to a specific frequency is generally used by using the design storm calculated according to the rainfall-runoff relationship. In the past, empirical equations such as rational equations were used to calculate the peak flow rate. However, as the duration of rainfall is prolonged, the outflow patterns are different from the actual events, so the accuracy of the temporal distribution of the probability rainfall becomes important. In the present work, Huff's quartile method is used for the temporal distribution of rainfall, and the third quartile is generally used. The regression equation for Huff's quadratic curve applies a sixth order polynomial equation because of its high accuracy throughout the duration of rainfall. However, in statistical modeling, the regression equation needs to be concise in accordance with the principle of simplicity, and it is necessary to determine the regression coefficient based on the statistical significance level. Therefore, in this study, the statistical significance test for regression equation for temporal distribution of the Huff's quartile method, which is used as the temporal distribution method of design rainfall, is conducted for 69 rainfall observation stations under the jurisdiction of the Korea Meteorological Administration. It is statistically significant that the regression equation of the Huff's quartile method can be considered only up to the 4th order polynomial equation, as the regression coefficient is significant in most of the 69 rainfall observation stations.

'Clinical Observation on the 290 cases of Cerebrovascular Accident' (뇌졸중환자(腦卒中患者) 290례(例)에 대(對)한 임상(臨床) 고찰(考察) (III))

  • Kang, Kwan-Ho;Jun, Chan-Yong;Park, Chong-Hyeong
    • The Journal of Korean Medicine
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    • v.18 no.2
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    • pp.223-244
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    • 1997
  • Clinical observation was done on 290 cases of patients who were diagnosed as CVA with brain CT, TCD, MRI scan and clinical observation. They were hospitalized in the oriental medical hospital of Kyung-Won University from 1st January to 31st December in 1996. 1. The cases were classified into the following kinds : cerebral infarction, cerebral hemorrhage, and transient ischemic attack. The most case of them was the cerebr진 infarction. 2. There is no significant difference in the frequency of strokes in male and female. And the frequency of strokes was highest in the aged over 50. 3. In cerebral infarction the most frequent lesion was the territory of middle cerebral artery, and in cerebral hemorrhage the most frequent lesion was the basal ganglia. 4. The most ordinary preceding disease was hypertension, and the next was diabetes. 5. The rate of recurrence was high in cerebral infarction. 6. The frequency of strokes seems to have no relation to the season. 7. The cerebral infarction occurred usually in resting and sleeping, and the cerebral hemorrhage in acting. 8. The course of entering hospital, most patients visited this hospital as soon as CVA occurred. And the half of patient visited this hospital within 2 days after CVA attack. 9. In the cases of patients who were unconscious at the admission, the prognosis was worse than that of the alert patients. 10. The common symptoms were motor disability and verbal disturbance. 11. The average duration of hospitalization was 27.4 days, and in case of cerebral hemorrhage the duration was prolonged. 12. The average time to start physical therapy was 13.3rd day after stroke in cerebral infarction and it was 19.9th day after stroke in cerebral hemorrhage. 13. The common complications were urinary tract infection, pneumonia, myocardial infarction and so on. 15. At the time of entering hospital, in most cases the blood pressure was high, but blood pressure was well controlled at the time of discharge. 16. Generally reported, hypercholesterolemia and hypertriglyceridemia are usually found in cerebral infarction. But in this study, they were found more frequently in cerebral hemorrhage than in infarction. 17, In the most cases, western and oriental medical treatments were given simultaneously. 18. In acute or subacute stage, the methods of smoothening the flow of KI(順氣), dispelling phlegm(祛痰), clearing away heat(淸熱) or purgation(瀉下) were frequently used. And in recovering stage, the methods of replenishing KI(補氣), tonifying the blood(補血) or tranquilization(安神) were frequently used.

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Treatment of highly concentrated organic wastewater by high efficiency $UV/TiO_{2}$ photocatalytic system (고효율 자외선/광촉매 시스템을 이용만 고농도 유기성 폐수처리)

  • Kim, Jung-Kon;Jung, Hyo-Ki;Son, Joo-Young;Kim, Si-Wouk
    • KSBB Journal
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    • v.23 no.1
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    • pp.83-89
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    • 2008
  • Food wastewater derived from the three-stage methane fermentation system developed in this lab contained high concentration organic substances. The organic wastewater should be treated through advanced wastewater treatment system to satisfy the "Permissible Pollutant Discharge Standard of Korea". In order to treat the organic wastewater efficiently, several optimum operation conditions of a modified $UV/TiO_{2}$ photocatalytic system have been investigated. In the first process, wastewater was pre-treated with $FeCl_{3}$. The optimum pH and coagulant concentration were 4.0 and 2000mg/L, respectively. Through this process, 52.6% of CODcr was removed. The second process was $UV-TiO_{2}$ photocatalytic reaction. The optimum operation conditions for the system were as follows: UV lamp wavelength, 254 nm; wastewater temperature, $40^{\circ}C$; pH 8.0; and air flow rate, 40L/min, respectively. Through the above two combined processes, 69.7% of T-N and 70.9% of CODcr contained in the wastewater were removed.

