• Journal of the Korean Society of Food Science and Nutrition
• /
• v.35 no.9
• /
• pp.1224-1231
• /
• 2006

Sucrose esters were synthesized by transesterification of sucrose with docosahexaenoic acid ethylester mixture (DHAEE). Potassium carbonate as a base catalyst was used in the presence of dimethylsulfoxide (DMSO) for the reactions. The reactions were performed with the different reaction times and molar ratios of substrates in the presence of surfactant in vacuum. Among the reaction conditions in this study, SE#4～7 showed the relatively high conversion rate (>96%) of DHAEE, leading to the high yield of sucrose esters. In addition, the product composition was changed from sucrose mono ester to di/tri/polyesters after the prolonged reaction time while the increased molar ratio of DHAEE also resulted in the composition changes of sucrose mono ester to the sucrose di/tri/polyesters. From the reaction (SE#7), conversion ratio was 98.5% in which 87.3% mono ester and 13.7% di/tri/polyester were found, resulting in the highest content of mono ester. Therefore, the sucrose ester containing various rates of mono and di/tri/polyesters, which effects on hydrophilic lipophilic balance (HLB) values, can be manipulatively synthesized using the reaction conditions reported in this study.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2015.08a
• /
• pp.86.1-86.1
• /
• 2015

As the feature size of Si-based semiconductor shrinks to nanometer scale, we are facing to the problems such as short channel effect and leakage current. One of the solutions to cope with those issues is to bring III-V compound semiconductors to the semiconductor structures, because III-V compound semiconductors have much higher carrier mobility than Si. However, introduction of III-V semiconductors to the current Si-based manufacturing process requires great challenge in the development of process integration, since they exhibit totally different physical and chemical properties from Si. For example, epitaxial growth, surface preparation and wet etching of III-V semiconductors have to be optimized for production. In addition, oxidation mechanisms of III-V semiconductors should be elucidated and re-growth of native oxide should be controlled. In this study, surface preparation methods of various III-V compound semiconductors such as GaAs, InAs, and GaSb are introduced in terms of i) how their surfaces are modified after different chemical treatments, ii) how they will be re-oxidized after chemical treatments, and iii) is there any effect of surface orientation on the surface preparation and re-growth of oxide. Surface termination and behaviors on those semiconductors were observed by MIR-FTIR, XPS, ellipsometer, and contact angle measurements. In addition, photoresist stripping process on III-V semiconductor is also studied, because there is a chance that a conventional photoresist stripping process can attack III-V semiconductor surfaces. Based on the Hansen theory various organic solvents such as 1-methyl-2-pyrrolydone, dimethyl sulfoxide, benzyl alcohol, and propylene carbonate, were selected to remove photoresists with and without ion implantation. Although SPM and DIO3 caused etching and/or surface roughening of III-V semiconductor surface, organic solvents could remove I-line photoresist without attack of III-V semiconductor surface. The behavior of photoresist removal depends on the solvent temperature and ion implantation dose.

• Bulletin of the Korean Chemical Society
• /
• v.24 no.8
• /
• pp.1181-1187
• /
• 2003

Condensation of 4-cyano-5,6-dimethyl-3-pyridazinone 1 with aromatic aldehydes gave the novel styryl derivatives 2a-c. Refluxing of compound 2a with phosphorus oxychloride furnished 3-chloropyridazine derivative 3. Compound 3 was reacted with thiourea and produced pyridazine-3(2H)thione 4. Thieno[2,3-c]- pyridazines 5a-e were achieved by cycloalkylation of compound 4 with halocompounds in methanol under reflux and in the presence of sodium methoxide. Also, refluxing of compound 4 with N-substituted chloroacetamide in the presence of potassium carbonate afforded thienopyridazines 6a-e. Cyclization of compound 6 with some electrophilic reagents as carbon disulfide and triethyl orthoformate furnished the novel pyrimido[4',5':4,5]thieno[2,3-c]pyridazines 12 and 13a-c, respectively. Diazotisation of compound 6 with sodium nitrite in acetic acid produced the pyridazino[4',3':4,5]thieno[3,2-d][1,2,3]triazines 14a-c. Ternary condensation of compound 1, aromatic aldehydes and malononitrile in ethanol containing piperidine under reflux afforded the novel phthalazines 16a-c. Compound 3 was subjected to some nucleophilic substitution reactions with amines and sodium azide and formed the aminopyridazines 17a, b and tetrazolo[1,5-b]-pyridazine 19, respectively. The structures of the synthesized compounds were established by elemental and spectral analyses.

• Journal of Environmental Health Sciences
• /
• v.18 no.2
• /
• pp.102-105
• /
• 1992

Introduction : Isothiazolinone product is one of new preservatives used in cooling tower, paper mill, and general industrial waters.l) It is also effective in controlling bacteria and fungi in the manufacture and storage of dispersed pigments, such as kaolin clays, titanium dioxide, calcium carbonate and others\ulcorner Its broad-spectrum activity, excellent physical and chemical compatibility with anionic, nonionic and cationic surfactants and most organic and inorganic compounds and low toxicity at recommended use levels provide formulators with an effective, economical, and environmentally acceptable alternative to other commercial biocides. It dose not contain or generate formaldehyde and is easy to formulate (1.5% solution is supplied as an aqueous solution), so that it gains advantage over the other preservatives. The active ingredients of the isothiazolinone product are unchlorinated compound (2-methyl-4-isothiazolin-3-one) and chlorinated one (5-chloro-2-methyl-4-isothiazolin-3-one). Methods preferred for the analysis of preservatives are chromatographic methods, especially high performance liquid chromatograph (HPLC). Although several methods were satisfactory in respect to separation, no offical method has been published for the isothiazolinone components. This study was performed to search for an alternative method in order to show flexible operating conditions of HPLC and to reduce assay time.

