• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• Journal of the Institute of Electronics and Information Engineers
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• v.51 no.12
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• pp.189-194
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• 2014

In this study, from a new x-ray detector that combines a columnar CsI:Na scintillation layer with a photosensitive mercuric iodide layer was investigated. In this structure, X-rays are converted into visible light on a thick CsI:Na layer, which is then converted to electric charges in a thin $HgI_2$ bottom layer. The thin coplanar mercuric iodide films as a photosensitive converter requiring only a few tens of volts of bias, associated with a thick columnar coating of phosphor layer, were simulated and designed. The results of this research suggest that the new coplanar x-ray detector with a hybrid-type structure can resolve the following problems: high voltage from the a-Se, and low conversion efficiency from the indirect conversion method. The results of this research suggest that the new CsI:Na/$HgI_2$ x-ray detector with a double-layer type structure can resolve the following problems: high voltage from the direct conversion method, and low conversion efficiency from the indirect conversion method.

• The Journal of Advanced Prosthodontics
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• v.6 no.1
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• pp.14-21
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• 2014

PURPOSE. The purpose of this study was to evaluate bone response to anodized titanium implants coated with the extract of black cohosh, Asarum Sieboldii, and pharbitis semen. MATERIALS AND METHODS. Forty anodized titanium implants were prepared as follows: group 1 was for control; group 2 were implants soaked in a solution containing triterpenoids extracted from black cohosh for 24 hours; group 3 were implants soaked in a solution containing extracts of black cohosh and Asarum Sieboldii for 24 hours; group 4 were implants soaked in a solution containing extracts of pharbitis semen for 24 hours. The implants from these groups were randomly and surgically implanted into the tibiae of ten rabbits. After 1, 2, and 4 weeks of healing, the nondecalcified ground sections were subjected to histological observation, and the percentage of bone-to-implant contact (BIC%) was calculated. RESULTS. All groups exhibited good bone healing with the bone tissue in direct contact with the surface of the implant. Group 2 ($52.44{\pm}10.98$, $25.54{\pm}5.56$) showed a significantly greater BIC% compared to that of group 3 ($45.34{\pm}5.00$, $22.24{\pm}2.20$) with respect to the four consecutive threads and total length, respectively. The BIC% of group 1 ($25.22{\pm}6.00$) was significantly greater than that of group 3 ($22.24{\pm}2.20$) only for total length. CONCLUSION. This study did not show any remarkable effects of the extract of black coshosh and the other natural products on osseointegration of anodized titanium implants as coating agents. Further studies about the application method of the natural products on to the surface of implants are required.

• KSCE Journal of Civil and Environmental Engineering Research
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• v.31 no.2A
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• pp.129-136
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• 2011

Recently studies on functional concrete with a photocatalytic material such as $TiO_2$ have actively been carried out in order to remove air pollutants. The absorbtion of $TiO_2$ from those studies is applied by it being directly mixed into concrete or by suspension coated on the surface. When it comes to the effectiveness, the former process is less than that of the latter compared with the $TiO_2$ use. As a result, the direct coating of $TiO_2$ on materials' surface is more used for effectiveness. The Surface spread of it needs to have a more than $400^{\circ}C$ heat treat done to stimulate the activation and adhesion of photocatalysis. Heat treat consequently leads hydration products in concrete to be dehydrated and shrunk and is the cause of cracking. The study produces $TiO_2$ used Sol-gel method which enables it to be coated with a low temperature treat, applies it to pearlite using Lightweight Aggregate Concrete fixed with a low temperature treat and evaluates the spread performance of it. In addition to this, the size of pearlite is divided into two types: One is 2.5 mm to 5.0 mm and the other is more than 5.0 mm for the benefit of finding out the removal characteristics of $CH_3CHO$ whether they are affected by pearlite size, mixing method and ratio with $TiO_2$ and elapsed time. The result of this experiment shows that although $TiO_2$ produced by Sol-gel method is treated with 120 temperature, it maintains a high spread rate on the XRF(X ray Florescence) quantitative analysis which ranks $TiO_2$ 38 percent, $SiO_2$ 29 percent and CaO 18 percent. In the size of perlite from 2.5 mm to 5.0 mm, the removal characteristic of $CH_3CHO$ from a low temperature heated Lightweight concrete appears 20 percent higher when $TiO_2$ with Sol-gel method is spreaded on the 7 percent of surface. In other words, the removal rate is 94 percent compared with the 72 percent where $TiO_2$ is mixed in 10 percent surface. In more than 5.0 mm sized perlite, the removal rate of $CH_3CHO$, when $TiO_2$ is mixed with 10 percent, is 69 percent, which is similar with that of the previous case. It suggests that the size of pearlite has little effects on the removal rate of $CH_3CHO$. In terms of Elapsed time, the removal characteristic seems apparent at the early stage, where the average removal rate for the first 10 hours takes up 84 percent compared with that of 20 hours.