Characteristic of Partial Oxidation of Methane and Ni Catalyst Reforming using GlidArc Plasma (GlidArc 플라즈마를 이용한 메탄 부분산화 및 Ni 촉매 개질 특성)

  • Kim, Seong-Cheon;Chun, Young-Nam
    • Journal of Korean Society of Environmental Engineers
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    • v.30 no.12
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    • pp.1268-1272
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    • 2008
  • Low temperature plasma applied with partial oxidation is a technique to produce synthesis gas from methane. Low temperature plasma reformer has superior miniaturization and start-up characteristics to reformers using steam reforming or CO$_2$ reforming. In this research, a low temperature plasma reformer using GlidArc discharge was proposed. Reforming characteristics for each of the following variables were studied: gas components ratio (O$_2$/CH$_4$), the amount of steam, comparison of reaction on nickle and iron catalysts and the amount of CO$_2$. The optimum conditions for hydrogen production from methane was found. The maximum Hydrogen concentration of 41.1% was obtained under the following in this condition: O$_2$/C ratio of 0.64, total gas flow of 14.2 L/min, catalyst reactor temperature of 672$^{\circ}C$, the amount of steam was 0.8, reformer energy density of 1.1 kJ/L with Ni catalyst in the catalyst reactor. At this point, the methane conversion rate, hydrogen selectivity and reformer thermal efficiency were 66%, 93% and 35.2%, respectively.

Development of Automatic Nutrient-Solution Mixing System Using a Low-Cost and Precise Liquid Metering Device (액제 정밀계량 장치를 이용한 양액 자동조제 시스템 개발)

  • 이규철;류관희;이정훈;김기영;황호준
    • Journal of Biosystems Engineering
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    • v.22 no.4
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    • pp.469-478
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    • 1997
  • This study was conducted to develop an automatic nutrient-solution mixing system for small-scale sewers. The nutrient-solution mixing system consisted of a low-cost and precise metering device and data acquisition & control system with a personal computer. and, the metering device was composed of three parts those were supply pumps, metering cylinders and venturi tube. The system controlled electric conductivity(EC) and pH of nutrient-solution based on the time-based feedback control method with the information about temperature, EC, and pH of the nutrient-solution. The performance of the nutrient-solution mixing system was evaluated through the control of EC and pH while compared with those of commercial system. Also an experimental cultivation of tomato was conducted to verify and to improve the developed system. Results of this study were as follows. 1. The correlation coefficient of meteing device between the flow rate and operating time was 0.9999, and the linear reuession equation computed was y=21.759x, where y is the discharge($g$) and x is the operating time(s). 2. Calculated errors for the developed metering device and two commercial pump were $\pm$0.3% $\pm$2.45% and $\pm$1.38 % FS error respectively. 3. An automatic nutrient-solution mixing system based on a low-cost and precise metering device was developed. 4. The full scale errors of the developed system in controlling EC and pH at 23$\pm$1$^{\circ}C$ were $\pm$0.05mS/cm and $\pm$0.2, respectively 5. When using the commercial system, the controlled values of EC and pH of the 500 $\ell$ of water were 1.29 mS/cm and 6.1 pH for the setting points of 1.4 mS/cm and 6.0 pH respectively at 23$pm1^{\circ}C$. 6. The developed nutrient-solution control system showed $\pm$0.05 ms/cm of deviation from the setting EC value over the experimental cultivation period. 7. The deviation from the average values of Ca and Mg mass content in the several nutrient-solution were 0.5% and 1.8% respectively.