• Journal of Conservation Science
• /
• v.37 no.4
• /
• pp.370-379
• /
• 2021

In the past, PVAc [poly(vinyl acetate)] was used as a fixative for the conservation of the murals in the murals of the Payathonzu temple located in Bagan, Myanmar. In this study, attention was paid to gel cleaning as a method for stably removing such PVAc fixatives. Based on the recent research trend related to the cleaning of murals in Bagan ruins, 3 types of gelling agents (Nevek^®, Laponite^®RD, Carbopol^®980) and 2 types of organic solvents (Acetone, Dimethyl carbonate) were selected. Six types of gel cleaners were prepared by mixing gelling agents and organic solvents, and the properties and fixative removability of these cleaners were compared. As a result of confirming the properties of the prepared gel cleaners, the pH of the cleaners was all in the weak acidic to weakly alkaline range, which was a stable condition for mural application. Also, there was no difference in the viscosity of the cleaners depending on the type of solvent, but there was a difference depending on the type of gelling agent used. Regarding the weight loss ratio of PVAc, which is an indicator of removability, the exposure conditions of the gel cleaners, the boiling point of the solvent used, and the viscosity of the gelling agent acted as factors affecting. As a result of comparing the removability of gel cleaners, it was confirmed that the solvent's fixative solubility, the volatility of the solvent itself, and the solvent release control properties of the gelling agent had a great effect on the removability of the gel cleaners. In Part 2, the stability and the running applicability of the gel cleaners will be investigated by making mockup samples reflecting the properties of the materials and techniques used to produce the mural paintings in the Payathonzu Temple.

• Clean Technology
• /
• v.12 no.3
• /
• pp.128-137
• /
• 2006

The volume change of an ionic liquid and the phase separation behavior of room temperature ionic liquid(RTIL)/organic compound mixture in supercritical carbon dioxide were measured in a high pressure view cell. 1-Butyl-3-methylimidazolium hexafluorophosphate ([bmim][$PF_6$]) and 1-butyl-3-methylimidazolium tetrafluoroborate ([bmim][$BF_4$]) was used as ionic liquid(IL). and methanol and dimethyl carbonate were used as organic compound. For a fixed amount of [bmim][$PF_6$] the lower critical endpoint (LCEP) pressure, where the liquid phase is split, decreased as increasing the amount of organic compound. The LCEP pressure became higher as the water content of ionic liquid was higher. However, for water contents above a certain value, no LCEP was formed. LCEP appeared 1.0 MPa higher for a mixture with [bmim][$BF_4$] than with [bmim][$PF_6$]. There was almost no difference in the K-point pressures for different types of ionic liquid and for different amounts of organic liquid. When the concentration of ionic liquid([bmim][$PF_6$]) (IL/(IL+MeOH)) in the initial liquid mixture was larger than 5.9 mol% at the LCEP of the mixture, the volume of $L_1$ because larger than the volume of $L_2$. When it was smaller, however, the volume became smaller, too. The volume change of ionic liquid in the presence of carbon dioxide decreased as increasing the temperature, while it increased as increasing the pressure. For temperatures between 313.15 to 343.15K at 300 bar, it was about 123~125 % of the original volume.

• Journal of Korean Society of Occupational and Environmental Hygiene
• /
• v.33 no.4
• /
• pp.517-527
• /
• 2023

Objectives: We examine cases of chemical poisoning that occurred in the cleaning of metal parts and the regulations on halogenated solvents in other countries and propose regulations necessary to prevent chemical poisoning from halogenated solvents. Methods: We collected cases of chemical poisoning through the website of the Korea Occupational Safety and Health Agency. A review of the literature was conducted focusing on regulations related to halogenated solvents in the United States and the European Union, particularly for cleaning metal parts. Among the Material Safety Data Sheets submitted to the government, MSDS containing eleven substances were extracted to confirm the composition and product use. We investigated cleaning methods for metal parts used in South Korea. For the hazard classification, the European Chemicals Agency or Japan's NITE's website was used. Results: In the case of poisoning, the cleaning methods involving trichloromethane were dipping and dry, which was not found in the literature. It was confirmed that many halogenated solvents and dimethyl carbonate were used for metal cleaning in South Korea. In vapor degreasing using TCE in the USA, even if the facility is strictly managed, such as by installing cooling coils in open cleaning facilities, the risk of exposure to TCE is considered to be not only carcinogenic but also a concern for acute and chronic effects. In comparison, exposure through Korean work methods such as dipping and drying operations is inevitably much higher. Conclusions: The transition to water-based cleaning with low-hazard chemicals should be a priority in the cleaning process. In the case of metal parts that require precise cleaning, if the use of a halogenated solvent is inevitable, a closed degreasing facility should be used to minimize exposure. The current regulations in the Occupational Safety and Health Act, the Chemical Substances Control Act, and the Air Environment Conservation Act do not require cleaning facilities to minimize emissions. To protect the health of workers using halogenated solvents to clean metal parts, regulations that require a fundamental reduction in exposure will be necessary.