• Journal of the Korean institute of surface engineering
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• v.29 no.6
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• pp.720-723
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• 1996

The behavior of electrodeposition of amorphous nickel-phosphorus has been studied from the point of deposition mechanism, kinetic parameters, morphology and formation of alloy films. The electorode reaction and electrode kinetics of deposition of nickel were significantly influenced by the content of phosphorus. The cathodic deposition of nickel-phosphorus alloy might be governed by the diffusion process of phosphorous acid. The direction of growth layer of the nickel-phosphorus alloy was different with substrate material. The formation of nickel-phosphorus alloy films was affected considerably by the solution compositions, electrolytic conditions and properties of the material as an underlayer.

• Journal of Powder Materials
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• v.6 no.3
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• pp.215-223
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• 1999

The synthesis of $Ni_5Si_2,\;Ni_2Si$ and NiSi has been investigated by mechanical alloying (MA) of Ni-27.9at%Si, Ni-33.3at%Si and Ni-50.0at%Si powder mixtures. As-received and premilled elemental powders were subjected to MA. The as-received Ni powder was spherical and the mean particle size 48.8$\mu$m, whereas the premilled Ni powder was flaky and the mean particle diameter and thickness were found to be 125 and 5$\mu$m, respectively. The mean surface area of the premilled Mi powder particle was 3.5 times as large as that of the as-received Ni powder particle. The as-received Si powder was was 10.0$\mu$m. Self-propagating high-temperature synthesis (SHS) reaction, followed by a slow reaction (a solid state diffusion), was observed to produce each Ni silicide during MA of the as-received elemental powders. In other word , the reactants and product coexisted for a long period of MA of time. Only SHS reaction was, however, observed to produce each Ni silicide during MA of the premilled elemental powders, indicating that each Ni sillicide formed rather abruptly at a short period of MA time. The mechanisms and reaction rates for the formation of the Ni silicides appeared to be influenced by the elemental powder particle size and shape as well as the heat of formation of the products $(Ni_5Si_2$longrightarrow-43.1kJ/mol.at., $Ni_2Si$$\rightarrow$-47.6kJ/mol.at.).

• Proceedings of the Korean Vacuum Society Conference
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• 2013.08a
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• pp.77.1-77.1
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• 2013

Atomic layer deposition (ALD) is known for its self-limiting reaction, which offers atomic-level controllability of the growth of thin films for a wide range of applications. The self-limiting mechanism leads to very useful properties, such as excellent uniformity over a large area and superior conformality on complex structures. These unique features of ALD provide promising opportunities for future electronics. Although the ALD of Al2O3 film (using trimethyl-aluminum and water as a metal precursor and oxygen source, respectively) can be regarded as a representative example of an ideal ALD based on the completely self-limiting reaction, there are many cases deviating from the ideal ALD reaction in recently developed ALD processes. The nonconventional aspects of the ALD reactions may strongly influence the various properties of the functional materials grown by ALD, and the lack of comprehension of these aspects has made ALD difficult to control. In this respect, several dominant factors that complicate ALD reactions, including the types of metal precursors, non-metal precursors (oxygen sources or reducing agents), and substrates, will be discussed in this presentation. Several functional materials for future electronics, such as higher-k dielectrics (TiO2, SrTiO3) for DRAM application, and resistive switching materials (NiO) for RRAM application, will be addressed in this talk. Unwanted supply of oxygen atoms from the substrate or other component oxide to the incoming precursors during the precursor pulse step, and outward diffusion of substrate atoms to the growing film surface even during the steady-state growth influenced the growth, crystal structure, and properties of the various films.

• KOREAN JOURNAL OF CROP SCIENCE
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• v.33 no.4
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• pp.353-359
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• 1988

Variations in photosynthetic capacities of leaves differing in thickness were explained on the basis of relationships between gas exchange and internal leaf structure. The relative importance of gas diffusion and of biochemical processes as limiting for leaf photosynthesis was also determined. Mesophyll cell surface was considered to be the limiting internal site for gas diffusion. and cell volume to be indicative of the sink capacity for CO$_2$ fixation. Increases in cell surface area were assumed to reduce proportionately mesophyll resistance to the liquid phase diffusion of CO$_2$. Increased cell volume was thought to account for a proportional increase in reaction rates for carboxylation, oxygenation. and dark respiration. This assumption was tested using chamber-grown Glycine max (L.) Merr. cv. Amsoy plants. Plants were grown under 200, 400, and 600 ${\mu}$mol photons m$\^$-2/ s$\^$-1/ of PAR to induce development of various leaf thickness. Photosynthetic CO$_2$ uptake rates were measured on the 3rd and 4th trifoliolate leaves under 1000 ${\mu}$mol photons m$\^$-2/ s$\^$-1/ of PAR and at the air temperature of 28 C. A pseudo -mechanistic photosynthesis model was modified to accommodate the concept of cell surface area as well as both cell volume and surface area. Both versions were used to simulate leaf photosynthesis. Computations based on volume and surface area showed slightly better agreement with experimental data than did those based on the surface area only. This implies that any single factor, whether it is photosynthetic model utilized in this study was suitable for relating leaf thickness to leaf productivity.