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Formation and Characteristics of the Fluorocarbonated SiOF Film by $O_2$/FTES-Helicon Plasma CVD Method

  • Kyoung-Suk Oh;Min-Sung Kang;Chi-Kyu Choi;Seok-Min Yun
    • Proceedings of the Korean Vacuum Society Conference
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    • 1998.02a
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    • pp.77-77
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    • 1998
  • Present silicon dioxide (SiOz) 떠m as intennetal dielectridIMD) layers will result in high parasitic c capacitance and crosstalk interference in 비gh density devices. Low dielectric materials such as f f1uorina뼈 silicon oxide(SiOF) and f1uoropolymer IMD layers have been tried to s이ve this problem. I In the SiOF ftlm, as fluorine concentration increases the dielectric constant of t뼈 film decreases but i it becomes unstable and wa않r absorptivity increases. The dielectric constant above 3.0 is obtain어 i in these ftlms. Fluoropolymers such as polyte$\sigma$따luoroethylene(PTFE) are known as low dielectric c constant (>2.0) materials. However, their $\alpha$)Or thermal stability and low adhesive fa$\pi$e have h hindered 야1리ru뚱 as IMD ma따"ials. 1 The concept of a plasma processing a찌Jaratus with 비gh density plasma at low pressure has r received much attention for deposition because films made in these plasma reactors have many a advantages such as go여 film quality and gap filling profile. High ion flux with low ion energy in m the high density plasma make the low contamination and go어 $\sigma$'Oss피lked ftlm. Especially the h helicon plasma reactor have attractive features for ftlm deposition 야~au똥 of i앙 high density plasma p production compared with other conventional type plasma soun:es. I In this pa야Jr, we present the results on the low dielectric constant fluorocarbonated-SiOF film d밑JOsited on p-Si(loo) 5 inch silicon substrates with 00% of 0dFTES gas mixture and 20% of Ar g gas in a helicon plasma reactor. High density 띠asma is generated in the conventional helicon p plasma soun:e with Nagoya type ill antenna, 5-15 MHz and 1 kW RF power, 700 Gauss of m magnetic field, and 1.5 mTorr of pressure. The electron density and temperature of the 0dFTES d discharge are measUI벼 by Langmuir probe. The relative density of radicals are measured by optic허 e emission spe따'Oscopy(OES). Chemical bonding structure 3I피 atomic concentration 따'C characterized u using fourier transform infrared(FTIR) s야3띠"Oscopy and X -ray photonelectron spl:’따'Oscopy (XPS). D Dielectric constant is measured using a metal insulator semiconductor (MIS;AVO.4 $\mu$ m thick f fIlmlp-SD s$\sigma$ucture. A chemical stoichiome$\sigma$y of 야Ie fluorocarbina$textsc{k}$영-SiOF film 따~si야영 at room temperature, which t the flow rate of Oz and FTES gas is Isccm and 6sccm, res야~tvely, is form려 야Ie SiouFo.36Co.14. A d dielec$\sigma$ic constant of this fIlm is 2.8, but the s$\alpha$'!Cimen at annealed 5OOt: is obtain려 3.24, and the s stepcoverage in the 0.4 $\mu$ m and 0.5 $\mu$ m pattern 킹'C above 92% and 91% without void, res야~tively. res야~tively.

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Development of Large-area Plasma Sources for Solar Cell and Display Panel Device Manufacturing

  • Seo, Sang-Hun;Lee, Yun-Seong;Jang, Hong-Yeong
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.08a
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    • pp.148-148
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    • 2011
  • Recently, there have been many research activities to develop the large-area plasma source, which is able to generate the high-density plasma with relatively good uniformity, for the plasma processing in the thin-film solar cell and display panel industries. The large-area CCP sources have been applied to the PECVD process as well as the etching. Especially, the PECVD processes for the depositions of various films such as a-Si:H, ${\mu}c$-Si:H, Si3N4, and SiO2 take a significant portion of processes. In order to achieve higher deposition rate (DR), good uniformity in large-area reactor, and good film quality (low defect density, high film strength, etc.), the application of VHF (>40 MHz) CCP is indispensible. However, the electromagnetic wave effect in the VHF CCP becomes an issue to resolve for the achievement of good uniformity of plasma and film. Here, we propose a new electrode as part of a method to resolve the standing wave effect in the large-area VHF CCP. The electrode is split up a series of strip-type electrodes and the strip-type electrodes and the ground ones are arranged by turns. The standing wave effect in the longitudinal direction of the strip-type electrode is reduced by using the multi-feeding method of VHF power and the uniformity in the transverse direction of the electrodes is achieved by controlling the gas flow and the gap length between the powered electrodes and the substrate. Also, we provide the process results for the growths of the a-Si:H and the ${\mu}c$-Si:H films. The high DR (2.4 nm/s for a-Si:H film and 1.5 nm/s for the ${\mu}c$-Si:H film), the controllable crystallinity (~70%) for the ${\mu}c$-Si:H film, and the relatively good uniformity (1% for a-Si:H film and 7% for the ${\mu}c$-Si:H film) can be obtained at the high frequency of 40 MHz in the large-area discharge (280 mm${\times}$540 mm). Finally, we will discuss the issues in expanding the multi-electrode to the 8G class large-area plasma processing (2.2 m${\times}$2.4 m) and in improving the process efficiency.

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