• Korean Journal of Ecology and Environment
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• v.34 no.4 s.96
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• pp.261-266
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• 2001

Effects of elevated carbon dioxide ($CO_2$) on soil microbial processes were studied in a northern peatland. Intact peat cores with surface vegetation were collected from a northern Welsh fen, and incubated either under elevated carbon dioxide (700 ppm) or ambient carbon dioxide (350 ppm) conditions for 4 months. Higher algal biomass was found under the elevated $CO_2$ condition, suggesting $CO_2$ fertilization effect on primary production, At the end of the incubation, trace gas production and consumption were analyzed using chemical inhibitors. For methane ($CH_4$ ), methyl fluoride ($CH_3F$) was applied to determine methane oxidation rates, while acetylene ($C_2H_2$) blocking method were applied to determine nitrification and denitrification rates. First, we have adopted those methods to optimize the reaction conditions for the wetland samples. Secondly, the methods were applied to the samples incubated under two levels of $CO_2$. The results exhibited that elevated carbon dioxide increased both methane production (210 vs. $100\;ng\;CH_4 g^{-1}\;hr^{-1}$) and oxidation (128 vs. $15\;ng\;CH_4 g^{-1}\;hr^{-1}$), resulting in no net increase in methane flux. For nitrous oxide ($N_2O$) , elevated carbon dioxide enhanced nitrous oxide emission probably from activation of nitrification process rather than denitrification rates. All of these changes seemed to be substantially influenced by higher oxygen diffusion from enhanced algal productivity under elevated $CO_2$.

• Polymer(Korea)
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• v.25 no.1
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• pp.6-14
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• 2001

The monomer N,N'-bis(3-pyrrol-1-yl-propyl)-4,4'-bipyridinium$(PF_6)_2$ was electrochemically polymerized on glassy carbon electrode surface. This polymer film electrode has electroactive sites on its bipyridinium ions distributed at the polymer strands. The formal potentials of the electrodes were -0.41V and -0.81V(vs. SSCE) for each step at phosphate buffer(pH=5.70). The diffusion coefficients of the dopants ions into the polymer matrix were $1.57{\times}10^{-4}$ and $4.35{\times}10^{-5}cm^2s^{-1}$ for first and second redox couple, respectively. The rate constants of electron transfer at $V^{2+/+}$ of the first step was a $57.53s^{-1}$, which was 22 times higher than $V^{+/0}$ one having $2.63s^{-1}$ in the solution. The charge transfer resistance of the polymer film was influenced by the dopant ion of the electrolyte. Thus the resistances were 22.63, 16.81, 12.44 and $11.36k{\Omega}$ for $LiClO_4,\;NaClO_4,\;KClO_4$, and phosphate buffer, respectively. The reaction order of the electropolymerization was first order and the rate constant of the polymerization was $1.31{\times}10^{-1}s^{-1}$ as determined by EQCM method. The G.C./p-BPB type electrode doped with phosphate ions showed a stability and reproducibility in CV procedure over 20 cycles.

• Clean Technology
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• v.25 no.2
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• pp.101-106
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• 2019

The aim of this study is to investigate the feasibility of an Ni-SA catalyst, which was prepared from nickel, kieselguhr, and alumina, for the hydrogenation of triglyceride in a bench-scale reactor. Ni-SA powders were prepared by precipitating nickel precursors on a silica and alumina support. The powder was reduced in a hydrogen flow, mixed with a saturated palm oil, and then cooled to prepare an Ni-SA catalyst tablet. The sizes of NiO crystals of a commercial Pricat catalyst and the Ni-SA catalyst prepared in this study were $35{\AA}$ and $38{\AA}$, respectively. The pore volume and pore size of the Ni-SA catalyst was much larger than the pore volume and pore size of the Pricat catalyst. In addition, the average particle size of the Ni-SA catalyst was much smaller than that of the Pricat catalyst. The triglyceride hydrogenation reaction was carried out in a semi-batch reactor using catalysts impregnated with oil and molded into tablets. It was found that the Ni-SA catalyst was superior to the commercial Pricat catalyst in triglyceride hydrogenation, which could be ascribed to the raw material and the products being less influenced by the diffusion resistance in the pores of the Ni-SA catalyst. The Ni-SA catalyst prepared in this study has the potential to replace the Pricat catalyst as a catalyst for use in the commercial process for hydrogenation of triglyceride.